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Jason J. Keleher, Ph.D. - Publications

Affiliations: 
2004 Clarkson University, Potsdam, NY, United States 
Area:
Organic Chemistry, Materials Science Engineering
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9 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Wortman-Otto KM, Graverson CF, Linhart AN, McDonough RK, Mlynarski AL, Keleher JJ. Synergistic Effect of Pad “Macroporous-Reactors” on Passivation Mechanisms to Modulate Cu Chemical Mechanical Planarization (CMP) Performance Ecs Journal of Solid State Science and Technology. 9: 54005. DOI: 10.1149/2162-8777/Ab9B05  0.306
2019 Zubi TB, Wiencek RA, Mlynarski AL, Truffa JM, Wortman-Otto KM, Saucedo C, Salinas MG, Graverson CF, Keleher JJ. Unraveling Slurry Chemistry/Nanoparticle/Polymeric Membrane Adsorption Relevant to Cu Chemical Mechanical Planarization (CMP) Filtration Applications Ecs Journal of Solid State Science and Technology. 8. DOI: 10.1149/2.0041905Jss  0.303
2018 Rickhoff TA, Sullivan E, Werth LK, Kissel DS, Keleher JJ. A biomimetic cellulose-based composite material that incorporates the antimicrobial metal-organic framework HKUST-1 Journal of Applied Polymer Science. 136: 46978. DOI: 10.1002/App.46978  0.409
2012 Soderquist TJ, Chesniak OM, Witt MR, Paramo A, Keeling VA, Keleher JJ. Evaluation of the catalytic decomposition of H2O2 through use of organo-metallic complexes--a potential link to the luminol presumptive blood test. Forensic Science International. 219: 101-5. PMID 22227152 DOI: 10.1016/J.Forsciint.2011.12.005  0.393
2009 Stewart KL, Keleher JJ, Gewirth AA. Synergy of ammonium oxalate and hydrogen peroxide on the dissolution of copper at neutral pH Journal of the Electrochemical Society. 156: H595-H600. DOI: 10.1149/1.3129611  0.336
2007 Cheemalapati K, Keleher J, Li Y. Key Chemical Components in Metal CMP Slurries Microelectronic Applications of Chemical Mechanical Planarization. 201-247. DOI: 10.1002/9780470180907.ch7  0.451
2002 Keleher J, Bashant J, Heldt N, Johnson L, Li Y. Photo-catalytic preparation of silver-coated TiO2 particles for antibacterial applications World Journal of Microbiology & Biotechnology. 18: 133-139. DOI: 10.1023/A:1014455310342  0.459
2000 Hariharaputhiran M, Zhang J, Ramarajan S, Keleher JJ, Li Y, Babu SV. Hydroxyl radical formation in H2O2-amino acid mixtures and chemical mechanical polishing of copper Journal of the Electrochemical Society. 147: 3820-3826. DOI: 10.1149/1.1393979  0.469
2000 Keleher J, Zhang J, Waud S, Li Y. Bridging the Gap: Understanding the Chemistry of CMP The Chemical Educator. 5: 242-245. DOI: 10.1007/S00897000412A  0.523
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