Stephen T. Meyers, Ph.D.
Affiliations: | 2008 | Oregon State University, Corvallis, OR |
Area:
materials chemistryGoogle:
"Stephen Meyers"Mean distance: 8.69 | S | N | B | C | P |
Parents
Sign in to add mentor| Doug Keszler | grad student | 2008 | Oregon State | |
| (Aqueous chemistries for oxide electronics.) | ||||
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Publications
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| Simone DD, Mao M, Kocsis M, et al. (2016) Demonstration of an N7 integrated fab process for metal oxide EUV photoresist Proceedings of Spie. 9776 |
| Stowers J, Anderson J, Cardineau B, et al. (2016) Metal oxide EUV photoresist performance for N7 relevant patterns and processes Proceedings of Spie - the International Society For Optical Engineering. 9779 |
| Grenville A, Anderson JT, Clark BL, et al. (2015) Integrated fab process for metal oxide EUV photoresist Proceedings of Spie - the International Society For Optical Engineering. 9425 |
| Jiang K, Meyers ST, Anderson MD, et al. (2013) Functional ultrathin films and nanolaminates from aqueous solutions Chemistry of Materials. 25: 210-214 |
| Teki R, John Kadaksham A, House M, et al. (2012) Alternative smoothing techniques to mitigate EUV substrate defectivity Proceedings of Spie - the International Society For Optical Engineering. 8322 |
| Kim KM, Kim CW, Heo JS, et al. (2011) Competitive device performance of low-temperature and all-solution- processed metal-oxide thin-film transistors Applied Physics Letters. 99 |
| Weiss DN, Yuan HC, Lee BG, et al. (2010) Nanoimprinting for diffractive light trapping in solar cells Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6M98-C6M103 |
| Weiss DN, Meyers ST, Keszler DA. (2010) All-inorganic thermal nanoimprint process Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 823-828 |
| Heo JS, Kim J, Choi S, et al. (2010) 17.4L: Late-news paper: Contact resistance and process integration effects on high-performance oxide TFTs with solution-deposited semiconductor and gate dielectric layers 48th Annual Sid Symposium, Seminar, and Exhibition 2010, Display Week 2010. 1: 241-244 |
| Heo JS, Kim J, Choi S, et al. (2010) 17.4L: Late-news paper: Contact resistance and process integration effects on high-performance oxide TFTs with solution-deposited semiconductor and gate dielectric layers 48th Annual Sid Symposium, Seminar, and Exhibition 2010, Display Week 2010. 1: 241-244 |