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Alexander D. Glew, Ph.D.

Affiliations: 
2003 Stanford University, Palo Alto, CA 
Area:
Materials Science Engineering
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Mark A. Cappelli grad student 2003 Stanford
 (Plasma deposition of diamond -like carbon and fluorinated amorphous carbon and the resultant properties and structure.)

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Glew AD, Cappelli MA. (2000) Characterization and dielectric properties of fluorinated amorphous carbon measured by capacitance-voltage response and spectroscopic ellipsometry Materials Research Society Symposium - Proceedings. 593: 341-346
Glew AD, Cappelli MA, Touzelbaev MN, et al. (1999) In situ plasma analysis, fluorine incorporation, thermostability, stress, and hardness comparison of fluorinated amorphous carbon and hydrogenated amorphous carbon thin films deposited on Si by plasma enhanced chemical vapor deposition Materials Research Society Symposium - Proceedings. 565: 285-290
Glew AD, Saha R, Kim JS, et al. (1999) Ion energy and momentum flux dependence of diamond-like carbon film synthesis in radio frequency discharges Surface and Coatings Technology. 114: 224-229
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