Erik R. Hosler, Ph.D.
Affiliations: | 2013 | Chemistry | University of California, Berkeley, Berkeley, CA, United States |
Area:
ultrafast laser investigations of soft x-rayGoogle:
"Erik Hosler"Mean distance: 8.99 | S | N | B | C | P |
Parents
Sign in to add mentor| Stephen R. Leone | grad student | 2013 | UC Berkeley | |
| (Ultrafast Strong-Field Vibrational Dynamics Studied by Femtosecond Extreme-Ultraviolet Transient Absorption Spectroscopy.) | ||||
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Publications
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| Hosler ER, Wood OR, Barletta WA. (2017) Free-electron laser emission architecture impact on EUV lithography Proceedings of Spie. 10143 |
| Hosler ER, Wood OR, Barletta WA. (2017) Free-electron laser emission architecture impact on extreme ultraviolet lithography Journal of Micro-Nanolithography Mems and Moems. 16: 1 |
| Mohanty N, Farrell R, Periera C, et al. (2016) LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of Spie - the International Society For Optical Engineering. 9782 |
| Hosler ER, Thiruvengadam S, Cantone JR, et al. (2016) EUV and optical lithographic pattern shift at the 5nm node Proceedings of Spie. 9776: 977616 |
| Dixit D, Green A, Hosler ER, et al. (2016) Optical critical dimension metrology for directed self-assembly assisted contact hole shrink Journal of Micro/ Nanolithography, Mems, and Moems. 15 |
| Dixit D, O'Mullane S, Sunkoju S, et al. (2015) Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry Proceedings of Spie - the International Society For Optical Engineering. 9424 |
| Hosler ER, Wood OR, Barletta WA, et al. (2015) Considerations for a free-electron laser-based extreme-ultraviolet lithography program Proceedings of Spie - the International Society For Optical Engineering. 9422 |
| Dixit D, Hosler ER, Preil M, et al. (2015) Optical CD metrology for directed self-assembly assisted contact hole shrink process Proceedings of Spie - the International Society For Optical Engineering. 9424 |
| Dixit D, O'Mullane S, Sunkoju S, et al. (2015) Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology Journal of Micro/ Nanolithography, Mems, and Moems. 14 |
| Dixit DJ, Kamineni V, Farrell R, et al. (2015) Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry Journal of Micro/ Nanolithography, Mems, and Moems. 14 |