Chi-Chun Liu, Ph.D. - Publications

Affiliations: 
University of Wisconsin, Madison, Madison, WI 

16 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2017 Chang TH, Xiong S, Liu CC, Liu D, Nealey PF, Ma Z. The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning. Macromolecular Rapid Communications. PMID 28749034 DOI: 10.1002/marc.201700285  0.8
2016 Chang TH, Xiong S, Jacobberger RM, Mikael S, Suh HS, Liu CC, Geng D, Wang X, Arnold MS, Ma Z, Nealey PF. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific Reports. 6: 31407. PMID 27528258 DOI: 10.1038/srep31407  0.8
2016 Wan L, Ji S, Liu CC, Craig GS, Nealey PF. Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates. Soft Matter. PMID 26891026 DOI: 10.1039/c5sm02829a  0.44
2014 Tsai H, Pitera JW, Miyazoe H, Bangsaruntip S, Engelmann SU, Liu CC, Cheng JY, Bucchignano JJ, Klaus DP, Joseph EA, Sanders DP, Colburn ME, Guillorn MA. Two-dimensional pattern formation using graphoepitaxy of PS-b-PMMA block copolymers for advanced FinFET device and circuit fabrication. Acs Nano. 8: 5227-32. PMID 24670216 DOI: 10.1021/nn501300b  0.8
2013 Dai Q, Chen Y, Liu CC, Rettner CT, Holmdahl B, Gleixner S, Chung R, Pitera JW, Cheng J, Nelson A. Programmable nanoparticle ensembles via high-throughput directed self-assembly. Langmuir : the Acs Journal of Surfaces and Colloids. 29: 3567-74. PMID 23458256 DOI: 10.1021/la4000457  0.8
2013 Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp LE, Topuria T, Arellano N, Sanders DP. Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy. Acs Nano. 7: 276-85. PMID 23199006 DOI: 10.1021/nn303974j  0.8
2012 Onses MS, Liu CC, Thode CJ, Nealey PF. Highly selective immobilization of Au nanoparticles onto isolated and dense nanopatterns of poly(2-vinyl pyridine) brushes down to single-particle resolution. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 7299-307. PMID 22497347 DOI: 10.1021/la300552w  0.8
2011 Onses MS, Pathak P, Liu CC, Cerrina F, Nealey PF. Localization of multiple DNA sequences on nanopatterns. Acs Nano. 5: 7899-909. PMID 21899356 DOI: 10.1021/nn2021277  0.8
2011 Ji S, Nagpal U, Liao W, Liu CC, de Pablo JJ, Nealey PF. Three-dimensional directed assembly of block copolymers together with two-dimensional square and rectangular nanolithography. Advanced Materials (Deerfield Beach, Fla.). 23: 3692-7. PMID 21735489 DOI: 10.1002/adma.201101813  0.8
2011 Päivänranta B, Sahoo PK, Tocce E, Auzelyte V, Ekinci Y, Solak HH, Liu CC, Stuen KO, Nealey PF, David C. Nanofabrication of broad-band antireflective surfaces using self-assembly of block copolymers. Acs Nano. 5: 1860-4. PMID 21323325 DOI: 10.1021/nn103361d  0.8
2010 Han E, Kang H, Liu CC, Nealey PF, Gopalan P. Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates. Advanced Materials (Deerfield Beach, Fla.). 22: 4325-9. PMID 20806266 DOI: 10.1002/adma.201001669  0.8
2010 Ji S, Liu CC, Liu G, Nealey PF. Molecular transfer printing using block copolymers. Acs Nano. 4: 599-609. PMID 20041629 DOI: 10.1021/nn901342j  0.8
2010 Hong AJ, Liu CC, Wang Y, Kim J, Xiu F, Ji S, Zou J, Nealey PF, Wang KL. Metal nanodot memory by self-assembled block copolymer lift-off. Nano Letters. 10: 224-9. PMID 19957954 DOI: 10.1021/nl903340a  0.8
2009 Hirai T, Leolukman M, Liu CC, Han E, Kim YJ, Ishida Y, Hayakawa T, Kakimoto MA, Nealey PF, Gopalan P. One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. Advanced Materials (Deerfield Beach, Fla.). 21: 4334-8. PMID 26042939 DOI: 10.1002/adma.200900518  0.8
2009 Morin SA, La YH, Liu CC, Streifer JA, Hamers RJ, Nealey PF, Jin S. Assembly of nanocrystal arrays by block-copolymer-directed nucleation. Angewandte Chemie (International Ed. in English). 48: 2135-9. PMID 19199322 DOI: 10.1002/anie.200805471  0.8
2007 Stoykovich MP, Kang H, Daoulas KCh, Liu G, Liu CC, de Pablo JJ, Müller M, Nealey PF. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. Acs Nano. 1: 168-75. PMID 19206647 DOI: 10.1021/nn700164p  0.8
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