| Year |
Citation |
Score |
| 2020 |
Kim JY, Liu P, Maher MJ, Callan DH, Bates CM, Carlson M, Asano Y, Blachut G, Rettner C, Cheng JY, Sunday DF, Kline RJ, Sanders DP, Lynd NA, Ellison CJ, et al. Spatial Control of Self-Assembled Block Copolymer Domain Orientation and Alignment on Photo-Patterned Surfaces. Acs Applied Materials & Interfaces. PMID 32345022 DOI: 10.1021/Acsami.0C02997 |
0.636 |
|
| 2017 |
Lai K, Liu C, Tsai H, Xu Y, Chi C, Raghunathan A, Dhagat P, Hu L, Park O, Jung S, Cho W, Morillo J, Pitera J, Schmidt K, Guillorn M, ... ... Sanders D, et al. Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design? Journal of Micro/Nanolithography, Mems, and Moems. 16: 013502. DOI: 10.1117/1.Jmm.16.1.013502 |
0.33 |
|
| 2016 |
Vora A, Schmidt K, Alva G, Arellano N, Magbitang TP, Chunder A, Thompson L, Lofano E, Pitera JW, Cheng JY, Sanders DP. Orientation Control of Block Copolymers using Surface Active, Phase-preferential Additives. Acs Applied Materials & Interfaces. PMID 27700028 DOI: 10.1021/Acsami.6B11293 |
0.382 |
|
| 2016 |
Xie T, Vora A, Mulcahey PJ, Nanescu SE, Singh M, Choi DS, Huang JK, Liu CC, Sanders DP, Hahm JI. Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains. Acs Nano. PMID 27462904 DOI: 10.1021/Acsnano.6B03071 |
0.33 |
|
| 2016 |
Nowak D, Morrison W, Wickramasinghe HK, Jahng J, Potma E, Wan L, Ruiz R, Albrecht TR, Schmidt K, Frommer J, Sanders DP, Park S. Nanoscale chemical imaging by photoinduced force microscopy. Science Advances. 2: e1501571. PMID 27051870 DOI: 10.1126/Sciadv.1501571 |
0.356 |
|
| 2016 |
Vora A, Alva G, Chunder A, Schmidt K, Magbitang T, Lofano E, Arellano N, Cheng J, Sanders DP. Synthesis and Thin-film Self-assembly of Cylinder-Forming High-χ Block Copolymers Journal of Photopolymer Science and Technology. 29: 685-688. DOI: 10.2494/Photopolymer.29.685 |
0.407 |
|
| 2016 |
Liu C, Franke E, Lie FL, Sieg S, Tsai H, Lai K, Truong H, Farrell R, Somervell M, Sanders D, Felix N, Guillorn M, Burns S, Hetzer D, Ko A, et al. Directed self-assembly patterning for forming fin field effect transistors Spie Newsroom. DOI: 10.1117/2.1201606.006519 |
0.374 |
|
| 2016 |
Chi C, Liu CC, Meli L, Schmidt K, Xu Y, Desilva EA, Sanchez M, Farrell R, Cottle H, Kawamura D, Singh L, Furukawa T, Lai K, Pitera JW, Sanders D, et al. DSA via hole shrink for advanced node applications Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219706 |
0.38 |
|
| 2016 |
Liu CCC, Franke E, Lie FL, Sieg S, Tsai H, Lai K, Truong H, Farrell R, Somervell M, Sanders D, Felix N, Guillorn M, Burns S, Hetzer D, Ko A, et al. DSA patterning options for FinFET formation at 7nm node Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219670 |
0.362 |
|
| 2016 |
Tsai H, Miyazoe H, Vora A, Magbitang T, Arellano N, Liu CC, Maher MJ, Durand WJ, Dawes SJ, Bucchignano JJ, Gignac L, Sanders DP, Joseph EA, Colburn ME, Willson CG, et al. High chi block copolymer DSA to improve pattern quality for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9779. DOI: 10.1117/12.2219544 |
0.369 |
|
| 2016 |
Schmidt K, Osaki H, Nishino K, Sanchez M, Liu CC, Furukawa T, Chi C, Pitera J, Felix N, Sanders D. Strategies to enable directed self-Assembly contact hole shrink for tight pitches Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219213 |
0.393 |
|
| 2016 |
Wojtecki R, Porath E, Vora A, Nelson A, Sanders D. Contrast enhanced diffusion NMR: quantifying impurities in block copolymers for DSA Proceedings of Spie. 9779: 977922. DOI: 10.1117/12.2218633 |
0.565 |
|
| 2016 |
Vora A, Wojtecki RJ, Schmidt K, Chunder A, Cheng JY, Nelson A, Sanders DP. Development of polycarbonate-containing block copolymers for thin film self-assembly applications Polymer Chemistry. 7: 940-950. DOI: 10.1039/C5Py01846C |
0.564 |
|
| 2015 |
Maher MJ, Rettner CT, Bates CM, Blachut G, Carlson MC, Durand WJ, Ellison CJ, Sanders DP, Cheng JY, Willson CG. Directed self-assembly of silicon-containing block copolymer thin films. Acs Applied Materials & Interfaces. 7: 3323-8. PMID 25594107 DOI: 10.1021/Am508197K |
0.641 |
|
| 2015 |
Vora A, Chunder A, Tjio M, Magbitang T, Lofano E, Arellano N, Schmidt K, Nguyen K, Cheng J, Sanders DP. Synthesis and characterization of polycarbonate-containing all-organic High-χ block copolymers for directed self-assembly Journal of Photopolymer Science and Technology. 28: 659-662. DOI: 10.2494/Photopolymer.28.659 |
0.429 |
|
| 2015 |
Maher MJ, Bates CM, Durand WJ, Blachut G, Janes DW, Cheng JY, Sanders DP, Willson CG, Ellison CJ. Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly Journal of Photopolymer Science and Technology. 28: 611-615. DOI: 10.2494/Photopolymer.28.611 |
0.611 |
|
| 2015 |
Hirahara E, Paunescu M, Polishchuk O, Jeong E, Ng E, Shan J, Kim J, Hong S, Baskaran D, Lin G, Vora A, Tjio M, Arellano N, Rettner CT, Lofano E, ... ... Sanders DP, et al. Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2087398 |
0.434 |
|
| 2015 |
Cheng J, Doerk GS, Rettner CT, Singh G, Tjio M, Truong H, Arellano N, Balakrishnan S, Brink M, Tsai H, Liu CC, Guillorn M, Sanders DP. Customization and design of directed self-assembly using hybrid prepatterns Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086973 |
0.409 |
|
| 2015 |
Tsai HY, Miyazoe H, Cheng J, Brink M, Dawes S, Klaus D, Bucchignano J, Sanders D, Joseph E, Colburn M, Guillorn M. Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2084845 |
0.408 |
|
| 2014 |
Doerk GS, Cheng JY, Singh G, Rettner CT, Pitera JW, Balakrishnan S, Arellano N, Sanders DP. Enabling complex nanoscale pattern customization using directed self-assembly. Nature Communications. 5: 5805. PMID 25512171 DOI: 10.1038/Ncomms6805 |
0.426 |
|
| 2014 |
Tsai H, Pitera JW, Miyazoe H, Bangsaruntip S, Engelmann SU, Liu CC, Cheng JY, Bucchignano JJ, Klaus DP, Joseph EA, Sanders DP, Colburn ME, Guillorn MA. Two-dimensional pattern formation using graphoepitaxy of PS-b-PMMA block copolymers for advanced FinFET device and circuit fabrication. Acs Nano. 8: 5227-32. PMID 24670216 DOI: 10.1021/Nn501300B |
0.371 |
|
| 2013 |
Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp LE, Topuria T, Arellano N, Sanders DP. Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy. Acs Nano. 7: 276-85. PMID 23199006 DOI: 10.1021/Nn303974J |
0.426 |
|
| 2013 |
Tsai H, Guillorn M, Doerk G, Cheng J, Sanders D, Lai K, Liu C, Colburn M. Directed self-assembly for ever-smaller printed circuits Spie Newsroom. DOI: 10.1117/2.1201303.004743 |
0.36 |
|
| 2013 |
Doerk GS, Cheng JY, Rettner CT, Balakrishnan S, Arellano N, Sanders DP. Deterministically isolated gratings through the directed self-assembly of block copolymers Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011629 |
0.391 |
|
| 2013 |
Tsai HY, Miyazoe H, Engelmann S, Liu CC, Gignac L, Bucchignano J, Klaus D, Breslin C, Joseph E, Cheng J, Sanders D, Guillorn M. Pattern transfer of directed self-assembly patterns for CMOS device applications Journal of Micro/Nanolithography, Mems, and Moems. 12. DOI: 10.1117/1.Jmm.12.4.041305 |
0.377 |
|
| 2013 |
Engler AC, Chan JMW, Coady DJ, O'Brien JM, Sardon H, Nelson A, Sanders DP, Yang YY, Hedrick JL. Accessing new materials through polymerization and modification of a polycarbonate with a pendant activated ester Macromolecules. 46: 1283-1290. DOI: 10.1021/Ma4001258 |
0.56 |
|
| 2012 |
Bencher C, Yi H, Zhou J, Cai M, Smith J, Miao L, Montal O, Blitshtein S, Lavi A, Dotan K, Dai H, Cheng JY, Sanders DP, Tjio M, Holmes S. Directed self-assembly defectivity assessment. Part II Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.917993 |
0.344 |
|
| 2012 |
Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp L, Topuria T, Arellano N, Sanders DP. Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916421 |
0.368 |
|
| 2012 |
Sanders DP. Special Section Guest Editorial: Directed Self-Assembly Journal of Micro/Nanolithography, Mems, and Moems. 11: 031301. DOI: 10.1117/1.Jmm.11.3.031301 |
0.378 |
|
| 2011 |
Bencher C, Smith J, Miao L, Cai C, Chen Y, Cheng JY, Sanders DP, Tjio M, Truong HD, Holmes S, Hinsberg WD. Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab Proceedings of Spie - the International Society For Optical Engineering. 7970. DOI: 10.1117/12.881293 |
0.43 |
|
| 2010 |
Sanders DP, Fukushima K, Coady DJ, Nelson A, Fujiwara M, Yasumoto M, Hedrick JL. A simple and efficient synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl ester intermediate. Journal of the American Chemical Society. 132: 14724-6. PMID 20883030 DOI: 10.1021/Ja105332K |
0.537 |
|
| 2010 |
Cheng JY, Sanders DP, Truong HD, Harrer S, Friz A, Holmes S, Colburn M, Hinsberg WD. Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist. Acs Nano. 4: 4815-23. PMID 20731456 DOI: 10.1021/Nn100686V |
0.416 |
|
| 2010 |
Sanders DP. Advances in patterning materials for 193 nm immersion lithography. Chemical Reviews. 110: 321-60. PMID 20070116 DOI: 10.1021/Cr900244N |
0.303 |
|
| 2010 |
Sanders DP, Cheng J, Rettner CT, Hinsberg WD, Kim HC, Friz HT, Harrer S, Holmes S, Colburn M. Integration of directed self-assembly with 193 nm lithography Journal of Photopolymer Science and Technology. 23: 11-18. DOI: 10.2494/Photopolymer.23.11 |
0.414 |
|
| 2010 |
Hinsberg W, Cheng J, Kim HC, Sanders DP. Self-assembling materials for lithographic patterning: Overview, status and moving forward Proceedings of Spie - the International Society For Optical Engineering. 7637. DOI: 10.1117/12.852230 |
0.417 |
|
| 2010 |
Chatterjee AK, Sanders DP, Grubbs RH. ChemInform Abstract: Synthesis of Symmetrical Trisubstituted Olefins by Cross Metathesis. Cheminform. 33: no-no. DOI: 10.1002/chin.200242069 |
0.558 |
|
| 2009 |
Coulembier O, Sanders DP, Nelson A, Hollenbeck AN, Horn HW, Rice JE, Fujiwara M, Dubois P, Hedrick JL. Hydrogen-bonding catalysts based on fluorinated alcohol derivatives for living polymerization. Angewandte Chemie (International Ed. in English). 48: 5170-3. PMID 19526473 DOI: 10.1002/Anie.200901006 |
0.482 |
|
| 2009 |
Cheng JY, Nelson A, Rettner CT, Sanders DP, Sutherland A, Pitera JW, Na YH, Kim HC, Hinsberg WD. Directed self-assembly on sparse chemical patterns for lithographic applications Journal of Photopolymer Science and Technology. 22: 219-222. DOI: 10.2494/Photopolymer.22.219 |
0.564 |
|
| 2008 |
Cheng JY, Sanders DP, Kim HC, Sundberg LK. Integration of polymer self-assembly for lithographic application Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.773247 |
0.457 |
|
| 2008 |
Sanders DP, Sundberg LK, Brock PJ, Ito H, Truong HD, Allen RD, McIntyre GR, Goldfarb DL. Self-segregating materials for immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772937 |
0.347 |
|
| 2008 |
Goldfarb DL, Burns SD, Vyklicky L, Pfeiffer D, Lisi A, Petrillo K, Arnold J, Sanders DP, Clancy A, Lang RN, Allen RD, Medeiros DR, Owe-Yang DC, Noda K, Tachibana S, et al. Graded spin-on organic bottom antireflective coating for high NA lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772268 |
0.325 |
|
| 2008 |
Cheng JK, Rettner CT, Sanders DP, Kim HC, Hinsberg WD. Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers Advanced Materials. 20: 3155-3158. DOI: 10.1002/Adma.200800826 |
0.41 |
|
| 2007 |
Sanders DP, Sundberg LK, Sooriyakumaran R, Brock PJ, DiPietro RA, Truong HD, Miller DC, Lawson MC, Allen RD. Fluoroalcohol materials with tailored interfacial properties for immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712768 |
0.323 |
|
| 2006 |
Allen RD, Breyta G, Brock P, DiPietro R, Sanders D, Sooriyakumaran R, Sundberg LK. Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography Journal of Photopolymer Science and Technology. 19: 569-572. DOI: 10.2494/Photopolymer.19.569 |
0.356 |
|
| 2005 |
Hong SH, Sanders DP, Lee CW, Grubbs RH. Prevention of undesirable isomerization during olefin metathesis. Journal of the American Chemical Society. 127: 17160-1. PMID 16332044 DOI: 10.1021/Ja052939W |
0.572 |
|
| 2005 |
Hong SH, Sanders DP, Lee CW, Grubbs RH. Prevention of olefin isomerization during olefin metathesis reactions Acs National Meeting Book of Abstracts. 229: ORGN-80. |
0.411 |
|
| 2003 |
Chatterjee AK, Choi TL, Sanders DP, Grubbs RH. A general model for selectivity in olefin cross metathesis. Journal of the American Chemical Society. 125: 11360-70. PMID 16220959 DOI: 10.1021/Ja0214882 |
0.672 |
|
| 2003 |
Sanders DP, Connor EF, Grubbs RH, Hung RJ, Osborn BP, Chiba T, MacDonald SA, Grant Willson C, Conley W. Metal-catalyzed addition polymers for 157 nm resist applications. Synthesis and polymerization of partially fluorinated, ester-functionalized tricyclo [4.2.1.02,5]non-7-enes Macromolecules. 36: 1534-1542. DOI: 10.1021/Ma021131I |
0.509 |
|
| 2003 |
Trinque BC, Chambers CR, Osborn BP, Callahan RP, Lee GS, Kusumoto S, Sanders DP, Grubbs RH, Conley WE, Willson CG. Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography Journal of Fluorine Chemistry. 122: 17-26. DOI: 10.1016/S0022-1139(03)00076-9 |
0.499 |
|
| 2002 |
Chatterjee AK, Sanders DP, Grubbs RH. Synthesis of symmetrical trisubstituted olefins by cross metathesis. Organic Letters. 4: 1939-42. PMID 12027652 DOI: 10.1021/Ol0259793 |
0.598 |
|
| 2002 |
Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, et al. Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Macromolecules. 35: 6539-6549. DOI: 10.1021/Ma0122371 |
0.487 |
|
| 2001 |
Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh Y, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, Sanders DP, Connor EF, Grubbs RH, Conley W, MacDonald SA, et al. Fluoropolymer Resist Materials for 157nm Microlithography. Journal of Photopolymer Science and Technology. 14: 669-674. DOI: 10.2494/Photopolymer.14.669 |
0.492 |
|
| 2001 |
Hung RJ, Tran HV, Trinque BC, Chiba T, Yamada S, Sanders DP, Connor EF, Grubbs RH, Klopp J, Frechet JMJ, Thomas BH, Shafer GJ, DesMarteau DD, Conley W, Grant Willson C. Resist materials for 157 nm microlithography: An update Proceedings of Spie - the International Society For Optical Engineering. 4345: 385-395. DOI: 10.1117/12.436870 |
0.347 |
|
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