Ulrich Gösele, Ph.D.

Max Planck Institute of Microstructure Physics 
"Ulrich Gösele"
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Reiche M, Gösele U. (2012) Direct Wafer Bonding Handbook of Wafer Bonding. 81-100
Huang Z, Geyer N, Werner P, et al. (2011) Metal-assisted chemical etching of silicon: A review Advanced Materials. 23: 285-308
Mathwig K, Geilhufe M, Müller F, et al. (2011) Bias-assisted KOH etching of macroporous silicon membranes Journal of Micromechanics and Microengineering. 21
Chen X, Berger A, Ge M, et al. (2011) Silica nanotubes by templated thermolysis of silicon tetraacetate Chemistry of Materials. 23: 3129-3131
Reiche M, Moutanabbir O, Hoentschel J, et al. (2011) Strained Silicon Nanodevices Mechanical Stress On the Nanoscale: Simulation, Material Systems and Characterization Techniques. 131-150
Szeghalmi A, Sklarek K, Helgert M, et al. (2010) Flexible replication technique for high-aspect-ratio nanostructures. Small (Weinheim An Der Bergstrasse, Germany). 6: 2701-7
Lee J, Berger A, Cagnon L, et al. (2010) Disproportionation of thermoelectric bismuth telluride nanowires as a result of the annealing process. Physical Chemistry Chemical Physics : Pccp. 12: 15247-50
Ou X, Kanungo PD, Kögler R, et al. (2010) Three-dimensional carrier profi ling of individual si nanowires by scanning spreading resistance microscopy Advanced Materials. 22: 4020-4024
Bruschi L, Mistura G, Liu L, et al. (2010) Capillary condensation and evaporation in alumina nanopores with controlled modulations. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 11894-8
Yang RB, Zakharov N, Moutanabbir O, et al. (2010) The transition between conformal atomic layer epitaxy and nanowire growth. Journal of the American Chemical Society. 132: 7592-4
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