Dustin G. Nest, Ph.D.

Affiliations: 
2009 University of California, Berkeley, Berkeley, CA 
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"Dustin Nest"
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David B. Graves grad student 2009 UC Berkeley
 (Experimental beam system studies of plasma-polymer interactions.)
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Publications

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Weilnboeck F, Bruce RL, Engelmann S, et al. (2010) Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 993-1004
Nest D, Chung TY, Végh JJ, et al. (2010) Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS Journal of Physics D: Applied Physics. 43
Chung TY, Nest D, Graves DB, et al. (2010) Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening Journal of Physics D: Applied Physics. 43
Bruce RL, Weilnboeck F, Lin T, et al. (2010) Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films Journal of Applied Physics. 107
Grimbergen M, Nest DG, Yu K, et al. (2009) Plasma characterization of tetra™ III chrome etch system Proceedings of Spie - the International Society For Optical Engineering. 7488
Engelmann S, Bruce RL, Weilnboeck F, et al. (2009) Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4 F 8 - And CF4 -based discharges Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 27: 1165-1179
Bruce RL, Engelmann S, Lin T, et al. (2009) Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 27: 1142-1155
Engelmann S, Bruce RL, Sumiya M, et al. (2009) Plasma-surface interactions of advanced photoresists with C4 F8 Ar discharges: Plasma parameter dependencies Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 92-106
Titus MJ, Nest DG, Chung TY, et al. (2009) Comparing 193 nm photoresist roughening in an inductively coupled plasma system and vacuum beam system Journal of Physics D: Applied Physics. 42
Titus MJ, Nest DG, Graves DB. (2009) Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist Journal of Physics D: Applied Physics. 42
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