John Daugherty

Affiliations: 
1989-1994 Chemical and Biomolecular Engineering University of California, Berkeley, Berkeley, CA 
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Huang Y, Shih H, Daugherty J, et al. (2009) Evaluation of the properties of anodized aluminum 6061 subjected to thermal cycling treatment using electrochemical impedance spectroscopy (EIS) Corrosion Science. 51: 2493-2501
Ullal SJ, Singh H, Daugherty J, et al. (2002) Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 1939-1946
Ullal SJ, Singh H, Daugherty J, et al. (2002) Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 1195-1201
Takahashi KM, Daugherty JE. (1996) Current capabilities and limitations of in situ particle monitors in silicon processing equipment Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 14: 2983-2993
Daugherty JE, Graves DB. (1995) Derivation and experimental verification of a particulate transport model for a glow discharge Journal of Applied Physics. 78: 2279-2287
Daugherty JE, Graves DB. (1993) Particulate Temperature in Radio Frequency Glow Discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 1126-1131
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