Kyle W. Patterson, Ph.D.
Affiliations: | 2000 | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
design and synthesis of functional organic materialsGoogle:
"Kyle Patterson"Mean distance: 8.45
Parents
Sign in to add mentor| C. Grant Willson | grad student | 2000 | UT Austin | |
| (Design, synthesis, and optimization of materials for 193 nm and 157 nm photoresists.) | ||||
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Publications
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| Chiba T, Hung RJ, Yamada S, et al. (2000) 157 nm Resist Materials: A Progress Report. Journal of Photopolymer Science and Technology. 13: 657-664 |
| Brodsky C, Byers J, Conley W, et al. (2000) 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401 |
| Somervell MH, Fryer DS, Osborn B, et al. (2000) Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 2551-2559 |
| Stewart MD, Patterson K, Somervell MH, et al. (2000) Organic imaging materials: a view of the future Journal of Physical Organic Chemistry. 13: 767-774 |
| Yamachika M, Patterson K, Cho S, et al. (1999) Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists Journal of Photopolymer Science and Technology. 12: 553-560 |
| Byers J, Patterson K, Cho S, et al. (1998) Recent Advancements In Cycloolefin Based Resists For ArF Lithography. Journal of Photopolymer Science and Technology. 11: 465-474 |