Thomas Cardolaccia, Ph.D. - Publications

Affiliations: 
University of Florida, Gainesville, Gainesville, FL, United States 
Area:
organic chemistry, materials chemistry

18 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2012 Lee SH, Park JK, Cardolaccia T, Sun J, Andes C, O'connell K, Barclay GG. Understanding dissolution behavior of 193-nm photoresists in organic solvent developers. Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.918045  0.96
2012 Reilly M, Andes C, Cardolaccia T, Kim YS, Park JK. Evolution of negative tone development photoresists for ArF lithography Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916633  0.96
2011 Koposov AY, Cardolaccia T, Albert V, Badaeva E, Kilina S, Meyer TJ, Tretiak S, Sykora M. Formation of assemblies comprising Ru-polypyridine complexes and CdSe nanocrystals studied by ATR-FTIR spectroscopy and DFT modeling Langmuir. 27: 8377-8383. PMID 21627143 DOI: 10.1021/la200531s  0.96
2011 Knight TE, Goldstein AP, Brennaman MK, Cardolaccia T, Pandya A, DeSimone JM, Meyer TJ. Influence of the fluid-to-film transition on photophysical properties of MLCT excited states in a polymerizable dimethacrylate fluid. The Journal of Physical Chemistry. B. 115: 64-70. PMID 21155553 DOI: 10.1021/jp107077t  0.96
2011 Bae YC, Lee SH, Bell R, Park JK, Cardolaccia T, Liu Y, Sun J, Andes C, Kim YS, Barclay GG. Effect of molecular weights of 193nm resist polymers on the negative tone development process Journal of Photopolymer Science and Technology. 24: 211-217. DOI: 10.2494/photopolymer.24.211  0.96
2011 Fouchier M, Pargon E, Azarnouche L, Menguelti K, Joubert O, Cardolaccia T, Bae YC. Vacuum ultra violet absorption spectroscopy of 193 nm photoresists Applied Physics a: Materials Science and Processing. 105: 399-405. DOI: 10.1007/s00339-011-6553-3  0.96
2011 Koposov AY, Szymanski P, Cardolaccia T, Meyer TJ, Klimov VI, Sykora M. Electronic properties and structure of assemblies of CdSe nanocrystal quantum dots and Ru-polypyridine complexes probed by steady state and time-resolved photoluminescence Advanced Functional Materials. 21: 3159-3168. DOI: 10.1002/adfm.201100415  0.96
2010 Bae YC, Liu Y, Cardolaccia T, Bell R, Spizuoco K, Barclay GG. Advanced patterning solutions based on the "Shrink Process Assisted by Double Exposure" (SPADE) Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848047  0.96
2010 Derrough S, Pikon A, Sourd C, Guérin I, Simon J, Gaugiran S, Cardolaccia T, Liu Y, Trefonas P, Barclay G, Bae YC. Thermal characterization of materials for double patterning Microelectronic Engineering. 87: 997-1000. DOI: 10.1016/j.mee.2009.11.117  0.96
2009 Bae YC, Liu Y, Cardolaccia T, Spizuoco K, Bell R, Joesten L, Pikon A, Reilly M, Ablaza S, Trefonas P, Barclay GG. Advanced patterning solutions based on double exposure: Double patterning and beyond Proceedings of Spie - the International Society For Optical Engineering. 7520. DOI: 10.1117/12.840461  0.96
2009 Bae YC, Liu Y, Cardolaccia T, McDermott JC, Trefonas P, Spizuoco K, Reilly M, Pikon A, Joesten L, Zhang GG, Barclay GG, Simon J, Gaugiran S. Materials for single-etch double patterning process: Surface curing agent and thermal cure resist Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814274  0.96
2009 Perret D, Simon J, Gaugiran S, Cutler C, Cardolaccia T, Pikon A, Guerin I, Lapeyre C, Derrough S, Szmanda C, Trefonas P. Materials for double patterning strategies: Development and application Microelectronic Engineering. 86: 757-760. DOI: 10.1016/j.mee.2009.01.051  0.96
2008 Liu F, Concepcion JJ, Jurss JW, Cardolaccia T, Templeton JL, Meyer TJ. Mechanisms of water oxidation from the blue dimer to photosystem II. Inorganic Chemistry. 47: 1727-52. PMID 18330966 DOI: 10.1021/ic701249s  0.96
2008 Cardolaccia T, Li Y, Schanze KS. Phosphorescent platinum acetylide organogelators. Journal of the American Chemical Society. 130: 2535-45. PMID 18232686 DOI: 10.1021/ja0765316  0.96
2007 Cardolaccia T, Funston AM, Kose ME, Keller JM, Miller JR, Schanze KS. Radical ion states of platinum acetylide oligomers. The Journal of Physical Chemistry. B. 111: 10871-80. PMID 17718472 DOI: 10.1021/jp0737552  0.96
2007 Liu F, Cardolaccia T, Hornstein BJ, Schoonover JR, Meyer TJ. Electrochemical oxidation of water by an adsorbed mu-oxo-bridged Ru complex. Journal of the American Chemical Society. 129: 2446-7. PMID 17284036 DOI: 10.1021/ja068630+  0.96
2005 Zhao X, Cardolaccia T, Farley RT, Abboud KA, Schanze KS. A platinum acetylide polymer with sterically demanding substituents: effect of aggregation on the triplet excited state. Inorganic Chemistry. 44: 2619-27. PMID 15819546 DOI: 10.1021/ic048961s  0.96
2005 Silverman EE, Cardolaccia T, Zhao X, Kim KY, Haskins-Glusac K, Schanze KS. The triplet state in Pt-acetylide oligomers, polymers and copolymers Coordination Chemistry Reviews. 249: 1491-1500. DOI: 10.1016/j.ccr.2004.11.020  0.96
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