Gottlieb Oehrlein

Affiliations: 
Physics University of Maryland, College Park, College Park, MD 
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"Gottlieb Oehrlein"
Mean distance: 1936
 
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Li C, Hofmann T, Edinger K, et al. (2020) Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment Journal of Vacuum Science & Technology B. 38: 032208
Li C, Godyak V, Hofmann T, et al. (2020) Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching Journal of Vacuum Science & Technology A. 38: 033001
Lin K, Li C, Engelmann S, et al. (2020) Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition Journal of Vacuum Science & Technology A. 38: 032601
Zhang S, Li Y, Knoll A, et al. (2020) Mechanistic aspects of plasma-enhanced catalytic methane decomposition by time-resolved operando diffuse reflectance infrared Fourier transform spectroscopy Journal of Physics D: Applied Physics. 53: 215201
Luan P, Oehrlein GS. (2019) Characterization of Ultrathin Polymer Films Using p-polarized ATR-FTIR and Its Comparison with XPS. Langmuir : the Acs Journal of Surfaces and Colloids
Knoll AJ, Pranda A, Lee H, et al. (2019) Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures Journal of Vacuum Science & Technology B. 37: 031802
Luan P, Kondeti VSSK, Knoll AJ, et al. (2019) Effect of water vapor on plasma processing at atmospheric pressure: Polymer etching and surface modification by an Ar/H2O plasma jet Journal of Vacuum Science & Technology A. 37: 031305
Knoll AJ, Zhang S, Lai M, et al. (2019) Infrared studies of gas phase and surface processes of the enhancement of catalytic methane decomposition by low temperature plasma Journal of Physics D: Applied Physics. 52: 225201
Pranda MA, Murugesan BJ, Knoll AJ, et al. (2019) Sensitivity of tumor versus normal cell migration and morphology to cold atmospheric plasma‐treated media in varying culture conditions Plasma Processes and Polymers. 17: 1900103
Pranda A, Gutierrez Razo SA, Fourkas JT, et al. (2019) Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure Plasma Processes and Polymers. 16: 1900026
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