Mark P. Stoykovich, Ph.D. - Publications

Affiliations: 
University of Wisconsin, Madison, Madison, WI 

42 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Kambe Y, Arges CG, Czaplewski DA, Dolejsi M, Krishnan S, Stoykovich MP, de Pablo JJ, Nealey PF. Role of Defects in Ion Transport in Block Copolymer Electrolytes. Nano Letters. PMID 31250653 DOI: 10.1021/acs.nanolett.9b01758  1
2018 Chen X, Zhou C, Chen SJ, Craig GSW, Rincon-Delgadillo P, Dazai T, Miyagi K, Maehashi T, Yamazaki A, Gronheid R, Stoykovich M, Nealey PF. Ionic liquids as additives to polystyrene-b-poly(methyl methacrylate) enabling directed self-assembly of patterns with sub-10 nm features. Acs Applied Materials & Interfaces. PMID 29667409 DOI: 10.1021/acsami.8b02990  1
2018 Love DM, Kim K, Goodrich JT, Fairbanks BD, Worrell BT, Stoykovich MP, Musgrave CB, Bowman CN. Amine Induced Retardation of the Radical-Mediated Thiol-Ene Reaction via the Formation of Metastable Disulfide Radical Anions. The Journal of Organic Chemistry. PMID 29390175 DOI: 10.1021/acs.joc.8b00143  0.36
2016 Morrissey KL, He C, Chapman RZ, Żołnierowski L, Stoykovich MP. Polyamphoteric flocculants for the enhanced separation of cellular suspensions. Acta Biomaterialia. PMID 27039976 DOI: 10.1016/j.actbio.2016.03.042  1
2015 Shen L, He C, Qiu J, Lee SM, Kalita A, Cronin SB, Stoykovich MP, Yoon J. Nanostructured Silicon Photocathodes for Solar Water Splitting Patterned by the Self-Assembly of Lamellar Block Copolymers. Acs Applied Materials & Interfaces. PMID 26575400 DOI: 10.1021/acsami.5b08661  1
2015 Funk N, Vera M, Szewciw LJ, Barthelat F, Stoykovich MP, Vernerey FJ. Bioinspired fabrication and characterization of a synthetic fish skin for the protection of soft materials. Acs Applied Materials & Interfaces. 7: 5972-83. PMID 25723101 DOI: 10.1021/acsami.5b00258  1
2015 Morrissey KL, He C, Wong MH, Zhao X, Chapman RZ, Bender SL, Prevatt WD, Stoykovich MP. Charge-tunable polymers as reversible and recyclable flocculants for the dewatering of microalgae. Biotechnology and Bioengineering. 112: 74-83. PMID 25060233 DOI: 10.1002/bit.25340  1
2015 Rice KP, Paterson AS, Stoykovich MP. Nanoscale kirkendall effect and oxidation kinetics in copper nanocrystals characterized by real-time, in situ optical spectroscopy Particle and Particle Systems Characterization. 32: 373-380. DOI: 10.1002/ppsc.201400155  1
2014 MacConaghy KI, Geary CI, Kaar JL, Stoykovich MP. Photonic crystal kinase biosensor. Journal of the American Chemical Society. 136: 6896-9. PMID 24761969 DOI: 10.1021/ja5031062  1
2014 Rice KP, Keller RR, Stoykovich MP. Specimen-thickness effects on transmission Kikuchi patterns in the scanning electron microscope. Journal of Microscopy. 254: 129-36. PMID 24660836 DOI: 10.1111/jmi.12124  1
2013 Rice KP, Saunders AE, Stoykovich MP. Seed-mediated growth of shape-controlled wurtzite CdSe nanocrystals: platelets, cubes, and rods. Journal of the American Chemical Society. 135: 6669-76. PMID 23544768 DOI: 10.1021/ja402240m  1
2012 Rice KP, Saunders AE, Stoykovich MP. Classifying the shape of colloidal nanocrystals by complex fourier descriptor analysis Crystal Growth and Design. 12: 825-831. DOI: 10.1021/cg201156q  1
2011 Rice KP, Walker EJ, Stoykovich MP, Saunders AE. Solvent-dependent surface plasmon response and oxidation of copper nanocrystals Journal of Physical Chemistry C. 115: 1793-1799. DOI: 10.1021/jp110483z  1
2010 Stoykovich MP, Daoulas KC, Müller M, Kang H, De Pablo JJ, Nealey PF. Remediation of line edge roughness in chemical nanopatterns bythe directed assembly of overlying block copolymer films Macromolecules. 43: 2334-2342. DOI: 10.1021/ma902494v  1
2009 Liu G, Stoykovich MP, Ji S, Stuen KO, Craig GSW, Nealey PF. Phase behavior and dimensional scaling of symmetric block copolymer-homopolymer ternary blends in thin films Macromolecules. 42: 3063-3072. DOI: 10.1021/ma802773h  1
2008 Ko HC, Stoykovich MP, Song J, Malyarchuk V, Choi WM, Yu CJ, Geddes JB, Xiao J, Wang S, Huang Y, Rogers JA. A hemispherical electronic eye camera based on compressible silicon optoelectronics. Nature. 454: 748-53. PMID 18685704 DOI: 10.1038/nature07113  1
2008 Kang H, Detcheverry FA, Mangham AN, Stoykovich MP, Daoulas KCh, Hamers RJ, Müller M, de Pablo JJ, Nealey PF. Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites. Physical Review Letters. 100: 148303. PMID 18518077 DOI: 10.1103/PhysRevLett.100.148303  1
2008 Daoulas KCh, Müller M, Stoykovich MP, Kang H, de Pablo JJ, Nealey PF. Directed copolymer assembly on chemical substrate patterns: a phenomenological and single-chain-in-mean-field simulations study of the influence of roughness in the substrate pattern. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 1284-95. PMID 18067336 DOI: 10.1021/la702482z  1
2008 Stoykovich MP, Yoshimoto K, Nealey PF. Mechanical properties of polymer nanostructures: Measurements based on deformation in response to capillary forces Applied Physics a: Materials Science and Processing. 90: 277-283. DOI: 10.1007/s00339-007-4262-8  1
2007 Stoykovich MP, Kang H, Daoulas KCh, Liu G, Liu CC, de Pablo JJ, Müller M, Nealey PF. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. Acs Nano. 1: 168-75. PMID 19206647 DOI: 10.1021/nn700164p  1
2007 Keymeulen HR, Diaz A, Solak HH, David C, Pfeiffer F, Patterson BD, Van Der Veen JF, Stoykovich MP, Nealey PF. Measurement of the x-ray dose-dependent glass transition temperature of structured polymer films by x-ray diffraction Journal of Applied Physics. 102. DOI: 10.1063/1.2752548  1
2007 Edwards EW, Müller M, Stoykovich MP, Solak HH, De Pablo JJ, Nealey PF. Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates Macromolecules. 40: 90-96. DOI: 10.1021/ma0607564  1
2007 La YH, Stoykovich MP, Park SM, Nealey PF. Directed assembly of cylinder-forming block copolymers into patterned structures to fabricate arrays of spherical domains and nanoparticles Chemistry of Materials. 19: 4538-4544. DOI: 10.1021/cm071208n  1
2007 Ekinci Y, Solak HH, Padeste C, Gobrecht J, Stoykovich MP, Nealey PF. 20 nm Line/space patterns in HSQ fabricated by EUV interference lithography Microelectronic Engineering. 84: 700-704. DOI: 10.1016/j.mee.2007.01.213  1
2007 Park SM, Stoykovich MP, Ruiz R, Zhang Y, Black CT, Nealey PF. Directed assembly of lamellae-forming block copolymers by using chemically and topographically patterned substrates Advanced Materials. 19: 607-611. DOI: 10.1002/adma.200601421  1
2006 Stoykovich MP, Edwards EW, Solak HH, Nealey PF. Phase behavior of symmetric ternary block copolymer-homopolymer blends in thin films and on chemically patterned surfaces. Physical Review Letters. 97: 147802. PMID 17155291 DOI: 10.1103/PhysRevLett.97.147802  1
2006 Daoulas KCh, Müller M, Stoykovich MP, Park SM, Papakonstantopoulos YJ, de Pablo JJ, Nealey PF, Solak HH. Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry. Physical Review Letters. 96: 036104. PMID 16486737 DOI: 10.1103/PhysRevLett.96.036104  1
2006 Edwards EW, Stoykovich MP, Nealey PF, Solak HH. Binary blends of diblock copolymers as an effective route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 340-344. DOI: 10.1116/1.2151226  1
2006 Kim SO, Kim BH, Kim K, Koo CM, Stoykovich MP, Nealey PF, Solak HH. Defect structure in thin films of a lamellar block copolymer self-assembled on neutral homogeneous and chemically nanopatterned surfaces Macromolecules. 39: 5466-5470. DOI: 10.1021/ma060087u  1
2006 Edwards EW, Stoykovich MP, Solak HH, Nealey PF. Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces Macromolecules. 39: 3598-3607. DOI: 10.1021/ma052335c  1
2006 Stoykovich MP, Nealey PF. Block copolymers and conventional lithography Materials Today. 9: 20-29. DOI: 10.1016/S1369-7021(06)71619-4  1
2006 Daoulas KC, Müller M, Stoykovich MP, Papakonstantopoulos YJ, De Pablo JJ, Nealey PF, Park SM, Solak HH. Directed assembly of copolymer materials on patterned substrates: Balance of simple symmetries in complex structures Journal of Polymer Science, Part B: Polymer Physics. 44: 2589-2604. DOI: 10.1002/polb.20904  1
2005 Stoykovich MP, Müller M, Kim SO, Solak HH, Edwards EW, de Pablo JJ, Nealey PF. Directed assembly of block copolymer blends into nonregular device-oriented structures. Science (New York, N.Y.). 308: 1442-6. PMID 15933196 DOI: 10.1126/science.1111041  1
2005 Junarsa I, Stoykovich MP, Nealey PF, Ma Y, Cerrina F, Solak HH. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 138-143. DOI: 10.1116/1.1849213  1
2005 Edwards EW, Stoykovich MP, Müller M, Solak HH, De Pablo JJ, Nealey PF. Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates Journal of Polymer Science, Part B: Polymer Physics. 43: 3444-3459. DOI: 10.1002/polb.20643  1
2005 Stoykovich MP. Directed self-assembly of block copolymers on nanopatterned surfaces Aiche Annual Meeting, Conference Proceedings. 3342.  0.56
2005 Nealey PF, Edwards EW, Müller M, Stoykovich MP, Solak HH, De Pablo JJ. Self-assembling resists for nanolithography Technical Digest - International Electron Devices Meeting, Iedm. 2005: 356-359.  1
2005 Stoykovich MP, Mueller M, Kim SO, Solak HH, Edwards EW, De Pablo JJ, Nealey PF. Directed self-assembly of block copolymer blends into nonregular device-oriented structures Aiche Annual Meeting, Conference Proceedings. 5009.  1
2004 Junarsa I, Stoykovich MP, Yoshimoto K, Nealey PF. The use of surfactant in the rinse to improve collapse behavior of chemically amplified photoresists Proceedings of Spie - the International Society For Optical Engineering. 5376: 842-849. DOI: 10.1117/12.533776  1
2004 Yoshimoto K, Stoykovich MP, Cao HB, De Pablo JJ, Nealey PF, Drugan WJ. A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties Journal of Applied Physics. 96: 1857-1865. DOI: 10.1063/1.1768614  1
2003 Kim SO, Solak HH, Stoykovich MP, Ferrier NJ, De Pablo JJ, Nealey PF. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates. Nature. 424: 411-4. PMID 12879065 DOI: 10.1038/nature01775  1
2003 Stoykovich MP, Cao HB, Yoshimoto K, Ocola LE, Nealey PF. Deformation of nanoscopic polymer structures in response to well-defined capillary forces Advanced Materials. 15: 1180-1184. DOI: 10.1002/adma.200305059  1
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