Charles H. Winter

Affiliations: 
Chemistry Wayne State University, Detroit, MI, United States 
Area:
Inorganic Chemistry
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"Charles Winter"
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Karl R. Gust grad student 2002 Wayne State
Jayani R. Perera grad student 2003 Wayne State
Azwana R. Sadique grad student 2003 Wayne State
Charles L. Dezelah grad student 2004 Wayne State
Hani M. El-Kaderi grad student 2005 Wayne State
Shamindri M. Arachchige grad student 2006 Wayne State
Oussama M. El-Kadri grad student 2006 Wayne State
Issam Kobrsi grad student 2006 Wayne State
Likitha P. Seneviratne grad student 2006 Wayne State
Sanuja L. Pitigalaarachchige grad student 2008 Wayne State
Baburam Sedai grad student 2008 Wayne State
Monika K. Wiedmann grad student 2009 Wayne State
Mahesh C. Karunarathne grad student 2010 Wayne State
Mark J. Saly grad student 2010 Wayne State
Thomas J. Knisley grad student 2012 Wayne State
Christopher J. Snyder grad student 2013 Wayne State
Lakmal C. Kalutarage grad student 2014 Wayne State
Stefan Cwik post-doc 2018-2020 Wayne State
Jonathan Hollin post-doc 2018-2020 Wayne State
Apoorva Upadhyay post-doc 2018-2020 Wayne State
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Publications

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Jayakodiarachchi N, Liu R, Dharmadasa CD, et al. (2023) Thermal atomic layer deposition of ErO films from a volatile, thermally stable enaminolate precursor. Dalton Transactions (Cambridge, England : 2003). 52: 11096-11103
Cwik S, Woods KN, Perera SS, et al. (2021) Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium. Dalton Transactions (Cambridge, England : 2003). 50: 18202-18211
Cwik S, Woods KN, Saly MJ, et al. (2020) Thermal atomic layer deposition of ruthenium metal thin films using nonoxidative coreactants Journal of Vacuum Science & Technology A. 38: 012402
Blakeney KJ, Martin PD, Winter CH. (2020) A Volatile Dialane Complex from Ring Expansion of an N-Heterocyclic Carbene and Its Use in the Thermal Atomic Layer Deposition of Aluminum Metal Films Organometallics. 39: 1006-1013
Longo E, Wiemer C, Belli M, et al. (2020) Ferromagnetic resonance of Co thin films grown by atomic layer deposition on the Sb2Te3 topological insulator Journal of Magnetism and Magnetic Materials. 509: 166885
Longo E, Mantovan R, Cecchini R, et al. (2020) ALD growth of ultra-thin Co layers on the topological insulator Sb2Te3 Nano Research. 13: 570-575
Blakeney KJ, Martin PD, Winter CH. (2018) Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films. Dalton Transactions (Cambridge, England : 2003)
Kerrigan MM, Klesko JP, Blakeney KJ, et al. (2018) Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films. Acs Applied Materials & Interfaces. 10: 14200-14208
Blakeney KJ, Ward CL, Winter CH. (2018) (Invited) Atomic Layer Deposition of Tungsten-Rich Tungsten Carbide Films Using WCl6 and AlH2(tBuNCH2CH2NMe2) as Precursors Ecs Transactions. 86: 41-51
Blakeney KJ, Winter CH. (2018) Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3 Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 36: 01A104
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