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Ramaswamy Sreenivasan, Ph.D. - Publications

Affiliations: 
2007 Chemical Engineering University of Maryland, College Park, College Park, MD 
Area:
Chemical Engineering, Materials Science Engineering
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7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2010 Alf ME, Asatekin A, Barr MC, Baxamusa SH, Chelawat H, Ozaydin-Ince G, Petruczok CD, Sreenivasan R, Tenhaeff WE, Trujillo NJ, Vaddiraju S, Xu J, Gleason KK. Chemical vapor deposition of conformal, functional, and responsive polymer films. Advanced Materials (Deerfield Beach, Fla.). 22: 1993-2027. PMID 20544886 DOI: 10.1002/Adma.200902765  0.328
2008 Sreenivasan R, Adomaitis RA, Rubloff GW. A comparative study of reactor designs for the production of graded films with applications to combinatorial CVD Journal of Crystal Growth. 310: 270-283. DOI: 10.1016/J.Jcrysgro.2007.10.041  0.625
2007 Cai Y, Henn-Lecordier L, Rubloff GW, Sreenivasan R, Choo JO, Adomaitis RA. Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1288-1297. DOI: 10.1116/1.2753851  0.572
2006 Sreenivasan R, Adomaitis RA, Rubloff GW. Demonstration of spatially programmable chemical vapor deposition: Model-based uniformitynonuniformity control Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 2706-2715. DOI: 10.1116/1.2359735  0.642
2005 Sreenivasan R, Adomaitis RA, Rubloff GW, Cai Y. Experimental results from a spatially programmable chemical vapor deposition system Aiche Annual Meeting, Conference Proceedings. 5578.  0.629
2001 Sreenivasan R, Gougousi T, Xu Y, Kidder J, Zafiriou E, Rubloff GW. Run to run control in tungsten chemical vapor deposition using H2/WF6 at low pressures Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 1931-1941. DOI: 10.1116/1.1406159  0.459
2001 Gougousi T, Sreenivasan R, Xu Y, Henn-Lecordier L, Rubloff GW, Kidder JN, Zafiriou E. In-situ Sensing Using Mass Spectrometry and its Use for Run-To-Run Control on a W-CVD Cluster Tool Characterization and Metrology For Ulsi Technology. 550: 249-253. DOI: 10.1063/1.1354406  0.436
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