Brian C. Trinque, Ph.D.
Affiliations: | 2003 | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
design and synthesis of functional organic materialsGoogle:
"Brian Trinque"Mean distance: 8.45
Parents
Sign in to add mentor| C. Grant Willson | grad student | 2003 | UT Austin | |
| (Synthesis, copolymerization studies and 157 nm photolithography applications of 2-trifluoromethylacrylates.) | ||||
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Publications
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| Ito H, Trinque BC, Kasai P, et al. (2008) Penultimate effect in radical copolymerization of 2- trifluoromethylacrylates Journal of Polymer Science, Part a: Polymer Chemistry. 46: 1559-1565 |
| Kim EK, Stacey NA, Smith BJ, et al. (2004) Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 131-135 |
| Jones RL, Hu T, Lin EK, et al. (2004) Formation of deprotected fuzzy blobs in chemically amplified resists Journal of Polymer Science, Part B: Polymer Physics. 42: 3063-3069 |
| Willson CG, Trinque BC. (2003) The Evolution of Materials for the Photolithographic Process Journal of Photopolymer Science and Technology. 16: 621-627 |
| Conley W, Trinque B, Miller D, et al. (2003) Negative photoresist for 157 nm microlithography: A progress report Proceedings of Spie - the International Society For Optical Engineering. 5039: 622-626 |
| Sharif I, DesMarteau D, Ford L, et al. (2003) Advances in TFE based fluoropolymers for 157nm lithography: A progress report Proceedings of Spie - the International Society For Optical Engineering. 5039: 33-42 |
| Burns S, Schmid G, Trinque B, et al. (2003) A fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry Proceedings of Spie - the International Society For Optical Engineering. 5039: 1063-1075 |
| Jones RL, Hu T, Prabhu VM, et al. (2003) Deprotection volume characteristics and line edge morphology in chemically amplified resists Proceedings of Spie - the International Society For Optical Engineering. 5039: 1031-1040 |
| Johnson HF, Ozair SN, Jamieson A, et al. (2003) Cationic graft polymerization lithography Proceedings of Spie - the International Society For Optical Engineering. 5037: 943-951 |
| Trinque BC, Chambers CR, Osborn BP, et al. (2003) Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography Journal of Fluorine Chemistry. 122: 17-26 |