Alyssandrea H. Hamad, Ph.D.
Affiliations: | 2004 | Cornell University, Ithaca, NY, United States |
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"Alyssandrea Hamad"Mean distance: 11.78 | S | N | B | C | P |
Parents
Sign in to add mentor| Christopher K. Ober | grad student | 2004 | Cornell | |
| (The critical role of small molecules in photoresists: Fluorinated dissolution inhibitors and molecular glasses as photoresists.) | ||||
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Publications
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| Dai J, Chang SW, Hamad A, et al. (2006) Molecular glass resists for high-resolution patterning Chemistry of Materials. 18: 3404-3411 |
| Hamad AH, Houlihan FM, Seger L, et al. (2003) Evaluation of fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 558-568 |
| Pham VQ, Ferris RJ, Hamad A, et al. (2003) Positive-Tone Photoresist Process for Supercritical Carbon Dioxide Development Chemistry of Materials. 15: 4893-4895 |
| Hamad AH, Bae YC, Liu XQ, et al. (2002) Fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 4690: 477-485 |
| Schmaljohann D, Young CB, Dai J, et al. (2000) Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography. Journal of Photopolymer Science and Technology. 13: 451-458 |
| Schmaljohann D, Bae YC, Dai J, et al. (2000) Fundamental studies of fluoropolymer photoresists for 157 nm lithography Journal of Photopolymer Science and Technology. 13: 451-458 |
| Schmaljohann D, Bae YC, Weibel GL, et al. (2000) Design strategies for 157 nm single-layer photoresists: Lithographic evaluation of a poly(α-trifluoromethyl vinyl alcohol) copolymer Proceedings of Spie - the International Society For Optical Engineering. 3999: I/- |