Chi-Chun Liu, Ph.D.
Affiliations: | University of Wisconsin, Madison, Madison, WI |
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"Chi-Chun Liu"Mean distance: 9.23 | S | N | B | C | P |
Parents
Sign in to add mentor| Paul F. Nealey | grad student | 2011 | UW Madison | |
| (Directed Self-Assembly of Block Copolymers with Density Multiplication and Its Integration with Lithographic Processes.) | ||||
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Publications
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| Chang TH, Xiong S, Liu CC, et al. (2017) The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning. Macromolecular Rapid Communications |
| Liu C, Franke E, Mignot Y, et al. (2017) DSA patterning options for logics and memory applications Proceedings of Spie. 10146: 1014603 |
| Chi C, Liu C, Meli L, et al. (2017) Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle Proceedings of Spie. 10146 |
| Bonam R, Muthinti R, Breton M, et al. (2017) An OCD perspective of line edge and line width roughness metrology Proceedings of Spie. 10145: 1014511 |
| Bonam R, Liu C, Breton M, et al. (2017) Comprehensive analysis of line-edge and line-width roughness for EUV lithography Proceedings of Spie. 10143 |
| Bruce RL, Fraczak G, Papalia JM, et al. (2017) Directed self-assembly patterning strategies for phase change memory applications Proceedings of Spie. 10149 |
| Lai K, Liu C, Tsai H, et al. (2017) Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design? Journal of Micro/Nanolithography, Mems, and Moems. 16: 013502 |
| Chang TH, Xiong S, Jacobberger RM, et al. (2016) Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific Reports. 6: 31407 |
| Xie T, Vora A, Mulcahey PJ, et al. (2016) Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains. Acs Nano |
| Wan L, Ji S, Liu CC, et al. (2016) Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates. Soft Matter |