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Andrew T. Jamieson, Ph.D. - Publications

Affiliations: 
2004 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
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7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2006 Pawloski AR, Acheta A, Levinson HJ, Michaelson TB, Jamieson A, Nishimura Y, Grant Willson C. Line edge roughness and intrinsic bias for two methacrylate polymer resist systems Journal of Microlithography, Microfabrication and Microsystems. 5. DOI: 10.1117/1.2200675  0.738
2005 Meiring JE, Michaelson TB, Jamieson AT, Schmid GM, Willson CG. Using mesoscale simulation to explore photoresist line edge roughness Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 350-360. DOI: 10.1117/12.599736  0.576
2004 Jamieson A, Willson CG, Hsu Y, Brodie AD. Low-voltage electron beam lithography resist processes: Top surface imaging and hydrogen silisesquioxane bilayer Journal of Microlithography, Microfabrication and Microsystems. 3: 442-449. DOI: 10.1117/1.1758268  0.568
2003 Johnson SC, Bailey TC, Dickey MD, Smith BJ, Kim EK, Jamieson AT, Stacey NA, Ekerdt JG, Willson CG, Mancini DP, Dauksher WJ, Nordquist KJ, Resnick DJ. Advances in step and flash imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 5037: 197-202. DOI: 10.1117/12.484985  0.573
2003 Johnson HF, Ozair SN, Jamieson A, Trinque BC, Brodsky CC, Willson CG. Cationic graft polymerization lithography Proceedings of Spie - the International Society For Optical Engineering. 5037: 943-951. DOI: 10.1117/12.484974  0.635
2001 Jamieson A, Somervell M, Hoang Vi Tran, Hung R, MacDonald SA, Grant Willson C. Top surface imaging at 157 nm Proceedings of Spie - the International Society For Optical Engineering. 4345: 406-416. DOI: 10.1117/12.436872  0.678
2000 Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, et al. 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401. DOI: 10.1116/1.1321762  0.499
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