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Yves J. Chabal - Publications

Affiliations: 
1980-2002 Bell Laboratories, Murray Hill, NJ, United States 
 2003-2008 Physics, Astronomy and Astrophysics Rutgers University, New Brunswick, New Brunswick, NJ, United States 
 2008- Materials Science and Engineering University of Texas at Dallas, Richardson, TX, United States 
Area:
Materials Science Engineering, Condensed Matter Physics
Website:
https://utdallas.edu/chairs/profiles/dr-yves-chabal/
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378 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Thampy S, Ashburn N, Dillon S, Chabal YJ, Cho K, Hsu JWP. Role of Surface Oxygen Vacancies in Intermediate Formationon Mullite-type Oxides upon NO Adsorption Journal of Physical Chemistry C. 124: 15913-15919. DOI: 10.1021/Acs.Jpcc.0C03443  0.36
2020 Assi H, Cocq K, Cure J, Casterou G, Lux KC, Collière V, Vendier L, Fau P, Maraval V, Fajerwerg K, Chabal YJ, Chauvin R, Kahn ML. Reorganization of a photosensitive carbo-benzene layer in a triptych nanocatalyst with enhancement of the photocatalytic hydrogen production from water International Journal of Hydrogen Energy. 45: 24765-24778. DOI: 10.1016/J.Ijhydene.2020.06.255  0.311
2019 Ashburn N, Zheng Y, Thampy S, Dillon S, Chabal YJ, Hsu JWP, Cho K. Integrated Experimental-Theoretical Approach to Determine Reliable Molecular Reaction Mechanisms on Transition Metal Oxide Surfaces. Acs Applied Materials & Interfaces. PMID 31353881 DOI: 10.1021/Acsami.9B09700  0.406
2019 Zheng Y, Thampy S, Ashburn N, Dillon S, Wang L, Jangjou Y, Tan K, Kong F, Nie Y, Kim MJ, Epling WS, Chabal YJ, Hsu JWP, Cho K. Stable and Active Oxidation Catalysis by Cooperative Lattice Oxygen Redox on SmMnO Mullite Surface. Journal of the American Chemical Society. PMID 31251057 DOI: 10.1021/Jacs.9B03334  0.329
2019 Hricovini K, Günther R, Thiry P, Taleb-Ibrahimi A, Indlekofer G, Bonnet JE, Dumas P, Petroff Y, Blase X, Zhu X, Louie SG, Chabal YJ, Thiry PA. Electronic structure and its dependence on local order for H/Si(111)-(1 x 1) surfaces. Physical Review Letters. 70: 1992-1995. PMID 10053438 DOI: 10.1103/Physrevlett.70.1992  0.434
2019 Rahman R, Klesko JP, Dangerfield A, Fang M, Lehn JM, Dezelah CL, Kanjolia RK, Chabal YJ. Mechanistic study of the atomic layer deposition of scandium oxide films using Sc(MeCp)2(Me2pz) and ozone Journal of Vacuum Science & Technology A. 37: 011504. DOI: 10.1116/1.5059695  0.486
2019 Thampy S, Ashburn N, Liu C, Xiong K, Dillon S, Zheng Y, Chabal YJ, Cho K, Hsu JWP. Superior low-temperature NO catalytic performance of PrMn2O5 over SmMn2O5 mullite-type catalysts Catalysis Science & Technology. 9: 2758-2766. DOI: 10.1039/C9Cy00490D  0.377
2019 Thampy S, Ashburn N, Dillon S, Liu C, Xiong K, Mattson EC, Zheng Y, Chabal YJ, Cho K, Hsu JWP. Critical Role of Mullite-type Oxides’ Surface Chemistry on Catalytic NO Oxidation Performance The Journal of Physical Chemistry C. 123: 5385-5393. DOI: 10.1021/Acs.Jpcc.8B10670  0.417
2019 Tan K, Jensen S, Feng L, Wang H, Yuan S, Ferreri M, Klesko JP, Rahman R, Cure J, Li J, Zhou H, Thonhauser T, Chabal YJ. Reactivity of Atomic Layer Deposition Precursors with OH/H2O-Containing Metal Organic Framework Materials Chemistry of Materials. 31: 2286-2295. DOI: 10.1021/Acs.Chemmater.8B01844  0.386
2018 Peña LF, Veyan JF, Todd MA, Derecskei-Kovacs A, Chabal YJ. Vapor Phase Cleaning and Corrosion Inhibition of Copper Films by Ethanol and Heterocyclic Amines. Acs Applied Materials & Interfaces. PMID 30335353 DOI: 10.1021/Acsami.8B13438  0.373
2018 Rahman R, Klesko JP, Dangerfield A, Mattson EC, Chabal YJ. Selective Growth of Interface Layers from Reactions of Sc(MeCp)(Mepz) with Oxide Substrates. Acs Applied Materials & Interfaces. PMID 30211529 DOI: 10.1021/Acsami.8B09264  0.446
2018 Rahman R, Mattson EC, Klesko JP, Dangerfield A, Rivillon-Amy S, Smith DC, Hausmann D, Chabal YJ. Thermal Atomic Layer Etching of Silica and Alumina Thin Films Using Trimethylaluminum with Hydrogen Fluoride or Fluoroform. Acs Applied Materials & Interfaces. PMID 30179460 DOI: 10.1021/Acsami.8B10899  0.411
2018 Peña LF, Mattson EC, Nanayakkara CE, Oyekan KA, Mallikarjunan A, Chandra H, Xiao M, Lei X, Pearlstein RM, Derecskei-Kovacs A, Chabal YJ. In-situ IR Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29381069 DOI: 10.1021/Acs.Langmuir.7B03522  0.464
2018 Cure J, Assi H, Cocq K, Marín L, Fajerwerg K, Fau P, Beche E, Chabal YJ, Esteve A, Rossi C. Controlled Growth and Grafting of High-Density Au Nanoparticles on Zinc Oxide Thin Films by Photo-Deposition. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29316786 DOI: 10.1021/Acs.Langmuir.7B04105  0.325
2018 Tan K, Jensen S, Zuluaga S, Chapman EK, Wang H, Rahman R, Cure J, Kim TH, Li J, Thonhauser T, Chabal YJ. The role of hydrogen bonding on transport of co-adsorbed gases in metal organic frameworks materials. Journal of the American Chemical Society. PMID 29295618 DOI: 10.1021/Jacs.7B09943  0.308
2018 Fuentes-Fernandez E, Jensen S, Tan K, Zuluaga S, Wang H, Li J, Thonhauser T, Chabal Y. Controlling Chemical Reactions in Confined Environments: Water Dissociation in MOF-74 Applied Sciences. 8: 270. DOI: 10.3390/App8020270  0.324
2018 Iachella M, Cure J, Djafari Rouhani M, Chabal Y, Rossi C, Estève A. Water Dissociation and Further Hydroxylation of Perfect and Defective Polar ZnO Model Surfaces The Journal of Physical Chemistry C. 122: 21861-21873. DOI: 10.1021/Acs.Jpcc.8B04967  0.372
2018 Gao Y, Iachella M, Mattson E, Lucero AT, Kim J, Djafari Rouhani M, Chabal Y, Rossi C, Estève A. Al Interaction with ZnO Surfaces The Journal of Physical Chemistry C. 122: 17856-17864. DOI: 10.1021/Acs.Jpcc.8B04952  0.423
2018 Mattson EC, Chabal YJ. Understanding Thermal Evolution and Monolayer Doping of Sulfur-Passivated GaAs(100) The Journal of Physical Chemistry C. 122: 8414-8422. DOI: 10.1021/Acs.Jpcc.8B01316  0.369
2018 Mattson EC, Cabrera Y, Rupich SM, Wang Y, Oyekan KA, Mustard TJ, Halls MD, Bechtel HA, Martin MC, Chabal YJ. Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning Chemistry of Materials. 30: 6192-6206. DOI: 10.1021/Acs.Chemmater.8B03149  0.615
2018 Klesko JP, Rahman R, Dangerfield A, Nanayakkara CE, L’Esperance T, Moser DF, Peña LF, Mattson EC, Dezelah CL, Kanjolia RK, Chabal YJ. Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water Chemistry of Materials. 30: 970-981. DOI: 10.1021/Acs.Chemmater.7B04790  0.421
2018 Thampy S, Zheng Y, Dillon S, Liu C, Jangjou Y, Lee Y, Epling WS, Xiong K, Chabal YJ, Cho K, Hsu JW. Superior catalytic performance of Mn-Mullite over Mn-Perovskite for NO oxidation Catalysis Today. 310: 195-201. DOI: 10.1016/J.Cattod.2017.05.008  0.363
2017 Guo T, Sampat S, Rupich SM, Hollingsworth JA, Buck M, Htoon H, Chabal YJ, Gartstein YN, Malko AV. Biexciton and trion energy transfer from CdSe/CdS giant nanocrystals to Si substrates. Nanoscale. 9: 19398-19407. PMID 29210416 DOI: 10.1039/C7Nr06272A  0.336
2017 Pluchery O, Caillard L, Dollfus P, Chabal YJ. Gold Nanoparticles on Functionalized Silicon Substrate Under Coulomb Blockade Regime: An Experimental and Theoretical Investigation. The Journal of Physical Chemistry. B. PMID 29069545 DOI: 10.1021/Acs.Jpcb.7B06979  0.323
2017 Calais T, Bourrier D, Bancaud A, Chabal YJ, Esteve A, Rossi C. DNA grafting and arrangement on oxide surfaces for self-assembly of Al and CuO nanoparticles. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28960992 DOI: 10.1021/Acs.Langmuir.7B02159  0.345
2017 Marín L, Gao Y, Vallet M, Abdallah I, Warot-Fonrose B, Tenailleau C, Lucero AT, Kim J, Esteve A, Chabal YJ, Rossi C. Performance enhancement via incorporation of ZnO nanolayers in energetic Al:CuO multilayers. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28950064 DOI: 10.1021/Acs.Langmuir.7B02964  0.366
2017 Cabrera Y, Rupich SM, Shaw R, Anand B, de Anda Villa M, Rahman R, Dangerfield A, Gartstein YN, Malko AV, Chabal YJ. Energy transfer from colloidal nanocrystals to strongly absorbing perovskites. Nanoscale. PMID 28613340 DOI: 10.1039/C7Nr02234D  0.307
2017 Nanayakkara CE, Liu G, Vega A, Dezelah CL, Kanjolia RK, Chabal YJ. Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28534625 DOI: 10.1021/Acs.Langmuir.7B00716  0.394
2017 Kerrigan MM, Klesko JP, Rupich SM, Dezelah CL, Kanjolia RK, Chabal YJ, Winter CH. Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid. The Journal of Chemical Physics. 146: 052813. PMID 28178839 DOI: 10.1063/1.4968848  0.411
2017 Mattson EC, Michalak DJ, Veyan JF, Chabal YJ. Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces. The Journal of Chemical Physics. 146: 052805. PMID 28178834 DOI: 10.1063/1.4964679  0.423
2017 Gao Y, Marín L, Mattson EC, Cure J, Nanayakkara CE, Veyan J, Lucero AT, Kim J, Rossi C, Estève A, Chabal YJ. Basic Mechanisms of Al Interaction with the ZnO Surface The Journal of Physical Chemistry C. 121: 12780-12788. DOI: 10.1021/Acs.Jpcc.7B02661  0.366
2017 Dangerfield A, Nanayakkara CE, Mallikarjunan A, Lei X, Pearlstein RM, Derecskei-Kovacs A, Cure J, Estève A, Chabal YJ. Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride Chemistry of Materials. 29: 6022-6029. DOI: 10.1021/Acs.Chemmater.7B01816  0.403
2017 Walsh LA, Mohammed S, Sampat SC, Chabal YJ, Malko AV, Hinkle CL. Oxide-related defects in quantum dot containing Si-rich silicon nitride films Thin Solid Films. 636: 267-272. DOI: 10.1016/J.Tsf.2017.06.022  0.401
2016 Tan K, Zuluaga S, Fuentes E, Mattson EC, Veyan JF, Wang H, Li J, Thonhauser T, Chabal YJ. Trapping gases in metal-organic frameworks with a selective surface molecular barrier layer. Nature Communications. 7: 13871. PMID 27958274 DOI: 10.1038/Ncomms13871  0.375
2016 Liu LH, Michalak DJ, Chopra TP, Pujari SP, Cabrera W, Dick D, Veyan JF, Hourani R, Halls MD, Zuilhof H, Chabal YJ. Surface etching, chemical modification and characterization of silicon nitride and silicon oxide-selective functionalization of Si3N4 and SiO2. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 28: 094014. PMID 26870908 DOI: 10.1088/0953-8984/28/9/094014  0.731
2016 Pluchery O, Zhang Y, Benbalagh R, Caillard L, Gallet JJ, Bournel F, Lamic-Humblot AF, Salmeron M, Chabal YJ, Rochet F. Static and dynamic electronic characterization of organic monolayers grafted on a silicon surface. Physical Chemistry Chemical Physics : Pccp. 18: 3675-84. PMID 26757829 DOI: 10.1039/C5Cp05943G  0.426
2016 Peng W, Anand B, Liu L, Sampat S, Bearden BE, Malko AV, Chabal YJ. Influence of growth temperature on bulk and surface defects in hybrid lead halide perovskite films. Nanoscale. 8: 1627-34. PMID 26691199 DOI: 10.1039/C5Nr06222E  0.35
2016 Longo RC, Mattson EC, Vega A, Cabrera W, Cho K, Chabal Y, Thissen P. Atomic Mechanism of Arsenic Monolayer Doping on oxide-free Silicon(111) Mrs Advances. 1: 2345-2353. DOI: 10.1557/Adv.2016.466  0.495
2016 Perkins CK, Mansergh RH, Ramos JC, Nanayakkara CE, Park D, Goberna-Ferrón S, Fullmer LB, Arens JT, Gutierrez-Higgins MT, Jones YR, Lopez JI, Rowe TM, Whitehurst DM, Nyman M, Chabal YJ, et al. Low-index, smooth Al_2O_3 films by aqueous solution process Optical Materials Express. 7: 273. DOI: 10.1364/Ome.7.000273  0.333
2016 Mattson EC, Michalak DJ, Cabrera W, Veyan JF, Chabal YJ. Initial nitride formation during plasma-nitridation of cobalt surfaces Applied Physics Letters. 109: 091602. DOI: 10.1063/1.4961943  0.433
2016 Zuluaga S, Fuentes-Fernandez EMA, Tan K, Arter CA, Li J, Chabal YJ, Thonhauser T. Chemistry in confined spaces: reactivity of the Zn-MOF-74 channels Journal of Materials Chemistry. 4: 13176-13182. DOI: 10.1039/C6Ta04388G  0.326
2016 Zuluaga S, Fuentes-Fernandez EMA, Tan K, Xu F, Li J, Chabal YJ, Thonhauser T. Understanding and controlling water stability of MOF-74 Journal of Materials Chemistry A. 4: 5176-5183. DOI: 10.1039/C5Ta10416E  0.302
2016 Dick D, Ballard JB, Longo RC, Randall JN, Cho K, Chabal YJ. Toward Selective Ultra-High-Vacuum Atomic Layer Deposition of Metal Oxides on Si(100) The Journal of Physical Chemistry C. 120: 24213-24223. DOI: 10.1021/Acs.Jpcc.6B08130  0.512
2016 Pena LF, Nanayakkara CE, Mallikarjunan A, Chandra H, Xiao M, Lei X, Pearlstein RM, Derecskei-Kovacs A, Chabal YJ. Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone Journal of Physical Chemistry C. 120: 10927-10935. DOI: 10.1021/Acs.Jpcc.6B01803  0.434
2016 Longo RC, Owen JHG, McDonnell S, Dick D, Ballard JB, Randall JN, Wallace RM, Chabal YJ, Cho K. Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations Journal of Physical Chemistry C. 120: 2628-2641. DOI: 10.1021/Acs.Jpcc.5B09053  0.501
2016 Nanayakkara CE, Vega A, Liu G, Dezelah CL, Kanjolia RK, Chabal YJ. Role of Initial Precursor Chemisorption on Incubation Delay for Molybdenum Oxide Atomic Layer Deposition Chemistry of Materials. 28: 8591-8597. DOI: 10.1021/Acs.Chemmater.6B03423  0.412
2016 Longo RC, Mattson EC, Vega A, Cabrera W, Cho K, Chabal YJ, Thissen P. Mechanism of Arsenic Monolayer Doping of Oxide-Free Si(111) Chemistry of Materials. 28: 1975-1979. DOI: 10.1021/Acs.Chemmater.5B04394  0.387
2016 Chopra TP, Longo RC, Cho K, Chabal YJ. Ammonia modification of oxide-free Si(111) surfaces Surface Science. DOI: 10.1016/J.Susc.2016.01.002  0.511
2015 Sahasrabudhe G, Rupich SM, Jhaveri J, Berg AH, Nagamatsu KA, Man G, Chabal YJ, Kahn A, Wagner S, Sturm JC, Schwartz J. Low-Temperature Synthesis of a TiO2/Si Heterojunction. Journal of the American Chemical Society. PMID 26579554 DOI: 10.1021/Jacs.5B09750  0.467
2015 Ballard JB, Dick DD, McDonnell SJ, Bischof M, Fu J, Owen JH, Owen WR, Alexander JD, Jaeger DL, Namboodiri P, Fuchs E, Chabal YJ, Wallace RM, Reidy R, Silver RM, et al. Atomically Traceable Nanostructure Fabrication. Journal of Visualized Experiments : Jove. PMID 26274555 DOI: 10.3791/52900  0.39
2015 Deibert BJ, Zhang J, Smith PF, Chapman KW, Rangan S, Banerjee D, Tan K, Wang H, Pasquale N, Chen F, Lee KB, Dismukes GC, Chabal YJ, Li J. Surface and Structural Investigation of a MnOx Birnessite-Type Water Oxidation Catalyst Formed under Photocatalytic Conditions. Chemistry (Weinheim An Der Bergstrasse, Germany). PMID 26263021 DOI: 10.1002/Chem.201501930  0.382
2015 Peng W, Rupich SM, Shafiq N, Gartstein YN, Malko AV, Chabal YJ. Silicon Surface Modification and Characterization for Emergent Photovoltaic Applications Based on Energy Transfer. Chemical Reviews. PMID 26244614 DOI: 10.1021/Acs.Chemrev.5B00085  0.375
2015 Marín L, Nanayakkara CE, Veyan JF, Warot-Fonrose B, Joulie S, Estève A, Tenailleau C, Chabal YJ, Rossi C. Enhancing the Reactivity of Al/CuO Nanolaminates by Cu Incorporation at the Interfaces. Acs Applied Materials & Interfaces. 7: 11713-8. PMID 25988997 DOI: 10.1021/Acsami.5B02653  0.323
2015 Peng W, Sampat S, Rupich SM, Anand B, Nguyen HM, Taylor D, Beardon BE, Gartstein YN, Chabal YJ, Malko AV. Hybrid light sensor based on ultrathin Si nanomembranes sensitized with CdSe/ZnS colloidal nanocrystal quantum dots. Nanoscale. 7: 8524-30. PMID 25896572 DOI: 10.1039/C5Nr00334B  0.368
2015 Caillard L, Sattayaporn S, Lamic-Humblot AF, Casale S, Campbell P, Chabal YJ, Pluchery O. Controlling the reproducibility of Coulomb blockade phenomena for gold nanoparticles on an organic monolayer/silicon system. Nanotechnology. 26: 065301. PMID 25611611 DOI: 10.1088/0957-4484/26/6/065301  0.301
2015 Cabrera W, Halls MD, Chabal YJ. Chemical nature and control of high-k dielectric/III-V interfaces Ecs Transactions. 66: 65-76. DOI: 10.1149/06606.0065ecst  0.565
2015 Skibinski ES, Debenedetti WJI, Rupich SM, Chabal YJ, Hines MA. Frustrated Etching during H/Si(111) Methoxylation Produces Fissured Fluorinated Surfaces, whereas Direct Fluorination Preserves the Atomically Flat Morphology Journal of Physical Chemistry C. 119: 26029-26037. DOI: 10.1021/Acs.Jpcc.5B08889  0.814
2015 Calais T, Playe B, Ducéré JM, Veyan JF, Rupich S, Hemeryck A, Djafari Rouhani M, Rossi C, Chabal YJ, Estève A. Role of Alumina Coatings for Selective and Controlled Bonding of DNA on Technologically Relevant Oxide Surfaces Journal of Physical Chemistry C. 119: 23527-23543. DOI: 10.1021/Acs.Jpcc.5B06820  0.44
2015 Thissen P, Fuchs E, Roodenko K, Peixoto T, Batchelor B, Smith D, Schmidt WG, Chabal Y. Nanopatterning on H-Terminated Si(111) Explained as Dynamic Equilibrium of the Chemical Reaction with Methanol Journal of Physical Chemistry C. 119: 16947-16953. DOI: 10.1021/Acs.Jpcc.5B03816  0.461
2015 Chopra TP, Longo RC, Cho K, Halls MD, Thissen P, Chabal YJ. Ethylenediamine Grafting on Oxide-Free H-, 1/3 ML F-, and Cl-Terminated Si(111) Surfaces Chemistry of Materials. 27: 6268-6281. DOI: 10.1021/Acs.Chemmater.5B03156  0.712
2015 Bernal-Ramos K, Saly MJ, Kanjolia RK, Chabal YJ. Atomic Layer Deposition of Cobalt Silicide Thin Films Studied by in Situ Infrared Spectroscopy Chemistry of Materials. 27: 4943-4949. DOI: 10.1021/Acs.Chemmater.5B00743  0.474
2014 Lanthony C, Guiltat M, Ducéré JM, Verdier A, Hémeryck A, Djafari-Rouhani M, Rossi C, Chabal YJ, Estève A. Elementary surface chemistry during CuO/Al nanolaminate-thermite synthesis: copper and oxygen deposition on aluminum (111) surfaces. Acs Applied Materials & Interfaces. 6: 15086-97. PMID 25089744 DOI: 10.1021/Am503126K  0.39
2014 Dong H, Cabrera W, Qin X, Brennan B, Zhernokletov D, Hinkle CL, Kim J, Chabal YJ, Wallace RM. Silicon interfacial passivation layer chemistry for high-k/InP interfaces. Acs Applied Materials & Interfaces. 6: 7340-5. PMID 24750024 DOI: 10.1021/Am500752U  0.441
2014 Zuluaga S, Canepa P, Tan K, Chabal YJ, Thonhauser T. Study of van der Waals bonding and interactions in metal organic framework materials. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 26: 133002. PMID 24613989 DOI: 10.1088/0953-8984/26/13/133002  0.305
2014 Gong C, Kim S, Zhou S, Hu Y, Acik M, De Heer W, Berger C, Bongiorno A, Riedo E, Chabal Y. Chemical bonding and stability of multilayer graphene oxide layers Proceedings of Spie - the International Society For Optical Engineering. 8987. DOI: 10.1117/12.2045554  0.374
2014 Ballard JB, Owen JHG, Owen W, Alexander JR, Fuchs E, Randall JN, Von Ehr JR, McDonnell S, Dick DD, Wallace RM, Chabal YJ, Bischof MR, Jaeger DL, Reidy RF, Fu J, et al. Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 32. DOI: 10.1116/1.4890484  0.365
2014 Longo RC, McDonnell S, Dick D, Wallace RM, Chabal YJ, Owen JHG, Ballard JB, Randall JN, Cho K. Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2×1) surface Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 32. DOI: 10.1116/1.4864619  0.457
2014 Nijem N, Chabal YJ. Adsorbate Interactions in Metal Organic Frameworks Studied by Vibrational Spectroscopy Comments On Inorganic Chemistry. 34: 78-102. DOI: 10.1080/02603594.2014.940418  0.307
2014 Liu LH, Debenedetti WJI, Peixoto T, Gokalp S, Shafiq N, Veyan JF, Michalak DJ, Hourani R, Chabal YJ. Morphology and chemical termination of HF-etched Si3N4 surfaces Applied Physics Letters. 105. DOI: 10.1063/1.4905282  0.503
2014 Peng W, Debenedetti WJI, Kim S, Hines MA, Chabal YJ. Lowering the density of electronic defects on organic-functionalized Si(100) surfaces Applied Physics Letters. 104. DOI: 10.1063/1.4883367  0.685
2014 Cabrera W, Brennan B, Dong H, O'Regan TP, Povey IM, Monaghan S, O'Connor E, Hurley PK, Wallace RM, Chabal YJ. Diffusion of In0.53Ga0.47As elements through hafnium oxide during post deposition annealing Applied Physics Letters. 104. DOI: 10.1063/1.4860960  0.359
2014 Lublow M, Fischer A, Merschjann C, Yang F, Schedel-Niedrig T, Veyan J-, Chabal YJ. Graphitic carbon nitride nano-emitters on silicon: a photoelectrochemical heterojunction composed of earth-abundant materials for enhanced evolution of hydrogen Journal of Materials Chemistry. 2: 12697-12702. DOI: 10.1039/C4Ta01711K  0.304
2014 Cabrera W, Halls MD, Povey IM, Chabal YJ. Role of interfacial aluminum silicate and silicon as barrier layers for atomic layer deposition of Al2O3 films on chemically cleaned InP(100) surfaces Journal of Physical Chemistry C. 118: 29164-29179. DOI: 10.1021/Jp5052084  0.686
2014 Cabrera W, Halls MD, Povey IM, Chabal YJ. Surface oxide characterization and interface evolution in atomic layer deposition of Al2O3 on InP(100) studied by in situ infrared spectroscopy Journal of Physical Chemistry C. 118: 5862-5871. DOI: 10.1021/Jp412455Y  0.721
2014 Longo RC, Owen JHG, McDonnell S, Ballard JB, Wallace RM, Randall JN, Chabal YJ, Cho K. Ab initio study of H2 associative desorption on ad-dimer reconstructed Si(001) and Ge(001)-(2×1) surfaces Journal of Physical Chemistry C. 118: 10088-10096. DOI: 10.1021/Jp411903Z  0.423
2014 Dick D, Veyan JF, Longo RC, McDonnell S, Ballard JB, Qin X, Dong H, Owen JHG, Randall JN, Wallace RM, Cho K, Chabal YJ. Digermane deposition on Si(100) and Ge(100): From adsorption mechanism to epitaxial growth Journal of Physical Chemistry C. 118: 482-493. DOI: 10.1021/Jp410145U  0.474
2014 Tan K, Zuluaga S, Gong Q, Canepa P, Wang H, Li J, Chabal YJ, Thonhauser T. Water reaction mechanism in metal organic frameworks with coordinatively unsaturated metal ions: MOF-74 Chemistry of Materials. 26: 6886-6895. DOI: 10.1021/Cm5038183  0.386
2014 Acik M, Yagneswaran S, Peng W, Lee G, Lund BR, Smith DW, Chabal YJ. Spectroscopic evaluation of out-of-plane surface vibration bands from surface functionalization of graphite oxide by fluorination Carbon. 77: 577-591. DOI: 10.1016/J.Carbon.2014.05.062  0.427
2014 Zhou S, Kim S, Di Gennaro E, Hu Y, Gong C, Lu X, Berger C, De Heer W, Riedo E, Chabal YJ, Aruta C, Bongiorno A. Film Structure of Epitaxial Graphene Oxide on SiC: Insight on the Relationship between Interlayer Spacing, Water Content, and Intralayer Structure Advanced Materials Interfaces. 1. DOI: 10.1002/Admi.201300106  0.336
2014 De Benedetti WJI, Nimmo MT, Rupich SM, Caillard LM, Gartstein YN, Chabal YJ, Malko AV. Efficient directed energy transfer through size-gradient nanocrystal layers into silicon substrates Advanced Functional Materials. 24: 5002-5010. DOI: 10.1002/Adfm.201400667  0.423
2013 Gong C, Huang C, Miller J, Cheng L, Hao Y, Cobden D, Kim J, Ruoff RS, Wallace RM, Cho K, Xu X, Chabal YJ. Metal contacts on physical vapor deposited monolayer MoS2. Acs Nano. 7: 11350-7. PMID 24219632 DOI: 10.1021/Nn4052138  0.321
2013 Nimmo MT, Caillard LM, De Benedetti W, Nguyen HM, Seitz O, Gartstein YN, Chabal YJ, Malko AV. Visible to near-infrared sensitization of silicon substrates via energy transfer from proximal nanocrystals: further insights for hybrid photovoltaics. Acs Nano. 7: 3236-45. PMID 23556540 DOI: 10.1021/Nn400924Y  0.43
2013 Caillard L, Seitz O, Campbell PM, Doherty RP, Lamic-Humblot AF, Lacaze E, Chabal YJ, Pluchery O. Gold nanoparticles on oxide-free silicon-molecule interface for single electron transport. Langmuir : the Acs Journal of Surfaces and Colloids. 29: 5066-73. PMID 23488728 DOI: 10.1021/La304971V  0.384
2013 Kwon J, Ducéré JM, Alphonse P, Bahrami M, Petrantoni M, Veyan JF, Tenailleau C, Estève A, Rossi C, Chabal YJ. Interfacial chemistry in Al/CuO reactive nanomaterial and its role in exothermic reaction. Acs Applied Materials & Interfaces. 5: 605-13. PMID 23289538 DOI: 10.1021/Am3019405  0.373
2013 Kim D, Thissen P, Viner G, Lee DW, Choi W, Chabal YJ, Lee JB. Recovery of nonwetting characteristics by surface modification of gallium-based liquid metal droplets using hydrochloric acid vapor. Acs Applied Materials & Interfaces. 5: 179-85. PMID 23206334 DOI: 10.1021/Am302357T  0.404
2013 Nguyen HM, Seitz O, Gartstein YN, Chabal YJ, Malko AV. Energy transfer from colloidal nanocrystals into Si substrates studied via photoluminescence photon counts and decay kinetics Journal of the Optical Society of America B. 30: 2401. DOI: 10.1364/Josab.30.002401  0.304
2013 Debenedetti WJI, Chabal YJ. Functionalization of oxide-free silicon surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4819406  0.468
2013 Hemani GK, Vandenberghe WG, Brennan B, Chabal YJ, Walker AV, Wallace RM, Quevedo-Lopez M, Fischetti MV. Interfacial graphene growth in the Ni/SiO2 system using pulsed laser deposition Applied Physics Letters. 103. DOI: 10.1063/1.4821944  0.33
2013 Dong H, Cabrera W, Galatage RV, Santosh K, Brennan B, Qin X, McDonnell S, Zhernokletov D, Hinkle CL, Cho K, Chabal YJ, Wallace RM. Indium diffusion through high-k dielectrics in high-k/InP stacks Applied Physics Letters. 103. DOI: 10.1063/1.4817932  0.316
2013 Gong C, Floresca HC, Hinojos D, McDonnell S, Qin X, Hao Y, Jandhyala S, Mordi G, Kim J, Colombo L, Ruoff RS, Kim MJ, Cho K, Wallace RM, Chabal YJ. Rapid selective etching of PMMA residues from transferred graphene by carbon dioxide Journal of Physical Chemistry C. 117: 23000-23008. DOI: 10.1021/Jp408429V  0.307
2013 McDonnell S, Longo RC, Seitz O, Ballard JB, Mordi G, Dick D, Owen JHG, Randall JN, Kim J, Chabal YJ, Cho K, Wallace RM. Controlling the atomic layer deposition of titanium dioxide on silicon: Dependence on surface termination Journal of Physical Chemistry C. 117: 20250-20259. DOI: 10.1021/Jp4060022  0.498
2013 Tan K, Canepa P, Gong Q, Liu J, Johnson DH, Dyevoich A, Thallapally PK, Thonhauser T, Li J, Chabal YJ. Mechanism of preferential adsorption of SO2 into two microporous paddle wheel frameworks M(bdc)(ted)0.5 Chemistry of Materials. 25: 4653-4662. DOI: 10.1021/Cm401270B  0.33
2013 Ramos KB, Clavel G, Marichy C, Cabrera W, Pinna N, Chabal YJ. In Situ Infrared Spectroscopic Study of Atomic Layer-Deposited TiO2 Thin Films by Nonaqueous Routes Chemistry of Materials. 25: 1706-1712. DOI: 10.1021/Cm400164A  0.431
2013 Bernal Ramos K, Saly MJ, Chabal YJ. Precursor design and reaction mechanisms for the atomic layer deposition of metal films Coordination Chemistry Reviews. 257: 3271-3281. DOI: 10.1016/J.Ccr.2013.03.028  0.333
2013 Liechti KM, Na SR, Wakamatsu M, Seitz O, Chabal Y. A High Vacuum Fracture Facility for Molecular Interactions Experimental Mechanics. 53: 231-241. DOI: 10.1007/S11340-012-9625-1  0.312
2013 Longo RC, Cho K, Schmidt WG, Chabal YJ, Thissen P. Monolayer doping via phosphonic acid grafting on silicon: Microscopic insight from infrared spectroscopy and density functional theory calculations Advanced Functional Materials. 23: 3471-3477. DOI: 10.1002/Adfm.201202808  0.341
2012 Thissen P, Vega A, Peixoto T, Chabal YJ. Controlled, low-coverage metal oxide activation of silicon for organic functionalization: unraveling the phosphonate bond. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 17494-505. PMID 23163566 DOI: 10.1021/La3038457  0.466
2012 Nijem N, Canepa P, Kong L, Wu H, Li J, Thonhauser T, Chabal YJ. Spectroscopic characterization of van der Waals interactions in a metal organic framework with unsaturated metal centers: MOF-74-Mg. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 24: 424203. PMID 23032253 DOI: 10.1088/0953-8984/24/42/424203  0.307
2012 Nguyen HM, Seitz O, Peng W, Gartstein YN, Chabal YJ, Malko AV. Efficient radiative and nonradiative energy transfer from proximal CdSe/ZnS nanocrystals into silicon nanomembranes. Acs Nano. 6: 5574-82. PMID 22584256 DOI: 10.1021/Nn301531B  0.444
2012 Vega A, Thissen P, Chabal YJ. Environment-controlled tethering by aggregation and growth of phosphonic acid monolayers on silicon oxide. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 8046-51. PMID 22554237 DOI: 10.1021/La300709N  0.452
2012 Thissen P, Peixoto T, Longo RC, Peng W, Schmidt WG, Cho K, Chabal YJ. Activation of surface hydroxyl groups by modification of H-terminated Si(111) surfaces. Journal of the American Chemical Society. 134: 8869-74. PMID 22554133 DOI: 10.1021/Ja300270W  0.476
2012 Feugmo CG, Champagne B, Caudano Y, Cecchet F, Chabal YJ, Liégeois V. Towards modelling the vibrational signatures of functionalized surfaces: carboxylic acids on H-Si(111) surfaces. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 24: 124111. PMID 22394578 DOI: 10.1088/0953-8984/24/12/124111  0.461
2012 Jandhyala S, Mordi G, Lee B, Lee G, Floresca C, Cha PR, Ahn J, Wallace RM, Chabal YJ, Kim MJ, Colombo L, Cho K, Kim J. Atomic layer deposition of dielectrics on graphene using reversibly physisorbed ozone. Acs Nano. 6: 2722-30. PMID 22352388 DOI: 10.1021/Nn300167T  0.337
2012 Roodenko K, Park SK, Kwon J, Wielunski L, Chabal YJ. Characterization of Ru thin-film conductivity upon atomic layer deposition on H-passivated Si(111) Journal of Applied Physics. 112. DOI: 10.1063/1.4766747  0.369
2012 Peng W, Seitz O, Chapman RA, Vogel EM, Chabal YJ. Probing the intrinsic electrical properties of thin organic layers/semiconductor interfaces using an atomic-layer-deposited Al 2O 3 protective layer Applied Physics Letters. 101. DOI: 10.1063/1.4742168  0.37
2012 Lublow M, Kubala S, Veyan JF, Chabal YJ. Colored porous silicon as support for plasmonic nanoparticles Journal of Applied Physics. 111. DOI: 10.1063/1.3703469  0.387
2012 Seitz O, Caillard L, Nguyen HM, Chiles C, Chabal YJ, Malko AV. Optimizing non-radiative energy transfer in hybrid colloidal-nanocrystal/silicon structures by controlled nanopillar architectures for future photovoltaic cells Applied Physics Letters. 100: 021902. DOI: 10.1063/1.3675634  0.418
2012 Lacina D, Yang L, Chopra I, Muckerman J, Chabal Y, Graetz J. Investigation of LiAlH 4-THF formation by direct hydrogenation of catalyzed Al and LiH Physical Chemistry Chemical Physics. 14: 6569-6576. DOI: 10.1039/C2Cp40493A  0.35
2012 Shpaisman H, Seitz O, Yaffe O, Roodenko K, Scheres L, Zuilhof H, Chabal YJ, Sueyoshi T, Kera S, Ueno N, Vilan A, Cahen D. Structure Matters: Correlating temperature dependent electrical transport through alkyl monolayers with vibrational and photoelectron spectroscopies Chemical Science. 3: 851-862. DOI: 10.1039/C1Sc00639H  0.33
2012 Arreaga-Salas DE, Sra AK, Roodenko K, Chabal YJ, Hinkle CL. Progression of solid electrolyte interphase formation on hydrogenated amorphous silicon anodes for lithium-ion batteries Journal of Physical Chemistry C. 116: 9072-9077. DOI: 10.1021/Jp300787P  0.408
2012 Gong C, Acik M, Abolfath RM, Chabal Y, Cho K. Graphitization of graphene oxide with ethanol during thermal reduction Journal of Physical Chemistry C. 116: 9969-9979. DOI: 10.1021/Jp212584T  0.302
2012 Kwon J, Saly M, Halls MD, Kanjolia RK, Chabal YJ. Substrate selectivity of ( tBu-Allyl)Co(CO) 3 during thermal atomic layer deposition of cobalt Chemistry of Materials. 24: 1025-1030. DOI: 10.1021/Cm2029189  0.71
2012 Thissen P, Thissen V, Wippermann S, Chabal YJ, Grundmeier G, Schmidt WG. pH-dependent structure and energetics of H2O/MgO(100) Surface Science. 606: 902-907. DOI: 10.1016/J.Susc.2012.01.018  0.354
2012 Thissen P, Seitz O, Chabal YJ. Wet chemical surface functionalization of oxide-free silicon Progress in Surface Science. 87: 272-290. DOI: 10.1016/J.Progsurf.2012.10.003  0.511
2011 Chopra IS, Chaudhuri S, Veyan JF, Chabal YJ. Turning aluminium into a noble-metal-like catalyst for low-temperature activation of molecular hydrogen. Nature Materials. 10: 884-9. PMID 21946610 DOI: 10.1038/Nmat3123  0.319
2011 Nijem N, Thissen P, Yao Y, Longo RC, Roodenko K, Wu H, Zhao Y, Cho K, Li J, Langreth DC, Chabal YJ. Understanding the preferential adsorption of CO2 over N2 in a flexible metal-organic framework. Journal of the American Chemical Society. 133: 12849-57. PMID 21736366 DOI: 10.1021/Ja2051149  0.306
2011 Seitz O, Fernandes PG, Mahmud GA, Wen HC, Stiegler HJ, Chapman RA, Vogel EM, Chabal YJ. One-step selective chemistry for silicon-on-insulator sensor geometries. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 7337-40. PMID 21627085 DOI: 10.1021/La200471B  0.381
2011 Zhao Y, Wu H, Emge TJ, Gong Q, Nijem N, Chabal YJ, Kong L, Langreth DC, Liu H, Zeng H, Li J. Enhancing gas adsorption and separation capacity through ligand functionalization of microporous metal-organic framework structures. Chemistry (Weinheim An Der Bergstrasse, Germany). 17: 5101-9. PMID 21433121 DOI: 10.1002/Chem.201002818  0.318
2011 Nijem N, Roodenko K, Zhao Y, Li J, Chabal YJ. Raman spectroscopy for probing guest-host interactions in metal organic frameworks Materials Research Society Symposium Proceedings. 1334: 1-5. DOI: 10.1557/Opl.2011.1311  0.303
2011 Chabal YJ, Seitz O, Aureau D, Thissen P, Peixoto T. Characterization of semiconductor surfaces during surface conditioning and functionalization Ecs Transactions. 41: 303-314. DOI: 10.1149/1.3630858  0.365
2011 Kong L, Chabal YJ, Langreth DC. First-principles approach to rotational-vibrational frequencies and infrared intensity for H2 adsorbed in nanoporous materials Physical Review B - Condensed Matter and Materials Physics. 83. DOI: 10.1103/Physrevb.83.121402  0.314
2011 Nguyen HM, Seitz O, Aureau D, Sra A, Nijem N, Gartstein YN, Chabal YJ, Malko AV. Spectroscopic evidence for nonradiative energy transfer between colloidal CdSe/ZnS nanocrystals and functionalized silicon substrates Applied Physics Letters. 98: 161904. DOI: 10.1063/1.3579545  0.471
2011 Seitz O, Fernandes PG, Tian R, Karnik N, Wen HC, Stiegler H, Chapman RA, Vogel EM, Chabal YJ. Control and stability of self-assembled monolayers under biosensing conditions Journal of Materials Chemistry. 21: 4384-4392. DOI: 10.1039/C1Jm10132C  0.343
2011 Chopra IS, Chaudhuri S, Veyan J, Graetz J, Chabal YJ. Correction to Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption The Journal of Physical Chemistry C. 115: 23652-23652. DOI: 10.1021/Jp210087D  0.354
2011 Roodenko K, Halls MD, Gogte Y, Seitz O, Veyan JF, Chabal YJ. Nature of hydrophilic aluminum fluoride and oxyaluminum fluoride surfaces resulting from XeF2 treatment of Al and Al2O3 Journal of Physical Chemistry C. 115: 21351-21357. DOI: 10.1021/Jp207839W  0.71
2011 Veyan JF, Choi H, Huang M, Longo RC, Ballard JB, McDonnell S, Nadesalingam MP, Dong H, Chopra IS, Owen JHG, Kirk WP, Randall JN, Wallace RM, Cho K, Chabal YJ. Si 2H 6 dissociative chemisorption and dissociation on Si(100)-(2×1) and Ge(100)-(2×1) Journal of Physical Chemistry C. 115: 24534-24548. DOI: 10.1021/Jp207086U  0.459
2011 Acik M, Lee G, Mattevi C, Pirkle A, Wallace RM, Chhowalla M, Cho K, Chabal Y. The role of oxygen during thermal reduction of graphene oxide studied by infrared absorption spectroscopy Journal of Physical Chemistry C. 115: 19761-19781. DOI: 10.1021/Jp2052618  0.321
2011 Chopra IS, Chaudhuri S, Veyan JF, Graetz J, Chabal YJ. Effect of titanium doping of Al(111) surfaces on alane formation, mobility, and desorption Journal of Physical Chemistry C. 115: 16701-16710. DOI: 10.1021/Jp203842R  0.401
2011 Kwon J, Saly M, Kanjolia RK, Chabal YJ. Surface reactions of μ2-η2-( tBu-acetylene)dicobalthexacarbonyl with Oxidized and H-terminated Si(111) Surfaces Chemistry of Materials. 23: 2068-2074. DOI: 10.1021/Cm103028X  0.512
2011 Lapin N, Seitz O, Chabal YJ. Infrared analysis of biomolecule attachment to functionalized silicon surfaces Biointerface Characterization by Advanced Ir Spectroscopy. 83-113. DOI: 10.1016/B978-0-444-53558-0.00004-7  0.787
2011 Sioncke S, Chabal YJ, Frank MM. Germanium Surface Conditioning and Passivation Handbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications. 429-472. DOI: 10.1002/9781118071748.ch12  0.382
2010 Nijem N, Veyan JF, Kong L, Wu H, Zhao Y, Li J, Langreth DC, Chabal YJ. Molecular hydrogen "pairing" interaction in a metal organic framework system with unsaturated metal centers (MOF-74). Journal of the American Chemical Society. 132: 14834-48. PMID 20925338 DOI: 10.1021/Ja104923F  0.338
2010 Acik M, Mattevi C, Gong C, Lee G, Cho K, Chhowalla M, Chabal YJ. The role of intercalated water in multilayered graphene oxide. Acs Nano. 4: 5861-8. PMID 20886867 DOI: 10.1021/Nn101844T  0.343
2010 Acik M, Lee G, Mattevi C, Chhowalla M, Cho K, Chabal YJ. Unusual infrared-absorption mechanism in thermally reduced graphene oxide. Nature Materials. 9: 840-5. PMID 20852618 DOI: 10.1038/Nmat2858  0.339
2010 Ojwang JG, Chaudhuri S, van Duin AC, Chabal YJ, Veyan JF, van Santen R, Kramer GJ, Goddard WA. Multiscale modeling of interaction of alane clusters on Al(111) surfaces: a reactive force field and infrared absorption spectroscopy approach. The Journal of Chemical Physics. 132: 084509. PMID 20192309 DOI: 10.1063/1.3302813  0.413
2010 Tian R, Seitz O, Li M, Hu WW, Chabal YJ, Gao J. Infrared characterization of interfacial Si-O bond formation on silanized flat SiO2/Si surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 4563-6. PMID 20180563 DOI: 10.1021/La904597C  0.449
2010 Dai M, Kwon J, Halls MD, Gordon RG, Chabal YJ. Surface and interface processes during atomic layer deposition of copper on silicon oxide. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 3911-7. PMID 20092316 DOI: 10.1021/La903212C  0.72
2010 Nijem N, Veyan JF, Kong L, Li K, Pramanik S, Zhao Y, Li J, Langreth D, Chabal YJ. Interaction of molecular hydrogen with microporous metal organic framework materials at room temperature. Journal of the American Chemical Society. 132: 1654-64. PMID 20070080 DOI: 10.1021/Ja908817N  0.336
2010 Michalak DJ, Amy SR, Aureau D, Dai M, Estève A, Chabal YJ. Nanopatterning Si(111) surfaces as a selective surface-chemistry route. Nature Materials. 9: 266-71. PMID 20062049 DOI: 10.1038/Nmat2611  0.616
2010 Roodenko K, Goldthorpe IA, McIntyre PC, Chabal YJ. Modified phonon confinement model for Raman spectroscopy of nanostructured materials Physical Review B - Condensed Matter and Materials Physics. 82. DOI: 10.1103/Physrevb.82.115210  0.312
2010 Veyan JF, Aureau D, Gogte Y, Campbell P, Yan XM, Chabal YJ. Comparative time-resolved study of the XeF2 etching of Mo and Si Journal of Applied Physics. 108. DOI: 10.1063/1.3520653  0.492
2010 Veyan JF, Halls MD, Rangan S, Aureau D, Yan XM, Chabal YJ. XeF2 -induced removal of SiO2 near Si surfaces at 300 K: An unexpected proximity effect. Journal of Applied Physics. 108. DOI: 10.1063/1.3517148  0.701
2010 Kwon J, Dai M, Halls MD, Chabal YJ. Suppression of substrate oxidation during ozone based atomic layer deposition of Al2 O3: Effect of ozone flow rate Applied Physics Letters. 97. DOI: 10.1063/1.3500821  0.723
2010 Petrantoni M, Rossi C, Salvagnac L, Conédéra V, Estève A, Tenailleau C, Alphonse P, Chabal YJ. Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro Journal of Applied Physics. 108: 084323. DOI: 10.1063/1.3498821  0.311
2010 Lee B, Mordi G, Kim MJ, Chabal YJ, Vogel EM, Wallace RM, Cho KJ, Colombo L, Kim J. Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices Applied Physics Letters. 97: 43107. DOI: 10.1063/1.3467454  0.315
2010 Kwon J, Chabal YJ. Effects of TaN, Ru, and Pt electrodes on thermal stability of hafnium-based gate stacks Journal of Applied Physics. 107. DOI: 10.1063/1.3429238  0.357
2010 Kwon J, Chabal YJ. Thermal stability comparison of TaN on HfO2 and Al2 O3 Applied Physics Letters. 96. DOI: 10.1063/1.3396189  0.355
2010 Roodenko K, Seitz O, Gogte Y, Veyan JF, Yan XM, Chabal YJ. Modification of the adhesive properties of XeF2-etched aluminum surfaces by deposition of organic self-assembled monolayers Journal of Physical Chemistry C. 114: 22566-22572. DOI: 10.1021/Jp1068076  0.486
2010 Aureau D, Varin Y, Roodenko K, Seitz O, Pluchery O, Chabal YJ. Controlled deposition of gold nanoparticles on well-defined organic monolayer grafted on silicon surfaces Journal of Physical Chemistry C. 114: 14180-14186. DOI: 10.1021/Jp104183M  0.472
2010 Ferguson GA, Aureau D, Chabal Y, Raghavachari K. Effects of the local environment on Si-H stretching frequencies for the mixed coverage X/H:Si(111) surface (X = F, Cl, Br, and I) Journal of Physical Chemistry C. 114: 17644-17650. DOI: 10.1021/Jp104140U  0.468
2010 Park SK, Kanjolia R, Anthis J, Odedra R, Boag N, Wielunski L, Chabal YJ. Atomic Layer Deposition of Ru/RuO2Thin Films Studied by In situ Infrared Spectroscopy Chemistry of Materials. 22: 4867-4878. DOI: 10.1021/Cm903793U  0.431
2009 Seitz O, Dai M, Aguirre-Tostado FS, Wallace RM, Chabal YJ. Copper-metal deposition on self assembled monolayer for making top contacts in molecular electronic devices. Journal of the American Chemical Society. 131: 18159-67. PMID 19924992 DOI: 10.1021/Ja907003W  0.533
2009 Dhar S, Seitz O, Halls MD, Choi S, Chabal YJ, Feldman LC. Chemical properties of oxidized silicon carbide surfaces upon etching in hydrofluoric acid. Journal of the American Chemical Society. 131: 16808-13. PMID 19919146 DOI: 10.1021/Ja9053465  0.714
2009 Lan A, Li K, Wu H, Kong L, Nijem N, Olson DH, Emge TJ, Chabal YJ, Langreth DC, Hong M, Li J. RPM3: a multifunctional microporous MOF with recyclable framework and high H2 binding energy. Inorganic Chemistry. 48: 7165-73. PMID 19722690 DOI: 10.1021/Ic9002115  0.311
2009 Dai M, Wang Y, Kwon J, Halls MD, Chabal YJ. Nitrogen interaction with hydrogen-terminated silicon surfaces at the atomic scale. Nature Materials. 8: 825-30. PMID 19684585 DOI: 10.1038/Nmat2514  0.774
2009 Lapin NA, Chabal YJ. Infrared characterization of biotinylated silicon oxide surfaces, surface stability, and specific attachment of streptavidin. The Journal of Physical Chemistry. B. 113: 8776-83. PMID 19489542 DOI: 10.1021/Jp809096M  0.816
2009 Li M, Dai M, Chabal YJ. Atomic layer deposition of aluminum oxide on carboxylic acid-terminated self-assembled monolayers. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 1911-4. PMID 19140733 DOI: 10.1021/La803581K  0.541
2009 Park SK, Roodenko K, Chabal YJ, Wielunski L, Kanjolia R, Anthis J, Odedra R, Boag N. Atomic layer deposition of ruthenium films on hydrogen terminated silicon Mrs Proceedings. 1156. DOI: 10.1557/Proc-1156-D04-02  0.353
2009 Dai M, Kwon J, Chabal YJ, Halls MD, Gordon RG. FTIR study of copper agglomeration during atomic layer deposition of copper Mrs Proceedings. 1155. DOI: 10.1557/Proc-1155-C11-06  0.724
2009 Kong L, Cooper VR, Nijem N, Li K, Li J, Chabal YJ, Langreth DC. Theoretical and experimental analysis of H2 binding in a prototypical metal-organic framework material Physical Review B - Condensed Matter and Materials Physics. 79. DOI: 10.1103/Physrevb.79.081407  0.315
2009 Hemeryck A, Estève A, Richard N, Djafari Rouhani M, Chabal YJ. Fundamental steps towards interface amorphization during silicon oxidation: Density functional theory calculations Physical Review B. 79. DOI: 10.1103/Physrevb.79.035317  0.433
2009 Singh S, Lapin N, Singh PK, Khan MA, Chabal YJ. Attachment of streptavidin-biotin on 3-aminopropyltriethoxysilane (APTES) modified porous silicon surfaces Aip Conference Proceedings. 1147: 443-449. DOI: 10.1063/1.3183471  0.792
2009 Ferguson GA, Rivillon S, Chabal Y, Raghavachari K. The structure and vibrational spectrum of the Si(111) - H/Cl surface Journal of Physical Chemistry C. 113: 21713-21720. DOI: 10.1021/Jp906614E  0.482
2009 Kwon J, Dai M, Halls MD, Langereis E, Chabal YJ, Gordon RG. In situ infrared characterization during atomic layer deposition of lanthanum oxide Journal of Physical Chemistry C. 113: 654-660. DOI: 10.1021/Jp806027M  0.737
2009 Moutanabbir O, Chabal YJ, Chicoine M, Christiansen S, Krause-Rehberg R, Schiettekatte F, Scholz R, Seitz O, Senz S, Süßkraut F, Gösele U. Mechanisms of ion-induced GaN thin layer splitting Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions With Materials and Atoms. 267: 1264-1268. DOI: 10.1016/J.Nimb.2009.01.028  0.35
2009 Dai M, Kwon J, Chabal YJ, Halls MD, Gordon RG. FTIR study of copper agglomeration during atomic layer deposition of copper Materials Research Society Symposium Proceedings. 1155: 41-46.  0.639
2008 Pasternack RM, Rivillon Amy S, Chabal YJ. Attachment of 3-(Aminopropyl)triethoxysilane on silicon oxide surfaces: dependence on solution temperature. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 12963-71. PMID 18942864 DOI: 10.1021/La8024827  0.43
2008 Chaudhuri S, Rangan S, Veyan JF, Muckerman JT, Chabal YJ. Formation and bonding of alane clusters on Al(111) surfaces studied by infrared absorption spectroscopy and theoretical modeling. Journal of the American Chemical Society. 130: 10576-87. PMID 18636724 DOI: 10.1021/Ja800136K  0.427
2008 Gruber-Woelfler H, Rivillon Amy S, Chabal YJ, Schitter G, Polo E, Ringwald M, Khinast JG. UV-induced immobilization of tethered zirconocenes on H-terminated silicon surfaces. Chemical Communications (Cambridge, England). 1329-31. PMID 18389123 DOI: 10.1039/B717817D  0.471
2008 Paumier G, Sudor J, Gue AM, Vinet F, Li M, Chabal YJ, Estève A, Djafari-Rouhani M. Nanoscale actuation of electrokinetic flows on thermoreversible surfaces. Electrophoresis. 29: 1245-52. PMID 18348218 DOI: 10.1002/Elps.200700396  0.331
2008 Sundararaghavan HG, Monteiro GA, Lapin NA, Chabal YJ, Miksan JR, Shreiber DI. Genipin-induced changes in collagen gels: correlation of mechanical properties to fluorescence. Journal of Biomedical Materials Research. Part A. 87: 308-20. PMID 18181104 DOI: 10.1002/Jbm.A.31715  0.73
2008 Chabal YJ. Chemistry, structures, dynamics and kinetics of adsorbates on surfaces by Fourier transform infrared spectroscopy Advances in Laser Science-Iii. 172: 471-476. DOI: 10.1063/1.37451  0.46
2008 Na HJ, Lee JC, Heh D, Sivasubramani P, Kirsch PD, Oh JW, Majhi P, Rivillon S, Chabal YJ, Lee BH, Choi R. Effective surface passivation methodologies for high performance germanium metal oxide semiconductor field effect transistors Applied Physics Letters. 93. DOI: 10.1063/1.3028025  0.414
2008 Seltzer SJ, Rampulla DM, Rivillon-Amy S, Chabal YJ, Bernasek SL, Romalis MV. Testing the effect of surface coatings on alkali atom polarization lifetimes Journal of Applied Physics. 104. DOI: 10.1063/1.2985913  0.334
2008 Michalak DJ, Amy SR, Estève A, Chabal YJ. Investigation of the chemical purity of silicon surfaces reacted with liquid methanol Journal of Physical Chemistry C. 112: 11907-11919. DOI: 10.1021/Jp8030539  0.498
2008 Ferguson GA, Raghavachari K, Michalak DJ, Chabal Y. Adsorbate-surface phonon interactions in deuterium-passivated Si(111)-(1 × 1) Journal of Physical Chemistry C. 112: 1034-1039. DOI: 10.1021/Jp0758768  0.454
2008 Kwon J, Dai M, Halls MD, Chabal YJ. Detection of a formate surface intermediate in the atomic layer deposition of high-k dielectrics using ozone Chemistry of Materials. 20: 3248-3250. DOI: 10.1021/Cm703667H  0.722
2008 Prabhakaran K, Kurian J, Kumar KNP, Chabal YJ. Formation of periodic nanostructure network through substrate-mediated assembly Applied Surface Science. 255: 2063-2068. DOI: 10.1016/J.Apsusc.2008.06.205  0.41
2007 Hemeryck A, Mayne AJ, Richard N, Estève A, Chabal YJ, Djafari Rouhani M, Dujardin G, Comtet G. Difficulty for oxygen to incorporate into the silicon network during initial O2 oxidation of Si(100)-(2x1). The Journal of Chemical Physics. 126: 114707. PMID 17381228 DOI: 10.1063/1.2566299  0.467
2007 Dai M, Kwon J, Ho MT, Wang Y, Rivillon S, Li M, Chabal YJ, Boleslawski M. In-situ Infrared Absorption Monitoring of Atomic Layer Deposition of Metal Oxides on Functionalized Si and Ge Surfaces Mrs Proceedings. 996. DOI: 10.1557/Proc-0996-H07-04  0.604
2007 Frank MM, Wang Y, Ho MT, Brewer RT, Moumen N, Chabal YJ. Hydrogen Barrier Layer Against Silicon Oxidation during Atomic Layer Deposition of Al2 O3 and Hf O2 Journal of the Electrochemical Society. 154: G44-G48. DOI: 10.1149/1.2405839  0.416
2007 Zahler JM, Fontcuberta I Morral A, Griggs MJ, Atwater HA, Chabal YJ. Role of hydrogen in hydrogen-induced layer exfoliation of germanium Physical Review B - Condensed Matter and Materials Physics. 75. DOI: 10.1103/Physrevb.75.035309  0.351
2007 Wang Y, Dai M, Ho MT, Wielunski LS, Chabal YJ. Infrared characterization of hafnium oxide grown by atomic layer deposition using ozone as the oxygen precursor Applied Physics Letters. 90. DOI: 10.1063/1.2430908  0.528
2007 Stokes MA, Kortan R, Amy SR, Katz HE, Chabal YJ, Kloc C, Siegrist T. Erratum: Molecular ordering in bis(phenylenyl)bithiophenes (Journal of Materials Chemistry (2007) 17) Journal of Materials Chemistry. 17: 3461-3462. DOI: 10.1039/B711339K  0.539
2007 Stokes MA, Kortan R, Amy SR, Katz HE, Chabal YJ, Kloc C, Siegrist T. Molecular ordering in bis(phenylenyl)bithiophenes Journal of Materials Chemistry. 17: 3427-3432. DOI: 10.1039/B701035D  0.573
2007 Amy SR, Michalak DJ, Chabal YJ, Wielunski L, Hurley PT, Lewis NS. Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces Journal of Physical Chemistry C. 111: 13053-13061. DOI: 10.1021/Jp071793F  0.448
2007 Wang Y, Ho MT, Goncharova LV, Wielunski LS, Rivillon-Amy S, Chabal YJ, Gustafsson T, Moumen N, Boleslawski M. Characterization of ultra-thin hafnium oxide films grown on silicon by atomic layer deposition using tetrakis(ethylmethyl-amino) hafnium and water precursors Chemistry of Materials. 19: 3127-3138. DOI: 10.1021/Cm061761P  0.458
2006 Michalak DJ, Rivillon S, Chabal YJ, Estève A, Lewis NS. Infrared spectroscopic investigation of the reaction of hydrogen-terminated, (111)-oriented, silicon surfaces with liquid methanol. The Journal of Physical Chemistry. B. 110: 20426-34. PMID 17034227 DOI: 10.1021/Jp0624303  0.497
2006 Webb LJ, Rivillon S, Michalak DJ, Chabal YJ, Lewis NS. Transmission infrared spectroscopy of methyl- and ethyl-terminated silicon(111) surfaces. The Journal of Physical Chemistry. B. 110: 7349-56. PMID 16599509 DOI: 10.1021/Jp054618C  0.472
2006 Soukiassian P, Silly MG, Radtke C, Enriquez H, D'angelo M, Derycke V, Aristov VY, Amy F, Chabal YJ, Moras P, Pedio M, Gardonio S, Ottaviani C, Perfetti P. Hydrogen nanochemistry achieving clean and pre-oxidized silicon carbide surface metallization Materials Science Forum. 667-672. DOI: 10.4028/Www.Scientific.Net/Msf.527-529.667  0.494
2006 Amy SR, Chabal YJ, Amy F, Kahn A, Krugg C, Kirsch P. Wet Chemical Cleaning of Germanium Surfaces for Growth of High-k Dielectrics Mrs Proceedings. 917. DOI: 10.1557/Proc-0917-E01-05  0.489
2006 Wang Y, Dai M, Ho MT, Rivillon S, Chabal YJ. In situ infrared absorption spectroscopy for thin film growth by atomic layer deposition Materials Research Society Symposium Proceedings. 967: 549-568. DOI: 10.1117/12.681331  0.516
2006 Edge LF, Schlom DG, Rivillon S, Chabal YJ, Agustin MP, Stemmer S, Lee T, Kim MJ, Craft HS, Maria JP, Hawley ME, Holländer B, Schubert J, Eisenbeiser K. Thermal stability of amorphous LaScO 3 films on silicon Applied Physics Letters. 89. DOI: 10.1063/1.2222302  0.345
2006 Rivillon S, Chabal YJ. Alkylation of silicon(111) surfaces Journal De Physique. Iv : Jp. 132: 195-198. DOI: 10.1051/Jp4:2006132037  0.467
2005 Langner A, Panarello A, Rivillon S, Vassylyev O, Khinast JG, Chabal YJ. Controlled silicon surface functionalization by alkene hydrosilylation. Journal of the American Chemical Society. 127: 12798-9. PMID 16159263 DOI: 10.1021/Ja054634N  0.493
2005 Beverina A, Frank MM, Shang H, Rivillon S, Amy F, Hsueh CL, Paruchuri VK, Mo RT, Copel M, Gusev EP, Gribelyuk, Chabal YJ. High-k Gate Dielectrics on Silicon and Germanium: Impact of Surface Preparation Solid State Phenomena. 3-6. DOI: 10.4028/Www.Scientific.Net/Ssp.103-104.3  0.452
2005 Rivillon S, Chabal YJ, Webb LJ, Michalak DJ, Lewis NS, Halls MD, Raghavachari K. Chlorination of hydrogen-terminated silicon (111) surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 1100-1106. DOI: 10.1116/1.1861941  0.711
2005 Fontcuberta I Morral A, Zahler JM, Griggs MJ, Atwater HA, Chabal YJ. Spectroscopic studies of the mechanism for hydrogen-induced exfoliation of InP Physical Review B - Condensed Matter and Materials Physics. 72. DOI: 10.1103/Physrevb.72.085219  0.35
2005 Rivillon S, Chabal YJ, Amy F, Kahn A. Hydrogen passivation of germanium (100) surface using wet chemical preparation Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2142084  0.465
2005 Rivillon S, Brewer RT, Chabal YJ. Water reaction with chlorine-terminated silicon (111) and (100) surfaces Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2119426  0.436
2005 Ho MT, Wang Y, Brewer RT, Wielunski LS, Chabal YJ, Moumen N, Boleslawski M. In situ infrared spectroscopy of hafnium oxide growth on hydrogen-terminated silicon surfaces by atomic layer deposition Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2058226  0.48
2005 Frank MM, Wilk GD, Starodub D, Gustafsson T, Garfunkel E, Chabal YJ, Grazul J, Muller DA. Hf O 2 and Al 2 O 3 gate dielectrics on GaAs grown by atomic layer deposition Applied Physics Letters. 86: 1-3. DOI: 10.1063/1.1899745  0.372
2005 Wielunski LS, Chabal Y, Paunescu M, Ho MT, Brewer R, Reyes JE. Ion backscattering study of ultra-thin oxides: Al2O3 and AlHfOx films on Si Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions With Materials and Atoms. 241: 377-381. DOI: 10.1016/J.Nimb.2005.07.045  0.411
2004 de Boer B, Frank MM, Chabal YJ, Jiang W, Garfunkel E, Bao Z. Metallic contact formation for molecular electronics: interactions between vapor-deposited metals and self-assembled monolayers of conjugated mono- and dithiols. Langmuir : the Acs Journal of Surfaces and Colloids. 20: 1539-42. PMID 15801409 DOI: 10.1021/La0356349  0.326
2004 Lita B, Pluchery O, Opila RL, Chabal YJ, Bunea G, Holman JP, Bekos EJ. Wet chemical cleaning of plasma oxide grown on heated (001) InP surfaces Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 1885-1892. DOI: 10.1116/1.1774202  0.368
2004 Brewer RT, Ho MT, Zhang KZ, Goncharova LV, Starodub DG, Gustafsson T, Chabal YJ, Moumen N. Ammonia pretreatment for high-k dielectric growth on silicon Applied Physics Letters. 85: 3830-3832. DOI: 10.1063/1.1807024  0.4
2004 Rivillon S, Amy F, Chabal YJ, Frank MM. Gas phase chlorination of hydrogen-passivated silicon surfaces Applied Physics Letters. 85: 2583-2585. DOI: 10.1063/1.1796536  0.499
2004 Edge LF, Schlom DG, Brewer RT, Chabal YJ, Williams JR, Chambers SA, Hinkle C, Lucovsky G, Yang Y, Stemmer S, Copel M, Holländer B, Schubert J. Suppression of subcutaneous oxidation during the deposition of amorphous lanthanum aluminate on silicon Applied Physics Letters. 84: 4629-4631. DOI: 10.1063/1.1759065  0.398
2004 Queeney KT, Herbots N, Shaw JM, Atluri V, Chabal YJ. Infrared spectroscopic analysis of an ordered Si/SiO 2 interface Applied Physics Letters. 84: 493-495. DOI: 10.1063/1.1644030  0.432
2004 Frank MM, Sayan S, Dörmann S, Emge TJ, Wielunski LS, Garfunkel E, Chabal YJ. Hafnium oxide gate dielectrics grown from an alkoxide precursor: Structure and defects Materials Science and Engineering B: Solid-State Materials For Advanced Technology. 109: 6-10. DOI: 10.1016/J.Mseb.2003.10.020  0.361
2003 Derycke V, Soukiassian PG, Amy F, Chabal YJ, D'angelo MD, Enriquez HB, Silly MG. Nanochemistry at the atomic scale revealed in hydrogen-induced semiconductor surface metallization. Nature Materials. 2: 253-8. PMID 12690399 DOI: 10.1038/Nmat835  0.466
2003 Morral AFi, Zahler JM, Atwater HA, Frank MM, Chabal YJ, Ahrenkiel P, Wanlass M. Electrical and Structural Characterization of the Interface of Wafer Bonded InP/Si Mrs Proceedings. 763. DOI: 10.1557/Proc-763-B2.8  0.419
2003 Halls MD, Raghavachari K, Frank MM, Chabal YJ. Atomic layer deposition of Al2O3 on H-passivated Si: Al(CH3)2OH surface reactions with H/Si(100)-2 × 1 Physical Review B - Condensed Matter and Materials Physics. 68: 1613021-1613024. DOI: 10.1103/Physrevb.68.161302  0.693
2003 Amy F, Chabal YJ. Interaction of H, O2, and H2O with 3C-SiC surfaces Journal of Chemical Physics. 119: 6201-6209. DOI: 10.1063/1.1602052  0.418
2003 Pluchery O, Chabal YJ, Opila RL. Wet chemical cleaning of InP surfaces investigated by in situ and ex situ infrared spectroscopy Journal of Applied Physics. 94: 2707-2715. DOI: 10.1063/1.1596719  0.435
2003 Frank MM, Chabal YJ, Green ML, Delabie A, Brijs B, Wilk GD, Ho M, Rosa EBOd, Baumvol IJR, Stedile FC. Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon Applied Physics Letters. 83: 740-742. DOI: 10.1063/1.1595719  0.439
2003 Frank MM, Chabal YJ, Wilk GD. Nucleation and interface formation mechanisms in atomic layer deposition of gate oxides Applied Physics Letters. 82: 4758-4760. DOI: 10.1063/1.1585129  0.385
2003 Queeney KT, Weldon MK, Chabal YJ, Raghavachari K. The microscopic origin of optical phonon evolution during water oxidation of Si(100) Journal of Chemical Physics. 119: 2307-2313. DOI: 10.1063/1.1582832  0.446
2003 De Boer B, Meng H, Perepichka DF, Zheng J, Frank MM, Chabal YJ, Bao Z. Synthesis and characterization of conjugated mono- and dithiol oligomers and characterization of their self-assembled monolayers Langmuir. 19: 4272-4284. DOI: 10.1021/La0341052  0.339
2003 Kwo J, Hong M, Busch B, Muller DA, Chabal YJ, Kortan AR, Mannaerts JP, Yang B, Ye P, Gossmann H, Sergent AM, Ng KK, Bude J, Schulte WH, Garfunkel E, et al. Advances in high κ gate dielectrics for Si and III-V semiconductors Journal of Crystal Growth. 251: 645-650. DOI: 10.1016/S0022-0248(02)02192-9  0.397
2002 Frank MM, Chabal YJ, Wilk GD. In situ spectroscopic approach to atomic layer deposition Materials Research Society Symposium - Proceedings. 745: 41-46. DOI: 10.1557/Proc-745-N2.4  0.431
2002 Busch BW, Pluchery O, Chabal YJ, Muller DA, Opila RL, Raynien Kwo J, Garfunkel E. Materials Characterization of Alternative Gate Dielectrics Mrs Bulletin. 27: 206-211. DOI: 10.1557/Mrs2002.72  0.364
2002 Chabal YJ, Raghavachari K, Zhang X, Garfunkel E. Silanone ( Si = O ) on Si(100): intermediate for initial silicon oxidation Physical Review B. 66: 1-4. DOI: 10.1103/Physrevb.66.161315  0.419
2002 Fukidome H, Pluchery O, Queeney KT, Caudano Y, Raghavachari K, Weldon MK, Chaban EE, Christman SB, Kobayashi H, Chabal YJ. In situ vibrational study of SiO2/liquid interfaces Surface Science. 502: 498-502. DOI: 10.1016/S0039-6028(01)01998-7  0.415
2002 Caudano Y, Thiry PA, Chabal YJ. Investigation of the bending vibrations of vicinal H/Si(1 1 1) surfaces by infrared spectroscopy Surface Science. 502: 91-95. DOI: 10.1016/S0039-6028(01)01904-5  0.46
2002 Pluchery O, Eng J, Opila RL, Chabal YJ. Vibrational study of indium phosphide oxides Surface Science. 502: 75-80. DOI: 10.1016/S0039-6028(01)01901-X  0.36
2002 Chabal YJ, Raghavachari K. Applications of infrared absorption spectroscopy to the microelectronics industry Surface Science. 502: 41-50. DOI: 10.1016/S0039-6028(01)01896-9  0.391
2002 Weldon MK, Queeney KT, Eng J, Raghavachari K, Chabal YJ. The surface science of semiconductor processing: Gate oxides in the ever-shrinking transistor Surface Science. 500: 859-878. DOI: 10.1016/S0039-6028(01)01585-0  0.392
2001 Queeney KT, Chabal YJ, Raghavachari K. Role of interdimer interactions in NH3 dissociation on si(100)-(2x1). Physical Review Letters. 86: 1046-9. PMID 11178006 DOI: 10.1103/Physrevlett.86.1046  0.44
2001 Eng J, Opila RL, Rosamilia JM, Sapjeta BJ, Chabal YJ, Boone T, Masaitis R, Sorsch T, Green ML. The evolution of chemical oxides into ultrathin oxides: A spectroscopic characterization Solid State Phenomena. 76: 145-148. DOI: 10.4028/Www.Scientific.Net/Ssp.76-77.145  0.334
2001 Zhang X, Chabal YJ, Christman SB, Chaban EE, Garfunkel E. Oxidation of H-covered flat and vicinal Si(111)-1×1 surfaces Journal of Vacuum Science and Technology. 19: 1725-1729. DOI: 10.1116/1.1335680  0.499
2001 Zhang X, Garfunkel E, Chabal YJ, Christman SB, Chaban EE. Stability of HF-etched Si(100) surfaces in oxygen ambient Applied Physics Letters. 79: 4051-4053. DOI: 10.1063/1.1425461  0.478
2001 Estève A, Chabal YJ, Raghavachari K, Weldon MK, Queeney KT, Djafari Rouhani M. Water-saturated Si(100)-(2×1): Kinetic Monte Carlo simulations of thermal oxygen incorporation Journal of Applied Physics. 90: 6000-6005. DOI: 10.1063/1.1417994  0.416
2001 Kwo J, Hong M, Kortan AR, Queeney KL, Chabal YJ, Opila RL, Muller DA, Chu SNG, Sapjeta BJ, Lay TS, Mannaerts JP, Boone T, Krautter HW, Krajewski JJ, Sergnt AM, et al. Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si Journal of Applied Physics. 89: 3920-3927. DOI: 10.1063/1.1352688  0.399
2001 Queeney KT, Fukidome H, Chaban EE, Chabal YJ. In-Situ FTIR Studies of Reactions at the Silicon/Liquid Interface: Wet Chemical Etching of Ultrathin SiO2 on Si(100)† Journal of Physical Chemistry B. 105: 3903-3907. DOI: 10.1021/Jp003409J  0.46
2001 Queeney KT, Fukidome H, Chaban EE, Chabal YJ. In-Situ FTIR Studies of Reactions at the Silicon/Liquid Interface: Wet Chemical Etching of Ultrathin SiO2 on Si(100) Journal of Physical Chemistry B. 105: 3903-3907.  0.354
2000 Chabal YJ, Isaacs ED, Weldon MK. Mechanistic studies of wafer bonding and thin silicon film exfoliation Materials Research Society Symposium - Proceedings. 587. DOI: 10.1557/Proc-587-O4.4  0.396
2000 Weldon MK, Queeney KT, Gurevich AB, Stefanov BB, Chabal YJ, Raghavachari K. Si-H bending modes as a probe of local chemical structure: Thermal and chemical routes to decomposition of H2O on Si(100)-(2×1) Journal of Chemical Physics. 113: 2440-2446. DOI: 10.1063/1.482061  0.483
2000 Queeney KT, Weldon MK, Chang JP, Chabal YJ, Gurevich AB, Sapjeta J, Opila RL. Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon Journal of Applied Physics. 87: 1322-1330. DOI: 10.1063/1.372017  0.406
2000 Kwo J, Hong M, Kortan AR, Queeney KT, Chabal YJ, Mannaerts JP, Boone T, Krajewski JJ, Sergent AM, Rosamilia JM. High ε gate dielectrics Gd2O3 and Y2O3 for silicon Applied Physics Letters. 77: 130-132. DOI: 10.1063/1.126899  0.342
1999 Chabal YJ, Weldon MK, Gurevich AB, Christman SB. Infrared absorption studies of wet chemical oxides: Thermal evolution of impurities Diffusion and Defect Data Pt.B: Solid State Phenomena. 65: 253-256. DOI: 10.4028/Www.Scientific.Net/Ssp.65-66.253  0.381
1999 Dumas P, Weldon MK, Chabal YJ, Williams GP. Molecules at surfaces and interfaces studied using vibrational spectroscopies and related techniques Surface Review and Letters. 6: 225-255. DOI: 10.1142/S0218625X99000263  0.398
1999 Queeney KT, Chabal YJ, Stefanov BB, Raghavachari K. Mechanistic studies of silicon oxidation Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 1795-1802. DOI: 10.1116/1.590829  0.364
1999 Honke R, Jakob P, Chabal YJ, Dvořák A, Tausendpfund S, Stigler W, Pavone P, Mayer AP, Schröder U. Anharmonic adlayer vibrations on the Si(111):H surface Physical Review B. 59: 10996-11013. DOI: 10.1103/Physrevb.59.10996  0.45
1999 Gurevich AB, Weldon MK, Chabal YJ, Opila RL, Sapjeta J. Thermal evolution of impurities in wet chemical silicon oxides Applied Physics Letters. 74: 1257-1259. DOI: 10.1063/1.123517  0.374
1999 Diebold AC, Venables D, Chabal Y, Muller D, Weldon M, Garfunkel E. Characterization and production metrology of thin transistor gate oxide films Materials Science in Semiconductor Processing. 2: 103-147. DOI: 10.1016/S1369-8001(99)00009-8  0.37
1999 Chabal YJ, Weldon MK, Caudano Y, Stefanov BB, Raghavachari K. Spectroscopic studies of H-decorated interstitials and vacancies in thin-film silicon exfoliation Physica B: Condensed Matter. 273: 152-163. DOI: 10.1016/S0921-4526(99)00435-4  0.41
1999 Queeney KT, Chabal YJ, Weldon MK, Raghavachari K. Silicon oxidation and ultra-thin oxide formation on silicon studied by infrared absorption spectroscopy Physica Status Solidi (a) Applied Research. 175: 77-88. DOI: 10.1002/(Sici)1521-396X(199909)175:1<77::Aid-Pssa77>3.0.Co;2-F  0.355
1998 Jackson WB, Franz A, Chabal Y, Weldon MK, Jin H, Abelson JR. Hydrogen Structures in Heavily Hydrogenated Crystalline and Amorphous Silicon Mrs Proceedings. 513. DOI: 10.1557/Proc-513-381  0.42
1998 Stefanov BB, Gurevich AB, Weldon MK, Raghavachari K, Chabal YJ. Silicon epoxide: Unexpected intermediate during silicon oxide formation Physical Review Letters. 81: 3908-3911. DOI: 10.1103/Physrevlett.81.3908  0.442
1998 Gurevich AB, Stefanov BB, Weldon MK, Chabal YJ, Raghavachari K. Heterogeneous nucleation of oxygen on silicon: Hydroxyl-mediated interdimer coupling on Si(100)-(2 × 1) Physical Review B - Condensed Matter and Materials Physics. 58: R13434-R13437. DOI: 10.1103/Physrevb.58.R13434  0.375
1998 Eng J, Raghavachari K, Struck LM, Chabal YJ, Bent BE, Banaszak-Holl MM, McFeely FR, Michaels AM, Flynn GW, Christman SB, Chaban EE, Williams GP, Radermacher K, Mantl S. An infrared study of H8Si8O12 cluster adsorption on Si(100) surfaces Journal of Chemical Physics. 108: 8680-8688. DOI: 10.1063/1.476411  0.41
1998 Weldon MK, Collot M, Chabal YJ, Venezia VC, Agarwal A, Haynes TE, Eaglesham DJ, Christman SB, Chaban EE. Mechanism of silicon exfoliation induced by hydrogen/helium co-implantation Applied Physics Letters. 73: 3721-3723. DOI: 10.1063/1.122875  0.343
1998 Alers GB, Werder DJ, Chabal Y, Lu HC, Gusev EP, Garfunkel E, Gustafsson T, Urdahl RS. Intermixing at the tantalum oxide/silicon interface in gate dielectric structures Applied Physics Letters. 73: 1517-1519. DOI: 10.1063/1.122191  0.397
1998 Martin MG, Avila J, Gruyters M, Teodorescu C, Dumas P, Chabal YJ, Asensio MC. Initial stage of the growth of Fe on Si(111)(1 × 1)-H Applied Surface Science. 123: 156-160. DOI: 10.1016/S0169-4332(97)00485-6  0.441
1997 Luo H, Chidsey CED, Chabal Y. Infrared Spectroscopy of Covalently Bonded Species on Silicon Surfaces: Deuterium, Chlorine, and Cobalt Tetracarbonyl Mrs Proceedings. 477. DOI: 10.1557/Proc-477-415  0.508
1997 Weldon MK, Marsico VE, Chabal YJ, Agarwal A, Eaglesham DJ, Sapjeta J, Brown WL, Jacobson DC, Caudano Y, Christman SB, Chaban EE. On the mechanism of the hydrogen-induced exfoliation of silicon Journal of Vacuum Science & Technology B. 15: 1065-1073. DOI: 10.1116/1.589416  0.406
1997 Weldon MK, Stefanov BB, Raghavachari K, Chabal YJ. Initial H2O-induced oxidation of Si(100)-(2 × 1) Physical Review Letters. 79: 2851-2854. DOI: 10.1103/Physrevlett.79.2851  0.375
1997 Eng J, Raghavachari K, Struck LM, Chabal YJ, Bent BE, Flynn GW, Christman SB, Chaban EE, Williams GP, Radermacher K, Mantl S. A vibrational study of ethanol adsorption on Si(100) Journal of Chemical Physics. 106: 9889-9898. DOI: 10.1063/1.473877  0.455
1997 Struck LM, Eng J, Bent BE, Flynn GW, Chabal YJ, Christman SB, Chaban EE, Raghavachari K, Williams GP, Radermacher K, Mantl S. Vibrational study of silicon oxidation: H2O on Si(100) Surface Science. 380: 444-454. DOI: 10.1016/S0039-6028(97)00041-1  0.415
1997 Dumas P, Suhren M, Chabal YJ, Hirschmugl CJ, Williams GP. Adsorption and reactivity of NO on Cu(111): A synchrotron infrared reflection absorption spectroscopic study Surface Science. 371: 200-212. DOI: 10.1016/S0039-6028(96)00987-9  0.358
1997 Chabal YJ, Weldon MK, Marsico VE. Applications of infrared absorption spectroscopy to the microelectronic industry Journal De Physique. Iv : Jp. 7.  0.31
1996 Chabal YJ. Physics and chemistry of silicon wafer bonding investigated by infrared absorption spectroscopy Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 14: 3095-3106. DOI: 10.1116/1.589070  0.491
1996 Dumas P, Gruyters M, Rudolf P, He Y, Yu L, Gensterblum G, Caudano R, Chabal Y. Vibrational study of C60 overlayers on Surface Science. 368: 330-336. DOI: 10.1016/S0039-6028(97)80028-3  0.446
1996 Weldon MK, Marsico VE, Chabal YJ, Hamann DR, Christman SB, Chaban EE. Infrared spectroscopy as a probe of fundamental processes in microelectronics : silicon wafer cleaning and bonding Surface Science. 368: 163-178. DOI: 10.1016/S0039-6028(96)01046-1  0.475
1996 Raghavachari K, Chabal YJ, Struck LM. Vibrational interactions at surfaces: H2O on Si(100) Chemical Physics Letters. 252: 230-235. DOI: 10.1016/0009-2614(96)00096-6  0.399
1995 Schuppler S, Friedman SL, Marcus MA, Adler DL, Xie Y, Ross FM, Chabal YJ, Harris TD, Brus LE, Brown WL, Chaban EE, Szajowski PF, Christman SB, Citrin PH. Size, shape, and composition of luminescent species in oxidized Si nanocrystals and H-passivated porous Si. Physical Review. B, Condensed Matter. 52: 4910-4925. PMID 9981675 DOI: 10.1103/Physrevb.52.4910  0.406
1995 Chabal YJ, Hines MA, Feijóo D. Characterization of silicon surfaces and interfaces by optical vibrational spectroscopy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 1719-1727. DOI: 10.1116/1.579758  0.642
1995 Pietsch GJ, Chabal YJ, Higashi GS. Infrared-absorption spectroscopy of Si(100) and Si(111) surfaces after chemomechanical polishing Journal of Applied Physics. 78: 1650-1658. DOI: 10.1063/1.360721  0.479
1995 Dumas P, Chabal YJ, Gunther R, Ibrahimi AT, Petroff Y. Vibrational characterization and electronic properties of long range-ordered, ideally hydrogen-terminated Si(111) Progress in Surface Science. 48: 313-324. DOI: 10.1016/0079-6816(95)93437-C  0.492
1995 Pietsch GJ, Chabal YJ, Higashi GS. The atomic-scale removal mechanism during chemo-mechanical polishing of Si(100) and Si(111) Surface Science. 331: 395-401. DOI: 10.1016/0039-6028(95)00292-8  0.474
1994 Schuppler S, Friedman SL, Marcus MA, Adler DL, Xie Y, Ross FM, Harris TD, Brown WL, Chabal YJ, Brus LE, Citrin PH. Dimensions of luminescent oxidized and porous silicon structures. Physical Review Letters. 72: 2648-2651. PMID 10055937 DOI: 10.1103/Physrevlett.72.2648  0.393
1994 Schuppler S, Friedman SL, Marcus MA, Adler D, Xie Y, Ross FM, Harris TD, Brown W, Chabal YJ, Szajowski PJ, Chaban EE, Brus LE, Citrin PH. Size, Shape, and Crystallinity of Luminescent Structures in Oxidized Si Nanoclusters and H-Passivated Porous Si Mrs Proceedings. 358. DOI: 10.1557/Proc-358-407  0.413
1994 Aydil ES, Gottscho RA, Chabal YJ. Real-time monitoring of surface chemistry during plasma processing Pure and Applied Chemistry. 66: 1381-1388. DOI: 10.1351/Pac199466061381  0.39
1994 Hirschmugl CJ, Chabal YJ, Hoffmann FM, Williams GP. Low-frequency dynamics of CO/Cu breakdown of Born-Oppenheimer approximation Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 12: 2229-2234. DOI: 10.1116/1.579120  0.307
1994 Hines MA, Chabal YJ, Harris TD, Harris AL. Measuring the structure of etched silicon surfaces with Raman spectroscopy The Journal of Chemical Physics. 101: 8055-8072. DOI: 10.1063/1.468232  0.652
1994 Kuhnke K, Harris AL, Chabal YJ, Jakob P, Morin M. Transient vibrational mode renormalization in dipole-coupled adsorbates at surfaces The Journal of Chemical Physics. 100: 6896-6906. DOI: 10.1063/1.467005  0.386
1994 Feijoó D, Chabal YJ, Christman SB. Silicon wafer bonding studied by infrared absorption spectroscopy Applied Physics Letters. 65: 2548-2550. DOI: 10.1063/1.112631  0.4
1994 Pietsch GJ, Higashi GS, Chabal YJ. Chemomechanical polishing of silicon: Surface termination and mechanism of removal Applied Physics Letters. 64: 3115-3117. DOI: 10.1063/1.111365  0.43
1994 Vinh LT, Eddrief M, Sébenne CA, Dumas P, Taleb‐Ibrahimi A, Gunther R, Chabal YJ, Derrien J. Low temperature formation of Si(111)7×7 surfaces from chemically prepared H/Si(111)‐(1×1) surfaces Applied Physics Letters. 64: 3308-3310. DOI: 10.1063/1.111288  0.487
1994 Taleb-Ibrahimi A, Gunther R, Dumas P, Indlekofer G, Chabal YJ, Petroff Y. High resolution photoemission spectroscopy of flat and stepped non reconstructed H/Si(111) surfaces Journal De Physique. Iv : Jp. 4. DOI: 10.1051/Jp4:1994911  0.495
1994 Jakob P, Chabal YJ, Kuhnke K, Christman SB. Monohydride structures on chemically prepared silicon surfaces Surface Science. 302: 49-56. DOI: 10.1016/0039-6028(94)91095-2  0.515
1993 Hines MA, Chabal YJ, Harris TD, Harris AL. Raman studies of steric hindrance and surface relaxation of stepped H-terminated silicon surfaces. Physical Review Letters. 71: 2280-2283. PMID 10054633 DOI: 10.1103/Physrevlett.71.2280  0.657
1993 Jakob P, Chabal YJ, Raghavachari K, Christman SB. Discrete nature of inhomogeneity on stepped H/Si(111) surfaces: Spectroscopic identification of individual terrace sizes. Physical Review. B, Condensed Matter. 47: 6839-6842. PMID 10004674 DOI: 10.1103/Physrevb.47.6839  0.463
1993 Raghavachari K, Higashi GS, Chabal YJ, Trucks GW. First-principles study of the etching reactions of HF and H2O with Si/SiO2 surfaces Materials Research Society Symposium Proceedings. 315: 437-446. DOI: 10.1557/Proc-315-437  0.482
1993 CHABAL Y, HARRIS A, RAGHAVACHARI K, TULLY J. INFRARED SPECTROSCOPY OF H-TERMINATED SILICON SURFACES International Journal of Modern Physics B. 7: 1031-1078. DOI: 10.1142/S0217979293002237  0.495
1993 Kuhnke K, Morin M, Jakob P, Levinos NJ, Chabal YJ, Harris AL. Vibrational energy transfer among adsorbate modes: Picosecond dynamics on stepped H/Si(111) The Journal of Chemical Physics. 99: 6114-6125. DOI: 10.1063/1.465907  0.374
1993 Aydil ES, Zhou Z, Giapis KP, Chabal Y, Gregus JA, Gottscho RA. Real‐time,insitumonitoring of surface reactions during plasma passivation of GaAs Applied Physics Letters. 62: 3156-3158. DOI: 10.1063/1.109113  0.436
1993 Harris AL, Kuhnke K, Morin M, Jakob P, Levinos NJ, Chabal YJ. Vibrational energy flow at stepped H/Si(111): phonons, dipoles and screening Faraday Discussions. 96: 217. DOI: 10.1039/Fd9939600217  0.336
1993 Hines MA, Harris TD, Harris AL, Chabal YJ. Looking up the down staircase: Surface Raman spectroscopy as a probe of adsorbate orientation Journal of Electron Spectroscopy and Related Phenomena. 64: 183-191. DOI: 10.1016/0368-2048(93)80078-Z  0.632
1993 Jakob P, Chabal YJ, Raghavachari K. The role of kinks in the Si-H vibrational spectrum of vicinal Si(111)-〈112〉 surfaces Journal of Electron Spectroscopy and Related Phenomena. 64: 59-66. DOI: 10.1016/0368-2048(93)80061-P  0.447
1993 Morin M, Kuhnke K, Jakob P, Chabal YJ, Levinos NJ, Harris A. Interadsorbate vibrational energy flow on stepped vicinal H/Si(111) surfaces Journal of Electron Spectroscopy and Related Phenomena. 11-21. DOI: 10.1016/0368-2048(93)80057-S  0.412
1993 Dumas P, Chabal YJ, Jakob P. Vibrational properties of H/Si(111)-(1 × 1) surfaces: infrared absorption and electron energy loss spectroscopic studies Applied Surface Science. 65: 580-586. DOI: 10.1016/0169-4332(93)90722-N  0.475
1993 Jakob P, Chabal YJ, Raghavachari K, Dumas P, Christman SB. Imperfections on the chemically prepared, ideally H-terminated Si(111)-(1 × 1) surfaces Surface Science. 285: 251-258. DOI: 10.1016/0039-6028(93)90436-N  0.465
1993 Chabal YJ. Infrared spectroscopy of semiconductor surfaces: H-terminated silicon surfaces Journal of Molecular Structure. 292: 65-80. DOI: 10.1016/0022-2860(93)80090-I  0.498
1993 Raghavachari K, Jakob P, Chabal YJ. Step relaxation and surface stress at H-terminated vicinal Si(111) Chemical Physics Letters. 206: 156-160. DOI: 10.1016/0009-2614(93)85533-T  0.469
1992 Bouzidi S, Coletti F, Debever JM, Thiry PA, Dumas P, Chabal YJ. Inverse-photoemission spectroscopy of the unreconstructed, ideally H-terminated Si(111) surface Physical Review B. 45: 1187-1192. PMID 10001593 DOI: 10.1103/Physrevb.45.1187  0.372
1992 Chabal YJ. Etching of Silicon (111) and (100) Surfaces in HF Solutions: H-Termination, Atomic Structure and Overall Morphology Mrs Proceedings. 259: 349. DOI: 10.1557/Proc-259-349  0.497
1992 Dumas P, Chabal YJ. Electron energy loss spectroscopy of H-terminated Si(111) and Si(100) prepared by chemical etching Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 2160-2165. DOI: 10.1116/1.577998  0.464
1992 Morin M, Jakob P, Levinos NJ, Chabal YJ, Harris AL. Vibrational energy transfer on hydrogen-terminated vicinal Si(111) surfaces: Interadsorbate energy flow The Journal of Chemical Physics. 96: 6203-6212. DOI: 10.1063/1.462637  0.445
1992 Dumas P, Chabal YJ, Jakob P. Morphology of hydrogen-terminated Si(111) and Si(100) surfaces upon etching in HF and buffered-HF solutions Surface Science. 269: 867-878. DOI: 10.1016/0039-6028(92)91363-G  0.474
1992 Bouzidi S, Coletti F, Debever JM, Thiry PA, Dumas P, Chabal YJ. Conduction-bands asymmetry of Si(111) revealed by inverse photoemission Surface Science. 829-832. DOI: 10.1016/0039-6028(92)91356-G  0.367
1992 Jakob P, Chabal YJ, Raghavachari K, Becker RS, Becker AJ. Kinetic model of the chemical etching of Si(111) surfaces by buffered HF solutions Surface Science. 275: 407-413. DOI: 10.1016/0039-6028(92)90813-L  0.489
1991 Jakob P, Chabal YJ. Chemical etching of vicinal Si(111): Dependence of the surface structure and the hydrogen termination on the pH of the etching solutions The Journal of Chemical Physics. 95: 2897-2909. DOI: 10.1063/1.460892  0.462
1991 Prybyla JA, Estrup PJ, Chabal YJ. Phase transitions, surface structures, and adsorbate bonding in the H/Mo(100) chemisorption system The Journal of Chemical Physics. 94: 6274-6295. DOI: 10.1063/1.460417  0.392
1991 Jakob P, Dumas P, Chabal YJ. Influence of silicon oxide on the morphology of HF-etched Si(111) surfaces: Thermal versus chemical oxide Applied Physics Letters. 59: 2968-2970. DOI: 10.1063/1.105814  0.495
1991 Higashi GS, Becker RS, Chabal YJ, Becker AJ. Comparison of Si(111) surfaces prepared using aqueous solutions of NH 4F versus HF Applied Physics Letters. 58: 1656-1658. DOI: 10.1063/1.105155  0.464
1991 Chabal YJ. Infrared spectroscopy of hydrogen on silicon surfaces Physica B: Physics of Condensed Matter. 170: 447-456. DOI: 10.1016/0921-4526(91)90159-C  0.495
1991 Chabal YJ, Dumas P, Guyot-Sionnest P, Higashi GS. Vibrational dynamics of the ideally H-terminated Si(111) surface Surface Science. 242: 524-530. DOI: 10.1016/0039-6028(91)90321-I  0.42
1991 Dumas P, Chabal YJ. Electron-energy-loss characterization of the H-terminated Si(111) and Si(100) surfaces obtained by etching in NH4F Chemical Physics Letters. 181: 537-543. DOI: 10.1016/0009-2614(91)80309-L  0.475
1990 Dumas P, Chabal YJ, Higashi GS. Coupling of an adsorbate vibration to a substrate surface phonon: H on Si(111). Physical Review Letters. 65: 1124-1127. PMID 10043111 DOI: 10.1103/Physrevlett.65.1124  0.446
1990 Trucks GW, Raghavachari K, Higashi GS, Chabal YJ. Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation. Physical Review Letters. 65: 504-507. PMID 10042937 DOI: 10.1103/Physrevlett.65.504  0.474
1990 Hirschmugl CJ, Williams GP, Hoffmann FM, Chabal YJ. Adsorbate-substrate resonant interactions observed for CO on Cu(100) in the far infrared. Physical Review Letters. 65: 480-483. PMID 10042931 DOI: 10.1103/Physrevlett.65.480  0.321
1990 Becker RS, Higashi GS, Chabal YJ, Becker AJ. Atomic-scale conversion of clean Si(111):H-1 x 1 to Si(111)-2 x 1 by electron-stimulated desorption. Physical Review Letters. 65: 1917-1920. PMID 10042397 DOI: 10.1103/Physrevlett.65.1917  0.373
1990 Guyot-Sionnest P, Dumas P, Chabal YJ, Higashi GS. Lifetime of an adsorbate-substrate vibration: H on Si(111). Physical Review Letters. 64: 2156-2159. PMID 10041598 DOI: 10.1103/Physrevlett.64.2156  0.393
1990 vom Felde A, Kern K, Higashi GS, Chabal YJ, Christman SB, Bahr CC, Cardillo MJ. Oxidation of GaAs(110) with NO2: Infrared spectroscopy. Physical Review. B, Condensed Matter. 42: 5240-5248. PMID 9996088 DOI: 10.1103/Physrevb.42.5240  0.319
1990 Trucks GW, Raghavachari K, Higashi GS, Chabal YJ. Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation Physical Review Letters. 65: 504-507. DOI: 10.1103/PhysRevLett.65.504  0.368
1990 Dumas P, Chabal YJ, Higashi GS. Coupling of an adsorbate vibration to a substrate surface phonon: H on Si(111) Physical Review Letters. 65: 1124-1127. DOI: 10.1103/PhysRevLett.65.1124  0.34
1990 Reutt-Robey JE, Doren DJ, Chabal YJ, Christman SB. CO diffusion on Pt(111) with time-resolved Infrared-pulsed molecular beam methods: Critical tests and analysis The Journal of Chemical Physics. 93: 9113-9129. DOI: 10.1063/1.459202  0.327
1990 Higashi GS, Chabal YJ, Trucks GW, Raghavachari K. Ideal hydrogen termination of the Si (111) surface Applied Physics Letters. 56: 656-658. DOI: 10.1063/1.102728  0.499
1990 Berrada K, Dumas P, Chabal YJ, Dubot P. Adsorption states and orientation of N-alkyl anhydride molecules on oxidized aluminium surface Journal of Electron Spectroscopy and Related Phenomena. 54: 1153-1162. DOI: 10.1016/0368-2048(90)80305-T  0.365
1990 Doak RB, Chabal YJ, Higashi GS, Dumas P. Inelastic helium scattering measurements of surface phonons in hydrogen-terminated Si(111) (1 × 1) Journal of Electron Spectroscopy and Related Phenomena. 54: 291-298. DOI: 10.1016/0368-2048(90)80221-U  0.488
1990 Hirschmugl CJ, Williams GP, Hoffmann FM, Chabal YJ. Adsorbate-substrate resonant interactions observed for Co on Cu(100) and (111) in the far-ir using synchrotron radiation Journal of Electron Spectroscopy and Related Phenomena. 54: 109-114. DOI: 10.1016/0368-2048(90)80203-M  0.305
1990 Dumas P, Chabal YJ, Higashi GS. Lineshape of the Si-H stretching vibration for the ideally H-terminated Si(111)1×1 Journal of Electron Spectroscopy and Related Phenomena. 54: 103-108. DOI: 10.1016/0368-2048(90)80202-L  0.462
1990 Guyot-Sionnest P, Dumas P, Chabal YJ. Lifetime of an adsorbate-substrate vibration measured by sum frequency generation : H on Si(111) Journal of Electron Spectroscopy and Related Phenomena. 54: 27-38. DOI: 10.1016/0368-2048(90)80198-J  0.353
1990 Chabal YJ. Molecular diffusion on metal surfaces: time-resolved infrared spectroscopy and other techniques Vacuum. 41: 70-73. DOI: 10.1016/0042-207X(90)90275-4  0.33
1990 Kern K, Chabal Y, Higashi G, Vom Felde A, Cardillo M. Low temperature adsorption and reaction of NO on GaAs(110) Chemical Physics Letters. 168: 203-207. DOI: 10.1016/0009-2614(90)85130-5  0.41
1989 Chabal YJ, Higashi GS, Raqhavachari K, Burrows VA. Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 7: 2104-2109. DOI: 10.1557/Proc-131-191  0.514
1989 Reutt-Robey JE, ChabaL YJ, Doren DJ, Christman SB. CO diffusion on Pt(111) by time-resolved surface infrared spectroscopy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 7: 2227-2234. DOI: 10.1116/1.575963  0.35
1988 Reutt-Robey JE, Doren DJ, Chabal YJ, Christman SB. Microscopic CO diffusion on a Pt(111) surface by time-resolved infrared spectroscopy. Physical Review Letters. 61: 2778-2781. PMID 10039220 DOI: 10.1103/Physrevlett.61.2778  0.354
1988 Reutt JE, Chabal YJ, Christman SB. Coupling of H vibration to substrate electronic states in Mo(100)-p(1×1)H and W(100)-p(1×1)H: Example of strong breakdown of adiabaticity Physical Review B. 38: 3112-3132. DOI: 10.1103/Physrevb.38.3112  0.372
1988 Swanson JR, Friend CM, Chabal YJ. Erratum: Laser‐assisted deposition of iron on Si(111)‐(7×7): The mechanism and energetics of Fe(CO)5 decomposition [J. Chem. Phys. 87, 5028 (1987)] The Journal of Chemical Physics. 89: 2593-2593. DOI: 10.1063/1.455741  0.308
1988 Burrows VA, Chabal YJ, Higashi GS, Raghavachari K, Christman SB. Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology Applied Physics Letters. 53: 998-1000. DOI: 10.1063/1.100053  0.489
1988 Chabal YJ. Surface infrared spectroscopy Surface Science Reports. 8: 211-357. DOI: 10.1016/0167-5729(88)90011-8  0.416
1987 Swanson JR, Friend C, Chabal Y. Laser-Assisted Deposition of Fe and W: Photodecomposition of Fe(CO)5, and W(CO)6 on Si(111)-(7×7) Mrs Proceedings. 101. DOI: 10.1557/Proc-101-201  0.38
1987 Prybyla JA, Estrup PJ, Chabal YJ. Summary Abstract: Reconstruction, adsorbate bonding, and desorption kinetics of H/Mo(100) Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 5: 791-792. DOI: 10.1116/1.574347  0.318
1987 Chabal YJ, Patel CKN. Molecular hydrogen in a-Si: H Reviews of Modern Physics. 59: 835-844. DOI: 10.1103/Revmodphys.59.835  0.369
1987 Prybyla JA, Estrup PJ, Ying SC, Chabal YJ, Christman SB. Reconstructive phase transitions and effective adsorbate-adsorbate interactions: H/Mo(100) and H/W(100) Physical Review Letters. 58: 1877-1880. DOI: 10.1103/Physrevlett.58.1877  0.383
1987 Swanson JR, Friend CM, Chabal YJ. Laser‐assisted deposition of iron on Si(111)‐(7×7): The mechanism and energetics of Fe(CO)5 decomposition The Journal of Chemical Physics. 87: 5028-5037. DOI: 10.1063/1.452819  0.34
1987 Reutt JE, Chabal YJ, Christman SB. Hydrogen phonon spectra on transition metal surfaces: infrared reflection-absorption investigations of Mo(l00), W(100), and Pt(111) Journal of Electron Spectroscopy and Related Phenomena. 44: 325-332. DOI: 10.1016/0368-2048(87)87033-0  0.389
1987 Chabal YJ, Christman SB, Arrecis JJ, Prybyla JA, Estrup PJ. Hydrogen-induced reconstruction on W(100) and Mo(100) by surface infrared spectroscopy Journal of Electron Spectroscopy and Related Phenomena. 44: 17-26. DOI: 10.1016/0368-2048(87)87003-2  0.407
1987 Burrows VA, Sundaresan S, Chabal YJ, Christman SB. Studies on self-sustained reaction-rate oscillations. II. The role of carbon and oxides in the oscillatory oxidation of carbon monoxide on platinum Surface Science. 180: 110-135. DOI: 10.1016/0039-6028(87)90039-2  0.397
1986 Swanson JR, Friend CM, Chabal YJ. Deposition of Iron on Si(111)-(7×7): Photo- and Electron-Assisted Decomposition of Fe(CO)5 Mrs Proceedings. 75. DOI: 10.1557/Proc-75-559  0.355
1986 Chabal YJ. Infrared absorption measurement of the overtone of the wagging mode of hydrogen on W(100) Journal of Vacuum Science and Technology. 4: 1324-1328. DOI: 10.1116/1.573602  0.345
1986 Arrecis JJ, Chabal YJ, Christman SB. H-induced structural phase transitions on W(100) by surface infrared spectroscopy Physical Review B. 33: 7906-7916. DOI: 10.1103/Physrevb.33.7906  0.373
1986 Chabal YJ. Dynamics of H Chemisorbed on Si(100) and W(100) Studied by High-Resolution Infrared Spectroscopy Studies in Surface Science and Catalysis. 26: 159-174. DOI: 10.1016/0368-2048(86)85086-1  0.399
1986 Chabal YJ. High-resolution infrared spectroscopy of adsorbates on semiconductor surfaces: Hydrogen on Si(100) and Ge(100) Surface Science. 168: 594-608. DOI: 10.1016/0039-6028(86)90890-3  0.497
1985 Chabal YJ, Raghavachari K. New ordered structure for the H-saturated Si(100) surface: The (3 x 1) phase. Physical Review Letters. 54: 1055-1058. PMID 10030917 DOI: 10.1103/Physrevlett.54.1055  0.338
1985 Tully JC, Chabal YJ, Raghavachari K, Bowman JM, Lucchese RR. Infrared linewidths and vibrational lifetimes at surfaces: H on Si(100). Physical Review. B, Condensed Matter. 31: 1184-1186. PMID 9935883 DOI: 10.1103/Physrevb.31.1184  0.456
1985 Chabal YJ. Infrared study of the chemisorption of hydrogen and water on vicinal Si(100) 2×1 surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 3: 1448-1451. DOI: 10.1116/1.572757  0.407
1985 Chabal YJ. Electronic Damping of Hydrogen Vibration on the W(100) Surface Physical Review Letters. 55: 845-848. DOI: 10.1103/Physrevlett.55.845  0.355
1985 Chabal YJ, Raghavachari K. New ordered structure for the H-saturated Si(100) surface: The (3×1) phase Physical Review Letters. 54: 1055-1058. DOI: 10.1103/PhysRevLett.54.1055  0.34
1985 Burrows VA, Sundaresan S, Chabal YJ, Christman SB. Studies on self-sustained reaction-rate oscillations. I. Real-time surface infrared measurements during oscillatory oxidation of carbon monoxide on platinum Surface Science. 160: 122-138. DOI: 10.1016/0039-6028(85)91031-3  0.372
1985 Riffe DM, Hanssen LM, Sievers AJ, Chabal YJ, Christman SB. Linewidth of H chemisorbed on W(100): An infrared study Surface Science. 161: L559-L564. DOI: 10.1016/0039-6028(85)90721-6  0.689
1985 Chabal YJ, Patel CKN. Effects of high pressure molecular hydrogen in a-Si:H Journal of Non-Crystalline Solids. 77: 201-212. DOI: 10.1016/0022-3093(85)90640-4  0.358
1984 Chabal YJ, Raghavachari K. Surface infrared study of Si(100)-(2×1)H Physical Review Letters. 53: 282-285. DOI: 10.1103/Physrevlett.53.282  0.447
1984 Chabal YJ, Patel CKN. Infrared absorption in a-Si: H: First observation of gaseous molecular H2 and Si-H overtone Physical Review Letters. 53: 210-213. DOI: 10.1103/Physrevlett.53.210  0.412
1984 Chabal YJ, Patel CKN. Solid hydrogen in amorphous silicon: Phase transition Physical Review Letters. 53: 1771-1774. DOI: 10.1103/Physrevlett.53.1771  0.345
1984 Chabal YJ, Christman SB. Evidence of dissociation of water on the Si(100)2 × 1 surface Physical Review B. 29: 6974-6976. DOI: 10.1103/Physrevb.29.6974  0.432
1984 Chabal YJ. Hydride formation on the Si(100):H2O surface Physical Review B. 29: 3677-3680. DOI: 10.1103/Physrevb.29.3677  0.476
1984 Sievers AJ, Schlesinger Z, Chabal YJ. IR SPECTROSCOPY WITH SURFACE ELECTROMAGNETIC WAVES Journal De Physique (Paris), Colloque. 45: 167-178. DOI: 10.1051/Jphyscol:1984525  0.354
1984 Chabal YJ, Patel CKN. INFRARED ABSORPTION IN a-Si:H: FIRST OBSERVATION OF THE GAS-SOLID TRANSITION OF OCCLUDED MOLECULAR H//2 Physica B: Physics of Condensed Matter &Amp; C: Atomic, Molecular and Plasma Physics, Optics. 126: 461-462. DOI: 10.1016/0378-4363(84)90205-5  0.366
1983 Chabal YJ, Christman SB, Chaban EE, Yin MT. Summary Abstract: Surface state optical absorption on the clean Si(100)2 ˟ 1 surface Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 1: 1241-1242. DOI: 10.1116/1.572295  0.429
1983 Chabal YJ. Hydrogen vibration on Si(111) 7 × 7: Evidence for a unique chemisorption site Physical Review Letters. 50: 1850-1853. DOI: 10.1103/Physrevlett.50.1850  0.43
1983 Chabal YJ, Higashi GS, Christman SB. Hydrogen chemisorption on Si(111)-(7×7) and -(1×1) surfaces. A comparative infrared study Physical Review B. 28: 4472-4479. DOI: 10.1103/Physrevb.28.4472  0.473
1983 Chabal YJ, Chaban EE, Christman SB. High resolution infrared study of hydrogen chemisorbed on Si(100) Studies in Surface Science and Catalysis. 14: 35-40. DOI: 10.1016/0368-2048(83)80037-1  0.395
1982 Franciosi A, Weaver JH, O’Neill DG, Chabal Y, Rowe JE, Poate JM, Bisi O, Calandra C. Chemical bonding at the Si–metal interface: Si–Ni and Si–Cr Journal of Vacuum Science and Technology. 21: 624-627. DOI: 10.1116/1.571800  0.621
1982 Chabal YJ, Rowe JE, Poate JM, Franciosi A, Weaver JH. Stoichiometry and structural disorder effects on the electronic structure of Ni and Pd silicides Physical Review B. 26: 2748-2758. DOI: 10.1103/Physrevb.26.2748  0.588
1982 Chabal YJ, Hamann DR, Rowe JE, Schlüter M. Photoemission and band-structure results for NiSi2 Physical Review B. 25: 7598-7602. DOI: 10.1103/Physrevb.25.7598  0.506
1981 Chabal YJ, Allara DL, Teicher D, Rowe JE. High frequency modulation interferometric study of electron stimulated infrared (ir) luminescence in insb Proceedings of Spie - the International Society For Optical Engineering. 289: 82. DOI: 10.1117/12.932134  0.442
1981 Chabal YJ, Rowe JE, Christman SB. LASER QUENCHED AND IMPURITY INDUCED METASTABLE Si (111) 1 multiplied by 1 SURFACES Journal of Vacuum Science &Amp; Technology. 20: 763-769. DOI: 10.1116/1.571454  0.612
1981 Chabal YJ, Rowe JE, Zwemer DA. Buckling reconstruction on laser-annealed Si(111) surfaces Physical Review Letters. 46: 600-603. DOI: 10.1103/Physrevlett.46.600  0.593
1981 Chabal YJ, Rowe JE, Christman SB. Nature of vicinal laser-annealed Si(111) surfaces Physical Review B. 24: 3303-3309. DOI: 10.1103/Physrevb.24.3303  0.64
1981 Chabal YJ, Sievers AJ. Infrared study of hydrogen chemisorbed on W(100) by surface- electromagnetic-wave spectroscopy Physical Review B. 24: 2921-2934. DOI: 10.1103/Physrevb.24.2921  0.393
1980 Chabal YJ, Culbertson RJ, Feldman LC, Rowe JE. Si(111): Ni SURFACES STUDIES BY AES, UPS, LEED, AND ION SCATTERING Journal of Vacuum Science &Amp; Technology. 18: 880-882. DOI: 10.1116/1.570983  0.644
1980 Chabal YJ, Sievers AJ. High-resolution infrared study of hydrogen (1×1) on tungsten (100) Physical Review Letters. 44: 944-947. DOI: 10.1103/Physrevlett.44.944  0.358
1978 Chabal YJ, Sievers AJ. IR STUDY OF MOLECULES ADSORBED ON METAL SURFACES BY SURFACE ELECTROMAGNETIC WAVE SPECTROSCOPY J Vac Sci Technol. 15: 638-641. DOI: 10.1116/1.569647  0.34
1978 Chabal YJ, Sievers AJ. Surface electromagnetic wave launching at the edge of a metal film Applied Physics Letters. 32: 90-92. DOI: 10.1063/1.89947  0.305
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