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Masayoshi Esashi, Ph.D. - Publications

Affiliations: 
Tohoku University, Sendai-shi, Miyagi-ken, Japan 
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Year Citation  Score
2020 Esashi M, Tanaka S, Aoyagi S, Mineta T, Suzumori K, Dohi T, Miki N. Special Issue on MEMS for Robotics and Mechatronics Journal of Robotics and Mechatronics. 32: 279-280. DOI: 10.20965/Jrm.2020.P0279  0.455
2019 Ou C, Lin Y, Keikoin Y, Ono T, Esashi M, Tsai Y. Two-dimensional MEMS Fe-based metallic glass micromirror driven by an electromagnetic actuator Japanese Journal of Applied Physics. 58: SDDL01. DOI: 10.7567/1347-4065/Ab0493  0.507
2019 Iguchi F, Kubota K, Inagaki Y, Tanaka S, Sata N, Esashi M, Yugami H. Low Temperature Operating Micro Solid Oxide Fuel Cells with Perovskite Type Proton Conductors Ecs Transactions. 35: 777-783. DOI: 10.1149/1.3570058  0.419
2018 Satoh S, Fukushi H, Esashi M, Tanaka S. Comprehensive Die Shear Test of Silicon Packages Bonded by Thermocompression of Al Layers with Thin Sn Capping or Insertions. Micromachines. 9. PMID 30424107 DOI: 10.3390/Mi9040174  0.518
2018 Makihata M, Muroyama M, Tanaka S, Nakayama T, Nonomura Y, Esashi M. Design and Fabrication Technology of Low Profile Tactile Sensor with Digital Interface for Whole Body Robot Skin. Sensors (Basel, Switzerland). 18. PMID 30037093 DOI: 10.3390/S18072374  0.567
2018 SATOH S, FUKUSHI H, ESASHI M, TANAKA S. Role of Thin Sn Layer for Low Temperature Al-Al Thermo-compression Bonding of Wafer-Level Hermetic Sealing Electronics and Communications in Japan. 101: 33-40. DOI: 10.1002/ECJ.12060  0.415
2017 Esashi M, Tanaka S. Heterogeneous Integration of MEMS on LSI Journal of Japan Institute of Electronics Packaging. 20: 372-375. DOI: 10.5104/Jiep.20.372  0.488
2017 Zhang G, Anand A, Hikichi K, Tanaka S, Esashi M, Hashimoto KY, Taniguchi S, Pokharel RK. A 1.9GHz Low-Phase-Noise Complementary Cross-Coupled FBAR-VCO without Additional Voltage Headroom in 0.18µm CMOS Technology Ieice Transactions On Electronics. 363-369. DOI: 10.1587/Transele.E100.C.363  0.49
2017 Satoh S, Fukushi H, Esashi M, Tanaka S. Role of Thin Sn Layer for Low Temperature Al-Al Thermo-compression Bonding of Wafer-level Hermetic Sealing Ieej Transactions On Sensors and Micromachines. 137: 432-437. DOI: 10.1541/IEEJSMAS.137.432  0.415
2017 SATOH S, FUKUSHI H, ESASHI M, TANAKA S. Low-Temperature Al-Al Thermocompression Bonding with Sn Oxidation Protect Layer for Wafer-Level Hermetic Sealing Electronics and Communications in Japan. 100: 43-50. DOI: 10.1541/Ieejsmas.136.237  0.482
2017 Satoh S, Fukushi H, Esashi M, Tanaka S. Low‐Temperature Al‐Al Thermocompression Bonding with Sn Oxidation Protect Layer for Wafer‐Level Hermetic Sealing Electronics and Communications in Japan. 100: 43-50. DOI: 10.1002/Ecj.11975  0.506
2016 Esashi M, Tanaka S. Stacked Integration of MEMS on LSI. Micromachines. 7. PMID 30404308 DOI: 10.3390/Mi7080137  0.562
2016 Kochhar A, Yamamoto Y, Teshigahara A, Hashimoto KY, Tanaka S, Esashi M. Wave Propagation Direction and c-axis Tilt Angle Influence on the Performance of ScAlN/Sapphire based SAW Devices. Ieee Transactions On Ultrasonics, Ferroelectrics, and Frequency Control. PMID 26978772 DOI: 10.1109/Tuffc.2016.2539226  0.509
2016 Miyaguchi H, Muroyama M, Yoshida S, Ikegami N, Kojima A, Tanaka S, Esashi M. Development of a 17×17 Parallel Electron Beam Lithography System Ieej Transactions On Sensors and Micromachines. 136: 413-419. DOI: 10.1541/Ieejsmas.136.413  0.658
2016 Kaushik N, Sharma P, Nishijima M, Makino A, Esashi M, Tanaka S. Structural, mechanical and optical properties of thin films deposited from a graphitic carbon nitride target Diamond and Related Materials. 66: 149-156. DOI: 10.1016/J.Diamond.2016.04.007  0.502
2015 Inoue KY, Matsudaira M, Nakano M, Ino K, Sakamoto C, Kanno Y, Kubo R, Kunikata R, Kira A, Suda A, Tsurumi R, Shioya T, Yoshida S, Muroyama M, Ishikawa T, ... ... Esashi M, et al. Advanced LSI-based amperometric sensor array with light-shielding structure for effective removal of photocurrent and mode selectable function for individual operation of 400 electrodes. Lab On a Chip. 15: 848-56. PMID 25483361 DOI: 10.1039/C4Lc01099J  0.557
2015 Wang WS, Lin YC, Gessner T, Esashi M. Fabrication of nanoporous gold and the application for substrate bonding at low temperature Japanese Journal of Applied Physics. 54. DOI: 10.7567/Jjap.54.030215  0.333
2015 Ogashiwa T, Totsu K, Nishizawa M, Ishida H, Sasaki Y, Miyairi M, Murai H, Kanehira Y, Tanaka S, Esashi M. Hermetic Seal Bonding at Low-temperature with Sub-micron Gold Particles for Wafer Level Packaging International Symposium On Microelectronics. 2015: 000073-000078. DOI: 10.4071/ISOM-2015-TP32  0.448
2015 Miyaguchi H, Muroyama M, Yoshida S, Ikegami N, Kojima A, Kaneko R, Totsu K, Tanaka S, Koshida N, Esashi M. An LSI for Massive Parallel Electron Beam Lithography: Its Design and Evaluation Ieej Transactions On Sensors and Micromachines. 135: 374-381. DOI: 10.1541/Ieejsmas.135.374  0.654
2015 Ikegami N, Kojima A, Miyaguchi H, Yoshida T, Yoshida S, Muroyama M, Sugata M, Koshida N, Totsu K, Esashi M. Review of Development and Performance Evaluation of Active-matrix Nanocrystalline Si Electron Emitter Array for Massively Parallel Electron Beam Direct-write Lithography Ieej Transactions On Sensors and Micromachines. 135: 221-229. DOI: 10.1541/Ieejsmas.135.221  0.59
2015 Koshida N, Kojima A, Ikegami N, Suda R, Yagi M, Shirakashi J, Miyaguchi H, Muroyama M, Yoshida S, Totsu K, Esashi M. Development of ballistic hot electron emitter and its applications to parallel processing: Active-matrix massive direct-write lithography in vacuum and thin-film deposition in solutions Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/12.2085782  0.615
2015 Hashimoto KY, Kimura T, Matsumura T, Hirano H, Kadota M, Esashi M, Tanaka S. Moving tunable filters forward Ieee Microwave Magazine. 16: 89-97. DOI: 10.1109/Mmm.2015.2431237  0.492
2015 Hayasaka T, Yoshida S, Inoue KY, Nakano M, Matsue T, Esashi M, Tanaka S. Integration of Boron-Doped Diamond Microelectrode on CMOS-Based Amperometric Sensor Array by Film Transfer Technology Journal of Microelectromechanical Systems. 24: 958-967. DOI: 10.1109/Jmems.2014.2360837  0.713
2015 Sabri MFM, Ono T, Said SM, Kawai Y, Esashi M. Fabrication and characterization of microstacked PZT actuator for MEMS applications Journal of Microelectromechanical Systems. 24: 80-90. DOI: 10.1109/Jmems.2014.2317495  0.554
2015 Samoto T, Hirano H, Somekawa T, Hikichi K, Fujita M, Esashi M, Tanaka S. Wafer–to–wafer transfer process of barium strontium titanate for frequency tuning applications using laser pre-irradiation Journal of Micromechanics and Microengineering. 25: 035015. DOI: 10.1088/0960-1317/25/3/035015  0.529
2015 Esashi M, Kojima A, Ikegami N, Miyaguchi H, Koshida N. Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays Microsystems & Nanoengineering. 1. DOI: 10.1038/Micronano.2015.29  0.335
2015 Naono T, Fujii T, Esashi M, Tanaka S. Non-resonant 2-D piezoelectric MEMS optical scanner actuated by Nb doped PZT thin film Sensors and Actuators, a: Physical. 233: 147-157. DOI: 10.1016/J.Sna.2015.06.029  0.557
2015 Suzuki Y, Totsu K, Moriyama M, Esashi M, Tanaka S. Free-standing subwavelength grid infrared cut filter of 90mm diameter for LPP EUV light source Sensors and Actuators a: Physical. 231: 59-64. DOI: 10.1016/J.Sna.2014.07.006  0.528
2015 Lin YC, Tsai YC, Ono T, Liu P, Esashi M, Gessner T, Chen M. Metallic Glass as a Mechanical Material for Microscanners Advanced Functional Materials. 25: 5677-5682. DOI: 10.1002/Adfm.201502456  0.552
2014 Yoshida S, Hanzawa H, Wasa K, Esashi M, Tanaka S. Highly c-axis-oriented monocrystalline Pb(Zr, Ti)O₃ thin films on si wafer prepared by fast cooling immediately after sputter deposition. Ieee Transactions On Ultrasonics, Ferroelectrics, and Frequency Control. 61: 1552-8. PMID 25167155 DOI: 10.1109/Tuffc.2014.3069  0.685
2014 Chiou MJ, Lin YC, Ono T, Esashi M, Yeh SL, Wu TT. Focusing and waveguiding of Lamb waves in micro-fabricated piezoelectric phononic plates. Ultrasonics. 54: 1984-90. PMID 24909597 DOI: 10.1016/J.Ultras.2014.05.007  0.526
2014 Kaushik N, Sharma P, Ahadian S, Khademhosseini A, Takahashi M, Makino A, Tanaka S, Esashi M. Metallic glass thin films for potential biomedical applications. Journal of Biomedical Materials Research. Part B, Applied Biomaterials. 102: 1544-52. PMID 24610895 DOI: 10.1002/Jbm.B.33135  0.54
2014 Kadota M, Kuratani Y, Kimura T, Esashi M, Tanaka S. Ultra-wideband and high frequency resonators using shear horizontal type plate wave in LiNbO3 thin plate Japanese Journal of Applied Physics. 53. DOI: 10.7567/Jjap.53.07Kd03  0.518
2014 Makihata M, Muroyama M, Nakano Y, Nakayama T, Yamaguchi U, Yamada H, Nonomura Y, Funabashi H, Hata Y, Tanaka S, Esashi M. Development of a 35Mbps Asynchronous Bus Based Communication System for Tactile Sensors Ieej Transactions On Sensors and Micromachines. 134: 300-307. DOI: 10.1541/Ieejsmas.134.300  0.485
2014 Kimura T, Kobayashi H, Kishimoto Y, Kato H, Inaba M, Hashimoto KY, Matsumura T, Hirano H, Kadota M, Esashi M, Tanaka S. Bandwidth-tunable filter consisting of SAW resonators and BaSrTiO3 varactors directly fabricated on a LiTaO3 wafer Ieee International Ultrasonics Symposium, Ius. 795-798. DOI: 10.1109/ULTSYM.2014.0195  0.456
2014 Konno A, Kadota M, Kushibiki JI, Ohashi Y, Esashi M, Yamamoto Y, Tanaka S. Determination of full material constants of ScAlN thin film from bulk and leaky Lamb waves in MEMS-based samples Ieee International Ultrasonics Symposium, Ius. 273-276. DOI: 10.1109/ULTSYM.2014.0068  0.422
2014 Kaushik N, Sharma P, Makino A, Tanaka S, Esashi M. Potential of Metallic Glass Thin Films as a Soft Magnetic Underlayer for ${\rm L}1_{0}$ FePt-Based Recording Media Ieee Transactions On Magnetics. 50: 1-4. DOI: 10.1109/Tmag.2013.2285307  0.54
2014 Zhang G, Anand A, Kamada K, Amalina S, Kanaya H, Pokharel RK, Hikichi K, Tanaka S, Esashi M, Hashimoto KY, Taniguchi S. A 1.9 GHz low phase noise complementary cross-coupled FBAR-VCO in 0.18 μm CMOS technology European Microwave Week 2014: "Connecting the Future", Eumw 2014 - Conference Proceedings; Eumic 2014: 9th European Microwave Integrated Circuits Conference. 253-256. DOI: 10.1109/EuMIC.2014.6997840  0.461
2014 Yoshida S, Esashi M, Tanaka S. Development of UV-assisted ozone steam etching and investigation of its usability for SU-8 removal Journal of Micromechanics and Microengineering. 24: 035007. DOI: 10.1088/0960-1317/24/3/035007  0.668
2014 Hajika R, Yoshida S, Kanamori Y, Esashi M, Tanaka S. An investigation of the mechanical strengthening effect of hydrogen anneal for silicon torsion bar Journal of Micromechanics and Microengineering. 24: 105014. DOI: 10.1088/0960-1317/24/10/105014  0.667
2014 Naono T, Fujii T, Esashi M, Tanaka S. A large-scan-angle piezoelectric MEMS optical scanner actuated by a Nb-doped PZT thin film Journal of Micromechanics and Microengineering. 24: 15010. DOI: 10.1088/0960-1317/24/1/015010  0.574
2014 Chand R, Esashi M, Tanaka S. P-N junction and metal contact reliability of SiC diode in high temperature (873 K) environment Solid-State Electronics. 94: 82-85. DOI: 10.1016/J.Sse.2014.02.006  0.506
2014 Nishino H, Yoshida S, Kojima A, Ikegami N, Tanaka S, Koshida N, Esashi M. Fabrication of Pierce-Type Nanocrystalline Si Electron-Emitter Array for Massively Parallel Electron Beam Lithography Ieej Transactions On Sensors and Micromachines. 134: 146-153. DOI: 10.1002/Ecj.11804  0.711
2013 Tanaka Y, Miyashita H, Esashi M, Ono T. An optically switchable emitter array with carbon nanotubes grown on a Si tip for multielectron beam lithography. Nanotechnology. 24: 015203. PMID 23221318 DOI: 10.1088/0957-4484/24/1/015203  0.551
2013 Konno A, Hirano H, Inaba M, Hashimoto K, Esashi M, Tanaka S. Tunable Surface Acoustic Wave Filter Using Integrated Micro-Electro-Mechanical-System Based Varactors Made of Electroplated Gold Japanese Journal of Applied Physics. 52: 07HD13. DOI: 10.7567/Jjap.52.07Hd13  0.533
2013 Zhang G, Kochhar A, Yoshida K, Tanaka S, Hashimoto K, Esashi M, Kanaya H, Pokharel RK. A low phase noise FBAR based multiband VCO design Ieice Electronics Express. 10. DOI: 10.1587/Elex.10.20130425  0.502
2013 Zhang G, Kochhar A, Yoshida K, Tanaka S, Hashimoto K, Esashi M, Pokharel RK. The methods of maintaining low frequency stability in FBAR based cross-coupled VCO design Ieice Electronics Express. 10. DOI: 10.1587/Elex.10.20130296  0.504
2013 Makihata M, Muroyama M, Nakano Y, Nakayama T, Yamaguchi U, Yamada H, Nonomura Y, Funabashi H, Hata Y, Tanaka S, Esashi M. CMOS-MEMS集積化触覚センサの検査・修正・実装技術;CMOS-MEMS集積化触覚センサの検査・修正・実装技術;Testing, Repairing and Packaging Technology for the CMOS-MEMS Integrated Tactile Sensor Ieej Transactions On Sensors and Micromachines. 133: 243-249. DOI: 10.1541/Ieejsmas.133.243  0.521
2013 Suzuki Y, Totsu K, Watanabe H, Moriyama M, Esashi M, Tanaka S. Low-Stress Epitaxial Polysilicon Process for Micromirror Devices Ieej Transactions On Sensors and Micromachines. 133: 223-228. DOI: 10.1541/Ieejsmas.133.223  0.491
2013 Hirano H, Rasly M, Kaushik N, Esashi M, Tanaka S. Particle Removal without Causing Damage to MEMS Structure Ieej Transactions On Sensors and Micromachines. 133: 157-163. DOI: 10.1541/Ieejsmas.133.157  0.452
2013 Yoshida S, Fujinami S, Esashi M. Investigation of Mechanical and Tribological Properties of Polyaniline Brush by Atomic Force Microscopy for Scanning Probe-Based Data Storage E-Journal of Surface Science and Nanotechnology. 11: 53-59. DOI: 10.1380/Ejssnt.2013.53  0.573
2013 IGUCHI F, MURAYAMA S, INAGAKI Y, TANAKA S, ESASHI M, YUGAMI H. F221004 Thermal Design and Fabrication of Micro SOFC for Mobile Electronic Devices The Proceedings of Mechanical Engineering Congress, Japan. 2013: _F221004-1-_F221004-. DOI: 10.1299/JSMEMECJ.2013._F221004-1  0.446
2013 Esashi M, Tanaka S. Heterogeneous integration by adhesive bonding Micro and Nano Systems Letters. 1: 3. DOI: 10.1186/2213-9621-1-3  0.556
2013 Ikegami N, Koshida N, Kojima A, Ohyi H, Yoshida T, Esashi M. Active-matrix nanocrystalline Si electron emitter array with a function of electronic aberration correction for massively parallel electron beam direct-write lithography: Electron emission and pattern transfer characteristics Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31: 06F703. DOI: 10.1116/1.4827819  0.355
2013 Kadota M, Esashi M, Tanaka S, Kuratani Y, Kimura T. High frequency resonators with wide bandwidth using SH0 mode plate wave in thin LiNbO3 Ieee International Ultrasonics Symposium, Ius. 1680-1683. DOI: 10.1109/ULTSYM.2013.0428  0.449
2013 Kadota M, Esashi M, Tanaka S, Ida Y, Kimura T. Improvement of insertion loss of band pass tunable filter using SAW resonators and GaAs diode variable capacitors Ieee International Ultrasonics Symposium, Ius. 1668-1671. DOI: 10.1109/ULTSYM.2013.0425  0.462
2013 Yoshida S, Yanagida H, Esashi M, Tanaka S. Simple Removal Technology of Chemically Stable Polymer in MEMS Using Ozone Solution Journal of Microelectromechanical Systems. 22: 87-93. DOI: 10.1109/Jmems.2012.2217374  0.657
2013 Bakule P, Beer GA, Contreras D, Esashi M, Fujiwara Y, Fukao Y, Hirota S, Iinuma H, Ishida K, Iwasaki M, Kakurai T, Kanda S, Kawai H, Kawamura N, Marshall GM, et al. Measurement of muonium emission from silica aerogel Progress of Theoretical and Experimental Physics. 2013. DOI: 10.1093/Ptep/Ptt080  0.525
2013 Yoshida S, Wang N, Kumano M, Kawai Y, Tanaka S, Esashi M. Fabrication and characterization of laterally-driven piezoelectric bimorph MEMS actuator with sol–gel-based high-aspect-ratio PZT structure Journal of Micromechanics and Microengineering. 23: 065014. DOI: 10.1088/0960-1317/23/6/065014  0.712
2013 Hirano H, Kimura T, Koutsaroff IP, Kadota M, Hashimoto KY, Esashi M, Tanaka S. Integration of BST varactors with surface acoustic wave device by film transfer technology for tunable RF filters Journal of Micromechanics and Microengineering. 23. DOI: 10.1088/0960-1317/23/2/025005  0.568
2013 Tsukamoto T, Esashi M, Tanaka S. High spatial, temporal and temperature resolution thermal imaging method using Eu(TTA)3 temperature sensitive paint Journal of Micromechanics and Microengineering. 23: 114015. DOI: 10.1088/0960-1317/23/11/114015  0.481
2013 Sharma P, Kaushik N, Esashi M, Nishijima M, Makino A. On the growth and magnetic properties of flower-like nanostructures formed on diffusion of FePt with Si substrate Journal of Magnetism and Magnetic Materials. 337: 38-45. DOI: 10.1016/J.Jmmm.2013.02.029  0.308
2013 Matsunaga T, Totsu K, Esashi M, Haga Y. Tactile display using shape memory alloy micro-coil actuator and magnetic latch mechanism Displays. 34: 89-94. DOI: 10.1016/J.Displa.2013.03.001  0.303
2013 Hatakeyama Y, Esashi M, Tanaka S. A Stochastic Counting MEMS Sensor Using White Noise Oscillation for a High-Temperature Environment Electronics and Communications in Japan. 96: 62-70. DOI: 10.1002/Ecj.10400  0.523
2012 Tanaka S, Park K, Esashi M. Lithium-niobate-based surface acoustic wave oscillator directly integrated with CMOS sustaining amplifier. Ieee Transactions On Ultrasonics, Ferroelectrics, and Frequency Control. 59: 1800-5. PMID 22899126 DOI: 10.1109/Tuffc.2012.2384  0.547
2012 Inoue KY, Matsudaira M, Kubo R, Nakano M, Yoshida S, Matsuzaki S, Suda A, Kunikata R, Kimura T, Tsurumi R, Shioya T, Ino K, Shiku H, Satoh S, Esashi M, et al. LSI-based amperometric sensor for bio-imaging and multi-point biosensing Lab On a Chip - Miniaturisation For Chemistry and Biology. 12: 3481-3490. PMID 22847217 DOI: 10.1039/C2Lc40323D  0.604
2012 Minh PN, Ono T, Tanaka S, Esashi M. Near-field optical apertured tip and modified structures for local field enhancement. Applied Optics. 40: 2479-84. PMID 18357258 DOI: 10.1364/Ao.40.002479  0.64
2012 Hashimoto KY, Hirano H, Tanaka S, Esashi M. Functional RF Devices Powered by MEMS Technologies Advances in Science and Technology. 81: 75-83. DOI: 10.4028/Www.Scientific.Net/Ast.81.75  0.513
2012 Esashi M, Tanaka S. Integrated Microsystems Advances in Science and Technology. 81: 55-64. DOI: 10.4028/www.scientific.net/AST.81.55  0.478
2012 Makihata M, Muroyama M, Tanaka S, Yamada H, Nakayama T, Yamaguchi U, Mima K, Nonomura Y, Fujiyoshi M, Esashi M. MEMS-CMOS Integrated Tactile Sensor with Digital Signal Processing for Robot Application Mrs Proceedings. 1427. DOI: 10.1557/Opl.2012.1489  0.526
2012 Esashi M, Tanaka S. MEMS on LSI by Adhesive Bonding and Wafer Level Packaging Mrs Proceedings. 1427. DOI: 10.1557/Opl.2012.1402  0.555
2012 Matsumura T, Esashi M, Harada H, Tanaka S. Fabrication Technology of Ruthenium Microelectrode Pattern for RF MEMS Ieej Transactions On Sensors and Micromachines. 132: 71-76. DOI: 10.1541/Ieejsmas.132.71  0.524
2012 Nakano Y, Muroyama M, Makihata M, Tanaka S, Matsuzaki S, Yamada H, Nakayama T, Yamaguchi U, Nonomura Y, Fujiyoshi M, Esashi M. A Simulated Network System Prototype for Development of a Networked Tactile Sensor System with Integrated MEMS-LSI Tactile Sensors Ieej Transactions On Sensors and Micromachines. 132: 288-295. DOI: 10.1541/Ieejsmas.132.288  0.489
2012 Moriyama M, Kawai Y, Tanaka S, Esashi M. Low-Voltage-Driven Thin Film PZT Stacked Actuator for RF-MEMS Switches Ieej Transactions On Sensors and Micromachines. 132: 282-287. DOI: 10.1541/Ieejsmas.132.282  0.517
2012 Suzuki Y, Tanaka S, Hatakeyama Y, Esashi M. Development of Double-side SiC PECVD System for MEMS Ieej Transactions On Sensors and Micromachines. 132: 114-118. DOI: 10.1541/Ieejsmas.132.114  0.516
2012 An Z, Esashi M, Ono T. Piezoresistive Silicon Microresonator for Measurements of Hydrogen Adsorption in Carbon Nanotubes Japanese Journal of Applied Physics. 51: 116601. DOI: 10.1143/Jjap.51.116601  0.5
2012 Lee J, Kawai Y, Tanaka S, Lin Y, Gessner T, Esashi M. Fabrication of Freestanding Pb(Zr,Ti)O Film Microstructures Using Ge Sacrificial Layer Japanese Journal of Applied Physics. 51: 21502. DOI: 10.1143/Jjap.51.021502  0.531
2012 Ikegami N, Yoshida T, Kojima A, Ohyi H, Koshida N, Esashi M. Active-matrix nc-Si electron emitter array for massively parallel direct-write electron-beam system Proceedings of Spie. 8323: 832312. DOI: 10.1117/12.916250  0.342
2012 Yoshida S, Kobayashi T, Kumano M, Esashi M. Conformal coating of poly-glycidyl methacrylate as lithographic polymer via initiated chemical vapor deposition Journal of Micro/Nanolithography, Mems, and Moems. 11: 023001-1. DOI: 10.1117/1.Jmm.11.2.023001  0.327
2012 Tsukamoto T, Esashi M, Tanaka S. Magnetocaloric cooling of a thermally-isolated microstructure Journal of Micromechanics and Microengineering. 22: 094008. DOI: 10.1088/0960-1317/22/9/094008  0.504
2012 Makihata M, Tanaka S, Muroyama M, Matsuzaki S, Yamada H, Nakayama T, Yamaguchi U, Mima K, Nonomura Y, Fujiyoshi M, Esashi M. Integration and packaging technology of MEMS-on-CMOS capacitive tactile sensor for robot application using thick BCB isolation layer and backside-grooved electrical connection Sensors and Actuators a: Physical. 188: 103-110. DOI: 10.1016/J.Sna.2012.04.032  0.566
2012 Yasue T, Komatsu T, Nakamura N, Hashimoto K, Hirano H, Esashi M, Tanaka S. Wideband tunable Love wave filter using electrostatically actuated MEMS variable capacitors integrated on lithium niobate Sensors and Actuators a: Physical. 188: 456-462. DOI: 10.1016/J.Sna.2012.01.017  0.52
2012 Tanaka S, Mohri M, Ogashiwa T, Fukushi H, Tanaka K, Nakamura D, Nishimori T, Esashi M. Electrical interconnection in anodic bonding of silicon wafer to LTCC wafer using highly compliant porous bumps made from submicron gold particles Sensors and Actuators a: Physical. 188: 198-202. DOI: 10.1016/J.Sna.2012.01.003  0.551
2012 Kim HH, Yoon SH, Ahn CH, Tanaka S, Esashi M, Ko SC, Jang WI, Go JS. Fabrication of a piezoelectric microcantilever array with a large initial deflection and an application to electrical energy harvesting International Journal of Precision Engineering and Manufacturing. 13: 1671-1677. DOI: 10.1007/S12541-012-0219-8  0.563
2012 Haubold M, Lin Y-, Frömel J, Wiemer M, Esashi M, Geßner T. A novel approach for increasing the strength of an Au/Si eutectic bonded interface on an oxidized silicon surface Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems. 18: 515-521. DOI: 10.1007/S00542-012-1440-1  0.326
2012 Yabe T, Mimura Y, Takahashi H, Onoe A, Muroga S, Yamaguchi M, Ono T, Esashi M. Three-dimensional microcoil oscillator fabricated with monolithic process on LSI Electronics and Communications in Japan. 95: 49-56. DOI: 10.1002/Ecj.11404  0.553
2012 Matsumura T, Esashi M, Harada H, Tanaka S. Vibration mode observation of piezoelectric disk‐type resonator by high‐frequency laser Doppler vibrometer Electronics and Communications in Japan. 95: 33-41. DOI: 10.1002/Ecj.10406  0.51
2012 Matsuzaki S, Tanaka S, Esashi M. Anodic bonding between LTCC wafer and Si wafer with Sn-Cu-based electrical connection Electronics and Communications in Japan. 95: 49-56. DOI: 10.1002/Ecj.10401  0.529
2011 Yoshida S, Ono T, Esashi M. Local electrical modification of a conductivity-switching polyimide film formed by molecular layer deposition. Nanotechnology. 22: 335302. PMID 21788684 DOI: 10.1088/0957-4484/22/33/335302  0.676
2011 Kuypers JH, Tanaka S, Esashi M. Imprinted laminate wafer-level packaging for SAW ID-tags and SAW delay line sensors. Ieee Transactions On Ultrasonics, Ferroelectrics, and Frequency Control. 58: 406-13. PMID 21342826 DOI: 10.1109/Tuffc.2011.1818  0.564
2011 Yugami H, Kubota K, Inagaki Y, Iguchi F, Tanaka S, Sata N, Esashi M. Low-Temperature Operating Micro Solid Oxide Fuel Cells with Perovskite-type Proton Conductors Mrs Proceedings. 1330. DOI: 10.1557/Opl.2011.1397  0.525
2011 Yabe T, Mimura Y, Takahashi H, Onoe A, Muroga S, Yamaguchi M, Ono T, Esashi M. Three-dimensional micro-coil oscillator fabricated with monolithic process on LSI Ieej Transactions On Sensors and Micromachines. 131: 363-368. DOI: 10.1541/Ieejsmas.131.363  0.563
2011 Muroyama M, Makihata M, Nakano Y, Matsuzaki S, Yamada H, Yamaguchi U, Nakayama T, Nonomura Y, Fujiyoshi M, Tanaka S, Esashi M. Development of an LSI for Tactile Sensor Systems on the Whole-Body of Robots Ieej Transactions On Sensors and Micromachines. 131: 302-309. DOI: 10.1541/Ieejsmas.131.302  0.481
2011 Jiang Y, Esashi M, Ono T. Design Issues for Piezoresistive Nanocantilever Sensors with Non-uniform Nanoscale Doping Profiles Ieej Transactions On Sensors and Micromachines. 131: 270-271. DOI: 10.1541/Ieejsmas.131.270  0.496
2011 Jiang Y, Esashi M, Ono T. Modeling and Experimental Analysis on the Nonlinearity of Single Crystal Silicon Cantilevered Microstructures Ieej Transactions On Sensors and Micromachines. 131: 195-196. DOI: 10.1541/Ieejsmas.131.195  0.478
2011 Matsuzaki S, Tanaka S, Esashi M. Anodic Bonding between LTCC Substrate and Si Substrate with Electrical Connections Ieej Transactions On Sensors and Micromachines. 131: 189-194. DOI: 10.1541/Ieejsmas.131.189  0.535
2011 Hatakeyama Y, Esashi M, Tanaka S. Stochastic Counting MEMS Sensor Using White Noise Oscillation for High Temperature Environment Ieej Transactions On Sensors and Micromachines. 131: 178-184. DOI: 10.1541/Ieejsmas.131.178  0.497
2011 Yanagida H, Yoshida S, Esashi M, Tanaka S. Etching Technology Using Ozone for Chemically Stable Polymer in MEMS Ieej Transactions On Sensors and Micromachines. 131: 122-127. DOI: 10.1541/Ieejsmas.131.122  0.659
2011 Matsumura T, Esashi M, Harada H, Tanaka S. Vibration Mode Observation of Piezoelectric Disk-type Resonator by High Frequency Laser Doppler Vibrometer Ieej Transactions On Electronics, Information and Systems. 131: 1086-1093. DOI: 10.1541/Ieejeiss.131.1086  0.509
2011 Miyashita H, Tomono E, Kawai Y, Toda M, Esashi M, Ono T. Fabrication of Einzel Lens Array with One-Mask Reactive Ion Etching Process for Electron Micro-Optics Japanese Journal of Applied Physics. 50: 106503. DOI: 10.1143/Jjap.50.106503  0.556
2011 Makihata M, Tanaka S, Muroyama M, Matsuzaki S, Yamada H, Nakayama T, Yamaguchi U, Mima K, Nonomura Y, Fujiyoshi M, Esashi M. Adhesive wafer bonding using a molded thick benzocyclobutene layer for wafer-level integration of MEMS and LSI Journal of Micromechanics and Microengineering. 21: 085002. DOI: 10.1088/0960-1317/21/8/085002  0.549
2011 Lee Y, Toda M, Esashi M, Ono T. Micro wishbone interferometer for Fourier transform infrared spectrometry Journal of Micromechanics and Microengineering. 21: 065039. DOI: 10.1088/0960-1317/21/6/065039  0.556
2011 Tsukamoto T, Esashi M, Tanaka S. A micro thermal switch with a stiffness-enhanced thermal isolation structure Journal of Micromechanics and Microengineering. 21: 104008. DOI: 10.1088/0960-1317/21/10/104008  0.519
2011 Sharma P, Kaushik N, Makino A, Esashi M, Inoue A. L10 FePt(111)/glassy CoFeTaB bilayered structure for patterned media Journal of Applied Physics. 109: 07B908. DOI: 10.1063/1.3561803  0.33
2010 Randles AB, Esashi M, Tanaka S. Etch rate dependence on crystal orientation of lithium niobate. Ieee Transactions On Ultrasonics, Ferroelectrics, and Frequency Control. 57: 2372-80. PMID 21041126 DOI: 10.1109/Tuffc.2010.1705  0.539
2010 Takahashi A, Esashi M, Ono T. Quartz-crystal scanning probe microcantilevers with a silicon tip based on direct bonding of silicon and quartz. Nanotechnology. 21: 405502. PMID 20829565 DOI: 10.1088/0957-4484/21/40/405502  0.566
2010 Shao CY, Kawai Y, Esashi M, Ono T. Electrostatic actuator probe with curved electrodes for time-of-flight scanning force microscopy. The Review of Scientific Instruments. 81: 083702. PMID 20815608 DOI: 10.1063/1.3469796  0.534
2010 Shao C, Kawai Y, Esashi M, Ono T. Electrostatically Switchable Microprobe for Mass-Analysis Scanning Force Microscopy Ieej Transactions On Sensors and Micromachines. 130: 59-60. DOI: 10.1541/Ieejsmas.130.59  0.476
2010 Hino R, Matsumura T, Esashi M, Tanaka S. Stress Control of AlN Thin Film Sputter-Deposited Using ECR Plasma Ieej Transactions On Sensors and Micromachines. 130: 523-527. DOI: 10.1541/Ieejsmas.130.523  0.484
2010 Kano M, Ishii M, Yoshinaga H, Esashi M, Tanaka S. Passive Dew Droplet Removal from Hydrogen Sensors for Fuel Cell Applications Ieej Transactions On Sensors and Micromachines. 130: 517-522. DOI: 10.1541/Ieejsmas.130.517  0.501
2010 Takahashi T, Makihata M, Esashi M, Tanaka S. Evaluation and Application of Resist for Alkaline Wet Etching Ieej Transactions On Sensors and Micromachines. 130: 421-425. DOI: 10.1541/Ieejsmas.130.421  0.519
2010 Lee Y, Toda M, Esashi M, Ono T. Micro Wishbone Interferometer for Miniature FTIR Spectrometer Ieej Transactions On Sensors and Micromachines. 130: 333-334. DOI: 10.1541/Ieejsmas.130.333  0.561
2010 Park K, Esashi M, Tanaka S. Preparation of Thin Lithium Niobate Layer on Silicon Wafer for Wafer-level Integration of Acoustic Devices and LSI Ieej Transactions On Sensors and Micromachines. 130: 236-241. DOI: 10.1541/Ieejsmas.130.236  0.475
2010 Fujita M, Izawa Y, Tsurumi Y, Tanaka S, Fukushi H, Sueda K, Nakata Y, Esashi M, Miyanaga N. Debris-free Low-stress High-speed Laser-assisted Dicing for Multi-layered MEMS Ieej Transactions On Sensors and Micromachines. 130: 118-123. DOI: 10.1541/Ieejsmas.130.118  0.457
2010 Tsukamoto T, Esashi M, Tanaka S. Carbon-Nanotube-Enhanced Thermal Contactor in Low Contact Pressure Region Japanese Journal of Applied Physics. 49: 070210. DOI: 10.1143/Jjap.49.070210  0.462
2010 Matsuo H, Kawai Y, Tanaka S, Esashi M. Investigation for (100)-/(001)-Oriented Pb(Zr,Ti)O3Films Using Platinum Nanofacets and PbTiO3Seeding Layer Japanese Journal of Applied Physics. 49: 061503. DOI: 10.1143/Jjap.49.061503  0.46
2010 Matsuo H, Kawai Y, Esashi M. Novel Design for Optical Scanner with Piezoelectric Film Deposited by Metal Organic Chemical Vapor Deposition Japanese Journal of Applied Physics. 49: 04DL19. DOI: 10.1143/Jjap.49.04Dl19  0.363
2010 Matsumura T, Esashi M, Harada H, Tanaka S. Multi-band radio-frequency filters fabricated using polyimide-based membrane transfer bonding technology Journal of Micromechanics and Microengineering. 20: 95027. DOI: 10.1088/0960-1317/20/9/095027  0.571
2010 Feng J, Ye X, Esashi M, Ono T. Mechanically coupled synchronized resonators for resonant sensing applications Journal of Micromechanics and Microengineering. 20: 115001. DOI: 10.1088/0960-1317/20/11/115001  0.504
2010 Yoshida S, Ono T, Esashi M. Deposition of conductivity-switching polyimide film by molecular layer deposition and electrical modification using scanning probe microscope Micro & Nano Letters. 5: 321. DOI: 10.1049/Mnl.2010.0128  0.686
2010 Yoshida K, Tanaka S, Hagihara Y, Tomonari S, Esashi M. Normally closed electrostatic microvalve with pressure balance mechanism for portable fuel cell application Sensors and Actuators a: Physical. 157: 290-298. DOI: 10.1016/J.Sna.2009.11.030  0.437
2010 Yoshida K, Tanaka S, Hagihara Y, Tomonari S, Esashi M. Normally closed electrostatic microvalve with pressure balance mechanism for portable fuel cell application. Part I: Design and simulation Sensors and Actuators a: Physical. 157: 299-306. DOI: 10.1016/J.Sna.2009.11.029  0.482
2009 Takahashi H, Mimura Y, Mori S, Ishimori M, Onoe A, Ono T, Esashi M. The fabrication of metallic tips with a silicon cantilever for probe-based ferroelectric data storage and their durability experiments. Nanotechnology. 20: 365201. PMID 19687555 DOI: 10.1088/0957-4484/20/36/365201  0.538
2009 Kim SJ, Ono T, Esashi M. Thermal imaging with tapping mode using a bimetal oscillator formed at the end of a cantilever. The Review of Scientific Instruments. 80: 033703. PMID 19334923 DOI: 10.1063/1.3095680  0.544
2009 Kuypers JH, Reindl LM, Tanaka S, Esashi M. Maximum accuracy evaluation scheme for wireless saw delay-line sensors. Ieee Transactions On Ultrasonics, Ferroelectrics, and Frequency Control. 55: 1640-52. PMID 18986954 DOI: 10.1109/Tuffc.2008.840  0.493
2009 Itoh A, Watanabe M, Habu H, Tokudome S, Hori K, Saito H, Kondo K, Tanaka S, Esashi M. MICRO SOLID PROPELLANT THRUSTER FOR SMALL SATELLITE International Journal of Energetic Materials and Chemical Propulsion. 8: 321-327. DOI: 10.1615/Intjenergeticmaterialschemprop.V8.I4.50  0.491
2009 Izawa Y, Tsurumi Y, Tanaka S, Fukushi H, Sueda K, Nakata Y, Esashi M, Miyanaga N, Fujita M. Debris-Free High-Speed Laser-Assisted Low-Stress Dicing for Multi-Layered MEMS Ieej Transactions On Sensors and Micromachines. 129: 63-68. DOI: 10.1541/IEEJSMAS.129.63  0.421
2009 Sabri MFM, Ono T, Esashi M. Microassembly of PZT Actuators into Silicon Microstructures Ieej Transactions On Sensors and Micromachines. 129: 471-472. DOI: 10.1541/Ieejsmas.129.471  0.581
2009 Muroyama M, Makihata M, Matsuzaki S, Yamada H, Yamaguchi U, Nakayama T, Nonomura Y, Tanaka S, Esashi M. LSI Design for Sensing Data Transmission by Interruption in Tactile Sensor Systems Ieej Transactions On Sensors and Micromachines. 129: 450-460. DOI: 10.1541/Ieejsmas.129.450  0.495
2009 TAKAHASHI T, IGUCHI F, YUGAMI H, ESASHI M, TANAKA S. Deposition and Microfabrication of Gd-Doped CeO_2 for Micro SOFC Operating at Low Temperature(Hydrogen Fuel Cell and SOFC,Power and Energy System Symposium) Transactions of the Japan Society of Mechanical Engineers Series B. 75: 524-526. DOI: 10.1299/Kikaib.75.751_524  0.493
2009 Wang DF, Nakajima M, Ono T, Esashi M. 504 Crystallographic orientations and thermal treatments influences on nanomechanics of ultra-thin single crystal silicon (SCS) resonators for ultimate sensing The Proceedings of Ibaraki District Conference. 2009: 125-126. DOI: 10.1299/jsmeibaraki.2009.125  0.452
2009 Sabri MFM, Ono T, Esashi M. Modeling and experimental validation of the performance of a silicon XY-microstage driven by PZT actuators Journal of Micromechanics and Microengineering. 19: 095004. DOI: 10.1088/0960-1317/19/9/095004  0.555
2009 Tsukamoto T, Esashi M, Tanaka S. Long working range mercury droplet actuation Journal of Micromechanics and Microengineering. 19: 094016. DOI: 10.1088/0960-1317/19/9/094016  0.518
2009 Jiang Y, Ono T, Esashi M. Temperature-dependent mechanical and electrical properties of boron-doped piezoresistive nanocantilevers Journal of Micromechanics and Microengineering. 19: 065030. DOI: 10.1088/0960-1317/19/6/065030  0.518
2009 Ye S, Hamakawa S, Tanaka S, Sato K, Esashi M, Mizukami F. A one-step conversion of benzene to phenol using MEMS-based Pd membrane microreactors Chemical Engineering Journal. 155: 829-837. DOI: 10.1016/J.Cej.2009.09.007  0.394
2008 Yoshida S, Ono T, Esashi M. Conductive polymer patterned media fabricated by diblock copolymer lithography for scanning multiprobe data storage. Nanotechnology. 19: 475302. PMID 21836269 DOI: 10.1088/0957-4484/19/47/475302  0.682
2008 Ho J, Ono T, Tsai CH, Esashi M. Photolithographic fabrication of gated self-aligned parallel electron beam emitters with a single-stranded carbon nanotube. Nanotechnology. 19: 365601. PMID 21828872 DOI: 10.1088/0957-4484/19/36/365601  0.558
2008 Izawa Y, Tsurumi Y, Tanaka S, Kikuchi H, Sueda K, Nakata Y, Esashi M, Miyanaga N, Fujita M. Debris-Free Laser-Assisted Low-Stress Dicing for Multi-Layered MEMS Ieej Transactions On Sensors and Micromachines. 128: 91-96. DOI: 10.1541/Ieejsmas.128.91  0.501
2008 Goto S, Matsunaga T, Matsuoka Y, Kuroda K, Esashi M, Haga Y. Development of Intravascular MRI Probe Applicable to Catheter Mounting Ieej Transactions On Sensors and Micromachines. 128: 389-395. DOI: 10.1541/Ieejsmas.128.389  0.306
2008 Larangot B, Tanaka S, Esashi M. Fabrication of Anti-Corrosive Capacitive Vacuum Sensors with a Silicon Carbide/Polysilicon Bi-Layer Diaphragm and Electrical Through-Hole Connections on the Opposite Side Ieej Transactions On Sensors and Micromachines. 128: 331-336. DOI: 10.1541/Ieejsmas.128.331  0.565
2008 Hashimoto S, Kuypers JH, Tanaka S, Esashi M. Design and Fabrication of Passive Wireless SAW Sensor for Pressure Measurement Ieej Transactions On Sensors and Micromachines. 128: 230-234. DOI: 10.1541/Ieejsmas.128.230  0.532
2008 Yoshida S, Ono T, Esashi M. Formation of a Flat Conductive Polymer Film Using Template-Stripped Gold (TSG) Surface and Surface-Graft Polymerization for Scanning Multiprobe Data Storage E-Journal of Surface Science and Nanotechnology. 6: 202-208. DOI: 10.1380/Ejssnt.2008.202  0.675
2008 Iwami K, Ono T, Esashi M. A New Approach to Terahertz Local Spectroscopy Using Microfabricated Scanning Near-Field Probe Japanese Journal of Applied Physics. 47: 8095-8097. DOI: 10.1143/Jjap.47.8095  0.486
2008 Ono T, Yoshida Y, Jiang YG, Esashi M. Noise-enhanced sensing of light and magnetic force based on a nonlinear silicon microresonator Applied Physics Express. 1: 1230011-1230013. DOI: 10.1143/Apex.1.123001  0.498
2008 Seki H, Ono T, Kawai Y, Esashi M. Bonding of a Si microstructure using field-assisted glass melting Journal of Micromechanics and Microengineering. 18: 085003. DOI: 10.1088/0960-1317/18/8/085003  0.557
2008 Klein MJK, Ono T, Esashi M, Korvink JG. Process for the fabrication of hollow core solenoidal microcoils in borosilicate glass Journal of Micromechanics and Microengineering. 18: 075002. DOI: 10.1088/0960-1317/18/7/075002  0.564
2008 Esashi M. Wafer level packaging of MEMS Journal of Micromechanics and Microengineering. 18: 73001. DOI: 10.1088/0960-1317/18/7/073001  0.344
2008 Jiang YG, Ono T, Esashi M. Fabrication of piezoresistive nanocantilevers for ultra-sensitive force detection Measurement Science and Technology. 19. DOI: 10.1088/0957-0233/19/8/084011  0.534
2008 Tanaka S, Kondo K, Habu H, Itoh A, Watanabe M, Hori K, Esashi M. Test of B/Ti multilayer reactive igniters for a micro solid rocket array thruster Sensors and Actuators a: Physical. 144: 361-366. DOI: 10.1016/J.Sna.2008.02.015  0.495
2008 Ahn Y, Ono T, Esashi M. Micromachined Si cantilever arrays for parallel AFM operation Journal of Mechanical Science and Technology. 22: 308-311. DOI: 10.1007/S12206-007-1029-2  0.549
2008 Satoh D, Tanaka S, Esashi M. Electrostatically Controlled, Pneumatically Actuated Microvalve with Low Pressure Loss Ieej Transactions On Electrical and Electronic Engineering. 3: 305-312. DOI: 10.1002/Tee.20271  0.498
2008 Tanaka S, Miura Y, Kang P, Hikichi K, Esashi M. MEMS-based Air Turbine with Radial-inflow Type Journal Bearing Ieej Transactions On Electrical and Electronic Engineering. 3: 297-304. DOI: 10.1002/Tee.20270  0.567
2007 Kim SJ, Ono T, Esashi M. Mass detection using capacitive resonant silicon resonator employing LC resonant circuit technique. The Review of Scientific Instruments. 78: 085103. PMID 17764351 DOI: 10.1063/1.2766840  0.545
2007 Kawai Y, Ono T, Esashi M, Meyer E, Gerber C. Resonator combined with a piezoelectric actuator for chemical analysis by force microscopy. The Review of Scientific Instruments. 78: 063709. PMID 17614618 DOI: 10.1063/1.2748394  0.552
2007 Jo J, Lee T, Kim D, Kim K, Lee E, Park K, Esashi M. Fabrication of Soluble Semiconductor Thin Film Transistor with Printed Electrodes using h-PDMS Stamp The Japan Society of Applied Physics. 2007: 1100-1101. DOI: 10.7567/Ssdm.2007.H-9-3  0.302
2007 Jo JD, Lee TM, Kim CH, Kim KY, Lee ES, Esashi M. Fabrication of OTFT Array with Coated Thin Film Dielectric and Printed Electrodes by Using Microcontact Printing Advanced Materials Research. 661-664. DOI: 10.4028/Www.Scientific.Net/Amr.26-28.661  0.327
2007 Iwami K, Ono T, Esashi M. Sputter Deposited Zinc Oxide Photoconductive Antenna on Silicon Substrate for Sub-Terahertz Time-Domain Spectroscopy Ieej Transactions On Sensors and Micromachines. 127: 508-509. DOI: 10.1541/Ieejsmas.127.508  0.518
2007 Randles AB, Esashi M, Tanaka S. Etch Stop Process for Fabrication of Thin Diaphragms in Lithium Niobate Japanese Journal of Applied Physics. 46: L1099-L1101. DOI: 10.1143/Jjap.46.L1099  0.537
2007 Tanaka S, Esashi M, Isomura K, Hikichi K, Endo Y, Togo S. Hydroinertia Gas Bearing System to Achieve 470m∕s Tip Speed of 10mm-Diameter Impellers Journal of Tribology. 129: 655-659. DOI: 10.1115/1.2736707  0.492
2007 Kang P, Tanaka S, Esashi M. Cavity-through deep reactive ion etching of directly-bonded silicon wafers Transducers and Eurosensors '07 - 4th International Conference On Solid-State Sensors, Actuators and Microsystems. 549-553. DOI: 10.1109/SENSOR.2007.4300189  0.492
2007 Nakajima A, Kang P, Honda N, Hikichi K, Esashi M, Tanaka S. Fabrication and high-speed characterization of SU-8 shrouded two-dimensional microimpellers Journal of Micromechanics and Microengineering. 17: S230-S236. DOI: 10.1088/0960-1317/17/9/S04  0.519
2007 Tanaka S, Fujimoto S, Ito O, Choe S, Esashi M. Laterally stacked glass substrates with high density electrical feedthroughs Journal of Micromechanics and Microengineering. 17: 597-602. DOI: 10.1088/0960-1317/17/3/023  0.551
2007 Yoshida S, Ono T, Esashi M. Conductive polymer patterned media for scanning multiprobe data storage Nanotechnology. 18: 505302. DOI: 10.1088/0957-4484/18/50/505302  0.675
2007 Kim S, Ono T, Esashi M. Study on the noise of silicon capacitive resonant mass sensors in ambient atmosphere Journal of Applied Physics. 102: 104304. DOI: 10.1063/1.2811911  0.53
2007 Cho W, Ono T, Esashi M. Proximity electron lithography using permeable electron windows Applied Physics Letters. 91: 044104. DOI: 10.1063/1.2762281  0.501
2007 Ono T, Yoshida S, Kawai Y, Esashi M. Optical amplification of the resonance of a bimetal silicon cantilever Applied Physics Letters. 90: 243112. DOI: 10.1063/1.2748848  0.687
2007 Fujikawa Y, Yamada-Takamura Y, Yoshikawa G, Ono T, Esashi M, Zhang PP, Lagally MG, Sakurai T. Silicon on insulator for symmetry-converted growth Applied Physics Letters. 90. DOI: 10.1063/1.2748099  0.545
2007 Ono T, Kim S, Esashi M. Imaging of acoustic pressure radiation from vibrating microstructure in atmosphere using thermal microprobe Applied Physics Letters. 90: 211911. DOI: 10.1063/1.2742908  0.525
2007 Tsai C, Ono T, Esashi M. Fabrication of diamond Schottky emitter array by using electrophoresis pre-treatment and hot-filament chemical vapor deposition Diamond and Related Materials. 16: 1398-1402. DOI: 10.1016/J.Diamond.2006.11.032  0.567
2006 Jo JD, Kim KY, Lee ES, Esashi M. Fabrication of Organic Thin Film Transistor(OTFT) Array by Using Nanoprinting Process Key Engineering Materials. 385-388. DOI: 10.4028/Www.Scientific.Net/Kem.326-328.385  0.348
2006 Takahashi H, Onoe A, Ono T, Cho Y, Esashi M. High-Density Ferroelectric Recording Using Diamond Probe by Scanning Nonlinear Dielectric Microscopy Japanese Journal of Applied Physics. 45: 1530-1533. DOI: 10.1143/Jjap.45.1530  0.543
2006 ESASHI M. RECENT PROGRESSES OF APPLICATION-ORIENTED MEMS THROUGH INDUSTRY-UNIVERSITY COLLABORATION International Journal of High Speed Electronics and Systems. 16: 693-704. DOI: 10.1142/S0129156406003941  0.363
2006 Iwami K, Ono T, Esashi M. Optical Near-Field Probe Integrated With Self-Aligned Bow-Tie Antenna and Electrostatic Actuator for Local Field Enhancement Journal of Microelectromechanical Systems. 15: 1201-1208. DOI: 10.1109/Jmems.2006.879694  0.535
2006 Itoh T, Tanaka S, Li J, Watanabe R, Esashi M. Silicon-Carbide Microfabrication by Silicon Lost Molding for Glass-Press Molds Journal of Microelectromechanical Systems. 15: 859-863. DOI: 10.1109/Jmems.2006.872231  0.558
2006 Yoshida K, Tanaka S, Tomonari S, Satoh D, Esashi M. High-Energy Density Miniature Thermoelectric Generator Using Catalytic Combustion Journal of Microelectromechanical Systems. 15: 195-203. DOI: 10.1109/Jmems.2005.859202  0.53
2006 Song Y, Lee H, Esashi M. Low Actuation Voltage Capacitive Shunt RF-MEMS Switch Having a Corrugated Bridge Ieice Transactions On Electronics. 89: 1880-1887. DOI: 10.1093/Ietele/E89-C.12.1880  0.326
2006 Takahashi T, Tanaka S, Esashi M. Development of anin situchemical vapor deposition method for an alumina catalyst bed in a suspended membrane micro fuel reformer Journal of Micromechanics and Microengineering. 16: S206-S210. DOI: 10.1088/0960-1317/16/9/S06  0.492
2006 Yoshida K, Tanaka S, Hiraki H, Esashi M. A micro fuel reformer integrated with a combustor and a microchannel evaporator Journal of Micromechanics and Microengineering. 16: S191-S197. DOI: 10.1088/0960-1317/16/9/S04  0.486
2006 Takahashi H, Ono T, Onoe A, Cho Y, Esashi M. A diamond-tip probe with silicon-based piezoresistive strain gauge for high-density data storage using scanning nonlinear dielectric microscopy Journal of Micromechanics and Microengineering. 16: 1620-1624. DOI: 10.1088/0960-1317/16/8/025  0.557
2006 Jiang YG, Ono T, Esashi M. High aspect ratio spiral microcoils fabricated by a silicon lost molding technique Journal of Micromechanics and Microengineering. 16: 1057-1061. DOI: 10.1088/0960-1317/16/5/025  0.557
2006 Min K, Tanaka S, Esashi M. Fabrication of novel MEMS-based polymer electrolyte fuel cell architectures with catalytic electrodes supported on porous SiO2 Journal of Micromechanics and Microengineering. 16: 505-511. DOI: 10.1088/0960-1317/16/3/005  0.543
2006 Xu HG, Ono T, Esashi M. Precise motion control of a nanopositioning PZT microstage using integrated capacitive displacement sensors Journal of Micromechanics and Microengineering. 16: 2747-2754. DOI: 10.1088/0960-1317/16/12/031  0.524
2006 Kim S, Ono T, Esashi M. Capacitive resonant mass sensor with frequency demodulation detection based on resonant circuit Applied Physics Letters. 88: 053116. DOI: 10.1063/1.2171650  0.53
2006 Totsu K, Fujishiro K, Tanaka S, Esashi M. Fabrication of three-dimensional microstructure using maskless gray-scale lithography Sensors and Actuators a-Physical. 130: 387-392. DOI: 10.1016/J.Sna.2005.12.008  0.52
2006 Song Y, Lee H, Esashi M. Parasitic leakage resonance-free HRS MEMS package for microwave and millimeter-wave Sensors and Actuators a-Physical. 130: 83-90. DOI: 10.1016/J.Sna.2005.11.064  0.35
2006 Xu H, Ono T, Zhang D, Esashi M. Fabrication and characterizations of a monolithic PZT microstage Microsystem Technologies. 12: 883-890. DOI: 10.1007/S00542-006-0206-Z  0.558
2005 Kim S, Ono T, Esashi M. Resonant Silicon Mass Sensor with Capacitive Readout The Japan Society of Applied Physics. 2005: 82-83. DOI: 10.7567/Ssdm.2005.D-1-7  0.533
2005 ONO T, IWAMI K, GOTO K, ESASHI M. Near-Field Optics and MEMS Technology The Review of Laser Engineering. 33: 739-744. DOI: 10.2184/Lsj.33.739  0.478
2005 Yoshida K, Hagihara Y, Saitoh M, Tomonari S, Tanaka S, Esashi M. Microvalve to Control Fuel for Portable Fuel Cells Ieej Transactions On Sensors and Micromachines. 125: 418-423. DOI: 10.1541/Ieejsmas.125.418  0.506
2005 Tanaka S, Min K, Kato N, Oikawa H, Esashi M. Application of Screen-Printed Catalytic Electrodes to MEMS-Based Fuel Cells Ieej Transactions On Sensors and Micromachines. 125: 413-417. DOI: 10.1541/Ieejsmas.125.413  0.503
2005 Norimatsu T, Tanaka S, Esashi M. Vertical Diaphragm Electrostatic Actuator for a High Density Ink Jet Printer Head Ieej Transactions On Sensors and Micromachines. 125: 350-354. DOI: 10.1541/Ieejsmas.125.350  0.564
2005 ESASHI M, ONO T. MEMS and Nanotechnology Hyomen Kagaku. 26: 68-73. DOI: 10.1380/Jsssj.26.68  0.573
2005 Ono T, Iwami K, Esashi M. Micromachined Optical Near-Field Bow-Tie Antenna Probe with Integrated Electrostatic Actuator Japanese Journal of Applied Physics. 44: L445-L448. DOI: 10.1143/Jjap.44.L445  0.53
2005 Genda T, Tanaka S, Esashi M. Charging Method of Micropatterned Electrets by Contact Electrification Using Mercury Japanese Journal of Applied Physics. 44: 5062-5067. DOI: 10.1143/Jjap.44.5062  0.474
2005 Song Y, Lee H, Esashi M. Resonance-free Millimeter-wave Coplanar Waveguide Si Microelectromechanical System Package using a Lightly-doped Silicon Chip Carrier Japanese Journal of Applied Physics. 44: 1693-1697. DOI: 10.1143/Jjap.44.1693  0.349
2005 Mourad MH, Totsu K, Kumagai S, Samukawa S, Esashi M. Electron Emission from Indium Tin Oxide/Silicon Monoxide/Gold Structure Japanese Journal of Applied Physics. 44: 1414-1418. DOI: 10.1143/Jjap.44.1414  0.324
2005 Haga Y, Mizushima M, Matsunaga T, Esashi M. Medical and welfare applications of shape memory alloy microcoil actuators Smart Materials and Structures. 14. DOI: 10.1088/0964-1726/14/5/015  0.307
2005 Isomura K, Tanaka S, Togo S, Esashi M. Development of high-speed micro-gas bearings for three-dimensional micro-turbo machines Journal of Micromechanics and Microengineering. 15: S222-S227. DOI: 10.1088/0960-1317/15/9/S08  0.501
2005 Chang K, Tanaka S, Esashi M. A micro-fuel processor with trench-refilled thick silicon dioxide for thermal isolation fabricated by water-immersion contact photolithography Journal of Micromechanics and Microengineering. 15: S171-S178. DOI: 10.1088/0960-1317/15/9/S01  0.533
2005 Ahn Y, Ono T, Esashi M. Si multiprobes integrated with lateral actuators for independent scanning probe applications Journal of Micromechanics and Microengineering. 15: 1224-1229. DOI: 10.1088/0960-1317/15/6/012  0.549
2005 Kang P, Tanaka S, Esashi M. Demonstration of a MEMS-based turbocharger on a single rotor Journal of Micromechanics and Microengineering. 15: 1076-1087. DOI: 10.1088/0960-1317/15/5/026  0.541
2005 Tao Y, Esashi M. Macroporous silicon-based deep anisotropic etching Journal of Micromechanics and Microengineering. 15: 764-770. DOI: 10.1088/0960-1317/15/4/013  0.372
2005 Chang C, Wang Y, Kanamori Y, Shih J, Kawai Y, Lee C, Wu K, Esashi M. Etching submicrometer trenches by using the Bosch process and its application to the fabrication of antireflection structures Journal of Micromechanics and Microengineering. 15: 580-585. DOI: 10.1088/0960-1317/15/3/020  0.306
2005 Lin Y, Ono T, Esashi M. Fabrication and characterization of micromachined quartz-crystal cantilever for force sensing Journal of Micromechanics and Microengineering. 15: 2426-2432. DOI: 10.1088/0960-1317/15/12/026  0.546
2005 Ono T, Wakamatsu H, Esashi M. Parametrically amplified thermal resonant sensor with pseudo-cooling effect Journal of Micromechanics and Microengineering. 15: 2282-2288. DOI: 10.1088/0960-1317/15/12/010  0.533
2005 Ye S, Tanaka S, Esashi M, Hamakawa S, Hanaoka T, Mizukami F. Thin palladium membrane microreactors with oxidized porous silicon support and their application Journal of Micromechanics and Microengineering. 15: 2011-2018. DOI: 10.1088/0960-1317/15/11/004  0.505
2005 Ono T, Fan CC, Esashi M. Micro instrumentation for characterizing thermoelectric properties of nanomaterials Journal of Micromechanics and Microengineering. 15: 1-5. DOI: 10.1088/0960-1317/15/1/001  0.527
2005 Wang DF, Takahashi A, Matsumoto Y, Itoh KM, Yamamoto Y, Ono T, Esashi M. Magnetic mesa structures fabricated by reactive ion etching with CO/NH3/Xe plasma chemistry for an all-silicon quantum computer Nanotechnology. 16: 990-994. DOI: 10.1088/0957-4484/16/6/062  0.516
2005 Yoshida S, Ono T, Oi S, Esashi M. Reversible electrical modification on conductive polymer for proximity probe data storage Nanotechnology. 16: 2516-2520. DOI: 10.1088/0957-4484/16/11/009  0.677
2005 Esashi M, Ono T. From MEMS to nanomachine Journal of Physics D: Applied Physics. 38: R223-R230. DOI: 10.1088/0022-3727/38/13/R01  0.568
2005 Ono T, Esashi M. Stress-induced mass detection with a micromechanical/nanomechanical silicon resonator Review of Scientific Instruments. 76: 093107. DOI: 10.1063/1.2041591  0.523
2005 Ono T, Lin Y, Esashi M. Scanning probe microscopy with quartz crystal cantilever Applied Physics Letters. 87: 074102. DOI: 10.1063/1.2031937  0.519
2005 Ono T, Esashi M. Effect of ion attachment on mechanical dissipation of a resonator Applied Physics Letters. 87: 044105. DOI: 10.1063/1.1993771  0.496
2005 Zhang D, Ono T, Esashi M. Piezoactuator-integrated monolithic microstage with six degrees of freedom Sensors and Actuators a: Physical. 122: 301-306. DOI: 10.1016/J.Sna.2005.03.076  0.543
2005 Satoh D, Tanaka S, Yoshida K, Esashi M. Micro-ejector to supply fuel–air mixture to a micro-combustor Sensors and Actuators a: Physical. 119: 528-536. DOI: 10.1016/J.Sna.2004.10.028  0.511
2005 Hara M, Kuypers J, Abe T, Esashi M. Surface micromachined AlN thin film 2GHz resonator for CMOS integration Sensors and Actuators a: Physical. 117: 211-216. DOI: 10.1016/J.Sna.2004.06.014  0.344
2005 Tuyen LTT, Minh PN, Roduner E, Chi PTD, Ono T, Miyashita H, Khoi PH, Esashi M. Hydrogen termination for the growth of carbon nanotubes on silicon Chemical Physics Letters. 415: 333-336. DOI: 10.1016/J.Cplett.2005.09.014  0.536
2004 Rajanna K, Tanaka S, Itoh T, Esashi M. Reaction bonding of microstructured silicon carbide using polymer and silicon thin film Materials Science Forum. 1527-1530. DOI: 10.4028/Www.Scientific.Net/Msf.457-460.1527  0.546
2004 Kondo K, Tanaka S, Habu H, Tokudome S, Hori K, Saito H, Itoh A, Watanabe M, Esashi M. Vacuum test of a micro-solid propellant rocket array thruster Ieice Electronics Express. 1: 222-227. DOI: 10.1587/Elex.1.222  0.527
2004 ISOMURA K, TANAKA S, TOGO S, KANEBAKO H, MURAYAMA M, SAJI N, SATO F, ESASHI M. Development of Micromachine Gas Turbine for Portable Power Generation Jsme International Journal Series B. 47: 459-464. DOI: 10.1299/Jsmeb.47.459  0.499
2004 ESASHI M, ONO T, TANAKA S. Micro Industry Equipments Jsme International Journal Series B. 47: 429-438. DOI: 10.1299/Jsmeb.47.429  0.637
2004 Ono T, Miyashita H, Esashi M. Nanomechanical Structure with Integrated Carbon Nanotube Japanese Journal of Applied Physics. 43: 855-859. DOI: 10.1143/Jjap.43.855  0.528
2004 Singh VK, Sasaki M, Hane K, Esashi M. Flow Condition in Resist Spray Coating and Patterning Performance for Three-Dimensional Photolithography over Deep Structures Japanese Journal of Applied Physics. 43: 2387-2391. DOI: 10.1143/Jjap.43.2387  0.304
2004 Ngoc Minh P, Ono T, Sato N, Mimura H, Esashi M. Microelectron field emitter array with focus lenses for multielectron beam lithography based on silicon on insulator wafer Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22: 1273. DOI: 10.1116/1.1738118  0.556
2004 Bae JH, Minh PN, Ono T, Esashi M. Schottky emitter using boron-doped diamond Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22: 1349. DOI: 10.1116/1.1736640  0.521
2004 Li J, Sugimoto S, Tanaka S, Esashi M, Watanabe R. Manufacturing Silicon Carbide Microrotors by Reactive Hot Isostatic Pressing within Micromachined Silicon Molds Journal of the American Ceramic Society. 85: 261-263. DOI: 10.1111/J.1151-2916.2002.Tb00077.X  0.551
2004 Wang S, Li X, Wakabayashi K, Esashi M. Deep Reactive Ion Etching of Lead Zirconate Titanate Using Sulfur Hexafluoride Gas Journal of the American Ceramic Society. 82: 1339-1641. DOI: 10.1111/J.1151-2916.1999.Tb01919.X  0.309
2004 Wang S, Li J, Watanabe R, Esashi M. Fabrication of Lead Zirconate Titanate Microrods for 1-3 Piezocomposites Using Hot Isostatic Pressing with Silicon Molds Journal of the American Ceramic Society. 82: 213-215. DOI: 10.1111/J.1151-2916.1999.Tb01745.X  0.38
2004 Tanaka S, Isomura K, Togo S, Esashi M. Turbo test rig with hydroinertia air bearings for a palmtop gas turbine Journal of Micromechanics and Microengineering. 14: 1449-1454. DOI: 10.1088/0960-1317/14/11/003  0.497
2004 Tao Y, Esashi M. Local formation of macroporous silicon through a mask Journal of Micromechanics and Microengineering. 14: 1411-1415. DOI: 10.1088/0960-1317/14/10/017  0.363
2004 Wang DF, Ono T, Esashi M. Thermal treatments and gas adsorption influences on nanomechanics of ultra-thin silicon resonators for ultimate sensing Nanotechnology. 15: 1851-1854. DOI: 10.1088/0957-4484/15/12/028  0.523
2004 Ono T, Esashi M. Mass sensing with resonating ultra-thin silicon beams detected by a double-beam laser Doppler vibrometer Measurement Science and Technology. 15: 1977-1981. DOI: 10.1088/0957-0233/15/10/005  0.519
2004 Li L, Esashi M, Abe T. A miniaturized biconvex quartz-crystal microbalance with large-radius spherical thickness distribution Applied Physics Letters. 85: 2652-2654. DOI: 10.1063/1.1796535  0.317
2004 Jang WI, Choi CA, Jun CH, Kim YT, Esashi M. Surface micromachined thermally driven micropump Sensors and Actuators a: Physical. 115: 151-158. DOI: 10.1016/J.Sna.2004.04.024  0.338
2004 Lee S, Esashi M. Characteristics on PZT (Pb(ZrxTi1−x)O3) films for piezoelectric angular rate sensor Sensors and Actuators a: Physical. 114: 88-92. DOI: 10.1016/J.Sna.2004.03.010  0.337
2004 Li L, Abe T, Esashi M. Fabrication of miniaturized bi-convex quartz crystal microbalance using reactive ion etching and melting photoresist Sensors and Actuators a-Physical. 114: 496-500. DOI: 10.1016/J.Sna.2003.12.031  0.339
2004 Tanaka S, Chang K, Min K, Satoh D, Yoshida K, Esashi M. MEMS-based components of a miniature fuel cell/fuel reformer system Chemical Engineering Journal. 101: 143-149. DOI: 10.1016/J.Cej.2004.01.017  0.486
2004 Chang C, Abe T, Esashi M. Trench filling characteristics of low stress TEOS/ozone oxide deposited by PECVD and SACVD Microsystem Technologies. 10: 97-102. DOI: 10.1007/S00542-003-0313-Z  0.31
2003 Tanaka S, Hosokawa R, Tokudome S, Hori K, Saito H, Watanabe M, Esashi M. MEMS-Based Solid Propellant Rocket Array Thruster with Electrical Feedthroughs. Transactions of the Japan Society For Aeronautical and Space Sciences. 46: 47-51. DOI: 10.2322/Tjsass.46.47  0.539
2003 Chang K, Tanaka S, Esashi M. MEMS-Based Fuel Reformer with Suspended Membrane Structure Ieej Transactions On Sensors and Micromachines. 123: 346-350. DOI: 10.1541/Ieejsmas.123.346  0.509
2003 Tanaka S, Higashitani A, Sugie K, Esashi M. Ieej Transactions On Sensors and Micromachines. 123: 340-345. DOI: 10.1541/Ieejsmas.123.340  0.5
2003 Genda T, Tanaka S, Esashi M. Design of High Power Electrostatic Motor and Generator Using Electrets Ieej Transactions On Sensors and Micromachines. 123: 331-339. DOI: 10.1541/Ieejsmas.123.331  0.461
2003 TANAKA S, CHANG KS, SATO D, YOSHIDA K, ESASHI M. Microreactors for Portable Power Sources The Proceedings of the Thermal Engineering Conference. 2003: 453-454. DOI: 10.1299/JSMETED.2003.453  0.383
2003 Esashi M, Ono T. OS6(3)-11(OS06W0429) Micro-Nano Electromechanical Systems by Silicon Bulk-Micromachining The Abstracts of Atem : International Conference On Advanced Technology in Experimental Mechanics : Asian Conference On Experimental Mechanics. 2003: 113. DOI: 10.1299/jsmeatem.2003.113  0.474
2003 Ono T, Sugimoto S, Miyashita H, Esashi M. Mechanical Energy Dissipation of Multiwalled Carbon Nanotube in Ultrahigh Vacuum Japanese Journal of Applied Physics. 42: L683-L684. DOI: 10.1143/Jjap.42.L683  0.483
2003 Ono T, Konoma C, Miyashita H, Kanamori Y, Esashi M. Pattern Transfer of Self-Ordered Structure with Diamond Mold Japanese Journal of Applied Physics. 42: 3867-3870. DOI: 10.1143/Jjap.42.3867  0.539
2003 RANDLES AB, POKINES BJ, TANAKA S, ESASHI M. DEEP STRUCTURES WET ETCHED INTO LITHIUM NIOBATE USING A PHYSICAL MASK International Journal of Computational Engineering Science. 4: 497-500. DOI: 10.1142/S1465876303001605  0.548
2003 Minh PN, Tuyen LTT, Ono T, Miyashita H, Suzuki Y, Mimura H, Esashi M. Selective growth of carbon nanotubes on Si microfabricated tips and application for electron field emitters Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 1705. DOI: 10.1116/1.1580115  0.53
2003 Tanaka S, Yamada T, Sugimoto S, Li J, Esashi M. Silicon nitride ceramic-based two-dimensional microcombustor Journal of Micromechanics and Microengineering. 13: 502-508. DOI: 10.1088/0960-1317/13/3/321  0.542
2003 Hara M, Tanaka S, Esashi M. Rotational infrared polarization modulator using a MEMS-based air turbine with different types of journal bearing Journal of Micromechanics and Microengineering. 13: 223-228. DOI: 10.1088/0960-1317/13/2/309  0.491
2003 Ono T, Yoshida S, Esashi M. Electrical modification of a conductive polymer using a scanning probe microscope Nanotechnology. 14: 1051-1054. DOI: 10.1088/0957-4484/14/9/321  0.672
2003 Ono T, Esashi M. Magnetic force and optical force sensing with ultrathin silicon resonator Review of Scientific Instruments. 74: 5141-5146. DOI: 10.1063/1.1623627  0.513
2003 Li X, Ono T, Wang Y, Esashi M. Ultrathin single-crystalline-silicon cantilever resonators: Fabrication technology and significant specimen size effect on Young’s modulus Applied Physics Letters. 83: 3081-3083. DOI: 10.1063/1.1618369  0.564
2003 Wang DF, Ono T, Esashi M. Crystallographic influence on nanomechanics of (100)-oriented silicon resonators Applied Physics Letters. 83: 3189-3191. DOI: 10.1063/1.1616652  0.529
2003 Ono T, Wang DF, Esashi M. Time dependence of energy dissipation in resonating silicon cantilevers in ultrahigh vacuum Applied Physics Letters. 83: 1950-1952. DOI: 10.1063/1.1608485  0.555
2003 Bae JH, Ono T, Esashi M. Scanning probe with an integrated diamond heater element for nanolithography Applied Physics Letters. 82: 814-816. DOI: 10.1063/1.1541949  0.556
2003 Ono T, Li X, Miyashita H, Esashi M. Mass sensing of adsorbed molecules in sub-picogram sample with ultrathin silicon resonator Review of Scientific Instruments. 74: 1240-1243. DOI: 10.1063/1.1536262  0.542
2003 Bae J, Ono T, Esashi M. Boron-doped diamond scanning probe for thermo-mechanical nanolithography Diamond and Related Materials. 12: 2128-2135. DOI: 10.1016/S0925-9635(03)00252-8  0.56
2003 Zhang D, Chang C, Ono T, Esashi M. A piezodriven XY-microstage for multiprobe nanorecording Sensors and Actuators a: Physical. 108: 230-233. DOI: 10.1016/S0924-4247(03)00373-X  0.527
2003 Li J, Tanaka S, Umeki T, Sugimoto S, Esashi M, Watanabe R. Microfabrication of thermoelectric materials by silicon molding process Sensors and Actuators a-Physical. 108: 97-102. DOI: 10.1016/S0924-4247(03)00369-8  0.544
2003 Abe T, Li X, Esashi M. Endpoint detectable plating through femtosecond laser drilled glass wafers for electrical interconnections Sensors and Actuators a: Physical. 108: 234-238. DOI: 10.1016/S0924-4247(03)00262-0  0.344
2003 Hung VN, Abe T, Minh PN, Esashi M. High-frequency one-chip multichannel quartz crystal microbalance fabricated by deep RIE Sensors and Actuators a: Physical. 108: 91-96. DOI: 10.1016/S0924-4247(03)00260-7  0.348
2003 Haga Y, Fujita M, Nakamura K, Kim CJ, Esashi M. Batch fabrication of intravascular forward-looking ultrasonic probe Sensors and Actuators a: Physical. 104: 40-43. DOI: 10.1016/S0924-4247(02)00480-6  0.307
2003 Tajima T, Nishiguchi T, Chiba S, Morita A, Abe M, Tanioka K, Saito N, Esashi M. High-performance ultra-small single crystalline silicon microphone of an integrated structure Microelectronic Engineering. 67: 508-519. DOI: 10.1016/S0167-9317(03)00108-4  0.386
2003 Li X, Ono T, Lin R, Esashi M. Resonance enhancement of micromachined resonators with strong mechanical-coupling between two degrees of freedom Microelectronic Engineering. 65: 1-12. DOI: 10.1016/S0167-9317(02)00595-6  0.51
2003 Minh PN, Ono T, Haga Y, Inoue K, Sasaki M, Hane K, Esashi M. Bach Fabrication of Microlens at the end of Optical Fiber using Self-photolithgraphy and Etching Techniques Optical Review. 10: 150-154. DOI: 10.1007/S10043-003-0150-4  0.493
2002 Itoh T, Tanaka S, Li J, Watanabe R, Esashi M. Micromachining of Silicon Carbide by Silicon Lost Molding, Chemical Vapor Deposition And Reaction-Sintering The Japan Society of Applied Physics. DOI: 10.7567/Ssdm.2002.P14-1  0.54
2002 Minh PN, Tuyen LTT, Ono T, Mimura H, Esashi M. Electron Field Emission with Carbon Nanotube on a Si Tip The Japan Society of Applied Physics. DOI: 10.7567/Ssdm.2002.F-1-5  0.492
2002 Min K, Tanaka S, Esashi M. MEMS-Based Polymer Electrolyte Fuel Cell Electrochemistry. 70: 924-927. DOI: 10.5796/Electrochemistry.70.924  0.472
2002 Li JF, Sugimoto S, Tanaka S, Watanabe R, Esashi M. Manufacturing Miniature Si-Based Ceramic Rotors by Micro Reaction Sintering Key Engineering Materials. 703-708. DOI: 10.4028/Www.Scientific.Net/Kem.224-226.703  0.52
2002 Suzuki G, Esashi M. Fabrication of Multilayer Piezoelectric Actuator by Groove Cutting and Electroplating Ieej Transactions On Sensors and Micromachines. 122: 217-222. DOI: 10.1541/Ieejsmas.122.217  0.349
2002 TANAKA S, ESASHI M. New Development of Power Sources for Portable Devices Journal of the Society of Mechanical Engineers. 105: 35-39. DOI: 10.1299/Jsmemag.105.998_35  0.411
2002 Minh PN, Tuyen LTT, Ono T, Mimura H, Yokoo K, Esashi M. Carbon Nanotube on a Si Tip for Electron Field Emitter Japanese Journal of Applied Physics. 41: L1409-L1411. DOI: 10.1143/Jjap.41.L1409  0.521
2002 Li X, Abe T, Liu Y, Esashi M. Fabrication of high-density electrical feed-throughs by deep-reactive-ion etching of Pyrex glass Journal of Microelectromechanical Systems. 11: 625-630. DOI: 10.1109/Jmems.2002.805211  0.362
2002 Yang J, Ono T, Esashi M. Energy dissipation in submicrometer thick single-crystal silicon cantilevers Ieee\/Asme Journal of Microelectromechanical Systems. 11: 775-783. DOI: 10.1109/Jmems.2002.805208  0.513
2002 Lee D, Ono T, Abe T, Esashi M. Microprobe array with electrical interconnection for thermal imaging and data storage Ieee\/Asme Journal of Microelectromechanical Systems. 11: 215-221. DOI: 10.1109/Jmems.2002.1007400  0.546
2002 Lee DW, Ono T, Esashi M. Electrical and thermal recording techniques using a heater integrated microprobe Journal of Micromechanics and Microengineering. 12: 841-848. DOI: 10.1088/0960-1317/12/6/315  0.531
2002 Ono T, Miyashita H, Esashi M. Electric-field-enhanced growth of carbon nanotubes for scanning probe microscopy Nanotechnology. 13: 62-64. DOI: 10.1088/0957-4484/13/1/314  0.535
2002 Hung VN, Abe T, Minh PN, Esashi M. Miniaturized, highly sensitive single-chip multichannel quartz-crystal microbalance Applied Physics Letters. 81: 5069-5071. DOI: 10.1063/1.1532750  0.322
2002 Matsunaga T, Esashi M. Acceleration switch with extended holding time using squeeze film effect for side airbag systems Sensors and Actuators a: Physical. 100: 10-17. DOI: 10.1016/S0924-4247(02)00039-0  0.305
2002 Mineta T, Mitsui T, Watanabe Y, Kobayashi S, Haga Y, Esashi M. An Active Guide Wire With Shape Memory Alloy Bending Actuator Fabricated By Room Temperature Process Sensors and Actuators a-Physical. 97: 632-637. DOI: 10.1016/S0924-4247(02)00021-3  0.321
2002 Tanaka S, Hara M, Esashi M. Mechanical polarization modulator using micro-turbo machinery for Fourier transform infrared spectroscopy Sensors and Actuators a: Physical. 96: 215-222. DOI: 10.1016/S0924-4247(01)00760-9  0.514
2002 Minh PN, Ono T, Tanaka S, Goto K, Esashi M. Near-field recording with high optical throughput aperture array Sensors and Actuators a: Physical. 95: 168-174. DOI: 10.1016/S0924-4247(01)00727-0  0.577
2001 Minh PN, Ono T, Tanaka S, Esashi M. Spatial distribution and polarization dependence of the optical near-field in a silicon microfabricated probe. Journal of Microscopy. 202: 28-33. PMID 11298865 DOI: 10.1046/J.1365-2818.2001.00818.X  0.325
2001 Ono T, Esashi M. Nano-Probe Sensing and Multi-Probe Data Storage The Japan Society of Applied Physics. 2001: 464-465. DOI: 10.7567/Ssdm.2001.A-8-2  0.479
2001 Ono T, Minh PN, Lee D, Esashi M. Micromachined Probe for High Density Data Storage The Review of Laser Engineering. 29: S11-S12. DOI: 10.2184/Lsj.29.Supplement_S11  0.468
2001 ONO T, MINH PN, LEE DW, ESASHI M. Information Technology Industry and Laser Technology. Multi-Probe Aimed for High Density Data Storage. The Review of Laser Engineering. 29: 516-521. DOI: 10.2184/Lsj.29.516  0.57
2001 Lee SH, Iijima T, Nakamura K, Tanaka S, Esashi M. Characteristics of Thick Sol-Gel Lead Zirconate Titanate Films for Angular Rate Sensor Application Mrs Proceedings. 687. DOI: 10.1557/Proc-687-B5.46  0.556
2001 Ono T, Wada A, Esashi M. Silicon Micromachined Tunable Infrared Polarizer Ieej Transactions On Sensors and Micromachines. 121: 119-123. DOI: 10.1541/Ieejsmas.121.119  0.529
2001 Lee D, Ono T, Esashi M. Magnetically actuated cantilever with small resonator for scanning probe microscopy Ieej Transactions On Sensors and Micromachines. 121: 113-118. DOI: 10.1541/Ieejsmas.121.113  0.566
2001 Asanuma H, Hashimoto S, Suzuki G, Niitsuma H, Esashi M. Optical Interference Type Micro Hydrophone Fabricated By Micro-machining Seg Technical Program Expanded Abstracts. 45-47. DOI: 10.1190/1.1816644  0.357
2001 Tanaka S, Rajanna K, Abe T, Esashi M. Deep reactive ion etching of silicon carbide Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19: 2173. DOI: 10.1116/1.1418401  0.523
2001 Yang J, Ono T, Esashi M. Investigating surface stress: Surface loss in ultrathin single-crystal silicon cantilevers Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19: 551. DOI: 10.1116/1.1347040  0.524
2001 Tanaka S, Sugimoto S, Li J, Watanabe R, Esashi M. Silicon carbide micro-reaction-sintering using micromachined silicon molds Journal of Microelectromechanical Systems. 10: 55-61. DOI: 10.1109/84.911092  0.536
2001 Lee DW, Ono T, Esashi M. Fabrication of thermal microprobes with a sub-100 nm metal-to-metal junction Nanotechnology. 13: 29-32. DOI: 10.1088/0957-4484/13/1/306  0.558
2001 Minh PN, Ono T, Watanabe H, Lee SS, Haga Y, Esashi M. Hybrid optical fiber-apertured cantilever near-field probe Applied Physics Letters. 79: 3020-3022. DOI: 10.1063/1.1416475  0.522
2001 Mineta T, Mitsui T, Watanabe Y, Kobayashi S, Haga Y, Esashi M. Batch fabricated flat meandering shape memory alloy actuator for active catheter Sensors and Actuators a-Physical. 88: 112-120. DOI: 10.1016/S0924-4247(00)00510-0  0.337
2001 Li X, Abe T, Esashi M. Deep reactive ion etching of Pyrex glass using SF6 plasma Sensors and Actuators a: Physical. 87: 139-145. DOI: 10.1016/S0924-4247(00)00482-9  0.329
2001 Pokines BJ, Tani J, Esashi M, Hamano T, Mizuno K, Inman DJ. Active material micro-actuator arrays fabricated with SU-8 resin Microsystem Technologies. 7: 117-119. DOI: 10.1007/S005420100093  0.311
2000 ESASHI M, ONO T, TANAKA S. Journal of the Surface Finishing Society of Japan. 51: 874-879. DOI: 10.4139/Sfj.51.874  0.616
2000 Hirata K, Niitsuma H, Esashi M. Silicon Micromachined Fiber-Optic Accelerometer for Downhole Seismic Measurement Ieej Transactions On Sensors and Micromachines. 120: 576-581. DOI: 10.1541/Ieejsmas.120.576  0.35
2000 Nishizawa M, Niitsuma H, Esashi M. Miniaturized Downhole Seismic Detector Using Micromachined Silicon Capacitive Accelerometer Seg Technical Program Expanded Abstracts. 1791-1793. DOI: 10.1190/1.1815772  0.324
2000 Esashi M. Bulk micromachining for sensors and actuators Proceedings of Spie. 4175: 6-15. DOI: 10.1117/12.395607  0.359
2000 Miyashita H, Esashi M. Wide dynamic range silicon diaphragm vacuum sensor by electrostatic servo system Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18: 2692. DOI: 10.1116/1.1320807  0.309
2000 Lee D, Ono T, Esashi M. High-speed imaging by electromagnetic alloy actuated probe with dual spring Ieee\/Asme Journal of Microelectromechanical Systems. 9: 419-424. DOI: 10.1109/84.896762  0.556
2000 Ono T, Sim DY, Esashi M. Micro-discharge and electric breakdown in a micro-gap Journal of Micromechanics and Microengineering. 10: 445-451. DOI: 10.1088/0960-1317/10/3/321  0.525
2000 Yang J, Ono T, Esashi M. Surface effects and high quality factors in ultrathin single-crystal silicon cantilevers Applied Physics Letters. 77: 3860-3862. DOI: 10.1063/1.1330225  0.541
2000 Minh PN, Ono T, Esashi M. High throughput aperture near-field scanning optical microscopy Review of Scientific Instruments. 71: 3111-3117. DOI: 10.1063/1.1304867  0.554
2000 Lee D, Ono T, Esashi M. Cantilever with integrated resonator for application of scanning probe microscope Sensors and Actuators a: Physical. 83: 11-16. DOI: 10.1016/S0924-4247(99)00378-7  0.547
2000 Abe T, Esashi M. One-chip multichannel quartz crystal microbalance (QCM) fabricated by Deep RIE Sensors and Actuators a: Physical. 82: 139-143. DOI: 10.1016/S0924-4247(99)00330-1  0.376
2000 Yang J, Ono T, Esashi M. Mechanical behavior of ultrathin microcantilever Sensors and Actuators a: Physical. 82: 102-107. DOI: 10.1016/S0924-4247(99)00319-2  0.543
2000 Minh PN, Ono T, Esashi M. Microfabrication of miniature aperture at the apex of SiO2 tip on silicon cantilever for near-field scanning optical microscopy Sensors and Actuators a: Physical. 80: 163-169. DOI: 10.1016/S0924-4247(99)00262-9  0.577
1999 Ueda Y, Henmi H, Minami K, Esashi M. An Electrostatic Servo Capacitive Pressure Sensor Ieej Transactions On Sensors and Micromachines. 119: 94-98. DOI: 10.1541/Ieejsmas.119.94  0.32
1999 Mineta T, Watanabe Y, Kobayashi S, Haga Y, Esashi M. Active Catheter Using Multi-Link-Joint Structure Fabricated in Silicon Wafer Ieej Transactions On Sensors and Micromachines. 119: 615-619. DOI: 10.1541/Ieejsmas.119.615  0.35
1999 Esashi M, Toda R, Minami K, Ono T. Precise Micro-Nanomachining of Silicon Ieej Transactions On Sensors and Micromachines. 119: 489-497. DOI: 10.1541/Ieejsmas.119.489  0.575
1999 Ko S, Sim D, Esashi M. An Electrostatic Servo-Accelerometer with mG Resolution Ieej Transactions On Sensors and Micromachines. 119: 368-373. DOI: 10.1541/Ieejsmas.119.368  0.356
1999 Minh PN, Ono T, Esashi M. Nonuniform silicon oxidation and application for the fabrication of aperture for near-field scanning optical microscopy Applied Physics Letters. 75: 4076-4078. DOI: 10.1063/1.125541  0.565
1999 Minami K, Morishita H, Esashi M. A bellows-shape electrostatic microactuator Sensors and Actuators a: Physical. 72: 269-276. DOI: 10.1016/S0924-4247(98)00213-1  0.358
1999 Ono T, Esashi M. Silicon—based Nanomachining Sensors Update. 6: 163-188. DOI: 10.1002/1616-8984(199911)6:1<163::Aid-Seup163>3.0.Co;2-2  0.423
1999 Wang S, Li J, Wakabayashi K, Esashi M, Watanabe R. Lost Silicon Mold Process for PZT Microstructures Advanced Materials. 11: 873-876. DOI: 10.1002/(Sici)1521-4095(199907)11:10<873::Aid-Adma873>3.0.Co;2-F  0.321
1998 Shiba Y, Ono T, Minami K, Esashi M. Capacitive AFM Probe for High Speed Imaging Ieej Transactions On Sensors and Micromachines. 118: 647-651. DOI: 10.1541/Ieejsmas.118.647  0.579
1998 Choi J, Minam K, Esashi M. Electromagentical excitation and induced electromotive voltage sensing silicon angular rate sensor Ieej Transactions On Sensors and Micromachines. 118: 641-646. DOI: 10.1541/Ieejsmas.118.641  0.346
1998 Choi J, Minami K, Esashi M. Rotating vibration type silicon angular rate sensor by deep ICPRIE and XeF2 gas etching Ieej Transactions On Sensors and Micromachines. 118: 437-443. DOI: 10.1541/Ieejsmas.118.437  0.345
1998 Lim G, Baek S, Esashi M. A new bulk-micromachining using deep RIE and wet etching for an accelerometer Ieej Transactions On Sensors and Micromachines. 118: 420-424. DOI: 10.1541/Ieejsmas.118.420  0.355
1998 Nagao M, Minami K, Esashi M. A Silicon Micromachined Resonant Angular Sensor Ieej Transactions On Sensors and Micromachines. 118: 212-217. DOI: 10.1541/Ieejsmas.118.212  0.375
1998 Toda R, Minami K, Esashi M. Thin-beam bulk micromachining based on RIE and xenon difluoride silicon etching Sensors and Actuators a: Physical. 66: 268-272. DOI: 10.1016/S0924-4247(98)01701-4  0.33
1997 Sugihara M, Minami K, Esashi M. Process Technology for Micromachines. Micro Assembly by High Rate CVD Using CW UV Laser. Ieej Transactions On Sensors and Micromachines. 117: 3-9. DOI: 10.1541/Ieejsmas.117.3  0.323
1997 Minami K, Moriuchi T, Esashi M. Damping Control for Packaged Micro Mechanical Devices. Ieej Transactions On Sensors and Micromachines. 117: 109-116. DOI: 10.1541/Ieejsmas.117.109  0.327
1997 Kong S, Minami K, Esashi M. Process Technology for Micromachines. Fabrication of Reactive Ion Etching Systems for Deep Silicon Machining. Ieej Transactions On Sensors and Micromachines. 117: 10-14. DOI: 10.1541/Ieejsmas.117.10  0.367
1997 ONO T, HAMANAKA H, ESASHI M. Application and Progress in the Scanning Probe Microscopy. Micromachining and Scanning Probe Microscope. Hyomen Kagaku. 18: 198-205. DOI: 10.1380/Jsssj.18.198  0.498
1997 Kim S, Myoren H, Chen J, Nakajima K, Esashi M. High Frequency Responses of YBa2Cu3O7-y Josephson Junctions on Si Substrates Fabricated by Focused Electron Beam Irradiation Japanese Journal of Applied Physics. 36: L1096-L1099. DOI: 10.1143/Jjap.36.L1096  0.333
1997 Esashi M, Ono T, Minami K. Precise micronanomachining for advanced sensors Proceedings of Spie. 3223: 44-55. DOI: 10.1117/12.284499  0.561
1997 Wang Y, Esashi M. A novel electrostatic servo capacitive vacuum sensor Sensors. 2: 1457-1460. DOI: 10.1109/Sensor.1997.635739  0.333
1997 Mizuno J, Nottmeyer K, Kobayashi T, Minami K, Esashi M. Silicon bulk micromachined accelerometer with simultaneous linear and angular sensitivity Sensors. 2: 1197-1200. DOI: 10.1109/Sensor.1997.635420  0.307
1997 Ono T, Saitoh H, Esashi M. Si nanowire growth with ultrahigh vacuum scanning tunneling microscopy Applied Physics Letters. 70: 1852-1854. DOI: 10.1063/1.118711  0.547
1996 Esashi M. Micro Systems by Bulk Silicon Micromachining The Japan Society of Applied Physics. 1996: 821-823. DOI: 10.7567/Ssdm.1996.D-6-1  0.318
1996 Sim DY, Kurabayashi T, Esashi M. PNEUMATIC MICROVALVE BASED ON SILICON MICROMACHINING Ieej Transactions On Sensors and Micromachines. 116: 56-61. DOI: 10.1541/Ieejsmas.116.56  0.353
1996 Sim DY, Kurabayashi T, Esashi M. A bakable microvalve with a Kovar - glass - silicon - glass structure Journal of Micromechanics and Microengineering. 6: 266-271. DOI: 10.1088/0960-1317/6/2/009  0.341
1996 Lim G, Minami K, Yamamoto K, Sugihara M, Uchiyama M, Esashi M. Multi-link active catheter snake-like motion Robotica. 14: 499-506. DOI: 10.1017/S0263574700019986  0.305
1996 Mizuno J, Nottmeyer K, Cabuz C, Minami K, Kobayashi T, Esashi M. Fabrication and characterization of a silicon capacitive structure for simultaneous detection of acceleration and angular rate Sensors and Actuators a: Physical. 54: 646-650. DOI: 10.1016/S0924-4247(97)80031-3  0.317
1996 Ono T, Hamanaka H, Kurabayashi T, Minami K, Esashi M. Nanoscale Al patterning on an STM-manipulated Si surface Thin Solid Films. 640-643. DOI: 10.1016/0040-6090(96)08705-6  0.503
1996 Choi J, Minami K, Esashi M. Application of deep reactive ion etching for silicon angular rate sensor Microsystem Technologies. 2: 186-190. DOI: 10.1007/Bf02739557  0.364
1995 Shoji Y, Minami K, Esashi M. Glass-silicon Anodic Bonding for the Reduction of Structural Distortion Ieej Transactions On Fundamentals and Materials. 115: 1208-1213. DOI: 10.1541/Ieejfms1990.115.12_1208  0.308
1995 Hashimoto M, Cabuz C, Minami K, Esashi M. Silicon resonant angular rate sensor using electromagnetic excitation and capacitive detection Journal of Micromechanics and Microengineering. 5: 219-225. DOI: 10.1088/0960-1317/5/3/003  0.343
1995 Tosaka H, Minami K, Esashi M. Optical in situ monitoring of silicon diaphragm thickness during wet etching Journal of Micromechanics and Microengineering. 5: 41-46. DOI: 10.1088/0960-1317/5/1/008  0.337
1995 Esashi M, Takinami M, Wakabayashi Y, Minami K. High-rate directional deep dry etching for bulk silicon micromachining Journal of Micromechanics and Microengineering. 5: 5-10. DOI: 10.1088/0960-1317/5/1/002  0.338
1995 Murakami K, Minami K, Esashi M. High aspect ratio fabrication method using O2 RIE and electroplating Microsystem Technologies. 1: 137-142. DOI: 10.1007/Bf01294805  0.313
1994 Esashi M. Micromachining and Micromachines Ieej Transactions On Fundamentals and Materials. 114: 499-506. DOI: 10.1541/Ieejfms1990.114.7-8_499  0.36
1994 Asada N, Matsuki H, Minami K, Esashi M. Silicon micromachined two-dimensional galvano optical scanner Ieee Transactions On Magnetics. 30: 4647-4649. DOI: 10.1109/20.334177  0.333
1994 Shoji S, Esashi M. Microflow devices and systems Journal of Micromechanics and Microengineering. 4: 157-171. DOI: 10.1088/0960-1317/4/4/001  0.304
1994 Henmi H, Shoji S, Shoji Y, Yoshimi K, Esashi M. Vacuum packaging for microsensors by glass-silicon anodic bonding Sensors and Actuators a: Physical. 43: 243-248. DOI: 10.1016/0924-4247(94)80003-0  0.358
1994 Cabuz C, Shoji S, Fukatsu K, Cabuz E, Minami K, Esashi M. Fabrication and packaging of a resonant infrared sensor integrated in silicon Sensors and Actuators a: Physical. 43: 92-99. DOI: 10.1016/0924-4247(93)00671-P  0.362
1994 Takashima K, Minami K, Esashi M, Nishizawa Ji. Laser projection CVD using the low temperature condensation method Applied Surface Science. 79: 366-374. DOI: 10.1016/0169-4332(94)90438-3  0.311
1994 Esashi M. Encapsulated micro mechanical sensors Microsystem Technologies. 1: 2-9. DOI: 10.1007/Bf01367754  0.355
1993 Shoji S, Esashi M. Microfabrication and microsensors. Applied Biochemistry and Biotechnology. 41: 21-34. PMID 8215338 DOI: 10.1007/Bf02918525  0.319
1993 Minami K, Kawamura S, Esashi M. Fabrication of distributed electrostatic micro actuator (DEMA) Journal of Microelectromechanical Systems. 2: 121-127. DOI: 10.1109/84.260256  0.339
1993 Minami K, Wakabayashi Y, Yoshida M, Watanabe K, Esashi M. YAG laser-assisted etching of silicon for fabricating sensors and actuators Journal of Micromechanics and Microengineering. 3: 81-86. DOI: 10.1088/0960-1317/3/2/008  0.359
1993 Matsumoto Y, Esashi M. Integrated silicon capacitive accelerometer with PLL servo technique Sensors and Actuators a: Physical. 39: 209-217. DOI: 10.1016/0924-4247(93)80221-2  0.357
1993 Esashi M. Silicon micromachining and micromachines Wear. 168: 181-187. DOI: 10.1016/0043-1648(93)90215-8  0.385
1993 Shirai T, Esashi M, Ura N. A Two-Wire Silicon Capacitive Accelerometer Electronics and Communications in Japan (Part Ii: Electronics). 76: 73-83. DOI: 10.1002/Ecjb.4420760408  0.338
1992 Nagata T, Terabe H, Kuwahara S, Sakurai S, Tabata O, Sugiyama S, Esashi M. Digital compensated capacitive pressure sensor using CMOS technology for low-pressure measurements Sensors and Actuators a: Physical. 34: 173-177. DOI: 10.1016/0924-4247(92)80189-A  0.328
1991 Kudoh T, Shoji S, Esashi M. An integrated miniature capacitive pressure sensor Sensors and Actuators a: Physical. 29: 185-193. DOI: 10.1016/0924-4247(91)80014-G  0.344
1991 Esashi M. Sensors by micromachining Electronics and Communications in Japan (Part Ii: Electronics). 74: 76-83. DOI: 10.1002/Ecjb.4420741109  0.322
1990 ESASHI M. Silicon microvalves and their applications. Journal of the Robotics Society of Japan. 8: 459-464. DOI: 10.20965/Jrm.1991.P0028  0.323
1990 Esashi M, Matsumoto Y, Shoji S. Absolute pressure sensors by air-tight electrical feedthrough structure Sensors and Actuators a: Physical. 23: 1048-1052. DOI: 10.1016/0924-4247(90)87087-Y  0.336
1990 Esashi M, Nakano A, Shoji S, Hebiguchi H. Low-temperature silicon-to-silicon anodic bonding with intermediate low melting point glan Sensors and Actuators a: Physical. 23: 931-934. DOI: 10.1016/0924-4247(90)87062-N  0.349
1990 Esashi M, Shoji S, Matsumoto Y, Furuta K. Catheter-tip capacitive pressure sensor Electronics and Communications in Japan (Part Ii: Electronics). 73: 79-87. DOI: 10.1002/Ecjb.4420731009  0.332
1989 Esashi M, Shoji S, Nakano A. Normally closed microvalve and mircopump fabricated on a silicon wafer Sensors and Actuators. 20: 163-169. DOI: 10.1016/0250-6874(89)87114-8  0.322
1989 Shoji S, Esashi M. Fabrication of a micropump for integrated chemical analyzing systems Electronics and Communications in Japan (Part Ii: Electronics). 72: 52-59. DOI: 10.1002/Ecjb.4420721006  0.369
1988 Shoji S, Esashi M, Matsuo T. Prototype miniature blood gas analyser fabricated on a silicon wafer Sensors and Actuators. 14: 101-107. DOI: 10.1016/0250-6874(88)80057-X  0.316
1986 Shoji S, Esashi M, Matsuo T. Prototype of micro ISFET for biomedical research Electronics and Communications in Japan (Part Ii: Electronics). 69: 21-29. DOI: 10.1002/Ecjb.4420690603  0.366
1983 Esashi M, Komatsu H, Matsuo T. Biomedical pressure sensor using buried piezoresistors Sensors and Actuators. 4: 537-544. DOI: 10.1016/0250-6874(83)85065-3  0.316
1982 Esashi M, Komatsu H, Matsuo T, Takahashi M, Takish T, Imabayashi K, Ozawa H. Fabrication of catheter-tip and sidewall miniature pressure sensors Ieee Transactions On Electron Devices. 29: 57-63. DOI: 10.1109/T-Ed.1982.20658  0.344
1979 Abe H, Esashi M, Matsuo T. ISFET's using inorganic gate thin films Ieee Transactions On Electron Devices. 26: 1939-1944. DOI: 10.1109/T-Ed.1979.19799  0.313
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