Daniel J. Shir, Ph.D. - Publications

2010 University of Illinois, Urbana-Champaign, Urbana-Champaign, IL 

12 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Shir D, Ballard ZS, Ozcan A. Flexible Plasmonic Sensors Ieee Journal On Selected Topics in Quantum Electronics. 22. DOI: 10.1109/JSTQE.2015.2507363  0.68
2010 Lambeth RH, Park J, Liao H, Shir DJ, Jeon S, Rogers JA, Moore JS. Proximity field nanopatterning of azopolymer thin films. Nanotechnology. 21: 165301. PMID 20348592 DOI: 10.1088/0957-4484/21/16/165301  0.68
2010 Shir DJ, Nelson EC, Chanda D, Brzezinski A, Braun PV, Rogers JA, Wiltzius P. Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 783-788. DOI: 10.1116/1.3456181  0.68
2010 Shir D, Yoon J, Chanda D, Ryu JH, Rogers JA. Performance of ultrathin silicon solar microcells with nanostructures of relief formed by soft imprint lithography for broad band absorption enhancement Nano Letters. 10: 3041-3046. DOI: 10.1021/Nl101510Q  0.68
2009 Shir D, Nelson EC, Chen YC, Brzezinski A, Liao H, Braun PV, Wiltzius P, Bogart KHA, Rogers JA. Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography Applied Physics Letters. 94. DOI: 10.1063/1.3036955  0.68
2009 Campos LM, Truong TT, Shim DE, Dimitriou MD, Shir D, Meinel I, Gerbec JA, Hahn HT, Rogers JA, Hawker CJ. Applications of photocurable PMMS thiol-ene stamps in soft lithography Chemistry of Materials. 21: 5319-5326. DOI: 10.1021/Cm902506A  0.68
2008 Shir D, Liao H, Jeon S, Xiao D, Johnson HT, Bogart GR, Bogart KH, Rogers JA. Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric penrose quasicrystal phase masks. Nano Letters. 8: 2236-44. PMID 18605700 DOI: 10.1021/Nl080841K  0.68
2007 Jeon S, Shir DJ, Nam YS, Nidetz R, Highland M, Cahill DG, Rogers JA, Su MF, El-Kady IF, Christodoulou CG, Bogart GR. Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures. Optics Express. 15: 6358-66. PMID 19546940 DOI: 10.1364/Oe.15.006358  0.68
2007 Shir DJ, Jeon S, Liao H, Highland M, Cahill DG, Su MF, El-Kady IF, Christodoulou CG, Bogart GR, Hamza AV, Rogers JA. Three-dimensional nanofabrication with elastomeric phase masks. The Journal of Physical Chemistry. B. 111: 12945-58. PMID 17941660 DOI: 10.1021/Jp074093J  0.68
2007 Nam YS, Jeon S, Shir DJ, Hamza A, Rogers JA. Thick, three-dimensional nanoporous density-graded materials formed by optical exposures of photopolymers with controlled levels of absorption. Applied Optics. 46: 6350-4. PMID 17805373 DOI: 10.1364/Ao.46.006350  0.68
2007 Menard E, Meitl MA, Sun Y, Park JU, Shir DJ, Nam YS, Jeon S, Rogers JA. Micro- and nanopatterning techniques for organic electronic and optoelectronic systems. Chemical Reviews. 107: 1117-60. PMID 17428024 DOI: 10.1021/Cr050139Y  0.68
2006 Shir D, Liu BZ, Mohammad AM, Lew KK, Mohney SE. Oxidation of silicon nanowires Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1333-1336. DOI: 10.1116/1.2198847  0.68
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