Todd R. Younkin, Ph.D. - Publications

Affiliations: 
2001 California Institute of Technology, Pasadena, CA 
Area:
Organic chemistry

74 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2015 Han E, Younkin TR, Chandhok M, Myers AM, Tronic TA, Gstrein F, Elineni KK, Gaikwad A, Nyhus PA, Setu PK, Wallace CH. Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2086094  1
2014 Younkin TR, Biewer TM, Klepper CC, Marcus C. Description of the prototype diagnostic residual gas analyzer for ITER. The Review of Scientific Instruments. 85: 11E816. PMID 25430381 DOI: 10.1063/1.4892157  1
2014 Krysak ME, Blackwell JM, Putna SE, Leeson MJ, Younkin TR, Harlson S, Frasure K, Gstrein F. Investigation of novel inorganic resist materials for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 9048. DOI: 10.1117/12.2046677  1
2014 Romo-Negreira A, Younkin TR, Gronheid R, Demuynck S, Vandenbroeck N, Seo T, Guerrero DJ, Parnell D, Muramatsu M, Shinichiro K, Takashi Y, Nafus K, Somervell MH. Evaluation of integration schemes for contact-hole graphoepitaxy dsa: A study of substrate and template affinity control Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046119  1
2014 Keen I, Cheng HH, Yu A, Jack KS, Younkin TR, Leeson MJ, Whittaker AK, Blakey I. Behavior of lamellar forming block copolymers under nanoconfinement: Implications for topography directed self-assembly of sub-10 nm structures Macromolecules. 47: 276-283. DOI: 10.1021/ma4019735  1
2013 Pret AV, Gronheid R, Engelen J, Yan PY, Leeson MJ, Younkin TR, Garidis K, Biafore J. Mask effects on resist variability in extreme ultraviolet lithography Japanese Journal of Applied Physics. 52. DOI: 10.7567/JJAP.52.06GC02  1
2013 Gronheid R, Rincon Delgadillo P, Singh A, Younkin TR, Sayan S, Chan BT, Van Look L, Bekaert J, Pollentier I, Nealey PF. Readying directed self-assembly for patterning in semi-conductor manufacturing Journal of Photopolymer Science and Technology. 26: 779-791. DOI: 10.2494/photopolymer.26.779  1
2013 Gronheid R, Singh A, Younkin TR, Rincon Delgadillo P, Nealey P, Chan BT, Nafus K, Negreira AR, Somervell M. Rectification of EUV-patterned contact holes using directed self-assembly Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012667  1
2013 Younkin TR, Gronheid R, Rincon Delgadillo P, Chan BT, Vandenbroeck N, Demuynck S, Romo-Negreira A, Parnell D, Nafus K, Tahara S, Somervell M. Progress in Directed Self-Assembly hole shrink applications Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012353  1
2013 Vaglio Pret A, Gronheid R, Younkin TR, Winroth G, Biafore JJ, Anno Y, Hoshiko K, Constantoudis V. Roughness and variability in EUV lithography: Who is to blame? (Part 1) Proceedings of Spie - the International Society For Optical Engineering. 8679. DOI: 10.1117/12.2011584  1
2012 Pret AV, Gronheid R, Engelen J, Yan PY, Leeson MJ, Younkin TR. Evidence of speckle in extreme-UV lithography. Optics Express. 20: 25970-8. PMID 23187412 DOI: 10.1364/OE.20.025970  1
2012 Jung B, Sha J, Paredes F, Chandhok M, Younkin TR, Wiesner U, Ober CK, Thompson MO. Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heating. Acs Nano. 6: 5830-6. PMID 22725269 DOI: 10.1021/nn300008a  1
2012 Cheng HH, Keen I, Yu A, Chuang YM, Blakey I, Jack KS, Leeson MJ, Younkin TR, Whittaker AK. EUVL compatible LER solutions using functional block copolymers Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916744  1
2012 Gronheid R, Winroth G, Pret AV, Younkin TR. Quantification of shot noise contributions to contact hole local cd non-uniformity Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916681  1
2012 Pret AV, Gronheid R, Younkin TR, Leeson MJ, Yan PY. Impact of EUV mask surface roughness on LER Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916632  1
2012 Ekinci Y, Vockenhuber M, Terhalle B, Hojeij M, Wang L, Younkin TR. Evaluation of resist performance with EUV interference lithography for sub-22 nm patterning Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916541  1
2012 Somervell M, Gronheid R, Hooge J, Nafus K, Delgadillo PR, Thode C, Younkin T, Matsunaga K, Rathsack B, Scheer S, Nealey P. Comparison of directed self-assembly integrations Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916406  1
2012 Winroth G, Younkin TR, Blackwell JM, Gronheid R. Critical material properties for pattern collapse mitigation Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916364  1
2012 Gronheid R, Rincon Delgadillo PA, Younkin TR, Pollentier I, Somervell M, Hooge JS, Nafus K, Nealey PF. Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern Journal of Micro/Nanolithography, Mems, and Moems. 11. DOI: 10.1117/1.JMM.11.3.031303  1
2012 Winroth G, Younkin TR, Blackwell JM, Gronheid R. Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4758772  1
2012 Cheng HH, Yu A, Keen I, Chuang YM, Jack KS, Leeson MJ, Younkin TR, Blakey I, Whittaker AK. Electron-beam-induced freezing of an aromatic-based EUV resist: A robust template for directed self-assembly of block copolymers Ieee Transactions On Nanotechnology. 11: 1140-1147. DOI: 10.1109/TNANO.2012.2216544  1
2012 Shi Z, Luo J, Huang S, Polishak BM, Zhou XH, Liff S, Younkin TR, Block BA, Jen AKY. Achieving excellent electro-optic activity and thermal stability in poled polymers through an expeditious crosslinking process Journal of Materials Chemistry. 22: 951-959. DOI: 10.1039/c1jm14254b  1
2011 Jung B, Chandhok M, Younkin TR, Ober CK, Thompson MO. Time dependent behavior of chemically amplified resist characterized under sub-millisecond post exposure bake Journal of Photopolymer Science and Technology. 24: 487-490. DOI: 10.2494/photopolymer.24.487  1
2011 Vandentop GJ, Putna ES, Leeson MJ, Younkin TR, Kloster GM, Shah U, Chandhok M. EUV resist testing status and post lithography LWR reduction Journal of Photopolymer Science and Technology. 24: 127-136. DOI: 10.2494/photopolymer.24.127  1
2011 Cheng HH, Keen I, Yu A, Chuang YM, Blakey I, Jack KS, Leeson MJ, Younkin TR, Whittaker AK. Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications Proceedings of Spie - the International Society For Optical Engineering. 7970. DOI: 10.1117/12.881491  1
2011 Gronheid R, Younkin TR, Leeson MJ, Fonseca C, Hooge JS, Nafus K, Biafore JJ, Smith MD. EUV secondary electron blur at the 22nm half pitch node Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.881427  1
2011 Putna ES, Younkin TR, Leeson M, Caudillo R, Bacuita T, Shah U, Chandhok M. EUV lithography for 22nm half pitch and beyond: Exploring resolution, LWR, and sensitivity tradeoffs Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879641  1
2011 Lee SH, Younkin TR, Leeson MJ, Chandhok M, Zhang G, Magana J, Tanabe H, Carson SL. EUVL dark-field exposure impact on CDs using thick and thin absorber masks Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879428  1
2011 Jung B, Ober CK, Thompson MO, Younkin TR, Chandhok M. Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879288  1
2011 Gronheid R, Younkin TR, Leeson MJ, Fonseca C, Hooge JS, Nafus K, Biafore JJ, Smith MD. Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node Journal of Micro/Nanolithography, Mems, and Moems. 10. DOI: 10.1117/1.3607429  1
2011 Lawrie KJ, Blakey I, Blinco JP, Cheng HH, Gronheid R, Jack KS, Pollentier I, Leeson MJ, Younkin TR, Whittaker AK. Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers Journal of Materials Chemistry. 21: 5629-5637. DOI: 10.1039/c0jm03288c  1
2011 Lawrie K, Blakey I, Blinco J, Gronheid R, Jack K, Pollentier I, Leeson MJ, Younkin TR, Whittaker AK. Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists Radiation Physics and Chemistry. 80: 236-241. DOI: 10.1016/j.radphyschem.2010.07.038  1
2010 Yu A, Liu H, Blinco JP, Jack KS, Leeson M, Younkin TR, Whittaker AK, Blakey I. Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography. Macromolecular Rapid Communications. 31: 1449-55. PMID 21567550 DOI: 10.1002/marc.201000117  1
2010 Blakey I, Yu A, Blinco J, Jack KS, Liu H, Leeson M, Yueh W, Younkin T, Whittaker AK. Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.853620  1
2010 Caudillo R, Younkin T, Putna S, Myers A, Shroff Y, Bacuita T, Kloster G, Sohmen E. Aerial image improvements on the Intel MET Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.849142  1
2010 Jung B, Sha J, Paredes F, Ober CK, Thompson MO, Chandhok M, Younkin TR. Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848418  1
2010 Lawson RA, Cheng J, Noga DE, Younkin TR, Tolbert LM, Henderson CL. Aqueous and solvent developed negative-tone molecular resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848414  1
2010 Kloster GM, Liang T, Younkin TR, Putna ES, Caudillo R, Son IS. Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.845740  1
2010 Kruger SA, Higgins C, Cardineau B, Younkin TR, Brainard RL. Catalytic and autocatalytic mechanisms of acid amplifiers for use in EUV photoresists Chemistry of Materials. 22: 5609-5616. DOI: 10.1021/cm101867g  1
2010 Shi Z, Liang W, Luo J, Huang S, Polishak BM, Li X, Younkin TR, Block BA, Jen AKY. Tuning the kinetics and energetics of Diels-Alder cycloaddition reactions to improve poling efficiency and thermal stability of high-temperature cross-linked electro-optic polymers Chemistry of Materials. 22: 5601-5608. DOI: 10.1021/cm101815b  1
2009 Kruger S, Revuru S, Higgins C, Gibbons S, Freedman DA, Yueh W, Younkin TR, Brainard RL. Fluorinated acid amplifiers for EUV lithography. Journal of the American Chemical Society. 131: 9862-3. PMID 19569650 DOI: 10.1021/ja901448d  1
2009 Brainard R, Kruger S, Higgins C, Revuru S, Gibbons S, Freedman D, Yueh W, Younkin T. Kinetics, chemical modeling and lithography of novel acid amplifiers for use in EUV photoresists Journal of Photopolymer Science and Technology. 22: 43-50. DOI: 10.2494/photopolymer.22.43  1
2009 Whittaker AK, Blakey I, Blinco J, Jack KS, Lawrie K, Liu H, Yu A, Leeson M, Yeuh W, Younkin T. Development of polymers for non-CAR resists for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.820493  1
2009 Lawson RA, Tolbert LM, Younkin TR, Hendersona CL. Negative-tone molecular resists based on cationic polymerization Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814455  1
2009 Vandentop G, Chandhok M, Putna ES, Younkin TR, Clarke JS, Carson S, Myers A, Leeson M, Zhang G, Liang T, Murachi T. Demonstration of full field patterning of 32 nm test chips using EUVL Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814436  1
2009 Sundaramoorthi A, Younkin TR, Henderson CL. Elucidating the physiochemical and lithographic behavior of ultraThin photoresist films Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814410  1
2009 Roberts JM, Bristol RL, Younkin TR, Fedynyshyn TH, Astolfi DK, Cabral A. Sensitivity of EUV resists to out-of-band radiation Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814342  1
2009 Koh C, Ren L, Georger J, Goodwin F, Wurm S, Pierson B, Park JO, Wallow T, Younkin TR, Naulleau P. Assessment of EUV resist readiness for 32nm hp manufacturing, and extendibility study of EUV ADT using state-of-the-art resist Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814314  1
2009 Brainard R, Higgins C, Kruger S, Revuru S, Cardineau B, Gibbons S, Freedman D, Solak H, Yueh W, Younkin T. Lithographie evaluation and chemical modeling of acid amplifiers used in EUV photoresists Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814308  1
2009 Sulc R, Blackwell JM, Younkin TR, Putna ES, Esswein K, Dipasquale AG, Callahan R, Tsubaki H, Tsuchihashi T. Aryl sulfonates as neutral photoacid generators (PAGs) for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814279  1
2009 Xu H, Blackwell JM, Younkin TR, Min K. Underlayer designs to enhance the performance of EUV resists Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814223  1
2009 Sharma S, Ogata Y, Tung C, Blackwell JM, Younkin TR, Hishiro Y, Figueroa JS, Rheingold AL. Incorporating organosilanes into EUV photoresists: Diphenyltrimethylsilylmethylsulfonium triflate as a new PAG Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814220  1
2009 Putna ES, Younkin TR, Chandhok M, Frasure K. EUV lithography for 30nm half pitch and beyond: Exploring resolution, sensitivity and LWR tradeoffs Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814191  1
2009 Kang S, Prabhu VM, Wu WL, Lin EK, Choi KW, Chandhok M, Younkin TR, Yueh W. Characterization of the photoacid diffusion length Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813555  1
2009 Lawson RA, Noga DE, Younkin TR, Tolbert LM, Henderson CL. Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2998-3003. DOI: 10.1116/1.3264672  1
2009 Sha J, Jung B, Thompson MO, Ober CK, Chandhok M, Younkin TR. Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3020-3024. DOI: 10.1116/1.3263173  1
2009 Shi Z, Luo J, Huang S, Cheng YJ, Kim TD, Polishak BM, Zhou XH, Tian Y, Jang SH, Knorr DB, Overney RM, Younkin TR, Jen AKY. Controlled diels alder reactions used to incorporate highly ef?cient polyenic chromophores into maleimide-containing side-chain polymers for electro-optics Macromolecules. 42: 2438-2445. DOI: 10.1021/ma802612g  1
2009 Lawson RA, Lee CT, Tolbert LM, Younkin TR, Henderson CL. High resolution negative tone molecular resist based on di-functional epoxide polymerization Microelectronic Engineering. 86: 734-737. DOI: 10.1016/j.mee.2008.11.097  1
2008 Block BA, Younkin TR, Davids PS, Reshotko MR, Chang P, Polishak BM, Huang S, Luo J, Jen AK. Electro-optic polymer cladding ring resonator modulators. Optics Express. 16: 18326-33. PMID 18958109 DOI: 10.1364/OE.16.018326  1
2008 Lee CT, Wang M, Gonsalves KE, Yueh W, Roberts JM, Younkin TR, Henderson CL. Effect of PAG and matrix structure on PAG acid generation behavior under UV and high-energy radiation exposure Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.782634  1
2008 Lee CT, Yueh W, Roberts JM, Younkin TR, Henderson CL. A new technique for studying photoacid generator chemistry and physics in polymer films using on-wafer ellipsometry and acid-sensitive dyes Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773393  1
2008 Chandhok M, Frasure K, Putna ES, Younkin TR, Rachmady W, Shah U, Yueh W. Improvement in linewidth roughness by postprocessing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 2265-2270. DOI: 10.1116/1.3013860  1
2008 Shi Z, Luo J, Huang S, Zhou XH, Kim TD, Cheng YJ, Polishak BM, Younkin TR, Block BA, Jen AKY. Reinforced site isolation leading to remarkable thermal stability and high electrooptic activities in cross-linked nonlinear optical dendrimers Chemistry of Materials. 20: 6372-6377. DOI: 10.1021/cm801828w  1
2008 Yoo HJ, Bielefeld JD, Balakrishnan S, Boyanov B, Clendenning SB, Kloster GM, Paluda PM, RamachandraRao VS, Suri S, Younkin TR. Plasma damage and repair of porous low-k carbon-doped oxide films Advanced Metallization Conference (Amc). 705-709.  1
2004 Waltman AW, Younkin TR, Grubbs RH. Insights into the deactivation of neutral nickel ethylene polymerization catalysts in the presence of functionalized olefins Organometallics. 23: 5121-5123. DOI: 10.1021/om049360b  1
2003 Connor EF, Younkin TR, Henderson JI, Waltman AW, Grubbs RH. Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stability. Chemical Communications (Cambridge, England). 2272-3. PMID 14518870  1
2003 Connor EF, Younkin TR, Henderson JI, Waltman AW, Grubbs RH. Synthesis of neutral nickel catalysts for ethylene polymerization - The influence of ligand size on catalyst stability Chemical Communications. 9: 2272-2273.  1
2002 Connor EF, Younkin TR, Henderson JI, Hwang S, Grubbs RH, Roberts WP, Litzau JJ. Linear functionalized polyethylene prepared with highly active neutral Ni(II) complexes Journal of Polymer Science, Part a: Polymer Chemistry. 40: 2842-2854. DOI: 10.1002/pola.10370  1
2000 Ostoja Starzewski KA, Younkin TR, Connor EF, Henderson JI, Friedrich SK, Grubbs RH, Bansleben DA. Scope of olefin polymerization nickel catalysts. Science (New York, N.Y.). 288: 1749-51. PMID 17836688 DOI: 10.1126/science.288.5472.1749  1
2000 Younkin TR, Connor EF, Henderson JI, Friedrich SK, Grubbs RH, Bansleben DA. Neutral, single-component nickel (II) polyolefin catalysts that tolerate heteroatoms Science (New York, N.Y.). 287: 460-2. PMID 10642541  1
2000 Younkin TR, Connor EF, Henderson JI, Friedrich SK, Grubbs RH, Bansleben DA. Neutral single-component nickel (II) polyolefin catalysts that tolerate heteroatoms Science. 287: 460-462. DOI: 10.1126/science.287.5452.460  1
2000 Kellogg RM, Younkin TR, Connor EF, Henderson JI, Friedrich SK, Grubbs RH, Bansleben DA. Neutral, single-component nickel(II) polyolefin catalysts that tolerate heteroatoms Chemtracts. 13: 245-248.  0.76
1998 Wang C, Friedrich S, Younkin TR, Li RT, Grubbs RH, Bansleben DA, Day MW. Neutral nickel(II)-based catalysts for ethylene polymerization Organometallics. 17: 3149-3151.  1
1997 Wagener KB, Brzezinska K, Anderson JD, Younkin TR, Steppe K, DeBoer W. Kenitic of acyclic diene metathesis (ADMET) polymerization. Influence of the negative neighboring group effect Macromolecules. 30: 7363-7369.  1
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