Jason J. Keleher, Ph.D.
Affiliations: | 2004 | Clarkson University, Potsdam, NY, United States |
Area:
Organic Chemistry, Materials Science EngineeringGoogle:
"Jason Keleher"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Yuzhuo Li | grad student | 2004 | Clarkson University | |
| (Development of next generation consumable technologies for chemical mechanical planarization of copper/low K devices.) | ||||
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Publications
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| Wortman-Otto KM, Graverson CF, Linhart AN, et al. (2020) Synergistic Effect of Pad “Macroporous-Reactors” on Passivation Mechanisms to Modulate Cu Chemical Mechanical Planarization (CMP) Performance Ecs Journal of Solid State Science and Technology. 9: 54005 |
| Zubi TB, Wiencek RA, Mlynarski AL, et al. (2019) Unraveling Slurry Chemistry/Nanoparticle/Polymeric Membrane Adsorption Relevant to Cu Chemical Mechanical Planarization (CMP) Filtration Applications Ecs Journal of Solid State Science and Technology. 8 |
| Rickhoff TA, Sullivan E, Werth LK, et al. (2018) A biomimetic cellulose-based composite material that incorporates the antimicrobial metal-organic framework HKUST-1 Journal of Applied Polymer Science. 136: 46978 |
| Soderquist TJ, Chesniak OM, Witt MR, et al. (2012) Evaluation of the catalytic decomposition of H2O2 through use of organo-metallic complexes--a potential link to the luminol presumptive blood test. Forensic Science International. 219: 101-5 |
| Stewart KL, Keleher JJ, Gewirth AA. (2009) Synergy of ammonium oxalate and hydrogen peroxide on the dissolution of copper at neutral pH Journal of the Electrochemical Society. 156: H595-H600 |
| Cheemalapati K, Keleher J, Li Y. (2007) Key Chemical Components in Metal CMP Slurries Microelectronic Applications of Chemical Mechanical Planarization. 201-247 |
| Keleher J, Bashant J, Heldt N, et al. (2002) Photo-catalytic preparation of silver-coated TiO2 particles for antibacterial applications World Journal of Microbiology & Biotechnology. 18: 133-139 |
| Hariharaputhiran M, Zhang J, Ramarajan S, et al. (2000) Hydroxyl radical formation in H |
| Keleher J, Zhang J, Waud S, et al. (2000) Bridging the Gap: Understanding the Chemistry of CMP The Chemical Educator. 5: 242-245 |