Darshan D. Gandhi, Ph.D.
Affiliations: | 2007 | Rensselaer Polytechnic Institute, Troy, NY, United States |
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Materials Science EngineeringGoogle:
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Parents
Sign in to add mentorG Ramanath | grad student | 2007 | RPI | |
(Mechanical and thermal stability of molecularly engineered copper-silica interfaces using organosilane nanolayers.) |
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Publications
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Singh B, Hyun JY, Singh AP, et al. (2010) Selective deposition of a cross-linked low-permittivity polycarbosilane on copper Acs Applied Materials and Interfaces. 2: 2180-2184 |
Gandhi DD, Singh B, Singh AP, et al. (2009) Effects of silylation on fracture and mechanical properties of mesoporous silica films interfaced with copper Journal of Applied Physics. 106 |
Singh AP, Gandhi DD, Singh B, et al. (2009) Pore orientation and silylation effects on mesoporous silica film properties Applied Physics Letters. 94 |
Purkayastha A, Yan Q, Raghuveer MS, et al. (2008) Surfactant-directed synthesis of branched bismuth telluride/sulfide core/shell nanorods. Advanced Materials (Deerfield Beach, Fla.). 20: 2679-83 |
Singh B, Gandhi DD, Singh AP, et al. (2008) Stabilization of mesoporous silica films using multiple organosilanes Applied Physics Letters. 92: 113516 |
Yang H, Yang L, Ling M, et al. (2008) Aging Susceptibility of Terrace-Like Pentacene Films Journal of Physical Chemistry C. 112: 16161-16165 |
Sarkar J, John VT, He J, et al. (2008) Surfactant-Templated Synthesis and Catalytic Properties of Patterned Nanoporous Titania Supports Loaded with Platinum Nanoparticles Chemistry of Materials. 20: 5301-5306 |
Purkayastha A, Yan Q, Gandhi DD, et al. (2008) Sequential organic-inorganic templating and thermoelectric properties of high-aspect-ratio single-crystal lead telluride nanorods Chemistry of Materials. 20: 4791-4793 |
Gandhi DD, Lane M, Zhou Y, et al. (2007) Annealing-induced interfacial toughening using a molecular nanolayer. Nature. 447: 299-302 |
Singh AP, Gandhi DD, Moore R, et al. (2007) Thermal stability of molecularly functionalized mesoporous silica thin films Journal of Applied Physics. 102: 44507 |