Charles H. Winter
Affiliations: | Chemistry | Wayne State University, Detroit, MI, United States |
Area:
Inorganic ChemistryGoogle:
"Charles Winter"Mean distance: (not calculated yet)
Parents
Sign in to add mentorPaul G. Gassman | grad student | 1986 | UMN |
John A. Gladysz | post-doc | 1988 | University of Utah |
Children
Sign in to add traineeKarl R. Gust | grad student | 2002 | Wayne State |
Jayani R. Perera | grad student | 2003 | Wayne State |
Azwana R. Sadique | grad student | 2003 | Wayne State |
Charles L. Dezelah | grad student | 2004 | Wayne State |
Hani M. El-Kaderi | grad student | 2005 | Wayne State |
Shamindri M. Arachchige | grad student | 2006 | Wayne State |
Oussama M. El-Kadri | grad student | 2006 | Wayne State |
Issam Kobrsi | grad student | 2006 | Wayne State |
Likitha P. Seneviratne | grad student | 2006 | Wayne State |
Sanuja L. Pitigalaarachchige | grad student | 2008 | Wayne State |
Baburam Sedai | grad student | 2008 | Wayne State |
Monika K. Wiedmann | grad student | 2009 | Wayne State |
Mahesh C. Karunarathne | grad student | 2010 | Wayne State |
Mark J. Saly | grad student | 2010 | Wayne State |
Thomas J. Knisley | grad student | 2012 | Wayne State |
Christopher J. Snyder | grad student | 2013 | Wayne State |
Lakmal C. Kalutarage | grad student | 2014 | Wayne State |
Stefan Cwik | post-doc | 2018-2020 | Wayne State |
Jonathan Hollin | post-doc | 2018-2020 | Wayne State |
Apoorva Upadhyay | post-doc | 2018-2020 | Wayne State |
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Publications
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Jayakodiarachchi N, Liu R, Dharmadasa CD, et al. (2023) Thermal atomic layer deposition of ErO films from a volatile, thermally stable enaminolate precursor. Dalton Transactions (Cambridge, England : 2003). 52: 11096-11103 |
Cwik S, Woods KN, Perera SS, et al. (2021) Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium. Dalton Transactions (Cambridge, England : 2003). 50: 18202-18211 |
Cwik S, Woods KN, Saly MJ, et al. (2020) Thermal atomic layer deposition of ruthenium metal thin films using nonoxidative coreactants Journal of Vacuum Science & Technology A. 38: 012402 |
Blakeney KJ, Martin PD, Winter CH. (2020) A Volatile Dialane Complex from Ring Expansion of an N-Heterocyclic Carbene and Its Use in the Thermal Atomic Layer Deposition of Aluminum Metal Films Organometallics. 39: 1006-1013 |
Longo E, Wiemer C, Belli M, et al. (2020) Ferromagnetic resonance of Co thin films grown by atomic layer deposition on the Sb2Te3 topological insulator Journal of Magnetism and Magnetic Materials. 509: 166885 |
Longo E, Mantovan R, Cecchini R, et al. (2020) ALD growth of ultra-thin Co layers on the topological insulator Sb2Te3 Nano Research. 13: 570-575 |
Blakeney KJ, Martin PD, Winter CH. (2018) Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films. Dalton Transactions (Cambridge, England : 2003) |
Kerrigan MM, Klesko JP, Blakeney KJ, et al. (2018) Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films. Acs Applied Materials & Interfaces. 10: 14200-14208 |
Blakeney KJ, Ward CL, Winter CH. (2018) (Invited) Atomic Layer Deposition of Tungsten-Rich Tungsten Carbide Films Using WCl6 and AlH2(tBuNCH2CH2NMe2) as Precursors Ecs Transactions. 86: 41-51 |
Blakeney KJ, Winter CH. (2018) Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3 Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 36: 01A104 |