Jaroslav Flidr
Affiliations: | 1999 | Nuclear Engineering | Cornell University, Ithaca, NY, United States |
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| Flidr J, Huang YC, Hines MA. (1999) An atomistic mechanism for the production of two- and three-dimensional etch hillocks on Si(111) surfaces Journal of Chemical Physics. 111: 6970-6981 |
| Flidr J, Huang YC, Newton TA, et al. (1999) The formation of etch hillocks during step-flow etching of Si(111) Chemical Physics Letters. 302: 85-90 |
| Huang YC, Flidr J, Newton TA, et al. (1998) Effects of dynamic step-step repulsion and autocatalysis on the morphology of etched Si(111) surfaces Physical Review Letters. 80: 4462-4465 |
| Huang YC, Flidr J, Newton TA, et al. (1998) Dynamic repulsion of surface steps during step flow etching: Controlling surface roughness with chemistry Journal of Chemical Physics. 109: 5025-5035 |
| Flidr J, Huang YC, Newton TA, et al. (1998) Extracting site-specific reaction rates from steady state surface morphologies: Kinetic Monte Carlo simulations of aqueous Si(111) etching Journal of Chemical Physics. 108: 5542-5553 |