Timothy B. Michaelson, Ph.D. - Publications

Affiliations: 
2005 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials

9 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2009 Chen L, Bekiaris N, Michaelson T, Mori G. Improved CD uniformity for chemical shrink patterning Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814359  0.88
2009 Meiring JE, Lee S, Costner EA, Schmid MJ, Michaelson TB, Willson CG, Grayson SM. Pattern recognition of shape-encoded hydrogel biosensor arrays Optical Engineering. 48. DOI: 10.1117/1.3099722  0.88
2008 Michaelson T, Dai J, Chen L, Cervera H, Lue B, Herchen H, Vellore K, Bekiaris N. Wafer shape compensation at the track PEB for improved CD uniformity Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772894  0.88
2006 Pawloski AR, Acheta A, Levinson HJ, Michaelson TB, Jamieson A, Nishimura Y, Grant Willson C. Line edge roughness and intrinsic bias for two methacrylate polymer resist systems Journal of Microlithography, Microfabrication and Microsystems. 5. DOI: 10.1117/1.2200675  0.88
2005 Nishimura Y, Michaelson TB, Meiring JE, Stewart MD, Willson CG. Line edge roughness in chemically amplified resist: Speculation, simulation and application Journal of Photopolymer Science and Technology. 18: 457-465. DOI: 10.2494/photopolymer.18.457  0.88
2005 Michaelson TB, Pawloski AR, Acheta A, Nishimura Y, Willson CG. The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 368-379. DOI: 10.1117/12.599848  0.88
2005 Meiring JE, Michaelson TB, Jamieson AT, Schmid GM, Willson CG. Using mesoscale simulation to explore photoresist line edge roughness Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 350-360. DOI: 10.1117/12.599736  0.88
2002 Stewart MD, Becker DJ, Stachowiak TB, Schmid GM, Michaelson TB, Tran HV, Willson CG. Acid mobility in chemically amplified photoresists Proceedings of Spie - the International Society For Optical Engineering. 4690: 943-951. DOI: 10.1117/12.474168  0.88
1999 Colburn M, Johnson S, Stewart M, Damle S, Bailey T, Choi B, Wedlake M, Michaelson T, Sreenivasan SV, Ekerdt J, Willson CG. Step and flash imprint lithography: A new approach to high-resolution patterning Proceedings of Spie - the International Society For Optical Engineering. 3676: 379-389.  0.88
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