Benjamen M. Rathsack, Ph.D.

Affiliations: 
2001 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
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C. Grant Willson grad student 2001 UT Austin
 (Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition.)
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Publications

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Somervell M, Yamauchi T, Okada S, et al. (2015) Driving DSA into volume manufacturing Proceedings of Spie - the International Society For Optical Engineering. 9425
Peters BL, Rathsack B, Somervell M, et al. (2015) Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes Journal of Polymer Science, Part B: Polymer Physics. 53: 430-441
Somervell M, Yamauchi T, Okada S, et al. (2014) High-volume manufacturing equipment and processing for directed self-assembly applications Proceedings of Spie - the International Society For Optical Engineering. 9051
Torres JA, Sakajiri K, Fryer D, et al. (2014) Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes Proceedings of Spie - the International Society For Optical Engineering. 9053
Rathsack B, Somervell M, Muramatsu M, et al. (2013) Advances in directed self assembly integration and manufacturability at 300 mm Proceedings of Spie - the International Society For Optical Engineering. 8682
Schmid G, Farrell R, Xu J, et al. (2013) Fabrication of 28nm pitch Si fins with DSA lithography Proceedings of Spie - the International Society For Optical Engineering. 8680
Harukawa R, Aoki M, Cross A, et al. (2013) DSA hole defectivity analysis using advanced optical inspection tool Proceedings of Spie - the International Society For Optical Engineering. 8681
Somervell M, Gronheid R, Hooge J, et al. (2012) Comparison of directed self-assembly integrations Proceedings of Spie - the International Society For Optical Engineering. 8325
Rathsack B, Somervell M, Hooge J, et al. (2012) Pattern scaling with directed self assembly through lithography and etch process integration Proceedings of Spie - the International Society For Optical Engineering. 8323
Gronheid R, Pret AV, Rathsack B, et al. (2011) Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist Journal of Micro/Nanolithography, Mems, and Moems. 10
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