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Steven McClellan George

University of Colorado, Boulder, Boulder, CO, United States 
surface chemistry, thin film growth and nanostructure engineering
"Steven George"
Mean distance: 7.89


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Charles Bonner Harris grad student 1983 UC Berkeley
 (Picosecond studies of vibrational linewidth broadening in liquids)


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Jamison A. Smith grad student 2001 CU Boulder
Zachary A. Sechrist grad student 2006 CU Boulder
Xiaohua Du grad student 2007 CU Boulder
Jarod A. McCormick grad student 2007 CU Boulder
Beau B. Burton grad student 2008 CU Boulder
Dragos Seghete grad student 2010 CU Boulder
Andrew S. Cavanagh grad student 2011 CU Boulder (Physics Tree)
Aziz I. Abdulagatov grad student 2012 CU Boulder
Jacob A. Bertrand grad student 2006-2012 CU Boulder
Daniel James Higgs grad student 2016 CU Boulder
Jeffrey W. Elam post-doc CU Boulder
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Moeini B, Avval TG, Brongersma HH, et al. (2023) Area-Selective Atomic Layer Deposition of ZnO on Si\SiO Modified with Tris(dimethylamino)methylsilane. Materials (Basel, Switzerland). 16
George SM. (2020) Mechanisms of Thermal Atomic Layer Etching. Accounts of Chemical Research. 53: 1151-1160
Young MJ, Yanguas-Gil A, Letourneau S, et al. (2020) Probing the atomic-scale structure of amorphous aluminum oxide grown by atomic layer deposition. Acs Applied Materials & Interfaces
Welch BC, McIntee OM, Ode AB, et al. (2020) Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition Journal of Vacuum Science and Technology. 38: 52409
Parsons GN, Elam JW, George SM, et al. (2020) Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)] Journal of Vacuum Science & Technology A. 38: 037001
Abdulagatov AI, George SM. (2020) Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism Journal of Vacuum Science & Technology A. 38: 022607
Fischer A, Routzahn A, Lee Y, et al. (2020) Thermal etching of AlF3 and thermal atomic layer etching of Al2O3 Journal of Vacuum Science and Technology. 38: 22603
Murdzek JA, George SM. (2020) Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide Journal of Vacuum Science & Technology A. 38: 022608
Mahuli N, Cavanagh AS, George SM. (2020) Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry Journal of Vacuum Science & Technology A. 38: 022407
Lee Y, Johnson NR, George SM. (2020) Thermal Atomic Layer Etching of Gallium Oxide Using Sequential Exposures of HF and Various Metal Precursors Chemistry of Materials. 32: 5937-5948
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