Jason Coyle

Carleton University, Ottawa, Canada 
"Jason Coyle"
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Chen B, Coyle JP, Barry ST, et al. (2019) Rational Design of Metalorganic Complexes for the Deposition of Solid Films: Growth of Metallic Copper with Amidinate Precursors Chemistry of Materials. 31: 1681-1687
Yao Y, Coyle JP, Barry ST, et al. (2017) Effect of the nature of the substrate on the surface chemistry of atomic layer deposition precursors. The Journal of Chemical Physics. 146: 052806
Chen B, Duan Y, Yao Y, et al. (2017) Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 35: 01B124
Coyle JP, Sirianni ER, Korobkov I, et al. (2017) Study of Monomeric Copper Complexes Supported by N-Heterocyclic and Acyclic Diamino Carbenes Organometallics. 36: 2800-2810
Yao Y, Coyle JP, Barry ST, et al. (2016) Thermal Decomposition of Copper Iminopyrrolidinate Atomic Layer Deposition (ALD) Precursors on Silicon Oxide Surfaces Journal of Physical Chemistry C. 120: 14149-14156
Griffiths MBE, Koponen SE, Mandia DJ, et al. (2015) Surfactant Directed Growth of Gold Metal Nanoplates by Chemical Vapor Deposition Chemistry of Materials. 27: 6116-6124
Hagen DJ, Povey IM, Rushworth S, et al. (2014) Atomic layer deposition of Cu with a carbene-stabilized Cu(i) silylamide Journal of Materials Chemistry C. 2: 9205-9214
Coyle JP, Pallister PJ, Kurek A, et al. (2013) Copper iminopyrrolidinates: a study of thermal and surface chemistry. Inorganic Chemistry. 52: 910-7
Coyle JP, Gordon PG, Wells AP, et al. (2013) Thermally robust gold and silver iminopyrrolidinates for chemical vapor deposition of metal films Chemistry of Materials. 25: 4566-4573
Kim T, Yao Y, Coyle JP, et al. (2013) Thermal chemistry of Cu(I)-iminopyrrolidinate and Cu(I)-guanidinate atomic layer deposition (ALD) precursors on Ni(110) single-crystal surfaces Chemistry of Materials. 25: 3630-3639
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