| Year |
Citation |
Score |
| 2017 |
Chang TH, Xiong S, Liu CC, Liu D, Nealey PF, Ma Z. The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning. Macromolecular Rapid Communications. PMID 28749034 DOI: 10.1002/Marc.201700285 |
0.684 |
|
| 2017 |
Liu C, Franke E, Mignot Y, LeFevre S, Sieg S, Chi C, Meli L, Parnell D, Schmidt K, Sanchez M, Singh L, Furukawa T, Seshadri I, Silva EAD, Tsai H, et al. DSA patterning options for logics and memory applications Proceedings of Spie. 10146: 1014603. DOI: 10.1117/12.2260479 |
0.313 |
|
| 2017 |
Chi C, Liu C, Meli L, Guo J, Parnell D, Mignot Y, Schmidt K, Sanchez M, Farrell R, Singh L, Furukawa T, Lai K, Xu Y, Sanders D, Hetzer D, et al. Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle Proceedings of Spie. 10146. DOI: 10.1117/12.2260454 |
0.346 |
|
| 2017 |
Bonam R, Muthinti R, Breton M, Liu C, Sieg S, Seshadri I, Saulnier N, Shearer J, Patlolla R, Huang H. An OCD perspective of line edge and line width roughness metrology Proceedings of Spie. 10145: 1014511. DOI: 10.1117/12.2258196 |
0.309 |
|
| 2017 |
Bonam R, Liu C, Breton M, Sieg S, Seshadri I, Saulnier N, Shearer J, Muthinti R, Patlolla R, Huang H. Comprehensive analysis of line-edge and line-width roughness for EUV lithography Proceedings of Spie. 10143. DOI: 10.1117/12.2258194 |
0.361 |
|
| 2017 |
Bruce RL, Fraczak G, Papalia JM, Tsai H, BrightSky M, Miyazoe H, Zhu Y, Engelmann SU, Lung H, Masuda T, Suu K, Liu C, Tang H, Arnold JC, Felix N, et al. Directed self-assembly patterning strategies for phase change memory applications Proceedings of Spie. 10149. DOI: 10.1117/12.2257829 |
0.442 |
|
| 2017 |
Lai K, Liu C, Tsai H, Xu Y, Chi C, Raghunathan A, Dhagat P, Hu L, Park O, Jung S, Cho W, Morillo J, Pitera J, Schmidt K, Guillorn M, et al. Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design? Journal of Micro/Nanolithography, Mems, and Moems. 16: 013502. DOI: 10.1117/1.Jmm.16.1.013502 |
0.341 |
|
| 2016 |
Chang TH, Xiong S, Jacobberger RM, Mikael S, Suh HS, Liu CC, Geng D, Wang X, Arnold MS, Ma Z, Nealey PF. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific Reports. 6: 31407. PMID 27528258 DOI: 10.1038/Srep31407 |
0.653 |
|
| 2016 |
Xie T, Vora A, Mulcahey PJ, Nanescu SE, Singh M, Choi DS, Huang JK, Liu CC, Sanders DP, Hahm JI. Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains. Acs Nano. PMID 27462904 DOI: 10.1021/Acsnano.6B03071 |
0.429 |
|
| 2016 |
Wan L, Ji S, Liu CC, Craig GS, Nealey PF. Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates. Soft Matter. PMID 26891026 DOI: 10.1039/C5Sm02829A |
0.651 |
|
| 2016 |
Liu C, Franke E, Lie FL, Sieg S, Tsai H, Lai K, Truong H, Farrell R, Somervell M, Sanders D, Felix N, Guillorn M, Burns S, Hetzer D, Ko A, et al. Directed self-assembly patterning for forming fin field effect transistors Spie Newsroom. DOI: 10.1117/2.1201606.006519 |
0.402 |
|
| 2016 |
Chi C, Liu CC, Meli L, Schmidt K, Xu Y, Desilva EA, Sanchez M, Farrell R, Cottle H, Kawamura D, Singh L, Furukawa T, Lai K, Pitera JW, Sanders D, et al. DSA via hole shrink for advanced node applications Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219706 |
0.416 |
|
| 2016 |
Schmidt K, Osaki H, Nishino K, Sanchez M, Liu CC, Furukawa T, Chi C, Pitera J, Felix N, Sanders D. Strategies to enable directed self-Assembly contact hole shrink for tight pitches Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219213 |
0.444 |
|
| 2016 |
Ji S, Wan L, Liu CC, Nealey PF. Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication Progress in Polymer Science. 54: 76-127. DOI: 10.1016/J.Progpolymsci.2015.10.006 |
0.63 |
|
| 2015 |
Li X, Fan Y, Xiao S, Peng S, Dong X, Zheng X, Liu CC, Li H, Xiao Z. Decreased platelet 5-hydroxytryptamin (5-HT) levels: a response to antidepressants. Journal of Affective Disorders. 187: 84-90. PMID 26321259 DOI: 10.1016/j.jad.2015.08.025 |
0.397 |
|
| 2015 |
Hirahara E, Paunescu M, Polishchuk O, Jeong E, Ng E, Shan J, Kim J, Hong S, Baskaran D, Lin G, Vora A, Tjio M, Arellano N, Rettner CT, Lofano E, ... Liu CC, et al. Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2087398 |
0.507 |
|
| 2015 |
Cheng J, Doerk GS, Rettner CT, Singh G, Tjio M, Truong H, Arellano N, Balakrishnan S, Brink M, Tsai H, Liu CC, Guillorn M, Sanders DP. Customization and design of directed self-assembly using hybrid prepatterns Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086973 |
0.428 |
|
| 2015 |
Liu CC, Lie FL, Rastogi V, Franke E, Mohanty N, Farrell R, Tsai H, Lai K, Ozlem M, Cho W, Jung SG, Strane J, Somervell M, Burns S, Felix N, et al. Fin formation using graphoepitaxy DSA for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086053 |
0.413 |
|
| 2015 |
Torres JA, Jiang F, Ma Y, Mellman J, Lai K, Raghunathan A, Xu Y, Liu CC, Chi C. Directed self assembly on resist-limited guiding patterns for hole grapho-epitaxy: Can DSA help lower EUV's source power requirements? Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2085959 |
0.445 |
|
| 2015 |
Mi H, Mikael S, Liu CC, Seo JH, Gui G, Ma AL, Nealey PF, Ma Z. Creating periodic local strain in monolayer graphene with nanopillars patterned by self-assembled block copolymer Applied Physics Letters. 107. DOI: 10.1063/1.4932657 |
0.524 |
|
| 2015 |
Li X, Fan Y, Xiao S, Peng S, Dong X, Zheng X, Liu CC, Li H, Xiao Z. Decreased platelet 5-hydroxytryptamin (5-HT) levels: A response to antidepressants Journal of Affective Disorders. 187: 84-90. DOI: 10.1016/j.jad.2015.08.025 |
0.395 |
|
| 2014 |
Tsai H, Pitera JW, Miyazoe H, Bangsaruntip S, Engelmann SU, Liu CC, Cheng JY, Bucchignano JJ, Klaus DP, Joseph EA, Sanders DP, Colburn ME, Guillorn MA. Two-dimensional pattern formation using graphoepitaxy of PS-b-PMMA block copolymers for advanced FinFET device and circuit fabrication. Acs Nano. 8: 5227-32. PMID 24670216 DOI: 10.1021/Nn501300B |
0.456 |
|
| 2014 |
Lai K, Ozlem M, Pitera JW, Liu CC, Schepis A, Dechene D, Krasnoperova A, Brue D, Abdallah J, Tsai H, Guillorn M, Cheng J, Doerk G, Tjio M, Topalogu R, et al. Computational lithography platform for 193i-guided directed self-assembly Proceedings of Spie - the International Society For Optical Engineering. 9052. DOI: 10.1117/12.2046920 |
0.313 |
|
| 2014 |
Liu CC, Estrada-Raygoza C, He H, Cicoria M, Rastogi V, Mohanty N, Tsai H, Schepis A, Lai K, Chao R, Liu D, Guillorn M, Cantone J, Mignot S, Kim RH, et al. Towards electrical testable soi devices using directed self-assembly for fin formation Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046462 |
0.35 |
|
| 2013 |
Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp LE, Topuria T, Arellano N, Sanders DP. Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy. Acs Nano. 7: 276-85. PMID 23199006 DOI: 10.1021/Nn303974J |
0.481 |
|
| 2013 |
Tsai H, Guillorn M, Doerk G, Cheng J, Sanders D, Lai K, Liu C, Colburn M. Directed self-assembly for ever-smaller printed circuits Spie Newsroom. DOI: 10.1117/2.1201303.004743 |
0.371 |
|
| 2013 |
Lai K, Liu CC, Pitera J, Dechene DJ, Schepis A, Abdallah J, Tsai H, Guillorn M, Cheng J, Doerk G, Tjio M, Rettner C, Odesanya O, Ozlem M, Lafferty N. Computational aspects of optical lithography extension by Directed Self-Assembly Proceedings of Spie - the International Society For Optical Engineering. 8683. DOI: 10.1117/12.2012440 |
0.362 |
|
| 2013 |
Liu CC, Estrada-Raygoza IC, Abdallah J, Holmes S, Yin Y, Schepis A, Cicoria M, Hetzer D, Tsai H, Guilllorn M, Tjio M, Cheng J, Somervell M, Colburn M. Directed self-assembly process implementation in a 300mm pilot line environment Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011610 |
0.416 |
|
| 2013 |
Tsai HY, Miyazoe H, Engelmann S, Liu CC, Gignac L, Bucchignano J, Klaus D, Breslin C, Joseph E, Cheng J, Sanders D, Guillorn M. Pattern transfer of directed self-assembly patterns for CMOS device applications Journal of Micro/Nanolithography, Mems, and Moems. 12. DOI: 10.1117/1.Jmm.12.4.041305 |
0.459 |
|
| 2013 |
Liu CC, Ramírez-Hernández A, Han E, Craig GSW, Tada Y, Yoshida H, Kang H, Ji S, Gopalan P, De Pablo JJ, Nealey PF. Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features Macromolecules. 46: 1415-1424. DOI: 10.1021/Ma302464N |
0.653 |
|
| 2012 |
Onses MS, Liu CC, Thode CJ, Nealey PF. Highly selective immobilization of Au nanoparticles onto isolated and dense nanopatterns of poly(2-vinyl pyridine) brushes down to single-particle resolution. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 7299-307. PMID 22497347 DOI: 10.1021/La300552W |
0.735 |
|
| 2012 |
Liu CC, Pitera J, Lafferty N, Lai K, Rettner C, Tjio M, Arellano N, Cheng J. Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916525 |
0.365 |
|
| 2012 |
Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp L, Topuria T, Arellano N, Sanders DP. Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916421 |
0.427 |
|
| 2012 |
Tsai HY, Miyazoe H, Engelmann S, To B, Sikorski E, Bucchignano J, Klaus D, Liu CC, Cheng J, Sanders D, Fuller N, Guillorn M. Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4767237 |
0.47 |
|
| 2012 |
Peter Yang CY, Yang EL, Steinhaus CA, Liu CC, Nealey PF, Skinner JL. Planar-localized surface plasmon resonance device by block-copolymer and nanoimprint lithography fabrication methods Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.3683475 |
0.544 |
|
| 2011 |
Onses MS, Pathak P, Liu CC, Cerrina F, Nealey PF. Localization of multiple DNA sequences on nanopatterns. Acs Nano. 5: 7899-909. PMID 21899356 DOI: 10.1021/Nn2021277 |
0.712 |
|
| 2011 |
Ji S, Nagpal U, Liao W, Liu CC, de Pablo JJ, Nealey PF. Three-dimensional directed assembly of block copolymers together with two-dimensional square and rectangular nanolithography. Advanced Materials (Deerfield Beach, Fla.). 23: 3692-7. PMID 21735489 DOI: 10.1002/Adma.201101813 |
0.657 |
|
| 2011 |
Päivänranta B, Sahoo PK, Tocce E, Auzelyte V, Ekinci Y, Solak HH, Liu CC, Stuen KO, Nealey PF, David C. Nanofabrication of broad-band antireflective surfaces using self-assembly of block copolymers. Acs Nano. 5: 1860-4. PMID 21323325 DOI: 10.1021/Nn103361D |
0.75 |
|
| 2011 |
Liu CC, Thode CJ, Rincon Delgadillo PA, Craig GSW, Nealey PF, Gronheid R. Towards an all-track 300 mm process for directed self-assembly Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29. DOI: 10.1116/1.3644341 |
0.595 |
|
| 2011 |
Ji S, Liu CC, Liao W, Fenske AL, Craig GSW, Nealey PF. Domain orientation and grain coarsening in cylinder-forming poly(styrene-b-methyl methacrylate) films Macromolecules. 44: 4291-4300. DOI: 10.1021/Ma2005734 |
0.588 |
|
| 2011 |
Liu CC, Han E, Onses MS, Thode CJ, Ji S, Gopalan P, Nealey PF. Fabrication of lithographically defined chemically patterned polymer brushes and mats Macromolecules. 44: 1876-1885. DOI: 10.1021/Ma102856T |
0.755 |
|
| 2011 |
Onses MS, Thode CJ, Liu CC, Ji S, Cook PL, Himpsel FJ, Nealey PF. Site-specific placement of Au nanoparticles on chemical nanopatterns prepared by molecular transfer printing using block-copolymer films Advanced Functional Materials. 21: 3074-3082. DOI: 10.1002/Adfm.201100300 |
0.778 |
|
| 2010 |
Han E, Kang H, Liu CC, Nealey PF, Gopalan P. Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates. Advanced Materials (Deerfield Beach, Fla.). 22: 4325-9. PMID 20806266 DOI: 10.1002/Adma.201001669 |
0.625 |
|
| 2010 |
Ji S, Liu CC, Liu G, Nealey PF. Molecular transfer printing using block copolymers. Acs Nano. 4: 599-609. PMID 20041629 DOI: 10.1021/nn901342j |
0.711 |
|
| 2010 |
Hong AJ, Liu CC, Wang Y, Kim J, Xiu F, Ji S, Zou J, Nealey PF, Wang KL. Metal nanodot memory by self-assembled block copolymer lift-off. Nano Letters. 10: 224-9. PMID 19957954 DOI: 10.1021/Nl903340A |
0.483 |
|
| 2010 |
Ting YH, Liu CC, Park SM, Jiang H, Nealey PF, Wendt AE. Surface roughening of polystyrene and poly(methyl methacrylate) in Ar/O2 plasma etching Polymers. 2: 649-663. DOI: 10.3390/Polym2040649 |
0.588 |
|
| 2010 |
Jha S, Liu CC, Park JH, Wiedmann MK, Kuan TS, Babcock SE, Mawst LJ, Nealey PF, Kuech TF. Block copolymer templating for formation of quantum dots and lattice-mismatched semiconductor structures Materials Research Society Symposium Proceedings. 1258: 187-192. DOI: 10.1557/Proc-1258-Q13-05 |
0.491 |
|
| 2010 |
Liu CC, Nealey PF, Raub AK, Hakeem PJ, Brueck SRJ, Han E, Gopalan P. Integration of block copolymer directed assembly with 193 immersion lithography Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6B30-C6B34. DOI: 10.1116/1.3501348 |
0.647 |
|
| 2010 |
Yang EL, Liu CC, Yang CYP, Steinhaus CA, Nealey PF, Skinner JL. Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography method Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6M93-C6M97. DOI: 10.1116/1.3501341 |
0.548 |
|
| 2010 |
Sun HS, Kang H, Liu CC, Nealey PF, Char K. Orientation of block copolymer resists on interlayer dielectrics with tunable surface energy Macromolecules. 43: 461-466. DOI: 10.1021/Ma901987Q |
0.587 |
|
| 2010 |
Liu CC, Craig GSW, Kang H, Ruiz R, Nealey PF, Ferrier NJ. Practical implementation of order parameter calculation for directed assembly of block copolymer thin films Journal of Polymer Science, Part B: Polymer Physics. 48: 2589-2603. DOI: 10.1002/Polb.22114 |
0.636 |
|
| 2009 |
Hirai T, Leolukman M, Liu CC, Han E, Kim YJ, Ishida Y, Hayakawa T, Kakimoto MA, Nealey PF, Gopalan P. One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. Advanced Materials (Deerfield Beach, Fla.). 21: 4334-8. PMID 26042939 DOI: 10.1002/Adma.200900518 |
0.614 |
|
| 2009 |
Morin SA, La YH, Liu CC, Streifer JA, Hamers RJ, Nealey PF, Jin S. Assembly of nanocrystal arrays by block-copolymer-directed nucleation. Angewandte Chemie (International Ed. in English). 48: 2135-9. PMID 19199322 DOI: 10.1002/Anie.200805471 |
0.616 |
|
| 2009 |
Park JH, Liu CC, Rathi MK, Mawst LJ, Nealey PF, Kuech TF. Nanoscale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nanopatterning Journal of Nanophotonics. 3. DOI: 10.1117/1.3085990 |
0.571 |
|
| 2009 |
Han E, Stuen KO, Leolukman M, Liu CC, Nealey PF, Gopalan P. Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions Macromolecules. 42: 4896-4901. DOI: 10.1021/Ma9002903 |
0.789 |
|
| 2008 |
Stuen KO, Liu C, Welander AM, Liu G, De Pablo JJ, Nealey PF, Satapathy DK, Nygrd K, Bunk O, Solak HH, Van Der Veen JF. In situ characterization of block copolymer ordering on chemically nanopatterned surfaces by time-resolved small angle x-ray scattering Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 2504-2508. DOI: 10.1116/1.2991977 |
0.701 |
|
| 2008 |
Ting YH, Park SM, Liu CC, Liu X, Himpsel FJ, Nealey PF, Wendt AE. Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 1684-1689. DOI: 10.1116/1.2966433 |
0.656 |
|
| 2008 |
Ji S, Liu CC, Son JG, Gotrik K, Craig GSW, Gopalan P, Himpsel FJ, Char K, Nealey PF. Generalization of the use of random copolymers to control the wetting behavior of block copolymer films Macromolecules. 41: 9098-9103. DOI: 10.1021/Ma801861H |
0.588 |
|
| 2008 |
Park SM, Craig GSW, Liu CC, La YH, Ferrier NJ, Nealey PF. Characterization of cylinder-forming block copolymers directed to assemble on spotted chemical patterns Macromolecules. 41: 9118-9123. DOI: 10.1021/Ma8009917 |
0.724 |
|
| 2007 |
Stoykovich MP, Kang H, Daoulas KCh, Liu G, Liu CC, de Pablo JJ, Müller M, Nealey PF. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. Acs Nano. 1: 168-75. PMID 19206647 DOI: 10.1021/Nn700164P |
0.787 |
|
| 2007 |
Liu CC, Nealey PF, Ting YH, Wendt AE. Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1963-1968. DOI: 10.1116/1.2801884 |
0.609 |
|
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