Stacey F. Bent
Affiliations: | 1998- | Stanford University, Palo Alto, CA |
Area:
surface and interfacial chemistry and materials synthesisWebsite:
https://cheme.stanford.edu/people/stacey-bentGoogle:
"Stacey F. Bent"Bio:
http://bentgroup.stanford.edu/
Mean distance: 7.95 | S | N | B | C | P |
Parents
Sign in to add mentorRichard N. Zare | grad student | 1992 | Stanford | |
(Dynamics of hydrogen recombination on silicon surfaces) |
Children
Sign in to add traineeGeorge T Wang | grad student | 2002 | Stanford |
Collin K. Mui | grad student | 2003 | Stanford |
Hailan Duan | grad student | 2004 | Stanford |
Christina J. Lee | grad student | 2005 | Stanford |
Gillian A. Zaharias | grad student | 2005 | Stanford |
Michael A. Filler | grad student | 2006 | Stanford |
Junsic Hong | grad student | 2006 | Stanford |
Marcus A. Worsley | grad student | 2006 | Stanford |
Neville Z. Mehenti | grad student | 2007 | Stanford |
Xirong Jiang | grad student | 2009 | Stanford |
Paul W. Loscutoff | grad student | 2010 | Stanford |
Bonggeun Shong | grad student | 2009-2014 | Stanford |
Scott M. Geyer | post-doc | Stanford | |
Andrew V. Teplyakov | post-doc | 1996-1998 | NYU |
Chaiya Prasittichai | post-doc | 2011-2013 | Stanford |
BETA: Related publications
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Publications
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Oh IK, Sandoval TE, Liu TL, et al. (2022) Elucidating the Reaction Mechanism of Atomic Layer Deposition of AlO with a Series of Al(CH)Cl and Al(CH) Precursors. Journal of the American Chemical Society. 144: 11757-11766 |
Schneider JR, de Paula C, Lewis J, et al. (2022) The Importance of Decarbonylation Mechanisms in the Atomic Layer Deposition of High-Quality Ru Films by Zero-Oxidation State Ru(DMBD)(CO). Small (Weinheim An Der Bergstrasse, Germany). e2105513 |
Liu TL, Zeng L, Nardi KL, et al. (2021) Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition. Langmuir : the Acs Journal of Surfaces and Colloids |
Liu TL, Nardi KL, Draeger N, et al. (2020) Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition. Acs Applied Materials & Interfaces |
Richey NE, de Paula C, Bent SF. (2020) Understanding chemical and physical mechanisms in atomic layer deposition. The Journal of Chemical Physics. 152: 040902 |
Oh IK, Kim WH, Zeng L, et al. (2020) Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition. Acs Nano |
Oh IK, Zeng L, Kim JE, et al. (2020) Surface Energy Change of Atomic-Scale Metal Oxide Thin Films by Phase Transformation. Acs Nano |
Raiford JA, Oyakhire ST, Bent SF. (2020) Applications of atomic layer deposition and chemical vapor deposition for perovskite solar cells Energy and Environmental Science. 13: 1997-2023 |
Sandoval TE, Pieck F, Tonner R, et al. (2020) Effect of Hetero-Aromaticity on Adsorption of Pyrazine on the Ge(100)-2×1 Surface Journal of Physical Chemistry C |
Baker JG, Schneider JR, Raiford JA, et al. (2020) Nucleation Effects in the Atomic Layer Deposition of Nickel-Aluminum Oxide Thin Films Chemistry of Materials. 32: 1925-1936 |