| Year |
Citation |
Score |
| 2020 |
Church J, Meli L, Guo J, Burkhardt M, Mack CA, Silva AD, Petrillo KE, Breton MA, Bonam RK, Lallement R, Miller ER, Austin B, Matham S, Felix NM. Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch Journal of Micro-Nanolithography Mems and Moems. 19: 34001. DOI: 10.1117/1.Jmm.19.3.034001 |
0.325 |
|
| 2019 |
Silva AD, Meli L, Guo J, Dutta A, Goldfarb DL, Church J, Felix NM. Patterning Material Challenges for Improving EUV Stochastics Journal of Photopolymer Science and Technology. 32: 169-177. DOI: 10.2494/Photopolymer.32.169 |
0.312 |
|
| 2019 |
Engelmann S, Wise R, Gronheid R, Felix N. Special Section Guest Editorial: Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications Journal of Micro/Nanolithography, Mems, and Moems. 18: 1. DOI: 10.1117/1.Jmm.18.1.011001 |
0.314 |
|
| 2018 |
Meli L, Petrillo K, De Silva A, Arnold J, Felix N, Robinson C, Briggs B, Matham S, Mignot Y, Shearer J, Hamieh B, Hontake K, Huli L, Lemley C, Hetzer D, et al. Defect detection strategies and process partitioning for single-expose EUV patterning Journal of Micro/Nanolithography, Mems, and Moems. 18: 1. DOI: 10.1117/1.Jmm.18.1.011006 |
0.341 |
|
| 2018 |
De Silva A, Dutta A, Meli L, Yao Y, Mignot Y, Guo J, Felix NM. Inorganic hardmask development for extreme ultraviolet patterning Journal of Micro/Nanolithography, Mems, and Moems. 18: 1. DOI: 10.1117/1.Jmm.18.1.011004 |
0.37 |
|
| 2018 |
Raley A, Lee J, Smith JT, Sun X, Farrell RA, Shearer J, Xu Y, Ko A, Metz AW, Biolsi P, Devilliers A, Arnold J, Felix N. Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning Journal of Micro/Nanolithography, Mems, and Moems. 18: 1. DOI: 10.1117/1.Jmm.18.1.011002 |
0.378 |
|
| 2017 |
Silva AD, Petrillo K, Meli L, Shearer JC, Beique G, Sun L, Seshadri I, Oh T, Han S, Saulnier N, Lee J, Arnold JC, Hamieh B, Felix NM, Furukawa T, et al. Single-expose patterning development for EUV lithography Proceedings of Spie. 10143. DOI: 10.1117/12.2261216 |
0.395 |
|
| 2017 |
Liu C, Franke E, Mignot Y, LeFevre S, Sieg S, Chi C, Meli L, Parnell D, Schmidt K, Sanchez M, Singh L, Furukawa T, Seshadri I, Silva EAD, Tsai H, ... ... Felix N, et al. DSA patterning options for logics and memory applications Proceedings of Spie. 10146: 1014603. DOI: 10.1117/12.2260479 |
0.307 |
|
| 2017 |
Chi C, Liu C, Meli L, Guo J, Parnell D, Mignot Y, Schmidt K, Sanchez M, Farrell R, Singh L, Furukawa T, Lai K, Xu Y, Sanders D, Hetzer D, ... ... Felix N, et al. Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle Proceedings of Spie. 10146. DOI: 10.1117/12.2260454 |
0.325 |
|
| 2017 |
Meli L, Petrillo K, Silva AD, Arnold J, Felix N, Johnson R, Murray C, Hubbard A, Durrant D, Hontake K, Huli L, Lemley C, Hetzer D, Kawakami S, Matsunaga K. Driving down defect density in composite EUV patterning film stacks Proceedings of Spie. 10143. DOI: 10.1117/12.2260146 |
0.347 |
|
| 2017 |
Koay C, Hamieh B, Felix N, Gaudiello J. Reaching for the true overlay in advanced nodes Proceedings of Spie. 10145. DOI: 10.1117/12.2260007 |
0.311 |
|
| 2017 |
Chen X, Gabor A, Samudrala P, Meyers S, Hosler E, Johnson R, Felix N. Mix-and-match considerations for EUV insertion in N7 HVM Proceedings of Spie. 10143. DOI: 10.1117/12.2258674 |
0.728 |
|
| 2017 |
Seshadri I, Silva AD, Meli L, Liu C, Chi C, Guo J, Schmidt K, Truang H, Arnold JC, Felix N, Singh L, Furukawa T, Ayothi R, Raley A, Farrell R. Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer Proceedings of Spie. 10143. DOI: 10.1117/12.2258565 |
0.436 |
|
| 2017 |
Silva AD, Seshadri I, Chung K, Arceo A, Meli L, Mendoza B, Sulehria Y, Yao Y, Sunder M, Truong H, Matham S, Bao R, Wu H, Felix NM, Kanakasabapathy S. Development of TiO2 containing hardmasks through PEALD deposition Proceedings of Spie. 10146: 1014615. DOI: 10.1117/12.2258380 |
0.315 |
|
| 2017 |
Glodde M, Bruce RL, Hopstaken MJP, Saccomanno MR, Felix N, Petrillo KE, Price B. Unexpected impact of RIE gases on lithographic films Proceedings of Spie. 10146. DOI: 10.1117/12.2258012 |
0.303 |
|
| 2017 |
Goldfarb DL, Glodde M, Silva AD, Sheshadri I, Felix NM, Lionti K, Magbitang T. Fundamentals of EUV resist-inorganic hardmask interactions Proceedings of Spie. 10146: 1014607. DOI: 10.1117/12.2257933 |
0.424 |
|
| 2017 |
Bruce RL, Fraczak G, Papalia JM, Tsai H, BrightSky M, Miyazoe H, Zhu Y, Engelmann SU, Lung H, Masuda T, Suu K, Liu C, Tang H, Arnold JC, Felix N, et al. Directed self-assembly patterning strategies for phase change memory applications Proceedings of Spie. 10149. DOI: 10.1117/12.2257829 |
0.354 |
|
| 2017 |
Felix N, Singh L, Seshadri I, Silva AD, Meli L, Liu C, Chi C, Guo J, Truang H, Schmidt K, Arnold JC, Furukawa T, Ayothi R, Raley A, Farrell R. Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer Journal of Micro/Nanolithography, Mems, and Moems. 16: 1. DOI: 10.1117/1.Jmm.16.3.033506 |
0.437 |
|
| 2017 |
De Silva A, Seshadri I, Chung K, Arceo A, Meli L, Mendoza B, Sulehria Y, Yao Y, Sunder M, Truong H, Matham S, Bao R, Wu H, Felix NM, Kanakasabapathy S. Development of TiO2 containing hardmasks through plasma-enhanced atomic layer deposition Journal of Micro/Nanolithography, Mems, and Moems. 16: 023504. DOI: 10.1117/1.Jmm.16.2.023504 |
0.314 |
|
| 2016 |
Felix N, Colburn M, Petrillo K, Saulnier N, Xu Y, Meli L, Silva AD, Seshadri I, Sieg S, Dunn D. Successes and frontiers in extreme UV patterning Spie Newsroom. DOI: 10.1117/2.1201605.006518 |
0.302 |
|
| 2016 |
Chao R, Breton M, L'herron B, Mendoza B, Muthinti R, Nelson F, Pena ADL, Le Fl, Miller E, Sieg S, Demarest J, Gin P, Wormington M, Cepler A, Bozdog C, ... ... Felix N, et al. Advanced in-line metrology strategy for self-aligned quadruple patterning Proceedings of Spie. 9778: 977813. DOI: 10.1117/12.2220601 |
0.375 |
|
| 2016 |
Muthinti R, Loubet N, Chao R, Ott J, Guillorn M, Felix N, Gaudiello J, Lund P, Cepler A, Sendelbach M, Cohen O, Wolfling S, Bozdog C, Klare M. Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA) Proceedings of Spie. 9778: 977810. DOI: 10.1117/12.2220379 |
0.312 |
|
| 2016 |
Felix N, Corliss D, Petrillo K, Saulnier N, Xu Y, Meli L, Tang H, Silva AD, Hamieh B, Burkhardt M, Mignot Y, Johnson R, Robinson C, Breton M, Seshadri I, et al. EUV patterning successes and frontiers Proceedings of Spie. 9776. DOI: 10.1117/12.2219894 |
0.407 |
|
| 2016 |
Xu Y, Faure T, Viswanathan R, Lobb G, Wistrom R, Burns S, Hu L, Graur I, Bleiman B, Fischer D, Mignot Y, Sakamoto Y, Toda Y, Bolton J, Bailey T, ... Felix N, et al. Lithographic qualification of high-Transmission mask blank for 10nm node and beyond Proceedings of Spie - the International Society For Optical Engineering. 9780. DOI: 10.1117/12.2219778 |
0.328 |
|
| 2016 |
Chi C, Liu CC, Meli L, Schmidt K, Xu Y, Desilva EA, Sanchez M, Farrell R, Cottle H, Kawamura D, Singh L, Furukawa T, Lai K, Pitera JW, Sanders D, ... ... Felix N, et al. DSA via hole shrink for advanced node applications Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219706 |
0.373 |
|
| 2016 |
Liu CCC, Franke E, Lie FL, Sieg S, Tsai H, Lai K, Truong H, Farrell R, Somervell M, Sanders D, Felix N, Guillorn M, Burns S, Hetzer D, Ko A, et al. DSA patterning options for FinFET formation at 7nm node Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219670 |
0.339 |
|
| 2016 |
Schmidt K, Osaki H, Nishino K, Sanchez M, Liu CC, Furukawa T, Chi C, Pitera J, Felix N, Sanders D. Strategies to enable directed self-Assembly contact hole shrink for tight pitches Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219213 |
0.361 |
|
| 2016 |
Goldfarb DL, Broadbent W, Wylie M, Felix N, Corliss D. Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool Proceedings of Spie. 9776. DOI: 10.1117/12.2218454 |
0.307 |
|
| 2016 |
De Silva A, Seshadri I, Arceo A, Petrillo K, Meli L, Mendoza B, Yao Y, Belyansky M, Halle S, Felix NM. Study of alternate hardmasks for extreme ultraviolet patterning Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34: 06KG03. DOI: 10.1116/1.4966960 |
0.39 |
|
| 2015 |
Saulnier N, Xu Y, Wang W, Sun L, Cheong LL, Lallement R, Beique G, Hamieh B, Arnold JC, Felix N, Colburn M. EUV processing and characterization for BEOL Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2086126 |
0.392 |
|
| 2015 |
Liu CC, Lie FL, Rastogi V, Franke E, Mohanty N, Farrell R, Tsai H, Lai K, Ozlem M, Cho W, Jung SG, Strane J, Somervell M, Burns S, Felix N, et al. Fin formation using graphoepitaxy DSA for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086053 |
0.359 |
|
| 2015 |
Petrillo K, Saulnier N, Johnson R, Meli L, Robinson C, Koay CS, Felix N, Corliss D, Colburn M, Saito T, Huli L, Hetzer D, Matsumoto H, Metz A, Hira Y. Towards production ready processing with a state-of-the-art EUV cluster Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2085894 |
0.335 |
|
| 2013 |
Brunner TA, Menon VC, Wong CW, Gluschenkov O, Belyansky MP, Felix NM, Ausschnitt CP, Vukkadala P, Veeraraghavan S, Sinha JK. Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress Journal of Micro/Nanolithography, Mems, and Moems. 12. DOI: 10.1117/1.Jmm.12.4.043002 |
0.315 |
|
| 2012 |
Shayan G, Felix N, Cho Y, Chatzichristidi M, Shuler ML, Ober CK, Lee KH. Synthesis and characterization of high-throughput nanofabricated poly(4-hydroxy styrene) membranes for in vitro models of barrier tissue. Tissue Engineering. Part C, Methods. 18: 667-76. PMID 22435738 DOI: 10.1089/Ten.Tec.2011.0598 |
0.679 |
|
| 2012 |
Pike M, Felix N, Menon V, Ausschnitt C, Wiltshire T, Meyers S, Won K, Minghetti B. High order wafer alignment in manufacturing Proceedings of Spie - the International Society For Optical Engineering. 8324. DOI: 10.1117/12.916483 |
0.35 |
|
| 2011 |
Felix NM, Gabor AH, Menon VC, Longo PP, Halle SD, Koay CS, Colburn ME. Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay Proceedings of Spie - the International Society For Optical Engineering. 7971. DOI: 10.1117/12.879532 |
0.353 |
|
| 2011 |
Bratton D, Ayothi R, Felix N, Ober CK. Applications of Controlled Macromolecular Architectures to Lithography Macromolecular Engineering: Precise Synthesis, Materials Properties, Applications. 4: 2295-2330. DOI: 10.1002/9783527631421.ch55 |
0.36 |
|
| 2010 |
Felix NM, Gabor AH, Muth WA, Ausschnitt CP. Smaller, smarter, faster, and more accurate: The new overlay metrology Proceedings of Spie - the International Society For Optical Engineering. 7638. DOI: 10.1117/12.848002 |
0.341 |
|
| 2010 |
Ausschnitt CP, Brunner TA, Felix NM, Minghetti B. Toward perfect on-wafer pattern placement: Stitched overlay exposure tool characterization Proceedings of Spie - the International Society For Optical Engineering. 7640. DOI: 10.1117/12.846847 |
0.368 |
|
| 2010 |
Liegl B, Sapp B, Low K, Greco S, Brunner T, Felix N, Stobert I, Nafisi K, Sarma C. Predicting and reducing substrate induced focus error Proceedings of Spie - the International Society For Optical Engineering. 7640. DOI: 10.1117/12.846768 |
0.309 |
|
| 2010 |
Minghetti B, Brunner T, Robinson C, Ausschnitt C, Corliss D, Felix N. Overlay characterization and matching of immersion photoclusters Proceedings of Spie - the International Society For Optical Engineering. 7640. DOI: 10.1117/12.846408 |
0.315 |
|
| 2010 |
Liegl B, Sapp B, Greco S, Brunner TA, Felix N, Stobert I, Nafisi K, Sarma C. Predicting substrate-induced focus error Journal of Micro/Nanolithography, Mems, and Moems. 9. DOI: 10.1117/1.3530580 |
0.312 |
|
| 2009 |
Wallace WE, Flynn KM, Guttman CM, VanderHart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Quantitative measurement of the polydispersity in the extent of functionalization of glass-forming calix[4]resorcinarenes. Rapid Communications in Mass Spectrometry : Rcm. 23: 1957-62. PMID 19504485 DOI: 10.1002/Rcm.4099 |
0.472 |
|
| 2009 |
Wallace WE, Flynn KM, Guttman CM, VanderHart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Quantitative measurement of the molecular-mass distribution in Calix[4]resorcinarene molecular glass resists by mass spectrometry Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813680 |
0.475 |
|
| 2009 |
Vanderhart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator Journal of Materials Chemistry. 19: 2683-2694. DOI: 10.1039/B816290E |
0.486 |
|
| 2009 |
Tanaka M, Rastogi A, Toepperwein GN, Riggleman RA, Felix NM, De Pablo JJ, Ober CK. Fluorinated quaternary ammonium salts as dissolution aids for polar polymers in environmentally benign supercritical carbon dioxide Chemistry of Materials. 21: 3125-3135. DOI: 10.1021/Cm900406C |
0.625 |
|
| 2008 |
Pfeiffer F, Felix NM, Neuber C, Ober CK, Schmidt HW. Towards environmentally friendly, dry deposited, water developable molecular glass photoresists. Physical Chemistry Chemical Physics : Pccp. 10: 1257-62. PMID 18292859 DOI: 10.1039/B715819J |
0.56 |
|
| 2008 |
Tanaka M, Rastogi A, Felix NM, Ober CK. Supercritical carbon dioxide compatible salts: Synthesis and application to next generation lithography Journal of Photopolymer Science and Technology. 21: 393-396. DOI: 10.2494/Photopolymer.21.393 |
0.602 |
|
| 2008 |
Vanderhart DL, De Silva A, Felix N, Prabhu VM, Ober CK. The effect of EUV molecular glass architecture on the bulk dispersion of a photo-acid generator Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773048 |
0.513 |
|
| 2008 |
Woodward JT, Choi KW, Prabhu VM, Kang S, Lavery K, Wu WL, Leeson M, De Silva A, Felix NM, Ober CK. Characterization of the latent image to developed image in model EUV photoresists Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773036 |
0.53 |
|
| 2008 |
Kang S, Lavery K, Choi KW, Prabhu VM, Wu WL, Lin EK, De Silva A, Felix N, Ober C. A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773018 |
0.55 |
|
| 2008 |
De Silva A, Felix N, Forman D, Jing S, Ober CK. New architectures for high resolution patterning Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772667 |
0.751 |
|
| 2008 |
Felix NM, De Silva A, Sha J, Ober CK. Achieving small dimensions with an environmentally friendly solvent: Photoresist development using supercritical CO2 Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772635 |
0.622 |
|
| 2008 |
Felix N, Ober CK. Acid-labile, chain-scission polymer systems used as positive-tone photoresists developable in supercritical CO2 Chemistry of Materials. 20: 2932-2936. DOI: 10.1021/Cm703580F |
0.497 |
|
| 2008 |
De Silva A, Lee JK, André X, Felix NM, Cao HB, Deng H, Ober CK. Study of the structure - Properties relationship of phenolic molecular glass resists for next generation photolithography Chemistry of Materials. 20: 1606-1613. DOI: 10.1021/Cm702613N |
0.679 |
|
| 2008 |
De Silva A, Felix NM, Ober CK. Molecular glass resists as high-resolution patterning materials Advanced Materials. 20: 3355-3361. DOI: 10.1002/Adma.200800763 |
0.581 |
|
| 2008 |
Felix NM, De Silva A, Ober CK. Calix[4]resorcinarene derivatives as high-resolution resist materials for supercritical CO2 processing Advanced Materials. 20: 1303-1309. DOI: 10.1002/Adma.200702772 |
0.533 |
|
| 2007 |
André X, Lee JK, De Silva A, Felix N, Ober CK, Cao HB, Deng H, Kudo H, Watanabe D, Nishikubo T. Phenolic molecular glasses as resists for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.722919 |
0.553 |
|
| 2007 |
Felix NM, De Silva A, Luk CMY, Ober CK. Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2 Journal of Materials Chemistry. 17: 4598-4604. DOI: 10.1039/B709649F |
0.504 |
|
| 2007 |
Pfeiffer F, Felix NM, Neuber C, Ober CK, Schmidt HW. Physical vapor deposition of molecular glass photoresists: a new route to chemically amplified patterning Advanced Functional Materials. 17: 2336-2342. DOI: 10.1002/Adfm.200600717 |
0.531 |
|
| 2006 |
Ayothi R, Seung WC, Felix N, Cao HB, Deng H, Yueh W, Ober CK. New PFOS free photoresist systems for EUV lithography Journal of Photopolymer Science and Technology. 19: 515-520. DOI: 10.2494/Photopolymer.19.515 |
0.55 |
|
| 2006 |
Chang SW, Ayothi R, Bratton D, Yang D, Felix N, Cao HB, Deng H, Ober CK. Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography Journal of Materials Chemistry. 16: 1470-1474. DOI: 10.1039/B514065J |
0.579 |
|
| 2006 |
Dai J, Chang SW, Hamad A, Yang D, Felix N, Ober CK. Molecular glass resists for high-resolution patterning Chemistry of Materials. 18: 3404-3411. DOI: 10.1021/Cm052452M |
0.761 |
|
| 2006 |
Mao Y, Felix NM, Nguyen PT, Ober CK, Gleason KK. Positive- And negative-tone CVD polyacrylic electron-beam resists developable by supercritical CO2 Chemical Vapor Deposition. 12: 259-262. DOI: 10.1002/Cvde.200506416 |
0.533 |
|
| 2006 |
Felix NM, Tsuchiya K, Ober CK. High-resolution patterning of molecular glasses using supercritical carbon dioxide Advanced Materials. 18: 442-446. DOI: 10.1002/Adma.200501802 |
0.513 |
|
| 2005 |
Tsuchiya K, Chang SW, Felix NM, Ueda M, Ober CK. Lithography based on molecular glasses Journal of Photopolymer Science and Technology. 18: 431-434. DOI: 10.2494/Photopolymer.18.431 |
0.543 |
|
| 2005 |
Chang SW, Yang D, Dai J, Felix N, Bratton D, Tsuchiya K, Kwark YJ, Bravo JP, Ober CK, Cao HB, Deng H. Materials for future lithography Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 1-9. DOI: 10.1117/12.607235 |
0.35 |
|
| 2004 |
Mao Y, Felix NM, Nguyen PT, Ober CK, Gleason KK. Towards all-dry lithography: Electron-beam patternable poly(glycidyl methacrylate) thin films from hot filament chemical vapor deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 2473-2478. DOI: 10.1116/1.1800351 |
0.511 |
|
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