Monica J. Titus, Ph.D.
Affiliations: | 2010 | Chemical Engineering | University of California, Berkeley, Berkeley, CA, United States |
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"Monica Titus"Mean distance: 4423.67
Parents
Sign in to add mentor| David B. Graves | grad student | 2010 | UC Berkeley | |
| (Plasma diagnostics and plasma -surface interactions in inductively coupled plasmas.) | ||||
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Publications
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| Titus MJ, Graves DB, Yamaguchi Y, et al. (2011) Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193nm photoresist Journal of Physics D: Applied Physics. 44 |
| Titus MJ, Hsu CC, Graves DB. (2010) "sensArray" voltage sensor analysis in an inductively coupled plasma Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 139-146 |
| Titus MJ, Nest DG, Chung TY, et al. (2009) Comparing 193 nm photoresist roughening in an inductively coupled plasma system and vacuum beam system Journal of Physics D: Applied Physics. 42 |
| Titus MJ, Nest DG, Graves DB. (2009) Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist Journal of Physics D: Applied Physics. 42 |
| Titus MJ, Nest D, Graves DB. (2009) Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist Applied Physics Letters. 94 |
| Titus MJ, Graves DB. (2008) Wafer heating mechanisms in a molecular gas, inductively coupled plasma: In situ, real time wafer surface measurements and three-dimensional thermal modeling Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 1154-1160 |