| Year |
Citation |
Score |
| 2011 |
Koposov AY, Cardolaccia T, Albert V, Badaeva E, Kilina S, Meyer TJ, Tretiak S, Sykora M. Formation of assemblies comprising Ru-polypyridine complexes and CdSe nanocrystals studied by ATR-FTIR spectroscopy and DFT modeling Langmuir. 27: 8377-8383. PMID 21627143 DOI: 10.1021/La200531S |
0.317 |
|
| 2011 |
Knight TE, Goldstein AP, Brennaman MK, Cardolaccia T, Pandya A, DeSimone JM, Meyer TJ. Influence of the fluid-to-film transition on photophysical properties of MLCT excited states in a polymerizable dimethacrylate fluid. The Journal of Physical Chemistry. B. 115: 64-70. PMID 21155553 DOI: 10.1021/Jp107077T |
0.418 |
|
| 2011 |
Koposov AY, Szymanski P, Cardolaccia T, Meyer TJ, Klimov VI, Sykora M. Electronic properties and structure of assemblies of CdSe nanocrystal quantum dots and Ru-polypyridine complexes probed by steady state and time-resolved photoluminescence Advanced Functional Materials. 21: 3159-3168. DOI: 10.1002/Adfm.201100415 |
0.377 |
|
| 2008 |
Liu F, Concepcion JJ, Jurss JW, Cardolaccia T, Templeton JL, Meyer TJ. Mechanisms of water oxidation from the blue dimer to photosystem II. Inorganic Chemistry. 47: 1727-52. PMID 18330966 DOI: 10.1021/Ic701249S |
0.303 |
|
| 2008 |
Cardolaccia T, Li Y, Schanze KS. Phosphorescent platinum acetylide organogelators. Journal of the American Chemical Society. 130: 2535-45. PMID 18232686 DOI: 10.1021/Ja0765316 |
0.644 |
|
| 2007 |
Cardolaccia T, Funston AM, Kose ME, Keller JM, Miller JR, Schanze KS. Radical ion states of platinum acetylide oligomers. The Journal of Physical Chemistry. B. 111: 10871-80. PMID 17718472 DOI: 10.1021/Jp0737552 |
0.672 |
|
| 2007 |
Liu F, Cardolaccia T, Hornstein BJ, Schoonover JR, Meyer TJ. Electrochemical oxidation of water by an adsorbed mu-oxo-bridged Ru complex. Journal of the American Chemical Society. 129: 2446-7. PMID 17284036 DOI: 10.1021/Ja068630+ |
0.316 |
|
| 2005 |
Zhao X, Cardolaccia T, Farley RT, Abboud KA, Schanze KS. A platinum acetylide polymer with sterically demanding substituents: effect of aggregation on the triplet excited state. Inorganic Chemistry. 44: 2619-27. PMID 15819546 DOI: 10.1021/Ic048961S |
0.713 |
|
| 2005 |
Silverman EE, Cardolaccia T, Zhao X, Kim KY, Haskins-Glusac K, Schanze KS. The triplet state in Pt-acetylide oligomers, polymers and copolymers Coordination Chemistry Reviews. 249: 1491-1500. DOI: 10.1016/J.Ccr.2004.11.020 |
0.428 |
|
| Low-probability matches (unlikely to be authored by this person) |
| 2011 |
Bae YC, Lee SH, Bell R, Park JK, Cardolaccia T, Liu Y, Sun J, Andes C, Kim YS, Barclay GG. Effect of molecular weights of 193nm resist polymers on the negative tone development process Journal of Photopolymer Science and Technology. 24: 211-217. DOI: 10.2494/photopolymer.24.211 |
0.281 |
|
| 2017 |
Despagnet-Ayoub E, Kramer WW, Sattler W, Sattler A, LaBeaume PJ, Thackeray JW, Cameron JF, Cardolaccia T, Rachford AA, Winkler JR, Gray HB. Triphenylsulfonium topophotochemistry. Photochemical & Photobiological Sciences : Official Journal of the European Photochemistry Association and the European Society For Photobiology. PMID 29143029 DOI: 10.1039/c7pp00324b |
0.216 |
|
| 2011 |
Fouchier M, Pargon E, Azarnouche L, Menguelti K, Joubert O, Cardolaccia T, Bae YC. Vacuum ultra violet absorption spectroscopy of 193 nm photoresists Applied Physics a: Materials Science and Processing. 105: 399-405. DOI: 10.1007/s00339-011-6553-3 |
0.104 |
|
| 2010 |
Derrough S, Pikon A, Sourd C, Guérin I, Simon J, Gaugiran S, Cardolaccia T, Liu Y, Trefonas P, Barclay G, Bae YC. Thermal characterization of materials for double patterning Microelectronic Engineering. 87: 997-1000. DOI: 10.1016/j.mee.2009.11.117 |
0.096 |
|
| 2009 |
Perret D, Simon J, Gaugiran S, Cutler C, Cardolaccia T, Pikon A, Guerin I, Lapeyre C, Derrough S, Szmanda C, Trefonas P. Materials for double patterning strategies: Development and application Microelectronic Engineering. 86: 757-760. DOI: 10.1016/j.mee.2009.01.051 |
0.082 |
|
| 2012 |
Lee SH, Park JK, Cardolaccia T, Sun J, Andes C, O'connell K, Barclay GG. Understanding dissolution behavior of 193-nm photoresists in organic solvent developers. Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.918045 |
0.067 |
|
| 2009 |
Bae YC, Liu Y, Cardolaccia T, McDermott JC, Trefonas P, Spizuoco K, Reilly M, Pikon A, Joesten L, Zhang GG, Barclay GG, Simon J, Gaugiran S. Materials for single-etch double patterning process: Surface curing agent and thermal cure resist Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814274 |
0.065 |
|
| 2012 |
Reilly M, Andes C, Cardolaccia T, Kim YS, Park JK. Evolution of negative tone development photoresists for ArF lithography Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916633 |
0.048 |
|
| 2009 |
Bae YC, Liu Y, Cardolaccia T, Spizuoco K, Bell R, Joesten L, Pikon A, Reilly M, Ablaza S, Trefonas P, Barclay GG. Advanced patterning solutions based on double exposure: Double patterning and beyond Proceedings of Spie - the International Society For Optical Engineering. 7520. DOI: 10.1117/12.840461 |
0.023 |
|
| 2010 |
Bae YC, Liu Y, Cardolaccia T, Bell R, Spizuoco K, Barclay GG. Advanced patterning solutions based on the "Shrink Process Assisted by Double Exposure" (SPADE) Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848047 |
0.022 |
|
| Hide low-probability matches. |