Year |
Citation |
Score |
2016 |
Li G, Zou L, Xie W, Wen S, Xie Q, Gao Y, Xu C, Xu H, Liu S, Wang S, Xue Y, Wu B, Lv Q, Ying M, Zhang X, et al. The effects of NONRATT021972 lncRNA siRNA on PC12 neuronal injury mediated by P2X7 receptor after exposure to oxygen-glucose deprivation. Purinergic Signalling. PMID 27100355 DOI: 10.1007/s11302-016-9513-8 |
0.315 |
|
2016 |
Tao J, Hu W, Wen S. Multi-source adaptation joint kernel sparse representation for visual classification. Neural Networks : the Official Journal of the International Neural Network Society. 76: 135-151. PMID 26894961 DOI: 10.1016/j.neunet.2016.01.008 |
0.383 |
|
2016 |
Tao J, Wen S, Hu W. Multi-source adaptation learning with global and local regularization by exploiting joint kernel sparse representation Knowledge-Based Systems. 98: 76-94. DOI: 10.1016/j.knosys.2016.01.021 |
0.383 |
|
2014 |
Fleming E, Wen S, Shi L, Da Silva AK. Experimental and theoretical analysis of an aluminum foam enhanced phase change thermal storage unit International Journal of Heat and Mass Transfer. 82: 273-281. DOI: 10.1016/J.Ijheatmasstransfer.2014.11.022 |
0.301 |
|
2011 |
Wen S, Shin YC. Comprehensive predictive modeling and parametric analysis of multitrack direct laser deposition processes Journal of Laser Applications. 23: 022003. DOI: 10.2351/1.3567962 |
0.531 |
|
2011 |
Wen S, Shin YC. Modeling of transport phenomena in direct laser deposition of metal matrix composite International Journal of Heat and Mass Transfer. 54: 5319-5326. DOI: 10.1016/J.Ijheatmasstransfer.2011.08.011 |
0.496 |
|
2011 |
Tan W, Wen S, Bailey N, Shin YC. Multiscale Modeling of Transport Phenomena and Dendritic Growth in Laser Cladding Processes Metallurgical and Materials Transactions B. 42: 1306-1318. DOI: 10.1007/S11663-011-9545-Y |
0.585 |
|
2010 |
Wen S, Shin YC. Modeling of the Off-Axis High Power Diode Laser Cladding Process Journal of Heat Transfer. 133. DOI: 10.1115/1.4002447 |
0.504 |
|
2010 |
Wen S, Shin YC. Modeling of transport phenomena during the coaxial laser direct deposition process Journal of Applied Physics. 108: 044908. DOI: 10.1063/1.3474655 |
0.534 |
|
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