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Colin J. Brodsky, Ph.D.

Affiliations: 
2001 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
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"Colin Brodsky"
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C. Grant Willson grad student 2001 UT Austin
 (Graft polymerization lithography.)

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Braggin J, Brodsky C, Linnane M, et al. (2013) Strategy for yield improvement with sub-10 nm photochemical filtration Proceedings of Spie - the International Society For Optical Engineering. 8682
Buengener R, Boye C, Rhoads BN, et al. (2011) Process window centering for 22 nm lithography Ieee Transactions On Semiconductor Manufacturing. 24: 165-172
Bums S, Pfeiffer D, Mahorowala A, et al. (2006) Silicon containing polymer in applications for 193 nm high NA lithography processes Proceedings of Spie - the International Society For Optical Engineering. 6153
Skordas S, Burns RL, Goldfarb DL, et al. (2004) Rinse additives for defect suppression in 193 nm and 248 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 5376: 471-481
Goldfarb DL, Burns SD, Burns RL, et al. (2004) Rinse additives for line edge roughness control in 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 5376: 343-351
Pfeiffer D, Mahorowala A, Babich K, et al. (2003) Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond Proceedings of Spie - the International Society For Optical Engineering. 5039: 136-143
Brodsky CJ, Trinque BC, Johnson HF, et al. (2001) Advances in graft polymerization lithography Proceedings of Spie - the International Society For Optical Engineering. 4343: 415-426
Chiba T, Hung RJ, Yamada S, et al. (2000) 157 nm Resist Materials: A Progress Report. Journal of Photopolymer Science and Technology. 13: 657-664
Brodsky C, Byers J, Conley W, et al. (2000) 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401
Chiba T, Hung RJ, Yamada S, et al. (2000) 157 nm resist materials: A progress report Journal of Photopolymer Science and Technology. 13: 657-664
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