| Year |
Citation |
Score |
| 2023 |
Hong W, Guo X, Zhang T, Zhang A, Yan Z, Zhang X, Li X, Guan Y, Liao D, Lu H, Liu H, Hu J, Niu Y, Hong Q, Zhao Y. Flexible Capacitive Pressure Sensor with High Sensitivity and Wide Range Based on a Cheetah Leg Structure via 3D Printing. Acs Applied Materials & Interfaces. PMID 37733928 DOI: 10.1021/acsami.3c09841 |
0.428 |
|
| 2014 |
Li J, Zangooie S, Boinapally K, Zou X, Hu J, Liu Z, Yedur S, Wilkens P, Ver A, Cohen R, Khamsepour B. Scatterometry performance improvement by parameter and spectrum feed-forward Proceedings of Spie. 9050. DOI: 10.1117/12.2046639 |
0.31 |
|
| 2014 |
Li J, Zangooie S, Boinapally K, Zou X, Hu J, Liu Z, Yedur S, Wilkens P, Ver A, Cohen R, Khamsehpour B, Schroder H, Piggot J. Scatterometry performance enhancement by holistic approach Journal of Micro/Nanolithography, Mems, and Moems. 13: 041406. DOI: 10.1117/1.Jmm.13.4.041406 |
0.305 |
|
| 2013 |
Chin H, Ling M, Liu B, Zhang X, Li J, Liu Y, Hu J, Yeo Y. Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry Proceedings of Spie. 8681. DOI: 10.1117/12.2013413 |
0.344 |
|
| 2013 |
Dasari P, Kritsun O, Li J, Volkman C, Hu J, Liu Z. Scatterometry evaluation of focus-dose effects of EUV structures Proceedings of Spie. 8681. DOI: 10.1117/12.2012120 |
0.318 |
|
| 2013 |
Li J, Kritsun O, Dasari P, Volkman C, Wallow T, Hu J. Evaluating scatterometry 3D capabilities for EUV Proceedings of Spie. 8681. DOI: 10.1117/12.2011675 |
0.374 |
|
| 2012 |
Li J, Kritsun O, Liu Y, Dasari P, Volkman C, Hu J. Faster diffraction-based overlay measurements with smaller targets using 3D gratings Proceedings of Spie. 8324. DOI: 10.1117/12.916747 |
0.308 |
|
| 2012 |
Dasari P, Li J, Hu J, Liu Z, Kritsun O, Volkman C. Scatterometry metrology challenges of EUV Proceedings of Spie. 8324. DOI: 10.1117/12.916006 |
0.306 |
|
| 2011 |
Dasari P, Li J, Hu J, Liu Z, Kritsun O, Volkman C. Metrology characterization of spacer double patterning by scatterometry Proceedings of Spie. 7971: 797111. DOI: 10.1117/12.879900 |
0.326 |
|
| 2011 |
Li J, Kritsun O, Liu Y, Dasari P, Weher U, Volkman C, Mazur M, Hu J. Advancements of diffraction-based overlay metrology for double patterning Proceedings of Spie. 7971. DOI: 10.1117/12.879552 |
0.301 |
|
| 2010 |
Dasari P, Hu J, Liu Z, Tan A, Kritsun O, Volkman C, Bencher C. Scatterometry characterization of spacer double patterning structures Proceedings of Spie. 7638. DOI: 10.1117/12.848518 |
0.322 |
|
| 2010 |
Dasari P, Hu J, Liu Z, Tan A, Kritsun O, Volkman C, Bencher C. Scatterometry characterization of spacer double patterning structures Journal of Micro-Nanolithography Mems and Moems. 9: 41309. DOI: 10.1117/1.3531999 |
0.341 |
|
| 2010 |
Li J, Hwu JJ, Liu Y, Rabello S, Liu Z, Hu J. Mueller matrix measurement of asymmetric gratings Journal of Micro-Nanolithography Mems and Moems. 9: 41305. DOI: 10.1117/1.3514708 |
0.318 |
|
| 2009 |
Kim YN, Paek JS, Rabello S, Lee S, Hu J, Liu Z, Hao Y, McGahan W. Device based in-chip critical dimension and overlay metrology. Optics Express. 17: 21336-43. PMID 19997373 DOI: 10.1364/Oe.17.021336 |
0.321 |
|
| 2009 |
Dave AD, Kritsun O, Deng Y, Yoshimoto K, Li J, Hu J. Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry Proceedings of Spie - the International Society For Optical Engineering. 7274. DOI: 10.1117/12.814955 |
0.323 |
|
| 2004 |
Hu J, Korlahalli R, Shivaprasad D, Yang F, Zhang X. Measurements of shallow trench isolation by normal incidence optical critical dimension technique Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22: 1000. DOI: 10.1116/1.1722039 |
0.333 |
|
| 2003 |
Shivaprasad D, Hu J, Tabet M, Hoobler R, Mui D, Liu W. Measurement of semi-isolated polysilicon gate structure with the optical critical dimension technique Journal of Vacuum Science & Technology B. 21: 2517-2523. DOI: 10.1116/1.1622946 |
0.343 |
|
| 2002 |
Nolting F, Lüning J, Rockenberger J, Hu J, Alivisatos AP. A PEEM study of small agglomerates of colloidal iron oxide nanocrystals Surface Review and Letters. 9: 437-440. DOI: 10.1142/S0218625X02002439 |
0.302 |
|
| 1999 |
Hu J, Ouyang M, Yang P, Lieber CM. Controlled growth and electrical properties of heterojunctions of carbon nanotubes and silicon nanowires Nature. 399: 48-51. DOI: 10.1038/19941 |
0.63 |
|
| 1999 |
Hu J, Odom TW, Lieber CM. Chemistry and physics in one dimension: Synthesis and properties of nanowires and nanotubes Accounts of Chemical Research. 32: 435-445. DOI: 10.1021/Ar9700365 |
0.573 |
|
| 1998 |
Hu J, Yang P, Lieber CM. Nitrogen-drivensp3tosp2transformation in carbon nitride materials Physical Review B. 57: R3185-R3188. DOI: 10.1103/Physrevb.57.R3185 |
0.57 |
|
| 1998 |
Hu J, Yang P, Lieber CM. Nitrogen driven structural transformation in carbon nitride materials Applied Surface Science. 127: 569-573. DOI: 10.1016/S0169-4332(97)00707-1 |
0.591 |
|
| 1996 |
Yang P, Zhang ZJ, Hu J, Lieber CM. Pulsed Laser Deposition of Diamond-Like Carbon Thin Films: Ablation Dynamics and Growth Mrs Proceedings. 438. DOI: 10.1557/Proc-438-593 |
0.558 |
|
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