Yongkwan Kim, Ph.D.

Affiliations: 
2014 Chemical Engineering University of California, Berkeley, Berkeley, CA, United States 
Area:
Surface/Interfacial Science and Micro-/Nanosystems Technology
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"Yongkwan Kim"
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Parents

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Roya Maboudian grad student 2014 UC Berkeley
 (Fabrication and Characterization of Gecko-inspired Fibrillar Adhesive.)
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Publications

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Tian Y, Zhao Z, Zaghi G, et al. (2015) Tuning the Friction Characteristics of Gecko-Inspired Polydimethylsiloxane Micropillar Arrays by Embedding Fe3O4 and SiO2 Particles. Acs Applied Materials & Interfaces. 7: 13232-7
Kim Y, Chung Y, Tian Y, et al. (2014) Two-fluid wetting behavior of a hydrophobic silicon nanowire array. Langmuir : the Acs Journal of Surfaces and Colloids. 30: 13330-7
Hsia B, Kim MS, Luna LE, et al. (2014) Templated 3D ultrathin CVD graphite networks with controllable geometry: synthesis and application as supercapacitor electrodes. Acs Applied Materials & Interfaces. 6: 18413-7
Kim Y, Chung Y, Tsao A, et al. (2014) Tuning micropillar tapering for optimal friction performance of thermoplastic gecko-inspired adhesive. Acs Applied Materials & Interfaces. 6: 6936-43
Kim Y, Claus RK, Limanto F, et al. (2013) Friction characteristics of polymeric nanofiber arrays against substrates with tailored geometry. Langmuir : the Acs Journal of Surfaces and Colloids. 29: 8395-401
Kim Y, Tsao A, Lee DH, et al. (2013) Solvent-induced formation of unidirectionally curved and tilted Si nanowires during metal-assisted chemical etching Journal of Materials Chemistry C. 1: 220-224
Kim Y, Limanto F, Lee DH, et al. (2012) Role of counter-substrate surface energy in macroscale friction of nanofiber arrays. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 2922-7
Lee DH, Kim Y, Fearing RS, et al. (2011) Effect of fiber geometry on macroscale friction of ordered low-density polyethylene nanofiber arrays. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 11008-16
Lee DH, Kim Y, Doerk GS, et al. (2011) Strategies for controlling Si nanowire formation during Au-assisted electroless etching Journal of Materials Chemistry. 21: 10359-10363
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