Augustin Jeyakumar, Ph.D.
Affiliations: | 2004 | Georgia Institute of Technology, Atlanta, GA |
Area:
Chemical Engineering, Materials Science EngineeringGoogle:
"Augustin Jeyakumar"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Clifford L. Henderson | grad student | 2004 | Georgia Tech | |
| (Development of inorganic resists for electron beam lithography: Novel materials and simulations.) | ||||
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Publications
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| Romeo M, Finger I, Jeyakumar A, et al. (2004) Photodefinable Metal Oxide Dielectrics II: Direct Fabrication of Patterned High-k Dielectrics for Low Cost RF Capacitive MEMS Switches Mrs Proceedings. 833 |
| Barstow SJ, Jeyakumar A, Roman PJ, et al. (2004) Direct photopatterning of metal oxide structures using photosensitive metallorganics Journal of the Electrochemical Society. 151 |
| Wang G, Jeyakumar A, Papapolymerou J, et al. (2003) Photodefinable metal oxide dielectrics: A novel method for fabricating low cost RF capacitive MEMS switches Materials Research Society Symposium - Proceedings. 783: 91-96 |
| Jeyakumar A, Henderson CL, Roman P, et al. (2003) Electron beam lithography process using radiation sensitive carboxylate metalorganic precursors Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 3157-3161 |
| Ali MA, Gonsalves KE, Agrawal A, et al. (2003) A new nanocomposite resist for low and high voltage electron beam lithography Microelectronic Engineering. 70: 19-29 |
| Henderson CL, Barstow S, Jeyakumar A, et al. (2002) Novel approaches to nanopatterning: From surface monolayer initiated polymerization to hybrid organometallic-organic bilayers Materials Research Society Symposium - Proceedings. 705: 3-14 |