David E. Noga, Ph.D.
Affiliations: | 2008 | Georgia Institute of Technology, Atlanta, GA |
Area:
Polymer Chemistry, Organic Chemistry, BiochemistryGoogle:
"David Noga"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| David M. Collard | grad student | 2008 | Georgia Tech | |
| (Synthesis of functional lactide copolymers for use in biomedical applications.) | ||||
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Publications
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| Yeh WM, Noga DE, Lawson RA, et al. (2010) Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films Proceedings of Spie - the International Society For Optical Engineering. 7639 |
| Noga DE, Yeh WM, Lawson RA, et al. (2010) The use of surface modifiers to mitigate pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7639 |
| Noga DE, Yeh WM, Lawson RA, et al. (2010) Methods to explore and prevent pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7639 |
| Lawson RA, Noga DE, Cheng J, et al. (2010) Non-traditional resist designs using molecular resists: Positive tone cross-linked and non-chemically amplified molecular resists Proceedings of Spie - the International Society For Optical Engineering. 7639 |
| Lawson RA, Cheng J, Noga DE, et al. (2010) Aqueous and solvent developed negative-tone molecular resists Proceedings of Spie - the International Society For Optical Engineering. 7639 |
| Yeh WM, Noga DE, Lawson RA, et al. (2010) Comparison of positive tone versus negative tone resist pattern collapse behavior Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28 |
| Noga DE, Lawson RA, Lee CT, et al. (2009) Understanding pattern collapse in high-resolution lithography: Impact of feature width on critical stress Proceedings of Spie - the International Society For Optical Engineering. 7273 |
| Lawson RA, Noga DE, Tolbert LM, et al. (2009) Non-ionic PAG behavior under high energy exposure sources Proceedings of Spie - the International Society For Optical Engineering. 7273 |
| Lawson RA, Noga DE, Tolbert LM, et al. (2009) Nonionic photoacid generator behavior under high-energy exposure sources Journal of Micro/Nanolithography, Mems, and Moems. 8 |
| Lawson RA, Noga DE, Younkin TR, et al. (2009) Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2998-3003 |