Year |
Citation |
Score |
2008 |
Ajmera HM, Heitsch AT, Bchir OJ, Norton DP, Reitfort LL, McElwee-White L, Anderson TJ. Deposition of WNxCy using the allylimido complexes Cl4(RCN)W(NC3H5): Effect of NH3 on film properties Journal of the Electrochemical Society. 155: H829-H835. DOI: 10.1149/1.2961053 |
0.601 |
|
2005 |
Bchir OJ, Green KM, Ajmera HM, Zapp EA, Anderson TJ, Brooks BC, Reitfort LL, Powell DH, Abboud KA, McElwee-White L. Tungsten allylimido complexes Cl4(RCN)W(NC3H5) as single-source CVD precursors for WNxCy thin films. Correlation of precursor fragmentation to film properties. Journal of the American Chemical Society. 127: 7825-33. PMID 15913372 DOI: 10.1021/Ja043799D |
0.595 |
|
2004 |
Bchir OJ, Kim KC, Andersen TJ, Craciun V, Brooks BC, McElwee-White L. Effect of NH3 on film properties of MOCVD tungsten nitride from Cl4(CH2CN)W(NiPr) Journal of the Electrochemical Society. 151: G697-G703. DOI: 10.1149/1.1789412 |
0.835 |
|
2004 |
Bchir OJ, Green KM, Hlad MS, Anderson TJ, Brooks BC, McElwee-White L. Tungsten nitride thin films deposited by MOCVD: Sources of carbon and effects on film structure and stoichiometry Journal of Crystal Growth. 261: 280-288. DOI: 10.1016/J.Jcrysgro.2003.11.018 |
0.767 |
|
2003 |
Bchir OJ, Green KM, Hlad MS, Anderson TJ, Brooks BC, Wilder CB, Powell DH, McElwee-White L. Cl4(PhCN)W(NPh) as a single-source MOCVD precursor for deposition of tungsten nitride (WNx) thin films Journal of Organometallic Chemistry. 684: 338-350. DOI: 10.1016/S0022-328X(03)00769-1 |
0.854 |
|
2003 |
Bchir OJ, Johnston SW, Cuadra AC, Anderson TJ, Ortiz CG, Brooks BC, Powell DH, McElwee-White L. MOCVD of tungsten nitride (WNx) thin films from the imido complex Cl4(CH3CN)W(NiPr) Journal of Crystal Growth. 249: 262-274. DOI: 10.1016/S0022-0248(02)02145-0 |
0.815 |
|
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