Shintaro Yamada, Ph.D.
Affiliations: | 2000 | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
design and synthesis of functional organic materialsGoogle:
"Shintaro Yamada"Mean distance: 8.45 | S | N | B | C | P |
Parents
Sign in to add mentorC. Grant Willson | grad student | 2000 | UT Austin | |
(Design and study of advanced photoresist materials: Positive tone photoresists with reduced environmental impact and materials for 157 nm lithography.) |
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Publications
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Yamada S, Cho S, Lee JH, et al. (2004) Design and Study of Silicone-based Materials for Bilayer Resist Application Journal of Photopolymer Science and Technology. 17: 511-518 |
Yamada S, Mrozek T, Rager T, et al. (2004) Toward environmentally friendly photolithographic materials: A new class of water-soluble photoresists Macromolecules. 37: 377-384 |
Tran HV, Hung RJ, Chiba T, et al. (2002) Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Macromolecules. 35: 6539-6549 |
Tran HV, Hung RJ, Chiba T, et al. (2001) Fluoropolymer Resist Materials for 157nm Microlithography. Journal of Photopolymer Science and Technology. 14: 669-674 |
Chiba T, Hung RJ, Yamada S, et al. (2000) 157 nm Resist Materials: A Progress Report. Journal of Photopolymer Science and Technology. 13: 657-664 |
Brodsky C, Byers J, Conley W, et al. (2000) 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401 |
Yamachika M, Patterson K, Cho S, et al. (1999) Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists Journal of Photopolymer Science and Technology. 12: 553-560 |
Havard JM, Vladimirov N, Fréchet JMJ, et al. (1999) Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate Macromolecules. 32: 86-94 |