Bigang Min, Ph.D. - Publications
Affiliations: | 2005 | University of Texas at Arlington, Arlington, TX, United States |
Area:
Electronics and Electrical EngineeringYear | Citation | Score | |||
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2007 | Devireddy SP, Min B, Çelik-Butler Z, Tseng HH, Tobin PJ, Zlotnicka A. Improved low frequency noise characteristics of sub-micron MOSFETs with TaSiN/TiN gate on ALD HfO2 dielectric Microelectronics Reliability. 47: 1228-1232. DOI: 10.1016/J.Microrel.2007.05.006 | 0.734 | |||
2006 | Min B, Devireddy SP, Celik-Butler Z, Shanware A, Colombo L, Green K, Chambers JJ, Visokay MR, Rotondaro ALP. Impact of interfacial layer on low-frequency noise of HfSiON dielectric MOSFETs Ieee Transactions On Electron Devices. 53: 1459-1466. DOI: 10.1109/Ted.2006.874759 | 0.727 | |||
2006 | Devireddy SP, Min B, Celik-Butler Z, Tseng H, Tobin PJ, Wang F, Zlotnicka A. Low-frequency noise in TaSiN/HfO/sub 2/ nMOSFETs and the effect of stress-relieved preoxide interfacial layer Ieee Transactions On Electron Devices. 53: 538-544. DOI: 10.1109/Ted.2005.863769 | 0.706 | |||
2005 | Min B, Devireddy SP, Celik-Butler Z, Shanware A, Green K, Chambers JJ, Visokay MV, Colombo L. Low-frequency noise characteristics of HfSiON gate-dielectric metal-oxide-semiconductor-field-effect transistors Applied Physics Letters. 86: 1-3. DOI: 10.1063/1.1866507 | 0.73 | |||
2004 | Min B, Devireddy S, Celik-Butler Z, Wang F, Zlotnicka A, Tseng H, Tobin P. Low-Frequency Noise in Submicrometer MOSFETs With HfO<tex>$_2$</tex>, HfO<tex>$_2/hbox Al_2hbox O_3$</tex>and HfAlO<tex>$_x$</tex>Gate Stacks Ieee Transactions On Electron Devices. 51: 1315-1322. DOI: 10.1109/Ted.2004.832821 | 0.698 | |||
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