Farhang Shadman - Publications

Affiliations: 
Chemical Engineering University of Arizona, Tucson, AZ 
Area:
Chemical Engineering

64 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Chang Y, Kishore J, Shadman F. Run-Away Energetic Reactions in the Exhaust of Deposition Reactors Advances in Chemical Engineering and Science. 9: 223-238. DOI: 10.4236/Aces.2019.92017  0.365
2019 Wu J, Shadman F. A Controlled Mixing Method for Stabilizing the Purity and Reducing the Waste in Gas Delivery Systems Advances in Chemical Engineering and Science. 9: 11-26. DOI: 10.4236/Aces.2019.91002  0.377
2018 Li M, Shadman F, Ogden KL. Algae-based sorbents for removal of gallium from semiconductor manufacturing wastewater Clean Technologies and Environmental Policy. 20: 899-907. DOI: 10.1007/S10098-018-1497-3  0.423
2017 Zeng C, Shadman F, Sierra-Alvarez R. Transport and abatement of fluorescent silica nanoparticle (SiO2 NP) in granular filtration: effect of porous media and ionic strength Journal of Nanoparticle Research. 19: 105. DOI: 10.1007/S11051-017-3808-8  0.307
2016 Zhao M, Alobeidli A, Chen X, Yam P, Zanelli C, Maraviov S, Nagel M, Shadman F, Keswani MK. Investigation of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications Mrs Advances. 1: 2255-2260. DOI: 10.1557/Adv.2016.313  0.318
2016 Zhao M, Jakes K, Luke K, Kishore J, Gouk R, Verhaverbeke S, Shadman F, Keswani MK. Application of Process Simulation for Comparison of Contactless and Conventional Electrodeposition Methods for 3D Packaging Ecs Journal of Solid State Science and Technology. 5. DOI: 10.1149/2.0111609Jss  0.308
2015 Zhao M, Balachandran R, Patterson Z, Gouk R, Verhaverbeke S, Shadman F, Keswani M. Contactless bottom-up electrodeposition of nickel for 3D integrated circuits Rsc Advances. 5: 45291-45299. DOI: 10.1039/C5Ra03683F  0.382
2015 Speed D, Westerhoff P, Sierra-Alvarez R, Draper R, Pantano P, Aravamudhan S, Chen KL, Hristovski K, Herckes P, Bi X, Yang Y, Zeng C, Otero-Gonzalez L, Mikoryak C, Wilson BA, ... ... Shadman F, et al. Physical, chemical, and in vitro toxicological characterization of nanoparticles in chemical mechanical planarization suspensions used in the semiconductor industry: Towards environmental health and safety assessments Environmental Science: Nano. 2: 227-244. DOI: 10.1039/C5En00046G  0.306
2015 Kishore J, Shadman F, Dittler R, Carl G. Pressure cycling for purging of dead spaces in high-purity gas delivery systems Aiche Journal. 61: 3973-3980. DOI: 10.1002/Aic.14890  0.778
2014 Dittler R, Kishore J, Geisert C, Shadman F. Contamination of Ultra-High-Purity (UHP) Gas Distribution Systems by Back Diffusion of Impurities Journal of the Iest. 57: 63-76. DOI: 10.17764/Jiet.57.1.Lj5X82412J018246  0.774
2014 Dodge MR, Shadman F. Computer modeling of surface interactions and contaminant transport in microstructures during the rinsing of patterned semiconductor wafers Computers and Chemical Engineering. 68: 182-189. DOI: 10.1016/J.Compchemeng.2014.05.018  0.384
2013 Zamani D, Dhane K, Mahdavi O, McBride MA, Yan J, Shadman F. Surface cleaning of small structures during spin rinsing of patterned substrates Microelectronic Engineering. 108: 57-65. DOI: 10.1016/J.Mee.2013.02.092  0.766
2013 Rottman J, Sierra-Alvarez R, Shadman F. Real-time monitoring of nanoparticle retention in porous media Environmental Chemistry Letters. 11: 71-76. DOI: 10.1007/S10311-012-0381-3  0.309
2013 Wang H, Shadman F. Effect of particle size on the adsorption and desorption properties of oxide nanoparticles Aiche Journal. 59: 1502-1510. DOI: 10.1002/Aic.13936  0.406
2012 Rottman J, Shadman F, Sierra-Alvarez R. Interactions of inorganic oxide nanoparticles with sewage biosolids. Water Science and Technology : a Journal of the International Association On Water Pollution Research. 66: 1821-7. PMID 22925851 DOI: 10.2166/Wst.2012.354  0.35
2012 Zamani D, Keswani M, Mahdavi O, Yan J, Raghavan S, Shadman F. Dynamics of interactions between HF and hafnium oxide during surface preparation of high-k dielectrics Ieee Transactions On Semiconductor Manufacturing. 25: 511-515. DOI: 10.1109/Tsm.2012.2196295  0.824
2011 Zamani D, Keswani M, Yan J, Raghavan S, Shadman F. Determining the fundamental kinetic parameters for rinsing and cleaning of hafnium-based high-k materials Ecs Transactions. 41: 45-50. DOI: 10.1149/1.3630825  0.814
2011 Dhane K, Han J, Yan J, Mahdavi O, Zamani D, Vermeire B, Shadman F. Dynamics of cleaning and rinsing of micro and nano structures in single-wafer cleaning tools Ieee Transactions On Semiconductor Manufacturing. 24: 125-133. DOI: 10.1109/Tsm.2010.2089542  0.767
2011 Wang H, Yao J, Shadman F. Characterization of the surface properties of nanoparticles using moisture adsorption dynamic profiling Chemical Engineering Science. 66: 2545-2553. DOI: 10.1016/J.Ces.2011.02.057  0.57
2010 Zhang X, Yan J, Vermeire B, Shadman F, Chae J. Passive Wireless Monitoring of Wafer Cleanliness during Rinsing of Semiconductor Wafers Ieee Sensors Journal. 10: 1048-1055. DOI: 10.1109/Jsen.2010.2042443  0.33
2010 Yao J, Wang H, Dittler R, Geisert C, Shadman F. Application of pressure-cycle purge (PCP) in dry-down of ultra-high-purity gas distribution systems Chemical Engineering Science. 65: 5041-5050. DOI: 10.1016/J.Ces.2010.06.002  0.787
2009 Juneja HS, Yao J, Shadman F. Effect of sampling line characteristics on the dynamic monitoring of fluid concentrations Industrial and Engineering Chemistry Research. 48: 5481-5488. DOI: 10.1021/Ie8016169  0.662
2009 Yan J, Dhane K, Vermeire B, Shadman F. In situ and real-time metrology during rinsing of micro- and nano-structures Microelectronic Engineering. 86: 199-205. DOI: 10.1016/J.Mee.2008.10.014  0.775
2007 Yao J, Iqbal A, Juneja H, Shadman F. Moisture uptake and outgassing in patterned and capped porous low- k dielectric films Journal of the Electrochemical Society. 154. DOI: 10.1149/1.2759829  0.761
2006 Juneja HS, Iqbal A, Yao J, Shadman F. Mechanism and kinetics of nonequilibrium and multilayer adsorption and desorption of gases on solids Industrial and Engineering Chemistry Research. 45: 6585-6593. DOI: 10.1021/Ie060475K  0.791
2006 Iqbal A, Juneja H, Yao J, Shadman F. Removal of moisture contamination from porous polymeric low-k dielectric films Aiche Journal. 52: 1586-1593. DOI: 10.1002/Aic.10760  0.776
2004 Sorooshian J, DeNardis D, Charns L, Li Z, Shadman F, Boning D, Hetherington D, Philipossian A. Arrhenius Characterization of ILD and Copper CMP Processes Journal of the Electrochemical Society. 151. DOI: 10.1149/1.1635388  0.354
2004 Yan J, Seif D, Raghavan S, Barnaby HJ, Vermeire B, Peterson T, Shadman F. Sensor for monitoring the rinsing of patterned wafers Ieee Transactions On Semiconductor Manufacturing. 17: 531-537. DOI: 10.1109/Tsm.2004.837001  0.312
2004 Raghu P, Yim C, Iqbal A, Shadman F, Shero E, Verghese M. Mechanistic study of surface contamination of dielectric oxides using isotope labeling Industrial and Engineering Chemistry Research. 43: 2977-2985. DOI: 10.1021/Ie0305972  0.742
2004 Morris RE, Krikanova E, Shadman F. Photocatalytic membrane for removal of organic contaminants during ultra-purification of water Clean Technologies and Environmental Policy. 6: 96-104. DOI: 10.1007/S10098-003-0198-7  0.376
2004 Raghu P, Yim C, Shadman F, Shero E. Susceptibility of SiO2, ZrO2, and HfO2 dielectrics to moisture contamination Aiche Journal. 50: 1881-1888. DOI: 10.1002/Aic.10148  0.675
2003 Raghu P, Rana N, Yim C, Shero E, Shadman F. Adsorption of Moisture and Organic Contaminants on Hafnium Oxide, Zirconium Oxide, and Silicon Oxide Gate Dielectrics Journal of the Electrochemical Society. 150. DOI: 10.1149/1.1605747  0.806
2003 Rana NB, Shadman F. Effect of interfacial and bulk organic contamination on the quality of thin silicon oxide Ieee Transactions On Semiconductor Manufacturing. 16: 76-81. DOI: 10.1109/Tsm.2002.807736  0.785
2002 Rana N, Raghu P, Shadman F. Kinetics and mechanism of carbon incorporation in ultrathin silicon-based dielectric films Journal of the Electrochemical Society. 149. DOI: 10.1149/1.1466863  0.798
2002 Rana N, Raghu P, Shero E, Shadman F. Interactions of moisture and organic contaminants with SiO2 and ZrO2 gate dielectric films Applied Surface Science. 205: 160-175. DOI: 10.1016/S0169-4332(02)01014-0  0.794
2002 Schmotzer M, Castro ME, Shadman F. Activated carbon removal of organic contaminants in ultra-pure water systems with recycle Clean Technologies and Environmental Policy. 4: 125-132. DOI: 10.1007/S10098-002-0141-3  0.429
2000 Shadman F, Seif D, Peterson T. Fundamentals of wafer rinse processes and the interactions with water conservation and recycling in semiconductor manufacturing plants Diffusion and Defect Data Pt.B: Solid State Phenomena. 76: 189-190. DOI: 10.4028/Www.Scientific.Net/Ssp.76-77.189  0.397
2000 Kin KT, Shadman F. Mechanisms for synergistic oxidation of organics in ultrapure water systems Ieee Transactions On Semiconductor Manufacturing. 13: 1-9. DOI: 10.1109/66.827334  0.404
2000 Wu B, Peterson TW, Shadman F, Senior CL, Morency JR, Huggins FE, Huffman GP. Interactions between vapor-phase mercury compounds and coal char in synthetic flue gas Fuel Processing Technology. 63: 93-107. DOI: 10.1016/S0378-3820(99)00091-0  0.386
1998 Kin K, DeGenova J, Shadman F. Oxidation of organic impurities in the recycle and reclaim loops of ultra-pure water plants Clean Products and Processes. 1: 31-38. DOI: 10.1007/S100980050005  0.736
1997 Degenova J, Shadman F. Recovery, reuse, and recycle of water in semiconductor wafer fabrication facilities Environmental Progress. 16: 263-267. DOI: 10.1002/Ep.3300160414  0.353
1996 Verma NK, Ma C, Shero E, Shadman F. Sources and transport mechanisms of gaseous impurities in vertical thermal reactors Ieee Transactions On Semiconductor Manufacturing. 9: 312-319. DOI: 10.1109/66.536104  0.401
1995 Wu B, Jaanu KK, Shadman F. Multi-functional sorbents for the removal of sulfur and metallic contaminants from high-temperature gases Environmental Science and Technology. 29: 1660-1665. DOI: 10.1021/Es00006A033  0.385
1994 Scotto MV, Uberoi M, Peterson TW, Shadman F, Wendt JOL. Metal capture by sorbents in combustion processes Fuel Processing Technology. 39: 357-372. DOI: 10.1016/0378-3820(94)90192-9  0.353
1993 Verma NK, Haider AM, Shadman F. Contamination of Ultrapure Systems by Back‐Diffusion of Gaseous Impurities Journal of the Electrochemical Society. 140: 1459-1463. DOI: 10.1149/1.2221579  0.347
1992 Parks HG, O'Hanlon JF, Shadman F. Research accomplishments at the University of Arizona SEMATECH Center of Excellence for contamination/defect assessment and control Ieee/Semi Advanced Semiconductor Manufacturing Conference and Workshop. 9-16. DOI: 10.1109/66.216932  0.335
1992 Governal RA, Bonner A, Shadman F. Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops Ieee Transactions On Semiconductor Manufacturing. 5: 70-73. DOI: 10.1109/66.121983  0.313
1991 Governal RA, Bonner A, Shadman F. Effect of Component Interactions on the Removal of Organic Impurities in Ultrapure Water Systems Ieee Transactions On Semiconductor Manufacturing. 4: 298-303. DOI: 10.1109/66.97813  0.319
1991 Haider AM, Shadman F. Desorption of Moisture from Stainless Steel Tubes and Alumina Filters in High Purity Gas Distribution Systems Ieee Transactions On Components, Hybrids, and Manufacturing Technology. 14: 507-511. DOI: 10.1109/33.83935  0.399
1991 Uberoi M, Shadman F. Simultaneous condensation and reaction of metal compound vapors in porous solids Industrial & Engineering Chemistry Research. 30: 624-631. DOI: 10.1021/Ie00052A004  0.33
1991 Uberol M, Shadman F. High-temperature removal of cadmium compounds using solid sorbents Environmental Science and Technology. 25: 1285-1289. DOI: 10.1021/Es00019A009  0.376
1991 Governal RA, Yahya MT, Gerba CP, Shadman F. Oligotrophic bacteria in ultra-pure water systems: Media selection and process component evaluations Journal of Industrial Microbiology. 8: 223-227. DOI: 10.1007/Bf01576059  0.301
1990 Uberoi M, Punjak WA, Shadman F. The kinetics and mechanism of alkali removal from flue gases by solid sorbents Progress in Energy and Combustion Science. 16: 205-211. DOI: 10.1016/0360-1285(90)90029-3  0.409
1990 Zhao Y, Shadman F. Kinetics and mechanism of ilmenite reduction with carbon monoxide Aiche Journal. 36: 1433-1438. DOI: 10.1002/Aic.690360917  0.335
1989 Shadman F. Kinetics of soot combustion during regeneration of surface filters Combustion Science and Technology. 63: 183-191. DOI: 10.1080/00102208908947126  0.312
1989 Punjak WA, Uberoi M, Shadman F. High-temperature adsorption of alkali vapors on solid sorbents Aiche Journal. 35: 1186-1194. DOI: 10.1002/Aic.690350714  0.417
1988 Punjak WA, Shadman F. Aluminosilicate sorbents for control of alkali vapors during coal combustion and gasification Energy and Fuels. 2: 702-708. DOI: 10.1021/Ef00011A017  0.387
1988 Shadman F, Punjak WA. Thermochemistry of alkali interactions with refractory adsorbents Thermochimica Acta. 131: 141-152. DOI: 10.1016/0040-6031(88)80069-8  0.434
1988 Shadman F, Dombek PE. Enhancement of SO2 sorption on lime by structure modifiers Canadian Journal of Chemical Engineering. 66: 930-935. DOI: 10.1002/Cjce.5450660606  0.35
1987 Morris RE, Shadman F. Control of sulphur oxides emission during the roasting of lime-coated metal sulphide pellets Chemical Engineering Science. 42: 9-15. DOI: 10.1016/0009-2509(87)80204-X  0.309
1986 Sams DA, Shadman F. Mechanism of potassium‐catalyzed carbon/CO2 reaction Aiche Journal. 32: 1132-1137. DOI: 10.1002/Aic.690320710  0.319
1985 Bissett EJ, Shadman F. Thermal regeneration of diesel-particulate monolithic filters Aiche Journal. 31: 753-758. DOI: 10.1002/Aic.690310508  0.303
1984 Hamilton RT, Sams DA, Shadman F. Variation of rate during potassium-catalysed CO2 gasification of coal char Fuel. 63: 1008-1012. DOI: 10.1016/0016-2361(84)90326-0  0.335
1983 Hahn WA, Shadman F. Effect of Solid Structural Change on the Rate of NO Formation During Char Combustion Combustion Science and Technology. 30: 89-104. DOI: 10.1080/00102208308923613  0.336
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