Xiaohua Du, Ph.D.
Affiliations: | 2007 | Chemical Engineering | University of Colorado, Boulder, Boulder, CO, United States |
Area:
Chemical Engineering, Physical ChemistryGoogle:
"Xiaohua Du"Mean distance: (not calculated yet)
Parents
Sign in to add mentorSteven McClellan George | grad student | 2007 | CU Boulder | |
(Understanding and optimization of gas sensors based on metal oxide semiconductors.) |
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Publications
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Du X, Zhang K, Holland K, et al. (2009) Chemical corrosion protection of optical components using atomic layer deposition. Applied Optics. 48: 6470-4 |
King DM, Johnson SI, Li J, et al. (2009) Atomic layer deposition of quantum-confined ZnO nanostructures. Nanotechnology. 20: 195401 |
King DM, Du X, Cavanagh AS, et al. (2008) Quantum confinement in amorphous TiO(2) films studied via atomic layer deposition. Nanotechnology. 19: 445401 |
Du X, Du Y, George SM. (2008) CO gas sensing by ultrathin tin oxide films grown by atomic layer deposition using transmission FTIR spectroscopy. Journal of Physical Chemistry A. 112: 9211-9219 |
Zhan GD, Du X, King DM, et al. (2008) Atomic layer deposition on bulk quantities of surfactant-modified single-walled carbon nanotubes Journal of the American Ceramic Society. 91: 831-835 |
Cooper R, Upadhyaya HP, Minton TK, et al. (2008) Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings Thin Solid Films. 516: 4036-4039 |
Du X, George SM. (2008) Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition Sensors and Actuators B-Chemical. 135: 152-160 |
Du X, Du Y, George SM. (2005) In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques Journal of Vacuum Science and Technology. 23: 581-588 |
Du Y, Du X, George SM. (2005) SiO2 film growth at low temperatures by catalyzed atomic layer deposition in a viscous flow reactor Thin Solid Films. 491: 43-53 |