Soon Cho, Ph.D.
Affiliations: | 2004 | University of Maryland, College Park, College Park, MD |
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"Soon Cho"Parents
Sign in to add mentor| Gary W. Rubloff | grad student | 2004 | University of Maryland | |
| (Real-time in-situ chemical sensing in aluminum gallium nitride/gallium nitride metal-organic chemical vapor deposition processes for advanced process control.) | ||||
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| Ponczak BH, Oliver JD, Cho S, et al. (2007) In-situ mass spectrometry for chemical identification in SiC epitaxial deposition Materials Science Forum. 556: 121-124 |
| Cho S, Janiak DS, Rubloff GW, et al. (2005) In situ chemical sensing in AlGaNGaN metal organic chemical vapor deposition process for precision film thickness metrology and real-time advanced process control Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2007-2013 |
| Cho S, Rubloff GW, Aumer ME, et al. (2005) Real-time material quality prediction, fault detection, and contamination control in AlGaN/GaN high electron mobility transistor metalorganic chemical vapor deposition process using in situ chemical sensing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1849-1855 |
| Cho S, Rubloff GW, Aumer ME, et al. (2005) In situ chemical sensing in AlGaNGaN high electron mobility transistor metalorganic chemical vapor deposition process for real-time prediction of product crystal quality and advanced process control Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1386-1397 |
| Cho S, Henn-Lecordier L, Liu Y, et al. (2004) In situ mass spectrometry in a 10 torr W chemical vapor deposition process for film thickness metrology and real-time advanced process control Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 880-887 |
| Cho S, Lei W, Melvin A, et al. (2004) Dynamic simulation and optimization of Cu CVD unit process for environmentally benign manufacturing Ieee Transactions On Semiconductor Manufacturing. 17: 455-469 |
| Xu Y, Gougousi T, Henn-Lecordier L, et al. (2002) Thickness metrology and end point control in W chemical vapor deposition process from SiH4/WF6 using in situ mass spectrometry Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2351-2360 |