Daniel P. Sanders, Ph.D. - Publications

Affiliations: 
2005 California Institute of Technology, Pasadena, CA 
Area:
Organic chemistry

69 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Vora A, Schmidt K, Alva G, Arellano N, Magbitang TP, Chunder A, Thompson L, Lofano E, Pitera JW, Cheng JY, Sanders DP. Orientation Control of Block Copolymers using Surface Active, Phase-preferential Additives. Acs Applied Materials & Interfaces. PMID 27700028 DOI: 10.1021/acsami.6b11293  0.4
2016 Xie T, Vora A, Mulcahey PJ, Nanescu SE, Singh M, Choi DS, Huang JK, Liu CC, Sanders DP, Hahm JI. Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains. Acs Nano. PMID 27462904 DOI: 10.1021/acsnano.6b03071  0.4
2016 Nowak D, Morrison W, Wickramasinghe HK, Jahng J, Potma E, Wan L, Ruiz R, Albrecht TR, Schmidt K, Frommer J, Sanders DP, Park S. Nanoscale chemical imaging by photoinduced force microscopy. Science Advances. 2: e1501571. PMID 27051870 DOI: 10.1126/sciadv.1501571  0.4
2016 Vora A, Wojtecki RJ, Schmidt K, Chunder A, Cheng JY, Nelson A, Sanders DP. Development of polycarbonate-containing block copolymers for thin film self-assembly applications Polymer Chemistry. 7: 940-950. DOI: 10.1039/c5py01846c  0.64
2015 Maher MJ, Rettner CT, Bates CM, Blachut G, Carlson MC, Durand WJ, Ellison CJ, Sanders DP, Cheng JY, Willson CG. Directed self-assembly of silicon-containing block copolymer thin films. Acs Applied Materials & Interfaces. 7: 3323-8. PMID 25594107 DOI: 10.1021/am508197k  0.64
2015 Kaufhold S, Hassel AW, Sanders D, Dohrmann R. Corrosion of high-level radioactive waste iron-canisters in contact with bentonite Journal of Hazardous Materials. 285: 464-473. PMID 25536393 DOI: 10.1016/j.jhazmat.2014.10.056  0.64
2015 Vora A, Chunder A, Tjio M, Magbitang T, Lofano E, Arellano N, Schmidt K, Nguyen K, Cheng J, Sanders DP. Synthesis and characterization of polycarbonate-containing all-organic High-χ block copolymers for directed self-assembly Journal of Photopolymer Science and Technology. 28: 659-662. DOI: 10.2494/photopolymer.28.659  0.64
2015 Maher MJ, Bates CM, Durand WJ, Blachut G, Janes DW, Cheng JY, Sanders DP, Willson CG, Ellison CJ. Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly Journal of Photopolymer Science and Technology. 28: 611-615. DOI: 10.2494/photopolymer.28.611  0.64
2015 Hirahara E, Paunescu M, Polishchuk O, Jeong E, Ng E, Shan J, Kim J, Hong S, Baskaran D, Lin G, Vora A, Tjio M, Arellano N, Rettner CT, Lofano E, ... ... Sanders DP, et al. Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2087398  0.64
2015 Cheng J, Doerk GS, Rettner CT, Singh G, Tjio M, Truong H, Arellano N, Balakrishnan S, Brink M, Tsai H, Liu CC, Guillorn M, Sanders DP. Customization and design of directed self-assembly using hybrid prepatterns Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086973  0.64
2015 Tsai HY, Miyazoe H, Cheng J, Brink M, Dawes S, Klaus D, Bucchignano J, Sanders D, Joseph E, Colburn M, Guillorn M. Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2084845  0.64
2015 Tsai H, Miyazoe H, Chang JB, Pitera J, Liu CC, Brink M, Lauer I, Cheng JY, Engelmann S, Rozen J, Bucchignano JJ, Klaus DP, Dawes S, Gignac L, Breslin C, ... ... Sanders DP, et al. Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme Technical Digest - International Electron Devices Meeting, Iedm. 2015: 32.1.1-32.1.4. DOI: 10.1109/IEDM.2014.7047152  0.64
2014 Doerk GS, Cheng JY, Singh G, Rettner CT, Pitera JW, Balakrishnan S, Arellano N, Sanders DP. Enabling complex nanoscale pattern customization using directed self-assembly. Nature Communications. 5: 5805. PMID 25512171 DOI: 10.1038/ncomms6805  0.64
2014 Tsai H, Pitera JW, Miyazoe H, Bangsaruntip S, Engelmann SU, Liu CC, Cheng JY, Bucchignano JJ, Klaus DP, Joseph EA, Sanders DP, Colburn ME, Guillorn MA. Two-dimensional pattern formation using graphoepitaxy of PS-b-PMMA block copolymers for advanced FinFET device and circuit fabrication. Acs Nano. 8: 5227-32. PMID 24670216 DOI: 10.1021/nn501300b  0.64
2014 Komura K, Hishiro Y, Wakamatsu G, Takimoto Y, Nagai T, Kimura T, Yamaguchi Y, Shimokawa T, Breyta G, Arellano N, Balakarishnan S, Bozano LD, Sankaranarayanan A, Bajjuri KM, Sanders DP, et al. Spin-on organic hardmask for topo-patterned substrate Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2046357  0.64
2014 Sanders DP, Coady DJ, Yasumoto M, Fujiwara M, Sardon H, Hedrick JL. Synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl carbonate intermediate Polymer Chemistry. 5: 327-329. DOI: 10.1039/c3py01128c  0.64
2013 Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp LE, Topuria T, Arellano N, Sanders DP. Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy. Acs Nano. 7: 276-85. PMID 23199006 DOI: 10.1021/nn303974j  0.64
2013 Sanchez MI, Sundberg LK, Bozano LD, Sooriyakumaran R, Sanders DP, Senna T, Tanabe M, Komizo T, Yoshida I, Zweber AE. Defects on high resolution negative-tone resist The revenge of the blobs Proceedings of Spie - the International Society For Optical Engineering. 8880. DOI: 10.1117/12.2028753  0.64
2013 Tsai HY, Miyazoe H, Engelmann S, Bangsaruntip S, Lauer I, Bucchignano J, Klaus D, Gignac L, Joseph E, Cheng J, Sanders D, Guillorn M. Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications Proceedings of Spie - the International Society For Optical Engineering. 8685. DOI: 10.1117/12.2014259  0.64
2013 Doerk GS, Cheng JY, Rettner CT, Balakrishnan S, Arellano N, Sanders DP. Deterministically isolated gratings through the directed self-assembly of block copolymers Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011629  0.64
2013 Tsai HY, Miyazoe H, Engelmann S, Liu CC, Gignac L, Bucchignano J, Klaus D, Breslin C, Joseph E, Cheng J, Sanders D, Guillorn M. Pattern transfer of directed self-assembly patterns for CMOS device applications Journal of Micro/Nanolithography, Mems, and Moems. 12. DOI: 10.1117/1.JMM.12.4.041305  0.64
2013 Engler AC, Chan JMW, Coady DJ, O'Brien JM, Sardon H, Nelson A, Sanders DP, Yang YY, Hedrick JL. Accessing new materials through polymerization and modification of a polycarbonate with a pendant activated ester Macromolecules. 46: 1283-1290. DOI: 10.1021/ma4001258  0.64
2012 Bencher C, Yi H, Zhou J, Cai M, Smith J, Miao L, Montal O, Blitshtein S, Lavi A, Dotan K, Dai H, Cheng JY, Sanders DP, Tjio M, Holmes S. Directed self-assembly defectivity assessment. Part II Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.917993  0.64
2012 Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp L, Topuria T, Arellano N, Sanders DP. Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916421  0.64
2012 Tsai HY, Miyazoe H, Engelmann S, To B, Sikorski E, Bucchignano J, Klaus D, Liu CC, Cheng J, Sanders D, Fuller N, Guillorn M. Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4767237  0.64
2011 Bencher C, Smith J, Miao L, Cai C, Chen Y, Cheng JY, Sanders DP, Tjio M, Truong HD, Holmes S, Hinsberg WD. Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab Proceedings of Spie - the International Society For Optical Engineering. 7970. DOI: 10.1117/12.881293  0.64
2010 Sanders DP, Fukushima K, Coady DJ, Nelson A, Fujiwara M, Yasumoto M, Hedrick JL. A simple and efficient synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl ester intermediate. Journal of the American Chemical Society. 132: 14724-6. PMID 20883030 DOI: 10.1021/ja105332k  0.64
2010 Cheng JY, Sanders DP, Truong HD, Harrer S, Friz A, Holmes S, Colburn M, Hinsberg WD. Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist. Acs Nano. 4: 4815-23. PMID 20731456 DOI: 10.1021/nn100686v  0.64
2010 Sanders DP. Advances in patterning materials for 193 nm immersion lithography. Chemical Reviews. 110: 321-60. PMID 20070116 DOI: 10.1021/cr900244n  0.64
2010 Sanders DP, Cheng J, Rettner CT, Hinsberg WD, Kim HC, Friz HT, Harrer S, Holmes S, Colburn M. Integration of directed self-assembly with 193 nm lithography Journal of Photopolymer Science and Technology. 23: 11-18. DOI: 10.2494/photopolymer.23.11  0.64
2010 Hinsberg W, Cheng J, Kim HC, Sanders DP. Self-assembling materials for lithographic patterning: Overview, status and moving forward Proceedings of Spie - the International Society For Optical Engineering. 7637. DOI: 10.1117/12.852230  0.64
2010 Sanders DP, Sundberg LK, Fujiwara M, Terui Y, Yasumoto M. High contact angle fluorosulfonamide-based materials for immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.847257  0.64
2009 Coulembier O, Sanders DP, Nelson A, Hollenbeck AN, Horn HW, Rice JE, Fujiwara M, Dubois P, Hedrick JL. Hydrogen-bonding catalysts based on fluorinated alcohol derivatives for living polymerization. Angewandte Chemie (International Ed. in English). 48: 5170-3. PMID 19526473 DOI: 10.1002/anie.200901006  0.64
2009 Cheng JY, Nelson A, Rettner CT, Sanders DP, Sutherland A, Pitera JW, Na YH, Kim HC, Hinsberg WD. Directed self-assembly on sparse chemical patterns for lithographic applications Journal of Photopolymer Science and Technology. 22: 219-222. DOI: 10.2494/photopolymer.22.219  0.64
2008 Goldfarb DL, Vyklicky L, Burns SD, Petrillo K, Arnold J, Lisi A, Pfeiffer D, Sanders DP, Allen RD, Medeiros DR, Owe-Yang DC, Noda K, Tachibana S, Shirai S. Graded spin-on organic bottom antireflective coating for high na immersion lithography Journal of Photopolymer Science and Technology. 21: 397-404. DOI: 10.2494/photopolymer.21.397  0.64
2008 Cheng JY, Sanders DP, Kim HC, Sundberg LK. Integration of polymer self-assembly for lithographic application Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.773247  0.64
2008 McIntyre G, Sanders D, Sooriyakumaran R, Truong H, Allen R. The limitations of high index resists for 193nm hyper-NA lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773114  0.64
2008 Sanders DP, Sundberg LK, Brock PJ, Ito H, Truong HD, Allen RD, McIntyre GR, Goldfarb DL. Self-segregating materials for immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772937  0.64
2008 Goldfarb DL, Burns SD, Vyklicky L, Pfeiffer D, Lisi A, Petrillo K, Arnold J, Sanders DP, Clancy A, Lang RN, Allen RD, Medeiros DR, Owe-Yang DC, Noda K, Tachibana S, et al. Graded spin-on organic bottom antireflective coating for high NA lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772268  0.64
2008 Cheng JK, Rettner CT, Sanders DP, Kim HC, Hinsberg WD. Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers Advanced Materials. 20: 3155-3158. DOI: 10.1002/adma.200800826  0.64
2008 Auyeung E, Cheng JY, Sanders DP. Orientation control of block copolymer thin films American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 49: 1140.  0.64
2007 Sanders D, Simon U. High-throughput gas sensing screening of surface-doped In2O 3 Journal of Combinatorial Chemistry. 9: 53-61. PMID 17206832 DOI: 10.1021/cc060044p  0.64
2007 Sanders DP, Sundberg LK, Sooriyakumaran R, Brock PJ, DiPietro RA, Truong HD, Miller DC, Lawson MC, Allen RD. Fluoroalcohol materials with tailored interfacial properties for immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712768  0.64
2007 Sundberg LK, Sanders DP, Sooriyakumaran R, Brock PJ, Allen RD. Contact angles & structure/surface property relationships of immersion materials 65191Q Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712632  0.64
2007 Sanders DP, Sundberg LK, Sooriyakumaran R, Allen RD. Topcoat-free photoresists for 193nm immersion lithography Microlithography World. 16: 8-11+13.  0.64
2006 Allen RD, Breyta G, Brock P, DiPietro R, Sanders D, Sooriyakumaran R, Sundberg LK. Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography Journal of Photopolymer Science and Technology. 19: 569-572. DOI: 10.2494/photopolymer.19.569  0.64
2006 Colicchio I, Keul H, Sanders D, Simon U, Weirich TE, Moeller M. Development of hybrid polymer electrolyte membranes based on the semi-interpenetrating network concept Fuel Cells. 6: 225-236. DOI: 10.1002/fuce.200500234  0.64
2006 Frenzer G, Frantzen A, Sanders D, Simon U, Maier WF. Wet chemical synthesis and screening of thick porous oxide films for resistive gas sensing applications Sensors. 6: 1568-1586.  0.64
2006 Koplin TJ, Siemons M, Océn-Valéntin C, Sanders D, Simon U. Workflow for high throughput screening of gas sensing materials Sensors. 6: 298-307.  0.64
2005 Hong SH, Sanders DP, Lee CW, Grubbs RH. Prevention of undesirable isomerization during olefin metathesis. Journal of the American Chemical Society. 127: 17160-1. PMID 16332044 DOI: 10.1021/ja052939w  0.96
2005 Simon U, Sanders D, Jockel J, Brinz T. Setup for high-throughput impedance screening of gas-sensing materials Journal of Combinatorial Chemistry. 7: 682-687. DOI: 10.1021/cc0500093  0.64
2005 Frantzen A, Sanders D, Scheidtmann J, Simon U, Maier WF. A flexible database for combinatorial and high-throughput materials science Qsar and Combinatorial Science. 24: 22-28. DOI: 10.1002/qsar.200420055  0.64
2005 Hong SH, Sanders DP, Lee CW, Grubbs RH. Prevention of olefin isomerization during olefin metathesis reactions Acs National Meeting Book of Abstracts. 229: ORGN-80.  0.64
2005 Sanders D, Siemons M, Koplin T, Simon U. Development of a high-throughput impedance spectroscopy screening system (HT-IS) for characterisation of novel nanoscaled gas sensing materials Materials Research Society Symposium Proceedings. 876: 95-100.  0.64
2004 Frantzen A, Scheidtmann J, Frenzer G, Maier WF, Jockel J, Brinz T, Sanders D, Simon U. High-Throughput Method for the Impedance Spectroscopic Characterization of Resistive Gas Sensors Angewandte Chemie - International Edition. 43: 752-754. DOI: 10.1002/anie.200352424  0.64
2003 Chatterjee AK, Choi TL, Sanders DP, Grubbs RH. A general model for selectivity in olefin cross metathesis. Journal of the American Chemical Society. 125: 11360-70. PMID 16220959 DOI: 10.1021/ja0214882  0.96
2003 Sanders DP, Connor EF, Grubbs RH, Hung RJ, Osborn BP, Chiba T, MacDonald SA, Grant Willson C, Conley W. Metal-catalyzed addition polymers for 157 nm resist applications. Synthesis and polymerization of partially fluorinated, ester-functionalized tricyclo [4.2.1.02,5]non-7-enes Macromolecules. 36: 1534-1542. DOI: 10.1021/ma021131i  0.64
2003 Trinque BC, Chambers CR, Osborn BP, Callahan RP, Lee GS, Kusumoto S, Sanders DP, Grubbs RH, Conley WE, Willson CG. Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography Journal of Fluorine Chemistry. 122: 17-26. DOI: 10.1016/S0022-1139(03)00076-9  0.64
2002 Simon U, Sanders D, Jockel J, Heppel C, Brinz T. Design strategies for multielectrode arrays applicable for high-throughput impedance spectroscopy on novel gas sensor materials Journal of Combinatorial Chemistry. 4: 511-515. PMID 12217024 DOI: 10.1021/cc020025p  0.64
2002 Chatterjee AK, Sanders DP, Grubbs RH. Synthesis of symmetrical trisubstituted olefins by cross metathesis. Organic Letters. 4: 1939-42. PMID 12027652  0.96
2002 Dunkers JP, Sanders DP, Hunston DL, Everett MJ, Green WH. Comparison of optical coherence tomography, X-ray computed tomography, and confocal microscopy results from an impact damaged epoxy/E-glass composite Journal of Adhesion. 78: 129-154. DOI: 10.1080/00218460210386  0.64
2002 Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, et al. Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Macromolecules. 35: 6539-6549. DOI: 10.1021/ma0122371  0.64
2001 Hung RJ, Tran HV, Trinque BC, Chiba T, Yamada S, Sanders DP, Connor EF, Grubbs RH, Klopp J, Frechet JMJ, Thomas BH, Shafer GJ, DesMarteau DD, Conley W, Grant Willson C. Resist materials for 157 nm microlithography: An update Proceedings of Spie - the International Society For Optical Engineering. 4345: 385-395. DOI: 10.1117/12.436870  0.64
2001 Dunkers JP, Phelan FR, Sanders DP, Everett MJ, Green WH, Hunston DL, Parnas RS. The application of optical coherence tomography to problems in polymer matrix composites Optics and Lasers in Engineering. 35: 135-147. DOI: 10.1016/S0143-8166(01)00010-0  0.64
2001 Ishida H, Sanders DP. Regioselectivity of the ring-opening polymerization of monofunctional alkyl-substituted aromatic amine-based benzoxazines Polymer. 42: 3115-3125. DOI: 10.1016/S0032-3861(00)00498-5  0.64
2001 Dunkers JP, Phelan FR, Zimba CG, Flynn KM, Sanders DP, Peterson RC, Parnas RS, Li X, Fujimoto JG. The prediction of permeability for an epoxy/E-glass composite using optical coherence tomographic images Polymer Composites. 22: 803-814. DOI: 10.1002/pc.10582  0.64
2001 Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, Sanders DP, Connor EF, Grubbs RH, Conley W, MacDonald SA, et al. Fluoropolymer resist materials for 157nm microlithography Journal of Photopolymer Science and Technology. 14: 669-674.  0.64
2000 Ishida H, Sanders DP. Regioselectivity and network structure of difunctional alkyl-substituted aromatic amine-based polybenzoxazines Macromolecules. 33: 8149-8157. DOI: 10.1021/ma991836t  0.64
2000 Ishida H, Sanders DP. Improved thermal and mechanical properties of polybenzoxazines based on alkyl-substituted aromatic amines Journal of Polymer Science, Part B: Polymer Physics. 38: 3289-3301. DOI: 10.1002/1099-0488(20001215)38:24<3289::AID-POLB110>3.0.CO;2-X  0.64
Show low-probability matches.