Sean D. Burns, Ph.D.
Affiliations: | 2003 | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
design and synthesis of functional organic materialsGoogle:
"Sean Burns"Mean distance: 8.45 | S | N | B | C | P |
Parents
Sign in to add mentor| C. Grant Willson | grad student | 2003 | UT Austin | |
| (Understanding fundamental mechanisms of photoresist dissolution.) | ||||
BETA: Related publications
See more...
Publications
|
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
| Xu Y, Faure T, Viswanathan R, et al. (2016) Lithographic qualification of high-Transmission mask blank for 10nm node and beyond Proceedings of Spie - the International Society For Optical Engineering. 9780 |
| Liu CCC, Franke E, Lie FL, et al. (2016) DSA patterning options for FinFET formation at 7nm node Proceedings of Spie - the International Society For Optical Engineering. 9777 |
| Guo D, Karve G, Tsutsui G, et al. (2016) FINFET technology featuring high mobility SiGe channel for 10nm and beyond Digest of Technical Papers - Symposium On Vlsi Technology. 2016 |
| Liu CC, Lie FL, Rastogi V, et al. (2015) Fin formation using graphoepitaxy DSA for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9423 |
| Seo KI, Haran B, Gupta D, et al. (2014) A 10nm platform technology for low power and high performance application featuring FINFET devices with multi workfunction gate stack on bulk and SOI Digest of Technical Papers - Symposium On Vlsi Technology |
| Guo D, Shang H, Seo K, et al. (2014) 10nm FINFET technology for low power and high performance applications Proceedings - 2014 Ieee 12th International Conference On Solid-State and Integrated Circuit Technology, Icsict 2014 |
| Mehta SS, Xu Y, Landie G, et al. (2012) Assessment of negative tone development challenges Proceedings of Spie - the International Society For Optical Engineering. 8325 |
| Landie G, Xu Y, Burns S, et al. (2011) Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond) Proceedings of Spie - the International Society For Optical Engineering. 7972 |
| Kim RH, Koay CS, Burns SD, et al. (2011) Spacer-defined double patterning for 20-nm and beyond logic BEOL technology Proceedings of Spie - the International Society For Optical Engineering. 7973 |
| Holmes SJ, Tang C, Burns S, et al. (2011) Optimization of pitch-split double patterning photoresist for applications at the 16nm node Proceedings of Spie - the International Society For Optical Engineering. 7972 |