Xiaohua Du, Ph.D.

Affiliations: 
2007 Chemical Engineering University of Colorado, Boulder, Boulder, CO, United States 
Area:
Chemical Engineering, Physical Chemistry
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"Xiaohua Du"
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Parents

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Steven McClellan George grad student 2007 CU Boulder
 (Understanding and optimization of gas sensors based on metal oxide semiconductors.)
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Publications

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Du X, Zhang K, Holland K, et al. (2009) Chemical corrosion protection of optical components using atomic layer deposition. Applied Optics. 48: 6470-4
King DM, Johnson SI, Li J, et al. (2009) Atomic layer deposition of quantum-confined ZnO nanostructures. Nanotechnology. 20: 195401
King DM, Du X, Cavanagh AS, et al. (2008) Quantum confinement in amorphous TiO(2) films studied via atomic layer deposition. Nanotechnology. 19: 445401
Du X, Du Y, George SM. (2008) CO gas sensing by ultrathin tin oxide films grown by atomic layer deposition using transmission FTIR spectroscopy. Journal of Physical Chemistry A. 112: 9211-9219
Zhan GD, Du X, King DM, et al. (2008) Atomic layer deposition on bulk quantities of surfactant-modified single-walled carbon nanotubes Journal of the American Ceramic Society. 91: 831-835
Cooper R, Upadhyaya HP, Minton TK, et al. (2008) Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings Thin Solid Films. 516: 4036-4039
Du X, George SM. (2008) Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition Sensors and Actuators B-Chemical. 135: 152-160
Du X, Du Y, George SM. (2005) In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques Journal of Vacuum Science and Technology. 23: 581-588
Du Y, Du X, George SM. (2005) SiO2 film growth at low temperatures by catalyzed atomic layer deposition in a viscous flow reactor Thin Solid Films. 491: 43-53
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