Seongyong Cho
Affiliations: | University of Illinois, Urbana-Champaign, Urbana-Champaign, IL |
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Parents
Sign in to add mentorKi-Bum Kim | grad student | 2009-2015 | Seoul Nation University |
Moonsub Shim | post-doc | UIUC |
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Publications
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Kim GH, Lee J, Lee JY, et al. (2021) High-Resolution Colloidal Quantum Dot Film Photolithography via Atomic Layer Deposition of ZnO. Acs Applied Materials & Interfaces |
Kim MS, Kim M, Son S, et al. (2020) Sheet Resistance Analysis of Interface-Engineered Multilayer Graphene: Mobility vs. Sheet Carrier Concentration. Acs Applied Materials & Interfaces |
Beom K, Kim M, Lee H, et al. (2020) Effect of nitrogen-doping on drain current modulation characteristics of an indium-gallium-zinc oxide thin-film transistor. Nanotechnology |
Kim M, Nabeya S, Han SM, et al. (2020) Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application. Acs Applied Materials & Interfaces |
Kim MS, Cho SY, Kim M, et al. (2020) Comparison of Growth Behavior and Electrical Properties of Graphene Grown on Solid and Liquid Copper by Chemical Vapor Deposition. Journal of Nanoscience and Nanotechnology. 20: 316-323 |
Kim G, Noh K, Han J, et al. (2020) Light‐Emitting Diodes: Enhanced Brightness and Device Lifetime of Quantum Dot Light‐Emitting Diodes by Atomic Layer Deposition (Adv. Mater. Interfaces 12/2020) Advanced Materials Interfaces. 7: 2070067 |
Kim G, Noh K, Han J, et al. (2020) Enhanced Brightness and Device Lifetime of Quantum Dot Light‐Emitting Diodes by Atomic Layer Deposition Advanced Materials Interfaces. 7: 2000343 |
Lee S, Kim M, Cho SY, et al. (2019) Electrical properties of graphene/In2O3 bilayer with remarkable uniformity as transparent conducting electrode. Nanotechnology |
Kim M, Nabeya S, Nandi DK, et al. (2019) Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH and Selective Deposition on Defects of Graphene. Acs Omega. 4: 11126-11134 |
Cho S, Kim M, Kim M, et al. (2019) Effect of Cu surface treatment in graphene growth by chemical vapor deposition Materials Letters. 236: 403-407 |