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Mark H. Somervell, Ph.D. - Publications

Affiliations: 
2000 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
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47 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Zhang Y, D'Ambra CA, Katsumata R, Burns RL, Somervell M, Segalman RA, Hawker CJ, Bates CM. Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating. Acs Applied Materials & Interfaces. PMID 31117458 DOI: 10.1021/Acsami.9B05190  0.724
2019 Zhang Y, Discekici EH, Burns RL, Somervell MH, Hawker CJ, Bates CM. Single-Step, Spin-on Process for High Fidelity and Selective Deposition Acs Applied Polymer Materials. 2: 481-486. DOI: 10.1021/acsapm.9b00914  0.572
2017 Liu C, Franke E, Mignot Y, LeFevre S, Sieg S, Chi C, Meli L, Parnell D, Schmidt K, Sanchez M, Singh L, Furukawa T, Seshadri I, Silva EAD, Tsai H, ... ... Somervell M, et al. DSA patterning options for logics and memory applications Proceedings of Spie. 10146: 1014603. DOI: 10.1117/12.2260479  0.642
2016 Liu C, Franke E, Lie FL, Sieg S, Tsai H, Lai K, Truong H, Farrell R, Somervell M, Sanders D, Felix N, Guillorn M, Burns S, Hetzer D, Ko A, et al. Directed self-assembly patterning for forming fin field effect transistors Spie Newsroom. DOI: 10.1117/2.1201606.006519  0.627
2016 Pathangi H, Vaid V, Chan BT, Vandenbroeck N, Li J, Hong SE, Cao Y, Durairaj B, Lin G, Somervell M, Kitano T, Harukawa R, Sah K, Cross A, Bayana H, et al. DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC Proceedings of Spie. 9777. DOI: 10.1117/12.2219936  0.393
2016 Liu CCC, Franke E, Lie FL, Sieg S, Tsai H, Lai K, Truong H, Farrell R, Somervell M, Sanders D, Felix N, Guillorn M, Burns S, Hetzer D, Ko A, et al. DSA patterning options for FinFET formation at 7nm node Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219670  0.775
2016 Muramatsu M, Nishi T, You G, Saito Y, Ido Y, Ito K, Tobana T, Hosoya M, Chen W, Nakamura S, Somervell M, Kitano T. Pattern fidelity improvement of chemo-epitaxy DSA process for high-volume manufacturing Proceedings of Spie. 9777. DOI: 10.1117/12.2218595  0.439
2015 Gronheid R, Doise J, Bekaert J, Chan BT, Karageorgos I, Ryckaert J, Vandenberghe G, Cao Y, Lin G, Somervell M, Fenger G, Fuchimoto D. Implementation of templated DSA for via layer patterning at the 7nm node Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086090  0.412
2015 Liu CC, Lie FL, Rastogi V, Franke E, Mohanty N, Farrell R, Tsai H, Lai K, Ozlem M, Cho W, Jung SG, Strane J, Somervell M, Burns S, Felix N, et al. Fin formation using graphoepitaxy DSA for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086053  0.779
2015 Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Kawakami S, Muramatsu M, Iijima E, Rastogi V, Nakano T, Iwao F, Nagahara S, Iwaki H, Dojun M, Yatsuda K, et al. Driving DSA into volume manufacturing Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2085776  0.761
2015 Peters BL, Rathsack B, Somervell M, Nakano T, Schmid G, De Pablo JJ. Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes Journal of Polymer Science, Part B: Polymer Physics. 53: 430-441. DOI: 10.1002/Polb.23652  0.773
2014 Gronheid R, Bekaert J, Murugesan Kuppuswamy VK, Vandenbroeck N, Doise J, Cao Y, Lin G, Sayan S, Parnell D, Somervell M. Process optimization of templated DSA flows Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2047266  0.444
2014 Gronheid R, Delgadillo PR, Pathangi H, Van Den Heuvel D, Parnell D, Chan BT, Lee YT, Van Look L, Cao Y, Her Y, Lin G, Harukawa R, Nagaswami V, D'Urzo L, Somervell M, et al. Defect reduction and defect stability in imec'S 14NM half pitch chemo-epitaxy DSA flow Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2047265  0.396
2014 Liu CC, Estrada-Raygoza C, He H, Cicoria M, Rastogi V, Mohanty N, Tsai H, Schepis A, Lai K, Chao R, Liu D, Guillorn M, Cantone J, Mignot S, Kim RH, ... ... Somervell M, et al. Towards electrical testable soi devices using directed self-assembly for fin formation Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046462  0.663
2014 Romo-Negreira A, Younkin TR, Gronheid R, Demuynck S, Vandenbroeck N, Seo T, Guerrero DJ, Parnell D, Muramatsu M, Shinichiro K, Takashi Y, Nafus K, Somervell MH. Evaluation of integration schemes for contact-hole graphoepitaxy dsa: A study of substrate and template affinity control Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046119  0.436
2014 Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Iijima E, Nakano T, Ishiguro T, Nagahara S, Iwaki H, Dojun M, Ozawa M, Yatsuda K, Tobana T, Romo Negreira A, et al. High-volume manufacturing equipment and processing for directed self-assembly applications Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2045975  0.774
2014 Chauhan S, Somervell M, Carcasi M, Scheer S, Bonnecaze RT, MacK CA, Grant Willson C. Mesoscale modeling: A study of particle generation and line-edge roughness Journal of Micro/Nanolithography, Mems, and Moems. 13. DOI: 10.1117/1.Jmm.13.1.013012  0.372
2013 Gronheid R, Singh A, Younkin TR, Rincon Delgadillo P, Nealey P, Chan BT, Nafus K, Negreira AR, Somervell M. Rectification of EUV-patterned contact holes using directed self-assembly Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012667  0.425
2013 Younkin TR, Gronheid R, Rincon Delgadillo P, Chan BT, Vandenbroeck N, Demuynck S, Romo-Negreira A, Parnell D, Nafus K, Tahara S, Somervell M. Progress in Directed Self-Assembly hole shrink applications Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012353  0.454
2013 Rathsack B, Somervell M, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Iwaki H, Akai K, Ozawa M, Negreira AR, Tahara S, Nafus K. Advances in directed self assembly integration and manufacturability at 300 mm Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012018  0.756
2013 Cao Y, Her YJ, Delgadillo PR, Vandenbroeck N, Gronheid R, Chan BT, Hashimoto Y, Romo A, Somervell M, Nafus K, Nealey PF. Using process monitor wafers to understand directed self-assembly defects Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011658  0.39
2013 Liu CC, Estrada-Raygoza IC, Abdallah J, Holmes S, Yin Y, Schepis A, Cicoria M, Hetzer D, Tsai H, Guilllorn M, Tjio M, Cheng J, Somervell M, Colburn M. Directed self-assembly process implementation in a 300mm pilot line environment Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011610  0.695
2013 Schmid G, Farrell R, Xu J, Park C, Preil M, Chakrapani V, Mohanty N, Ko A, Cicoria M, Hetzer D, Somervell M, Rathsack B. Fabrication of 28nm pitch Si fins with DSA lithography Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011607  0.796
2013 Rincon Delgadillo PA, Gronheid R, Lin G, Cao Y, Romo A, Somervell M, Nafus K, Nealey PF. Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011446  0.455
2012 Rincon Delgadilloa PA, Gronheid R, Thode CJ, Wu H, Cao Y, Lin G, Somervell M, Nafus K, Nealey PF. Geometric control of chemically nano-patterned substrates for feature multiplication using directed self-assembly of block copolymers Journal of Photopolymer Science and Technology. 25: 77-81. DOI: 10.2494/Photopolymer.25.77  0.369
2012 Rincon Delgadillo PA, Gronheid R, Thode CJ, Wu H, Cao Y, Somervell M, Nafus K, Nealey PF. All track directed self-assembly of block copolymers: Process flow and origin of defects Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916410  0.433
2012 Somervell M, Gronheid R, Hooge J, Nafus K, Delgadillo PR, Thode C, Younkin T, Matsunaga K, Rathsack B, Scheer S, Nealey P. Comparison of directed self-assembly integrations Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916406  0.748
2012 Rathsack B, Somervell M, Hooge J, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Hiroyuki I, Akai K, Hayakawa T. Pattern scaling with directed self assembly through lithography and etch process integration Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916311  0.775
2012 Muramatsu M, Iwashita M, Kitano T, Toshima T, Somervell M, Seino Y, Kawamura D, Kanno M, Kobayashi K, Azuma T. Nanopatterning of diblock copolymer directed self-assembly lithography with wet development Journal of Micro/Nanolithography, Mems, and Moems. 11. DOI: 10.1117/1.Jmm.11.3.031305  0.423
2012 Gronheid R, Rincon Delgadillo PA, Younkin TR, Pollentier I, Somervell M, Hooge JS, Nafus K, Nealey PF. Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern Journal of Micro/Nanolithography, Mems, and Moems. 11. DOI: 10.1117/1.Jmm.11.3.031303  0.408
2012 Delgadillo PAR, Gronheid R, Thode CJ, Wu H, Cao Y, Neisser M, Somervell M, Nafus K, Nealey PF. Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment Journal of Micro/Nanolithography, Mems, and Moems. 11. DOI: 10.1117/1.Jmm.11.3.031302  0.474
2010 Chauhan S, Somervell M, Carcasi M, Scheer S, Bonnecaze RT, Mack C, Willson CG. Particle generation during photoresist dissolution Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848424  0.551
2010 Carcasi M, Somervell M, Scheer S, Chauhan S, Strahan J, Willson CG. Extension of 248 nm Monte Carlo, mesoscale models to 193 nm platforms Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.846658  0.622
2010 Fonseca C, Somervell M, Scheer S, Kuwahara Y, Nafus K, Gronheid R, Tarutani S, Enomoto Y. Advances in dual-tone development for pitch frequency doubling Proceedings of Spie - the International Society For Optical Engineering. 7640. DOI: 10.1117/12.846575  0.472
2009 Chauhan S, Somervell M, Scheer S, Mack C, Bonnecaze RT, Willson CG. Polymer dissolution model: An energy adaptation of the critical ionization theory Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814344  0.576
2009 Fonseca C, Somervell M, Scheer S, Printz W, Nafus K, Hatakeyama S, Kuwahara Y, Niwa T, Bernard S, Gronheid R. Advances and challenges in dual-tone development process optimization Proceedings of Spie - the International Society For Optical Engineering. 7274. DOI: 10.1117/12.814289  0.458
2008 Kawasaki T, Shimura S, Iwao F, Nishimura E, Kushibiki M, Hasebe K, Carcasi M, Somervell M, Scheer S, Yaegashi H. Fabrication of 32nm contact/via hole by photolithographic-friendly method Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.771907  0.457
2002 Mark Ma Z, Kim W, Rathsack B, Xing G, Somervell M, Hong H. CD variations from non-trivial mask related factors Proceedings of Spie - the International Society For Optical Engineering. 4754: 677-683. DOI: 10.1117/12.476928  0.709
2001 Jamieson A, Somervell M, Hoang Vi Tran, Hung R, MacDonald SA, Grant Willson C. Top surface imaging at 157 nm Proceedings of Spie - the International Society For Optical Engineering. 4345: 406-416. DOI: 10.1117/12.436872  0.705
2000 Chiba T, Hung RJ, Yamada S, Trinque B, Yamachika M, Brodsky C, Patterson K, Heyden AV, Jamison A, Lin SH, Somervell M, Byers J, Conley W, Willson CG. 157 nm Resist Materials: A Progress Report. Journal of Photopolymer Science and Technology. 13: 657-664. DOI: 10.2494/Photopolymer.13.657  0.77
2000 Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, et al. 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401. DOI: 10.1116/1.1321762  0.719
2000 Somervell MH, Fryer DS, Osborn B, Patterson K, Byers J, Willson CG. Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 2551-2559. DOI: 10.1116/1.1289547  0.766
2000 Stewart MD, Patterson K, Somervell MH, Willson CG. Organic imaging materials: a view of the future Journal of Physical Organic Chemistry. 13: 767-774. DOI: 10.1002/1099-1395(200012)13:12<767::Aid-Poc323>3.0.Co;2-A  0.763
2000 Chiba T, Hung RJ, Yamada S, Trinque B, Yamachika M, Brodsky C, Patterson K, Heyden AV, Jamison A, Lin SH, Somervell M, Byers J, Conley W, Grant Willson C. 157 nm resist materials: A progress report Journal of Photopolymer Science and Technology. 13: 657-664.  0.81
2000 Patterson K, Yamachika M, Hung R, Brodsky C, Yamada S, Somervell M, Osborn B, Hall D, Dukovic G, Byers J, Conley W, Willson CG. Polymers for 157 nm photoresist applications: A progress report Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  0.785
2000 Somervell MH, Fryer DS, Osborn B, Patterson K, Cho S, Byers J, Willson CG. Using alicyclic polymers in top surface imaging systems to reduce line edge roughness Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  0.759
1998 Postnikov SV, Somervell MH, Henderson CL, Katz S, Willson CG, Byers JD, Qin A, Lin Q. Top surface imaging through silylation Proceedings of Spie - the International Society For Optical Engineering. 3333: 997-1008. DOI: 10.1117/12.312370  0.57
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